Abstract: A method of scanning over a substrate includes implementing a write mode of the substrate by scanning a probe across a substrate, the probe having a spring cantilever probe mechanically fixed to a probe holding structure, a tip with a nanoscale apex, and an actuator for lateral positioning of the tip; the actuator comprising a thermally switchable element and a heating element for heating the thermally switchable element; and heating the heating element to a given temperature so as to locally soften a portion of the substrate and applying a force to the softened portion of the substrate through the tip so as to create one or more indentation marks in the softened portion of the substrate.

Abstract: A method for improving the resolution of STEM images of thick samples. In STEM, the diameter of the cross-over depends on the opening half-angle ? of the beam and can be as low as 0.1 nm. For optimum resolution an opening half-angle is chosen at which the diameter of the cross-over R(?) shows a minimum. For thick samples the resolution is, for those parts of the sample removed from the cross-over plane, limited by the convergence of the beam, resulting in a diameter D of the beam at the surface of the sample. The opening angle is chosen to balance the contribution of convergence and of diameter of the cross-over by choosing an opening half-angle smaller than the optimum opening half-angle. Effectively the sample is then scanned with a beam that has a substantially constant diameter over the length of the sample material through which the electrons have to travel.

Abstract: An system for the measurement, analysis, and imaging of objects and surfaces in a variety of sizes is provided. In the most general terms, the invention relates to a device capable of measuring an object using a combination of low-resolution optical, high-resolution optical, SPM/AFM and/or material analysis techniques. The data gathered at various resolutions is correlated to absolute locations on the object's surface, allowing selected regions of the object's surface to be analyzed to any desired degree of precision (down to atomic scale). In a specific embodiment of the present invention, a system for collecting measurement data regarding an object of interest is disclosed. The system includes a sample stage adapted to hold the object of interest. The system further includes an optical lens assembly disposed above the sample stage. The optical lens assembly is configured to capture an optical image of the object of interest.

Abstract: Provided is a scanning probe microscope (SPM), a probe of which can be automatically replaced and the replacement probe can be attached onto an exact position. The SPM includes a first scanner that has a carrier holder, and changes a position of the carrier holder in a straight line; a second scanner changing a position of a sample on a plane; and a tray being able to store a spare carrier and a spare probe attached to the spare carrier. The carrier holder includes a plurality of protrusions.

Abstract: A drive stage for a scanning probe apparatus includes a supporting member, a plurality of movable portions fixed to the supporting member, and a plurality of drive elements configured and positioned to drive the plurality of movable portions. The drive stage is driven in a direction in which inertial forces of the plurality of movable portions are mutually canceled during drive of the plurality of drive elements. The drive stage further includes an inertial force difference detection member configured and positioned to detect a difference in inertial force between the plurality of movable portions, and an inertial force adjustment member configured and positioned to effect inertial force adjustment so that the difference in inertial force between the plurality of movable portions is decreased on the basis of a detection output of the inertial force detection member.

Abstract: In accordance with the invention, a computer pointing device is interfaced with an SPM system to provide real time control of the SPM and improve the ease of use.

Abstract: Provided is a scanning probe microscope capable of precisely analyzing characteristics of samples having an overhang surface structure. The scanning probe microscope comprises a first probe, a first scanner changing a position of the first probe along a straight line, and a second scanner changing a position of a sample in a plane, wherein the straight line in which the position of the first probe is changed by using the first scanner is non-perpendicular to the plane in which the position of the sample is changed by using the second scanner.

Abstract: An apparatus including an actuator configured for controllable deflection, and also including a piezoresistive element integral to the actuator and having first and second piezoresistive portions and a plurality of contacts. One of the plurality of contacts is configured to pass a received feedback signal through the first and second piezoresistive portions. Detection of the actuator deflection is indicated by comparison of the feedback signal as detected via at least one of the plurality of contacts that are interposed by at least one of the first and second piezoresistive portions.

Abstract: When writing the shapes of elements of a fine pattern on a substrate by microscopically vibrating the electron beam back and forth in a radial direction of the substrate or in a direction orthogonal to the radial direction and deflecting the electron beam in a direction orthogonal to the vibration direction to scan the electron beam so as to completely fill the shapes of the elements, a proximity-effect correction is performed according to the arrangement density of the elements in which the amount of dose is adjusted by setting the deflection speed faster for the writing of an element in a densely arranged region than for the writing of an identical element in a sparsely arranged region.

Abstract: When performing writing on a substrate applied with a resist by rapidly vibrating electron beam in a direction orthogonal to a radial direction of the substrate and X-Y deflecting the electron beam while rotating the substrate in one direction, a long element is written by scanning the electron beam with the middle position of a 2-bit signal length as the center position of the electron beam so as to completely fill the area of the writing length reduced by a predetermined ratio and an unwritten portion of predetermined width remaining on each side of the long element with respect to a final 2-bit signal length on a magnetic disk medium.

Abstract: A method of position control for scanning probe spectroscopy of a specimen. Probe positional error is determined by comparing images generated from a sequence of scans to identify differences between positions of at least a portion of a reference characteristic of the specimen in the images. A probe is moved to a target location for spectroscopic analysis, as a function of the determined probe positional error.

Abstract: A fine pattern which includes servo patterns, each constituted by servo elements, and groove patterns, each for separating adjacent data tracks, is formed on a substrate applied with a resist and placed on a rotation stage by scanning an electron beam on the substrate. While rotating the substrate in one direction, the electron beam is scanned so as to completely fill servo elements corresponding to a plurality of tracks one by one during one rotation of the substrate by X-Y deflecting the electron beam and vibrating back and forth in the radius direction. Each groove pattern is set as a line-up of a plurality of groove elements divided at a predetermined angle, and groove elements corresponding to the plurality of tracks following the writing of the servo elements are sequentially written by deflection scanning the electron beam largely in a circumferential direction during the same rotation.

Abstract: When writing a fine pattern on a substrate applied with a resist by scanning an electron beam on the substrate such that each element of the fine pattern is completely filled by the electron beam, the rotational speed of the rotation stage is controlled so as to be fast in writing on an inner circumferential track and slow in writing on an outer circumferential track in inversely proportional to the radius of the writing position. A write control signal of the electron beam is generated based on a writing clock signal generated in association with the rotation of the rotation stage, and the number of clocks of the writing clock signal in one rotation of the rotation stage is maintained at a constant value for each track irrespective of the radius of the writing position.

Abstract: A method for improving the resolution of STEM images of thick samples. In STEM, the diameter of the cross-over depends on the opening half-angle ? of the beam and can be as low as 0.1 nm. For optimum resolution an opening half-angle is chosen at which the diameter of the cross-over R(?) shows a minimum. For thick samples the resolution is, for those parts of the sample removed from the cross-over plane, limited by the convergence of the beam, resulting in a diameter D of the beam at the surface of the sample. The opening angle is chosen to balance the contribution of convergence and of diameter of the cross-over by choosing an opening half-angle smaller than the optimum opening half-angle. Effectively the sample is then scanned with a beam that has a substantially constant diameter over the length of the sample material through which the electrons have to travel.

Abstract: A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.