Magnet Or Solenoid Activating Means Patents (Class 96/36)
  • Patent number: 7871063
    Abstract: A two phase reactor includes a source of liquid reactant and a source of gas reactant. A chamber has an inlet coupled to the source of gas reactant and a flat jet nozzle coupled to the source of the liquid reactant.
    Type: Grant
    Filed: February 4, 2008
    Date of Patent: January 18, 2011
    Assignee: Neumann Systems Group, Inc.
    Inventors: William Edward McDermott, David Kurt Neumann, Thomas Lee Henshaw
  • Patent number: 7459010
    Abstract: A method for the acceleration of an electromagnetic rapper, particularly for an electrostatic precipitator, which includes a metal cylinder as a hammer, an electrical coil for lifting the metal cylinder and a coil energizer for energizing the electrical coil. For cleaning a surface the metal cylinder is lifted by an initial electrical pulse generated by the coil energizer. The coil energizer supplies the electrical coil with an additional electrical pulse so that the metal cylinder is accelerated when it has reached the maximum point of its trajectory.
    Type: Grant
    Filed: July 20, 2007
    Date of Patent: December 2, 2008
    Assignee: Alstom Technology Ltd
    Inventor: Anders Johansson
  • Patent number: 6231643
    Abstract: A membrane is used as a collection substrate in an electrostatic precipitator (ESP). Possible material choices include fibers in the form of woven mats, screens made from stainless steel wires or fiber reinforced polymer composite membranes. The membranes have a tensile bias applied during operation, and have impulse tensile force applied during a dust removal step. By combining a dry ESP membrane field with wet-film cleaning field, it may be possible to improve collection efficiencies both by reducing turbulence and eliminating re-entrainment losses due to rapping. Through implementation of new materials that resist hostile ESP environments, the invention enhances the possibility of using novel technologies, such as pulsed corona and others, suitable for removal of molecules such as NOx and SOx, which is very important for meeting proposed PM2.5 EPA emissions regulations.
    Type: Grant
    Filed: May 19, 2000
    Date of Patent: May 15, 2001
    Assignee: Ohio University
    Inventors: Hajrudin Pasic, Md Khairul Alam, David J. Bayless
  • Patent number: 6117215
    Abstract: This invention relates to electro-magnetic rappers which are used on precipitators. Such structures of this type, generally, employ the use of a wear guide which reduces rapper liner wear.
    Type: Grant
    Filed: April 5, 1999
    Date of Patent: September 12, 2000
    Assignee: Westvaco Corporation
    Inventors: Richard Michael Erickson, Isaac Espinosa Ortiz
  • Patent number: 4168168
    Abstract: A method of producing a durable photomask comprising,Forming a silver image pattern in a silver halide emulsion layer on a glass support by imagewise exposing the emulsion layer followed by development,Removing pattern-like the silver halide emulsion layer utilizing the difference in property between the silver image-containing portions and the non-silver image-containing portions of the emulsion layer to partially uncover the surface of the glass support at the portions where the emulsion layer was removed,Applying a silver ion-supplying material and/or a copper ion-supplying material on the glass support to form a layer of the ion-supplying material, andHeating the glass support at a high temperature to diffuse the metal ions into the surface of the glass support at the uncovered surface portions of the glass support.
    Type: Grant
    Filed: August 3, 1978
    Date of Patent: September 18, 1979
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masamichi Sato
  • Patent number: 4167413
    Abstract: A hybrid integrated circuit package and a method for fabricating the package. The package comprises a ceramic substrate having a blank metallization and feedthroughs screen printed thereon. A ceramic seal ring is joined to the substrate to form the side walls of the package. The substrate metallization is plated with nickel and gold and external leads are brazed to the ends of the feedthroughs. As such the package is suitable for use with a large number of different integrated circuits. The package can be adapted for use with a particular integrated circuit function by selectively patterning the blank substrate metallization. This is accomplished by laminating a preformed piece of dry film photoresist material to the package bottom. This piece of photoresist is then exposed through a photographic mask using a collimated light source.
    Type: Grant
    Filed: November 14, 1977
    Date of Patent: September 11, 1979
    Assignee: Motorola, Inc.
    Inventors: Allen E. Christ, Dennis R. Sprague, Bernhard A. Ziegner
  • Patent number: 4164754
    Abstract: A method of manufacturing a metallic die intended for the duplication of a video frequency signal recording. A master impression is engraved in a positive photosensitive resin layer having a thickness on the order of 3000 to 4000 A and covering a metallic substrate, by exposing the layer to a laser beam modulated by the signal which is to be recorded and removing the exposed portions of the layer to bare the underlying substrate. A metal layer substantially equal to the thickness of the initial photosensitive layer is deposited on the non-exposed photosensitive layer and the bared portions of the substrate. Thereafter, the non-exposed photosensitive material and overlying portions of the metal layer are eliminated by a solvent for the non-exposed photosensitive material to form the metal projections of the die.
    Type: Grant
    Filed: May 6, 1977
    Date of Patent: August 14, 1979
    Assignee: Thomson-Brandt
    Inventor: Jean-Claude Dubois
  • Patent number: 4159202
    Abstract: This invention relates to a photo-cross-linkable polymer containing units each having a 2-pyridone side group. The invention also relates to a photosensitive copying material including the novel photo-cross-linkable polymer.
    Type: Grant
    Filed: May 26, 1977
    Date of Patent: June 26, 1979
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Harald Furrer, Hartmut Steppan, Gerhard Lohaus
  • Patent number: 4157935
    Abstract: Nozzle arrays for ink jet recording are produced by preferred chemical etching of a substrate material which frequently has a non-uniform thickness. The preferred substrate is a monocrystalline silicon wafer and the 100 plane surface of the wafer is coated with etchant masking material and the resist coated wafer is held in close physical contact with a base member. A suitable mask member which defines a nozzle array pattern is spaced a predetermined distance from the base member and is positioned parallel to the base member. The wafer is then exposed through the mask by a suitable light source arranged at a suitable angle while the wafer is simultaneously rotated about an axis perpendicular to the wafer. The wafer is then exposed to a chemical anisotropic etching agent to produce a uniform array of nozzles in the wafer wherein the lateral walls of the nozzles are substantially in the "111" plane of the wafer. The masking material is then stripped from the wafer.
    Type: Grant
    Filed: December 23, 1977
    Date of Patent: June 12, 1979
    Assignee: International Business Machines Corporation
    Inventor: Erik R. Solyst
  • Patent number: 4156612
    Abstract: A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.
    Type: Grant
    Filed: November 25, 1977
    Date of Patent: May 29, 1979
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Thomas H. Jones
  • Patent number: 4149888
    Abstract: Photographic masks, suitable for reproduction in a photoresist layer -- by exposure of the latter to actinic light under the mask, and development of the photo-resist image -- of the pattern of a microelectronic component or device, are made by exposure to light in accordance with an original (especially by contact exposure under a primary mask) containing the pattern to be reproduced, of light-sensitive material having a flat, rigid, dimensionally stable transparent base such as glass and a thin (e.g. 0.
    Type: Grant
    Filed: April 24, 1974
    Date of Patent: April 17, 1979
    Assignee: GAF Corporation
    Inventor: Frank J. Loprest
  • Patent number: 4149885
    Abstract: An improved electroluminescent display panel having an X-Y array of display elements upon a planar insulating substrate. Integral thin film transistor circuit elements and drive signal buses are interconnected on the panel with individual electroluminescent electrodes covering a large area of the panel to increase the active display area. The electroluminescent electrode is a multilevel electrode with a first level portion disposed on the insulated substrate, a second level electrode portion disposed over an insulative polymerized layer which covers the thin film circuit areas and the drive signal buses, and a connecting electrode portion which extends between the first and second level electrode portions.
    Type: Grant
    Filed: October 22, 1976
    Date of Patent: April 17, 1979
    Assignee: Westinghouse Electric Corp.
    Inventors: Fang-Chen Luo, Thomas P. Brody, David H. Davies
  • Patent number: 4150398
    Abstract: In optically producing a reproducible recording of video or other signals, the intensity of at least one laser light beam is modulated by the signals to be recorded while such light beam scans a substantially flat surface on a photo-sensitive recording medium which is photo-reacted to a degree varying substantially linearly in correspondence with the intensity of the light impinging thereon over a predetermined range of light intensities, and the intensity of the light beam and the degree of modulation thereof by the signals are selected to maintain the maximum and minimum intensities of the modulated light beam within such predetermined range so as to form simultaneously on the record medium a tracking path portion and a recorded signal portion which is unified with the latter.
    Type: Grant
    Filed: January 12, 1976
    Date of Patent: April 17, 1979
    Assignee: Sony Corporation
    Inventors: Chiaki Kojima, Hiroshi Ohki, Yuzuru Yanagisawa
  • Patent number: 4148658
    Abstract: A photopolymerizable composition comprising, as essential components, (A) at least one compound having one or more addition polymerizable ethylenically unsaturated double bonds and (B) a photopolymerization initiator composition comprising (i) a combination of at least one compound (a) and at least one compound (b), (ii) a combination of at least one compound (a) and at least one compound (c) or (iii) a combination of at least one compound (a), at least one compound (b) and at least one compound (c);Wherein compound (a) is a benzoylmethylenebenzothiazolylidenethiazolidone compound selected from the group consisting of 2-benzoylmethylene-5-benzothiazolylidenethiazolidin-4-one and the substituted derivatives thereof represented by the following general formula (I): ##STR1## wherein R.sup.1, R.sup.2 and X are as defined in the specification; COMPOUND (B) IS A TERTIARY OR POLYAMINE COMPOUND SELECTED FROM THE GROUP CONSISTING OF TERTIARY AMINES REPRESENTED BY THE FOLLOWING GENERAL FORMULA (II): ##STR2## wherein R.
    Type: Grant
    Filed: November 29, 1977
    Date of Patent: April 10, 1979
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Syunichi Kondoh, Akihiro Matsufuji, Akira Umehara, Akira Sato, Akira Ogawa
  • Patent number: 4144067
    Abstract: This invention relates to an improvement in a light-sensitive copying material, the copying layer of which comprises a water-soluble, curable binder and a diazonium salt polycondensation product of recurring units of the general types (A-N.sub.2 X) and (B) which are linked to one another by intermediate members which have two bonds and are derived from a carbonyl compound capable of undergoing a condensation reaction, wherein A is the radical of a compound which contains at least two isocyclic or heterocyclic aromatic rings and is able to undergo a condensation reaction, at least at one point in the molecule, with formaldehyde in an acid medium, B is the radical of a compound which is free of diazonium groups and is able to undergo a condensation reaction, at least at one point in the molecule, with formaldehyde in an acid medium, and X is the anion of an acid which forms a water-soluble salt with the condensation product, the improvement being that fish glue is the water-soluble, curable binder.
    Type: Grant
    Filed: August 22, 1977
    Date of Patent: March 13, 1979
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans Ruckert, Rainer Unholz
  • Patent number: 4142898
    Abstract: An imaging film comprising, as an essential component thereof, an imaging structure formed of a thin layer of a metal, or metal-like, image forming material on which there is provided a thin layer of an energy sensitive material. The imaging structure, in turn, has a coating or layer of a sensitizing material thereon which material comprises a composition formed of a mixture of one, or more, amines, organic halogen compounds and a polymer or copolymer. The sensitizing material acts not only to increase the absolute sensitivity of the basic imaging structure but, also, to extend its spectral sensitivity from essentially the invisible, or ultraviolet light region to the visible light region enabling the imaging film to be used as a primary recording film for the production, for example, of original microfilm having, among other things, uniquely high contrast, resolution and acuity characteristics.
    Type: Grant
    Filed: August 11, 1976
    Date of Patent: March 6, 1979
    Assignee: Energy Conversion Devices, Inc.
    Inventor: Masatsugu Izu
  • Patent number: 4142892
    Abstract: The density of defects formed during the exposure of a positive resist layer, due to the loss of photoresist in circular areas is reduced by the addition of an antistatic agent. The resist layer includes a phenol-formaldehyde resin and an o-diazoquinone photoactive compound and a suitable antistatic agent is a 2-alkyl-N-hydroxyethyl imidazolinium salt.
    Type: Grant
    Filed: May 20, 1977
    Date of Patent: March 6, 1979
    Assignee: International Business Machines Corporation
    Inventor: Gabor Paal
  • Patent number: 4142893
    Abstract: A method is disclosed for dicing individual or groups of diode mesas fabricated upon a single metal heat sink. The undiced device is placed diode mesas down upon a transparent glass plate with the mesas protected in wax. A first mask is positioned upon the opposite side of the plate by alignment with the diode mesas as seen through the plate. Portions of the first mask extend on the plate beyond the edges of the wax and heat sink. A second etching mask is then fabricated upon the bottom of the heat sink by exposing a layer of photoresist through a mask having the same grid pattern as the first mask and which is aligned with the portions of the first mask seen through the glass plate beyond the edge of the heat sink. The diode mesas are etched apart by spraying an appropriate etchant through apertures in the etching mask.
    Type: Grant
    Filed: September 14, 1977
    Date of Patent: March 6, 1979
    Assignee: Raytheon Company
    Inventors: Michael G. Adlerstein, Robert L. Sprague
  • Patent number: 4141731
    Abstract: A video disc master of glass, having a metal surface with microscopic apertures therein representing information, is coated with a photosensitive resist. The resist is uniformly exposed through the glass disc. The unexposed resist is removed. The resulting disc having surface irregularities can be used in a first process to produce "stampers" for embossing replicas and, in a second process, to produce a mold for casting replicas.
    Type: Grant
    Filed: January 2, 1976
    Date of Patent: February 27, 1979
    Assignee: MCA Disco-Vision, Inc.
    Inventor: Manfred H. Jarsen
  • Patent number: 4142107
    Abstract: In the process of developing exposed photoresist on a substrate, the endpoint in developing away all of the exposed positive photoresist or any other positive resist is detected by exposing a wafer with a predetermined pattern including an optical grating or other special pattern formed in the photoresist upon a test area. In a system employing this concept, a beam is diffracted by the optics of the grating only at a first angle until the resist forming the grating is removed by development. Then a sensor is activated when an angle of reflection is unblocked when the grating disappears. The system is then turned off to stop development by the sensor in an automatic system or, by the operator in a manual system. A double exposure technique is employed to produce the grating or other special pattern.
    Type: Grant
    Filed: June 30, 1977
    Date of Patent: February 27, 1979
    Assignee: International Business Machines Corporation
    Inventors: Michael Hatzakis, Constantino Lapadula, Burn J. Lin
  • Patent number: 4139386
    Abstract: Method for obtaining an engravers template having a desired pattern therein with engraved portions and raised portions. An aluminum sheet is provided having an aluminum oxide layer on one side and a plastic layer on the opposite side. The desired engraved pattern is etched through the oxide layer and through the aluminum sheet.
    Type: Grant
    Filed: December 8, 1976
    Date of Patent: February 13, 1979
    Assignee: Swiss Aluminium Ltd.
    Inventor: John V. Stewart
  • Patent number: 4139409
    Abstract: Means and method for forming a raised metallic relief wherein a metal foil affixed to a support film is selectively etched, affixed to a wood surface, and then exposed to a scanning concentrated laser beam to vaporize the support film and wood in areas unprotected by the metal sheet. The metal design is left on the wood surface in the form of a raised relief.
    Type: Grant
    Filed: February 9, 1978
    Date of Patent: February 13, 1979
    Inventors: John A. Macken, Paul N. Palanos
  • Patent number: 4138262
    Abstract: An imaging film, and a method of making it, comprising a flexible plastic substrate having a thin, high optical density, continuous layer of bismuth, or an alloy of bismuth, deposited on a surface thereof. The bismuth layer has a roughened outer surface. To this roughened surface a layer of a photoactive material is applied which serves as a photoresist as well as a protective overlayer for the bismuth. The photoactive material may be positive or negative working. A layer of a developable photographic emulsion may be applied to the photoactive material layer to impart camera speed to the imaging film. The photoresist side of the film has a non-shiny, essentially non-reflecting black surface which resembles the appearance of developed silver halide films. The substrate side of the film, on the other hand, has a metallic appearance which is easily distinguishable from the photoresist side. This feature of the film enables an operator to readily ascertain the photoresist side of the film and speeds plate making.
    Type: Grant
    Filed: September 20, 1976
    Date of Patent: February 6, 1979
    Assignee: Energy Conversion Devices, Inc.
    Inventors: Harvey H. Wacks, Masatsugu Izu, Donald J. Sarrach
  • Patent number: 4135964
    Abstract: A method of manufacturing a die for embossing a desired circuit pattern of a metal foil onto a substrate comprises steps of forming, on the work surface of die material, a first circuit-coating pattern corresponding to the contour of the desired circuit pattern and a second circuit-coating pattern large enough to cover the first circuit-coating pattern and larger than the desired circuit pattern. The die material surface uncovered by the second circuit-coating pattern is partly etched away to leave a grooving for receiving the embossed metal foil. Then, the second circuit-coating pattern is stripped away, and the uncovered metal portion surrounded by the first circuit-coating pattern is suitably removed, and finally the first coating pattern is stripped away.
    Type: Grant
    Filed: April 27, 1977
    Date of Patent: January 23, 1979
    Assignee: Nippon Mektron Kabushiki Kaisha
    Inventors: Yasuyuki Tanaka, Kazuo Nakajima
  • Patent number: 4133685
    Abstract: A photopolymerizable coating over a diazo resin provides a high-speed lithographic plate or photoresist while improving the printing life of the plate while making its development simpler than that of most other photopolymer plates. The photopolymer is a cinnamoylated polyvinyl alcohol resin which is placed over a diazo based material.
    Type: Grant
    Filed: January 17, 1978
    Date of Patent: January 9, 1979
    Assignee: Richardson Chemical Company
    Inventors: Daniel C. Thomas, Jack L. Sorkin
  • Patent number: 4132575
    Abstract: A moire contour map of a three-dimensional object is obtained by a moire contour measuring system. The moire contour map is used for making a profiling model to be used in a profiling machine to make a number of plates having configurations corresponding to the contour lines of the moire contour map. The number of plates prepared by the profiling machine are stacked to form a stack of plates having a contour approximately equivalent to the contour of the original three-dimensional object. The stacked plates are bound together and a surface smoothing cover or a filling agent is applied on the surface of the stacked plates to form a replica of the object.
    Type: Grant
    Filed: September 16, 1977
    Date of Patent: January 2, 1979
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventors: Masane Suzuki, Kiyoshi Suzuki
  • Patent number: 4132550
    Abstract: A germanium mesa transistor is fabricated having an epitaxially grown base region and an aluminum alloy emitter in the epitaxially grown layer spaced from the collector junction, and having a gold-comprising base electrode surrounding the emitter and closely spaced therefrom. The gold contact is formed by photolithographic and selective etching techniques, followed by the formation of the aluminum emitter, which is also formed by photolithographic and selective etching techniques. A key step is the selective removal of the aluminum from the germanium wafer without disturbing the gold contact.
    Type: Grant
    Filed: November 24, 1976
    Date of Patent: January 2, 1979
    Assignee: Motorola, Inc.
    Inventor: Ronald R. Bowman
  • Patent number: 4131466
    Abstract: A lithographic photographic material has a photosensitive layer comprising gelatin having an isoelectric point of at least 7 and a condensation product formed between a diazonium salt of a para-aminodipheynylamine derivative and an aldehyde. The photosensitive layer can be photoinsolubilized and will form a photo-relief.A method for using the lithographic photographic material comprises partially photoinsolubilizing the photosensitive layer and then immersing it in a bath of an acid or direct dye to form level dying, washing the dye material with water to remove unexposed areas, thereby forming an image composed of the dye photoinsolubilized resin layer corresponding to the exposed areas.
    Type: Grant
    Filed: December 8, 1975
    Date of Patent: December 26, 1978
    Assignee: Somar Manufacturing Co., Ltd.
    Inventors: Masahiro Nomura, Yutaka Hirabayashi
  • Patent number: 4131472
    Abstract: An improvement in the process of manufacturing integrated circuits to enhance the yield, including the steps of tracking which of the individual dies on a photomask or related series of photomasks has produced a predominance of defective chips on the semiconductor wafer, then correcting the die images on the master photomasks and then producing new working masks. This procedure may be repeated several times, each time reducing the number of defect-bearing die images on the photomask and thereby providing a means by which a semiconductor device manufacturer can obtain better yields.
    Type: Grant
    Filed: September 15, 1976
    Date of Patent: December 26, 1978
    Assignee: Align-Rite Corporation
    Inventors: James L. MacDonald, Jr., Richard A. Mink
  • Patent number: 4126931
    Abstract: Several junction-type semiconductor chips, specifically NPN transistors, are simultaneously produced by mesa technique from a semiconductor wafer by adhering to one major surface thereo a supporting structure including a bonding layer of wax, similarly adhering a protective layer of a relatively soft material -- likewise a wax -- to the opposite major wafer surface, and dividing the wafer into chips temporarily held together by the supporting structure. The last-mentioned step involves a splitting of the protective layer into isolated sections by making incisions in that layer cutting into the underlying wafer body, followed by an erosion of the semiconductor material of that body by an etching solution to form channels which extend completely across the wafer and terminate at the supporting structure, these channels being widened in the immediate vicinity of the protective layer to form undercuts. A continuous passivating film is applied, e.g.
    Type: Grant
    Filed: April 11, 1977
    Date of Patent: November 28, 1978
    Assignee: SGS-ATES Componenti Elettronici S.p.A.
    Inventors: Luciano Gandolfi, Rudolf Rocak
  • Patent number: 4127414
    Abstract: A pattern-forming material comprises a substrate and a radiation sensitive chalcogenide layer disposed thereon. The radiation sensitive chalcogenide layer consists of an amorphous layer having a chemical composition of 75 to 95 mol% of selenium and 5 to 25 mol% of germanium and a silver layer superimposed thereon. The pattern-forming materials having the radiation sensitive chalcogenide layer of the invention are particularly useful in lithographic applications.
    Type: Grant
    Filed: June 8, 1977
    Date of Patent: November 28, 1978
    Assignee: Nippon Telegraph and Telephone Public Corporation
    Inventors: Akira Yoshikawa, Haruo Nagai, Osamu Ochi, Kazuko Nakano, Yoshihiko Mizushima
  • Patent number: 4127437
    Abstract: Process for etching SiO.sub.2 with hydrogen fluoride gas, utilizing an organic material such as negative photoresist as a catalyst. In one embodiment, the negative photoresist is applied directly to the portions of the SiO.sub.2 to be removed, and in another the negative photoresist is spaced away from the SiO.sub.2. In some embodiments, positive photoresist is applied to the portions of the SiO.sub.2 which are to be retained.
    Type: Grant
    Filed: September 1, 1977
    Date of Patent: November 28, 1978
    Assignee: Dionex Corporation
    Inventors: Richard L. Bersin, James H. Junkin, Richard F. Reichelderfer
  • Patent number: 4118230
    Abstract: An improved process for adjusting different exposure masks consecutively relative to a substrate wafer by providing individual pairs of adjustment marks on the substrate with each pair being associated with a selected exposure mask and the number of pairs on the substrate being equal to the number of exposure masks minus one, to be utilized. Preferably, the marks of the pairs are aligned in rows with the first mark of each pair being in the first row and the second mark of each pair being in the second row.
    Type: Grant
    Filed: September 22, 1977
    Date of Patent: October 3, 1978
    Assignee: Siemens Aktiengesellschaft
    Inventor: Hans Binder
  • Patent number: 4115120
    Abstract: A method of depositing patterned thin films on an integrated circuit substrate which comprises first forming a layer of positive photoresist material on the substrate and then heating to partially cure the photoresist while maintaining the surface of the photoresist interfacing with the substrate at a lower temperature than the opposite surface of the photoresist which is being exposed to the heat. As a result of this expedient, the upper or exposed portion of the photoresist layer is cured to a greater extent than the lower portion at the interface with the substrate. Then, the photoresist layer is exposed to a selected pattern of light, after which developer for the photoresist material is applied.
    Type: Grant
    Filed: September 29, 1977
    Date of Patent: September 19, 1978
    Assignee: International Business Machines Corporation
    Inventors: Donald R. Dyer, Claude Johnson, Jr., Robert R. Wilbarg
  • Patent number: 4115127
    Abstract: A processing-free lithographic printing plate, which comprises a support having deposited thereon a composition containing germanium and sulfur and at least one of a metal or metal compound in a physically mixed state.
    Type: Grant
    Filed: March 11, 1977
    Date of Patent: September 19, 1978
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tomoaki Ikeda, Yuzo Mizobuchi, Akira Nahara, Yasuo Washizawa, Yoshihiro Ono, Takeshi Tomotsu
  • Patent number: 4113486
    Abstract: A method for producing a photomask, which comprises exposing and development-processing a photographic light-sensitive material comprising a transparent support having thereon a masking layer and a silver halide emulsion layer to thereby form a silver image, bleaching the silver image with a bleaching solution containing hexavalent chromium ion, heating in the presence of oxygen to imagewise uncover the masking layer, etching away the uncovered masking layer, and then removing the emulsion layer at the non-image areas to uncover the masking layer corresponding to the non-image areas.
    Type: Grant
    Filed: June 9, 1976
    Date of Patent: September 12, 1978
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masamichi Sato
  • Patent number: 4110114
    Abstract: An image forming method comprising forming a silver image on a photographic material which comprises a substrate having a silver halide emulsion layer thereon by exposing and developing the photographic material and image-wise ion-etching away the layer to remove non-image areas of the emulsion layer, wherein the silver image is intensified or toned, if desired, before the ion-etching treatment.
    Type: Grant
    Filed: October 14, 1975
    Date of Patent: August 29, 1978
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masamichi Sato
  • Patent number: 4109029
    Abstract: The specification describes a process for fabricating semiconductor devices and circuits in which lateral geometry dimensions determining the performance level of the device or circuit are extremely small. In this process electron beam microfabrication techniques are used to define these extremely small dimensions. The complete fabrication process uses standard photolithography for the definition of some of the device geometry and mask patterns, and partitioning of pattern definition between electron beam microfabrication and standard photolithography is utilized according to pattern resolution requirements, and is optimized for the highest yield-throughout product.
    Type: Grant
    Filed: January 24, 1977
    Date of Patent: August 22, 1978
    Assignee: Hughes Aircraft Company
    Inventors: Faik S. Ozdemir, Dall D. Loper
  • Patent number: 4108659
    Abstract: A process for engraving printing surfaces with unmodulated energy beams by interposing a variable reflectivity mask between the energy beam source and the printing surface. The local reflectivity of the mask varies in correspondence with the tone graduation of the original to be printed and may be formed by conventional photographic or the like techniques directly on the printing surface or on a substrate carrier through which the energy beam is passable.
    Type: Grant
    Filed: July 31, 1975
    Date of Patent: August 22, 1978
    Assignee: European Rotogravure Association
    Inventor: Mamiliano Dini
  • Patent number: 4108660
    Abstract: A recording blank, composed of at least one diffraction grating substrate, such as nickel, covered with a layer of photoresist is used to produce an embossing master by exposing the photoresist to picture information composed of respective white and non-white manifesting regions; developing the exposed photoresist to reveal the grating portions underlying solely the white manifesting regions; electroplating and/or etching the revealed portions to level and obliterate the revealed grating portions, and then removing the remainder of the photoresist.
    Type: Grant
    Filed: March 25, 1977
    Date of Patent: August 22, 1978
    Assignee: RCA Corporation
    Inventors: Michael Thomas Gale, James Kane
  • Patent number: 4106943
    Abstract: An organic solvent- or water-developable photosensitive composition consisting essentially of a ring-opened polymer or copolymer of at least one norbornene derivative having at least one substituent selected from the group consisting of ester groups, nitrile groups, carboxyl groups, amide groups, imide groups, hydroxyl groups, halogens and carboxylic acid anhydride groups, or a ring-opened copolymer of at least one said norbornene derivative and at least one cycloolefin other than cyclohexene, or a hydrolysis product of said ring-opened polymer or copolymer and a photosensitive crosslinking agent or photosensitizer soluble in organic solvents or water. The above photosensitive composition is excellent in sensitivity, adhesion and stability.
    Type: Grant
    Filed: October 13, 1976
    Date of Patent: August 15, 1978
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Hiroharu Ikeda, Seiji Aotani, Yoshiyuki Harita
  • Patent number: 4105493
    Abstract: The invention concerns a method for producing foils for dry shavers.The method of the invention includes forming a layer of photosensitive material on each side of a metal plate, exposing each side to light to produce a pattern of exposed and unexposed areas, corresponding to perforations at one side and recesses in the backs of the bars of the foil on the other side, etching each side, them removing photosensitive material from the front side and carrying out further etching until the foil is completely perforated.The invention is especially suitable for forming foils for battery operated dry shavers.
    Type: Grant
    Filed: August 8, 1977
    Date of Patent: August 8, 1978
    Assignee: The Gillette Company
    Inventor: Jean-Daniel Chauvy
  • Patent number: 4105450
    Abstract: A positive light-sensitive composition containing: (a) a quinonediazide type, positive light-sensitive substance and (1) (b) at least one compound selected from the group consisting of those compounds represented by the following general formulae (I) ##STR1## wherein X.sub.1 and X.sub.2 each represents an oxygen atom or a sulfur atom; R.sub.1 and R.sub.2 each represents a hydrogen atom, an alkyl group, an aralkyl group, an aryl group or a cycloalkyl group; (2) those compounds represented by the general formula (II) ##STR2## wherein R.sub.3 represents a hydrogen atom, an alkyl group, an aralkyl group, an aryl group or a cycloalkyl group; and R.sub.4 represents a hydrogen atom, an alkyl group or a cycloalkyl group; and (3) o-benzoic acid sulfimide.
    Type: Grant
    Filed: May 25, 1976
    Date of Patent: August 8, 1978
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiaki Shinozaki, Tomoaki Ikeda
  • Patent number: 4104070
    Abstract: The invention relates to a method of making a negative photoresist image on a substrate, where a normally positive working photoresist material containing 1-hydroxyethyl-2-alkyl-imidazoline is applied to a substrate, image-wise exposed with actinic radiation, heated, and blanket exposed to actinic radiation. The material which was not exposed originally is then removed with a solvent to give a negative image.
    Type: Grant
    Filed: May 3, 1976
    Date of Patent: August 1, 1978
    Assignee: International Business Machines Corporation
    Inventors: Holger Moritz, Gabor Paal
  • Patent number: 4102734
    Abstract: Method and apparatus for producing a design on a preformed arcuate surface by etching and/or selective plating. The design is transferred to the arcuate surface by progressively and successively projecting narrow images of the design from a flat form and progressively rotating an arcuate surface about its axis such that the narrow images of the design are successively projected upon and received by corresponding portions of the arcuate surface.
    Type: Grant
    Filed: October 5, 1976
    Date of Patent: July 25, 1978
    Assignee: MBI, Inc.
    Inventor: Murray M. Schiffman
  • Patent number: 4102735
    Abstract: A high precision die particularly adapted to form, from a relatively heavy foil sheet, a circuit board where the individual circuit elements and the spacing thereof are of relatively small dimensions. The die is made as follows. A working surface of a die block is covered with a first protective overlay having an enlarged pattern corresponding to the pattern of the die elements to be formed, but enlarged by a substantially uniform width dimension. The surface is then exposed to an etching solution to remove material from the exposed area. These two steps are repeated a second time with a pattern enlarged to a lesser degree, and again a third time to bring the die elements being formed from the die block within quite close tolerances to the original pattern. The die faces of the die elements are then etched to form knife edges on the die elements, in a plurality of etching steps using reduced protective overlay patterns.
    Type: Grant
    Filed: June 13, 1977
    Date of Patent: July 25, 1978
    Assignee: Jerobee Industries, Inc.
    Inventor: Walter Weglin
  • Patent number: 4101323
    Abstract: This invention relates to a radiation-sensitive copying composition comprising a compound (1) which splits-off an acid upon irradiation and a compound (2) having at least one group selected from the group consisting of a carboxylic ortho acid ester group and a carboxylic acid amide acetal group, which composition, upon irradiation, forms an exposure product having a higher solubility in a liquid developer than the non-irradiated composition.
    Type: Grant
    Filed: March 24, 1976
    Date of Patent: July 18, 1978
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Gerhard Buhr, Hans Ruckert, Hans Werner Frass
  • Patent number: 4099973
    Abstract: When a water-soluble alcohol having 4 to 6 hydroxyl groups is added to a photosensitive composition comprising a water-soluble polymer substance and a bisazide crosslinking agent, the polymer crosslinking reaction by said bisazide crosslinking agent is promoted and a polymer crosslinkage enough to form an image is produced even at a low exposure dose of ultraviolet ray. Thus, the photosensitive composition is highly sensitized as compared with prior art photosensitive compositions. The alcohol is exemplified by erythritol, pentitol, etc. and is preferably added in an amount of 1 - 100 parts by weight per 100 parts by weight of the water-soluble polymer substance.
    Type: Grant
    Filed: September 14, 1976
    Date of Patent: July 11, 1978
    Assignee: Hitachi, Ltd.
    Inventors: Kiyoshi Miura, Yoshifumi Tomita
  • Patent number: 4098712
    Abstract: A processing solution useful for the development of or halftone dot reduction of a metal image-forming material comprising a support, a thin metallic layer composed mainly of aluminum on the support and a photosensitive resin layer on the metallic layer, with the processing solution comprising (1) an alkaline solution, such as an aqueous solution of sodium hydroxide or potassium hydroxide, and (2) at least one compound of the formula (I) or (II):m(brO.sub.3).sub.p (I)m.sub.m (IO.sub.n).sub.p (II)wherein M represents a hydrogen atom or a metal having a valence of 1 to 3, m represents 1, 2, 3, or 5, n represents 3, 4, or 6, and p represents 1, 2 or 3, which solution lends itself to safe storage and handling, and permits rapid and uniform etching of the metallic layer of the metal image-forming material without bubble formation occurring.
    Type: Grant
    Filed: February 11, 1977
    Date of Patent: July 4, 1978
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tomoaki Ikeda, Yasuo Washizawa, Masamiti Sigyo, Sadaharu Ikeda, Satoshi Yoshida
  • Patent number: 4097283
    Abstract: A water-soluble, photosensitive resin composition containing a water-soluble polymer having an ethylenic unsaturated bond in its side-chains, a water-soluble anthraquinone sulfonic acid or anthraquinone carboxylic acid sensitizer, or salts thereof, and if desired, a water-soluble azide compound.
    Type: Grant
    Filed: December 15, 1975
    Date of Patent: June 27, 1978
    Assignee: Fuji Chemicals Industrial Company Limited
    Inventors: Takateru Asano, Keiko Ito