Abstract: A pipeline apparatus has a body configured to fit inside a pipeline. A flow channel is formed within the body and includes an inlet, an outlet, and a bypass channel connecting the inlet and the outlet, the inlet being configured to receive a portion of a fluid flowing through the pipeline, and the outlet being configured such that the fluid flowing through the bypass channel flows out of the bypass channel through the outlet. A flow control valve is attached to the body and has a sleeve configured to move to vary a flow rate of the fluid flowing out of the outlet. A motor is provided in a chamber in the body and is configured to move the sleeve.
Type:
Grant
Filed:
February 24, 2010
Date of Patent:
June 25, 2013
Assignee:
PII (Canada) Limited
Inventors:
Raymond Harvey, Leon Fussell, Francesco Zingoni
Abstract: There is provided a substrate processing method of supplying a processing solution to a substrate through a supply nozzle connected with a supply path via a differential pressure flowmeter provided on the supply path for supplying the processing solution and performing a process on the substrate by the processing solution. The substrate processing method includes measuring a pressure value in the supply path by a pressure measurement unit included in the differential pressure flowmeter when the processing solution is not supplied to the substrate; determining whether the pressure measurement unit is operated normally by comparing the pressure value measured in the measuring process with a predetermined pressure value; and supplying the processing solution to a substrate if it is determined that the pressure measurement unit is operated normally in the determining process.