Abstract: An only inkjet-printing-based process for depositing functional materials, in various instances PZT, Bi-based material or (K,Na)-based material, on a substrate, in various instances platinized silicon. Substrate templating (via SAMs) and material deposition are both performed by an inkjet printing process. Additionally, a composition to be used as a SAM precursor ink which is a thiol in a solvent mixture. Further, a cartridge for a printing machine with such a composition. Still further, the use of such a cartridge, alone, or as a kit with another cartridge containing a precursor of the functional material, in particular to perform both steps of the printing method. Finally, a product, for instance a microsystem, obtained by the process.

Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged par

Abstract: Electron source designs are disclosed. The emitter structure, which may be silicon, has a layer on it. The layer may be graphene or a photoemissive material, such as an alkali halide. An additional layer between the emitter structure and the layer or a protective layer on the layer can be included. Methods of operation and methods of manufacturing also are disclosed.

Abstract: An X-ray tube assembly is provided including an emitter configured to emit an electron beam, an emitter focusing electrode, an extraction electrode, and a downstream focusing electrode. The emitter focusing electrode is disposed proximate to the emitter and outward of the emitter in an axial direction. The extraction electrode is disposed downstream of the emitter and the emitter focusing electrode. The extraction electrode has a negative bias voltage setting at which the extraction electrode has a negative bias voltage with respect to the emitter. The downstream focusing electrode is disposed downstream of the extraction electrode, and has a positive bias voltage with respect to the emitter. When the extraction electrode is at the negative bias voltage setting, the electron beam is emitted from an emission area that is smaller than a maximum emission area from which electrons may be emitted.

Abstract: The disclosure relates to methods of beam pen lithography using a tip array having a plurality of transparent, elastomeric, reversibly-deformable tips coated with a blocking layer and apertures defined in the blocking layer to expose tip ends of the tips in the array. The tip array can be used to perform a photolithography process in which the tips are illuminated with a radiation that is channeled through the tips and out the apertures to expose a photosensitive substrate. Also disclosed are tip arrays formed of polymers and gels, apparatus including the tip arrays and radiation sources, and related apparatus for selectively masking tips in the tip array from radiation emitted from the radiation source.

Abstract: The present invention relates to an atomic resolution deformation distribution measurement device that can measure a deformation rate of an atomic scale with low expense by improving resolution using an AFM system, and the atomic resolution deformation distribution measurement device includes: a laser source generating a laser beam; a first cantilever and a second cantilever provided close to a measurement specimen or a reference specimen to cause deformation by an atomic force; an optical system controlling a light path of the laser beam so as to cause the laser beam to be sequentially reflected to the first cantilever and the second cantilever and locate the first cantilever and the second cantilever to an image point; a measurement unit measuring the laser beam reflected from the second cantilever; and a stage on which a measurement specimen or a reference specimen is located and movable in X, Y, and Z axis directions.

Abstract: The invention provides methods for sharpening the tip of an electrical conductor. The methods of the invention are capable of producing tips with an apex radius of curvature less than 2 nm. The methods of the invention are based on simultaneous direction of ionized atoms towards the apex of a previously sharpened conducting tip and application of an electric potential difference to the tip. The sign of the charge on the ions is the same as the sign of the electric potential. The methods of the invention can be used to sharpen metal wires, metal wires tipped with conductive coatings, multi-walled carbon nanotubes, semiconducting nanowires and semiconductors in other forms.

Abstract: The invention refers to a probe assembly for a scanning probe microscope which comprises at least one first probe-adapted for analyzing a specimen, at least one second probe adapted for modifying the specimen and at least one motion element associated with the probe assembly and adapted for scanning one of the probes being in a working position across a surface of the specimen so that the at least one first probe interacts with the specimen whereas the at least one second probe is in a neutral position in which it does not interact with the specimen and to bring the at least one second probe into a position so that the at least one second probe can modify a region of the specimen analyzed with the at least one first probe.

Abstract: A method of leveling a polymer pen array includes contacting a pen array with a surface and measuring a total force exerted on the surface by the pen array, the pen array being disposed at a first angle with respect to a first axis of the surface and a second angle with respect to a second axis of the surface; tilting one or both of the pen array and the surface to vary the first and second angles of the pen array with respect to the surface; measuring the total force exerted by the tilted pen array on the surface; and repeating the tilting and measuring steps until a global maximum of the total force exerted on the surface by the pen array is measured, thereby determining first and second angles which correspond to a leveled position of the pen array with respect to the surface.

Abstract: An apparatus and method for the controlled fabrication of nanostructures using catalyst retaining structures is disclosed. The apparatus includes one or more modified force microscopes having a nanotube attached to the tip portion of the microscopes. An electric current is passed from the nanotube to a catalyst layer of a substrate, thereby causing a localized chemical reaction to occur in a resist layer adjacent the catalyst layer. The region of the resist layer where the chemical reaction occurred is etched, thereby exposing a catalyst particle or particles in the catalyst layer surrounded by a wall of unetched resist material. Subsequent chemical vapor deposition causes growth of a nanostructure to occur upward through the wall of unetched resist material having controlled characteristics of height and diameter and, for parallel systems, number density.

Abstract: A dynamic probe detection system (29,32) is for use with a scanning probe microscope of the type that includes a probe (18) that is moved repeatedly towards and away from a sample surface. As a sample surface is scanned, an interferometer (88) generates an output height signal indicative of a path difference between light reflected from the probe (80a,80b,80c) and a height reference beam. Signal processing apparatus monitors the height signal and derives a measurement for each oscillation cycle that is indicative of the height of the probe. This enables extraction of a measurement that represents the height of the sample, without recourse to averaging or filtering, that may be used to form an image of the sample. The detection system may also include a feedback mechanism that is operable to maintain the average value of a feedback parameter at a set level.

Abstract: The stress due to contact between a probe and a measurement sample is improved when using a microcontact prober having a conductive nanotube, nanowire, or nanopillar probe, the insulating layer at the contact interface is removed, thereby the contact resistance is reduced, and the performance of semiconductor device examination is improved. The microcontact prober comprises a cantilever probe in which each cantilever is provided with a nanowire, nanopillar, or a metal-coated carbon nanotube probe projecting by 50 to 100 nm from a holder provided at the fore end and a vibrating mechanism for vibrating the cantilever horizontally with respect to the subject. The fore end of the holder may project from the free end of the cantilever, and the fore end of the holder can be checked from above the cantilever.

Abstract: A The local probe microscopy apparatus (1) comprises a probe (3) with translation stages (5a, 5b) for controlling the position of the probe (3) relative to a sample surface. The probe (3) has a feedback mechanism (6, 5 7) for maintaining the deflection of the probe and a height measuring system (9) which includes means for compensating for environmental noise. The local probe microscopy apparatus is particularly suitable for use as a wafer inspection tool in a wafer fabrication plant where the inspection tool is liable to be exposed to significant mechanical vibration.

Abstract: An optical tip for a Near-field Scanning Optical Microscope (NSOM) is provided. The optical tip includes a waveguide with a semiconductor or metal core and a cladding. The refractive-index-square-ratio contrast between the core and the cladding is at least 0.3. The optical tip may also include a light detector and a light source. The waveguide, the light source and the light detector may be integrated to form a single chip.

Abstract: A microcantilever sensor includes a supporting substrate, a cantilever spring element at least partially disposed over the support substrate, a probe layer disposed over the first side of the cantilever spring element, and a piezoresistive transducer attached to the second side of the cantilever spring element. The cantilever spring element is characterized by having a first side and a second side and comprising a polymer having a Young's modulus less than about 100 Gpa. Sensing systems that incorporate the cantilever sensor of the invention include a detector in communication with the piezoresistive transducer to provide measurements of surface strain changes in the piezoresistive transducer.

Abstract: The disclosure relates to methods of beam pen lithography using a tip array having a plurality of transparent, elastomeric, reversibly-deformable tips coated with a blocking layer and apertures defined in the blocking layer to expose tip ends of the tips in the array. The tip array can be used to perform a photolithography process in which the tips are illuminated with a radiation that is channeled through the tips and out the apertures to expose a photosensitive substrate. Also disclosed are tip arrays formed of polymers and gels, apparatus including the tip arrays and radiation sources, and related apparatus for selectively masking tips in the tip array from radiation emitted from the radiation source.

Abstract: The invention provides a scanning probe microscope capable of performing highly accurate three-dimensional profile measurement in a state in which no sliding of the probe or deformation of the sample substantially occurs.

Abstract: An improved method of loading tips and other surfaces with patterning compositions or inks for use in deposition. A method of patterning is described, the method comprising: (i) providing at least one array of tips; (ii) providing a plurality of patterning compositions; (iii) ink jet printing at least some of the patterning compositions onto some of the tips; and (iv) depositing at least some of the patterning compositions onto a substrate surface; wherein the ink jet printing is adapted to prevent substantial cross-contamination of the patterning composition on the tips. Good printing reproducibility and control of printing rate can be achieved. The surfaces subjected to ink jet printing can be treated to encourage localization of the ink at the tip. The method is particularly important for high density arrays.

Abstract: In a two-dimensional probe array, an interval between the leading ends of probes adjacent to each other in an X direction is made shorter than that between the leading ends of probes adjacent to each other in a Y direction. Thus, the leading ends of the probes are arranged to form a lattice wherein many rectangles are arranged. Furthermore, the lowest resonance frequency of an actuator which moves a recording medium in the X direction is set higher than the lowest resonance frequency of an actuator which moves the recording medium in the Y direction. At the time of recording or reading information, the recording medium is reciprocated in the X direction at a frequency substantially equal to the lowest resonance frequency of the actuator.

Abstract: A process manufactures a probe intended to interact with a storage medium of a probe-storage system, wherein a sacrificial layer is deposited on top of a substrate; a hole is formed in the sacrificial layer; a mold layer is deposited; the mold layer is etched via the technique for forming spacers so as to form a mold region delimiting an opening having an area decreasing towards the substrate. Then a stack of conductive layers is deposited on top of the sacrificial layer, the stack is etched so as to form a suspended structure, formed by a pair of supporting arms arranged to form a V, and an interaction tip projecting monolithically from the supporting arms. Then a stiffening structure is formed, of insulating material, and the suspended structure is fixed to a supporting wafer. The substrate, the sacrificial layer, and, last, the mold region are then removed.

Abstract: A probe assembly is for use in a scanning probe microscope. The probe assembly includes a carrier having a plurality of at least three substantially identical probes, each probe having a tip that is located on a plane that is common to the plurality of probe tips and that is movable from this plane. The assembly also includes addressing means adapted to select one of the plurality of probes for relative movement with respect to a majority of the remainder of the probes. Such an assembly, with its potential to facilitate rapid, perhaps automated, replacement of a used probe, lends itself to use in high-speed scanning apparatus.

Abstract: Provided is a scanning probe microscope (SPM), a probe of which can be automatically replaced and the replacement probe can be attached onto an exact position. The SPM includes a first scanner that has a carrier holder, and changes a position of the carrier holder in a straight line; a second scanner changing a position of a sample on a plane; and a tray being able to store a spare carrier and a spare probe attached to the spare carrier. The carrier holder includes a plurality of protrusions.

Abstract: A disclosed chemical detection system for detecting a target material, such as an explosive material, can include a cantilevered probe, a probe heater coupled to the cantilevered probe, and a piezoelectric element disposed on the cantilevered probe. The piezoelectric element can be configured as a detector and/or an actuator. Detection can include, for example, detecting a movement of the cantilevered probe or a property of the cantilevered probe. The movement or a change in the property of the cantilevered probe can occur, for example, by adsorption of the target material, desorption of the target material, reaction of the target material and/or phase change of the target material. Examples of detectable movements and properties include temperature shifts, impedance shifts, and resonant frequency shifts of the cantilevered probe. The overall chemical detection system can be incorporated, for example, into a handheld explosive material detection system.

Abstract: The present invention provides a scanning probe microscope cantilever comprising a support portion, a lever portion extended from the support portion, and a needle projecting out of a first surface of the cantilever in the vicinity of a free end of the lever portion. From a second surface of the cantilever opposite the first surface, a bore extends through the needle to an aperture formed at a tip of the needle. To the tip of the needle, a substantially globular particle is attached. A method of scanning a sample surface comprises creating relative cantilever motion substantially toward the sample such that the particle experiences a contact force with the sample, illuminating a top surface of the cantilever with laser light such that a portion of the laser light passes through the hollow needle and is emitted from the aperture onto the particle, and detecting scattered light from the sample.

Abstract: An improved method of loading tips and other surfaces with patterning compositions or inks for use in deposition. A method of patterning is described, the method comprising: (i) providing at least one array of tips; (ii) providing a plurality of patterning compositions; (iii) ink jet printing at least some of the patterning compositions onto some of the tips; and (iv) depositing at least some of the patterning compositions onto a substrate surface; wherein the ink jet printing is adapted to prevent substantial cross-contamination of the patterning composition on the tips. Good printing reproducibility and control of printing rate can be achieved. The surfaces subjected to ink jet printing can be treated to encourage localization of the ink at the tip. The method is particularly important for high density arrays.