Abstract: A method is described of etching structures into .alpha. quartz and LiNbO.sub.3, two materials widely used in surface wave devices and which heretofore have not been found suitable for use with chemical etching techniques, in which concentrated HF acid at a predetermined temperature is used as an etchant, and the formation of overhanging ledges accomplished through a specific crystal orientation. Steps are shown which avoid the problems associated with suitable masking of the surface, which problems were encountered in the prior art, a primary step being one of a mechanical-chemical polishing to assure that the resist mask adheres to the surface properly.

Abstract: A light-sensitive layer transfer material and such layer disposed on a carrier, for use in screen-printing stencils, printed circuit boards, integrated circuits, intaglio printing plates, relief printing plates, proof prints and the like, which comprises an alkali-soluble phenolic resin, such as phenol-formaldehyde novolacs, an ester or an amide of an o-naphthoquinone-diazide sulphonic acid, such as the p-cumyl phenyl ester of 1,2-naphthoquinone-2-diazide-4-sulphonic acid, etc., and an acrylic resin, such as a polymer of an alkyl ester of acrylic acid or methacrylic acid.

Abstract: A positive working, thermally stable photoresist, comprising a light-sensitive orthoquinone diazide or naphthoquinone diazide and a polyamic acid condensation product of an aromatic dianhydride and an aromatic di-primary amine, and a support carrying a layer of said photoresist. After exposure, the image is developed in the layer with an alkaline aqueous developer and is unaffected by heating to 500.degree. C, thus allowing the use of the photoresist layer for plasma and sputter-etching as well as ion implantation.

Abstract: Compositions comprising (I) solvent-soluble, negative-acting, light-sensitive reaction products of (a) water-soluble diazo condensation products with (b) water-insolubilizing inorganic compounds therefor and (II) synthetic, film-forming oleophilic resins, which compositions can be coated onto suitable base sheet materials to form presensitized lithographic printing plates, proofs for multi-color printing, visual aids, printed circuits and the like.

Abstract: A double exposure and double etch technique for producing precision parts from a photosensitive material is described. The process is described in terms of producing an array of ink jet charge electrodes which comprise a series of small through holes on accurately defined centers. The process comprises the steps of exposing the photosensitive material through a mask to develop an undersized through hole and heat treating the photosensitive material to change its characteristics so that an etchable material is produced in the exposed area. The material is then etched to form the undersized through hole which is substantially tapered. The material is then exposed again with a full sized mask including any conductor patterns and the material is again heat treated. The material is again etched and this etching, in the nature of a surface etch, reduces the taper because of the lower etch rate of the unexposed material as compared to the much higher etch rate of the previously unetched tapered material.

Abstract: Photohardenable, liquid compositions are described which are particularly useful as plating and etching resists.

Abstract: This single level masking process includes the use of two layers of a positive photoresist. A pattern is formed in the first layer of photoresist. This photoresist pattern is heated and polymerized to a degree which permits it to be resistant to attack when covered with a second layer of the same positive photoresist, that is, the first photoresist pattern will maintain its integrity. After the heat treatment, the first layer pattern is substantially insensitive to actinic radiation and is easily stripped with conventional solvents. A pattern is formed in a second layer of photoresist that is different from the pattern formed in the first layer. After a first metal is deposited on portions of the substrates exposed in the second layer pattern, the second layer pattern is removed. A second metal is deposited on the portions of the substrate exposed in the first layer pattern and then that pattern is removed.

Abstract: Process and apparatus for producing a photopolymer plate having relief images thereon. Successive portions of a continuous length of a protective film material are travelled in a horizontal elongated plane defined by a pair of parallel and spaced guide rollers. A layer of liquid photosensitive material is applied to a length of the horizontal web of the protective film material. A length of backing material is then laminated onto the upper surface of the layer to form an assembly. The assembly is moved by the protective film material into a relief exposure station for the exposure of the lower surface of the layer through an image-bearing transparency and the protective film material to an actinic radiation. The laminated portion of the backing material is separated from the remaining continuous web of the backing material. The image-bearing transparency is fed to the relief exposure station by a continuous length of another film material.

Abstract: A latent image is produced on a metallic film having at least one layer of chromium or aluminum by exposing the film to a light pattern. The intensity of the light from the light pattern must be below the threshold for evaporation of the metallic film. The latent image is developed by dipping the metallic film into an etchant.

Abstract: A method for producing a light conductor structure having a pair of light conductors embedded in a substrate and electrodes arranged between and along the light conductors, which structure is particularly adapted for use as an electrically controllable coupler, characterized by providing a substrate of an electro-optical material having a c-axis parallel to one surface of the substrate and extending at right angles to the longitudinal axes of the later formed light electrodes, forming a layer of polycrystalline silicon in zones of the substrate, which lie adjacent to second zones of said one surface in which second zones the light conductors will be formed; applying a layer of diffusion material to the silicon layer and the second zones which are free of silicon; diffusing the diffusion material into the substrate by heating to an elevated temperature to form light conductors by increasing the index of refraction of the light conductor above the index of refraction of the remaining portions of the substrate;

Abstract: The present invention affords a process for forming a pattern having a surface area substantially equal to or smaller than area of apertures of shadow-mask through which beams pass on a photoresist film, which contains an acrylamidediacetoneacrylamide copolymer and a water-soluble aromatic bisazide compound, by exposing said photoresist film to light through a mask having the pattern and then developing the film.The use of said photoresist film for the preparation of a phosphor screen of a color picture tube of a black matrix or black stripe type does not require a special technique such as post-etching of a shadow mask and makes it possible to form a three primary color phosphor pattern having a surface area substantially equal to or smaller than the area of apertures of the shadow mask through which lightbeams pass, without mutual "bridging" between phosphor dots. Thus, an excellent phosphor screen of a color picture tube of a black matrix or black stripe type can be prepared.

Abstract: An exposure method for exposing to a pattern a photosensitive material formed over a substrate having a reflective surface uses a light source having beam components of different wavelengths. The beam from the light source is used to project an exposure pattern upon the photosensitive material through a predetermined mask pattern to thereby form a combined standing wave pattern with the aid of the light beam incident on the photosensitive material and the light beam reflected by the reflective surface. The photosensitive material is disposed in the reduced peak value region of the combined standing wave pattern as the result of the interposition of a transparent layer between the reflecting surface and the photosensitive layer. Thus, the photosensitive material is pattern-exposed to a substantially uniform sensitizing energy.

Abstract: By providing a given thickness for a positive photoresist layer on a substrate which, if unexposed, after development has a maximum depth just equal to the sum of the individual depths of two, at least partly superimposed, rectangular relief-profile diffraction gratings in the developed photoresist layer, it is possible to make a single master recording, which can be used to provide a stamper for embossing two of the three primary colors in a single surface of a transparent plastic sheet in the fabrication of diffractive subtractive filters.

Abstract: An imaging member comprising an agglomerable layer on and not embedded in a substrate is agglomerated in image configuration to cause relative transparentizing or a color change and the formation of larger agglomerates in the agglomerated areas. This imaging process is followed by removal of the agglomerates from the agglomerated areas.

Abstract: Copolymers of glycidyl acrylate and allyl glycidyl ether and terpolymers derived from addition of glycidyl methacrylate to the polymerizable mixture, having an inherent viscosity within the range of about 0.09 to 0.28 and an epoxy equivalent of at least about 0.64 per 100 g. of polymer are provided which upon admixture with a catalyst which is a radiation-sensitive aryldiazonium salt of a complex halogenide, provides compositions suitable for use in a dry photopolymer positive imaging process. In the process, the polymer which is non-tacky at room temperature, together with the catalyst is applied to a substrate and exposed to an energy source for example, electromagnetic radiation through a transparency or mask. Following exposure, the coating is heated to the softening point of the unexposed portion of the coating and a powder or toner is applied thereto, the toner being adhered to only the tacky, nonexposed area of the coating, resulting in a pigmented image.

Abstract: A light sensitive mass which contains a film former, which consists of 20 to 90 percent by weight of a vinylpyrrolidone-vinyl acetate copolymer or a polyvinyl pyrrolidone or both and 10 to 80 percent by weight of an aryl sulfone amide formaldehyde resin, and at least one sensitizer, the weight ratio of said film former to sensitizer being between 1:1 and 10:1. Usually the light sensitive mass is used as a light sensitive reversal-development layer on a carrier.

Abstract: A musical movement which comprises, primarily, a metal comb produced by a chemical machining process and, secondarily, a drum in the shape of a frustum of a stepped comb. The comb is advantageously provided with means whereby it can be fastened to a movement base without employing bolts or the like and the drum steps advantageously have projections, for co-operation with the comb teeth, that do not extend further radially than do the immediately neighboring drum steps of larger size.

Abstract: The process of this invention applies a photoresist film to a preimaged patterned relief substrate wherein the height of the relief image is at least 0.00004 inch (0.001 mm) and the thickness of the photoresist film is at least one third the thickness of the relief image height. Prior to the application of the photoresist film, the patterned relief substrate is flooded with a swelling agent for the photoresist, the depth of flooding being at least to cover the relief height. The process can occur at room temperature.

Abstract: This method of forming viaducts or "through-holes" in semiconductor material for transistor and integrated circuit fabrication and especially for ink jet printing systems forms viaducts of uniform diameter without critical registration of masks.A seed layer of Cr-Au is sputtered onto a silicon-dioxide substrate. The viaducts or holes to be made are imaged by a photoresist process with a 5 .mu. thick photoresist on this seed layer. A 4 .mu. thick gold layer is now applied on the seed layer by a plating process. After the dissolution of the photoresist this layer contains the hole pattern with the holes having the required diameter. In order to make a through-hole, the substrate has to be etched. For that purpose, the bare substrate surface is covered with photoresist and exposed from the back through gold holes, and subsequently developed.

Abstract: A process for producing a thin metal structure with a self-supporting frame, such as a grid, characterized by forming a galvanic resistant coating on a first surface of a carrier member with the coating exposing portions of the first surface adjacent the end of the carrier member and portions of the first surface in the configuration of the metal structure to be formed, depositing a layer of metal on the exposed portion of the first surface, removing the galvanic resistant coating, applying an etch resistant coating on the edges of thecarrier member and at least a portion of a second surface adjacent the edges of the carrier member and then selectively etching the carrier member to remove the carrier member except for that portion protected by the etch resistant coating to form the thin metal structure mounted on a self-supporting frame. The carrier member may either be a single member or a multi-layer member which has a metal coating forming the first surface.

Abstract: A mother for manufacturing long-playing video records is provided by (1) selectively exposing a photoresist disposed as the outer layer on a substrate comprising a disc-shaped plate, a thin layer of base material, e.g., an oxide of nitride, adhering to the plate and a thin metal layer, e.g., chromium, silver, nickel or titanium, coating the base material layer, (2) removing non-activated sections of the photoresist layer and (3) sputter or chemically etching the thin metal and base material layers in sections corresponding to the removed sections of the photoresist layer.

Abstract: A method for producing a relief pattern comprising forming one of (i) a silver image, (ii) a silver halide image, or (iii) an image obtained by toning and/or intensifying the silver image or silver halide image, in the emulsion layer of a photographic light-sensitive material which comprises a support having thereon at least one silver halide emulsion layer, either directly or on at least one subbing layer on the support, by image-wise exposing to light and developing, heating the photographic material to decompose the binder of the emulsion layer, and then ion-etching the photographic material to form a relief pattern of the support corresponding to the above-described image.

Abstract: A high precision die particularly adapted to form from a relatively heavy foil sheet a circuit board where the individual circuit elements and the spacing thereof are of relatively small dimensions. The die is made as follows. A working surface of a die block is covered with a first protective overlay having an enlarged pattern corresponding to the pattern of the die elements to be formed, but enlarged by a substantially uniform width dimension. The surface is then exposed to an etching solution to remove material from the exposed areas. These two steps are repeated a second time with a pattern enlarged to a lesser degree, and again a third time to bring the die elements being formed from the die block within quite close tolerances to the original pattern. The die faces of the die elements are then etched to form knife edges on the die elements.

Abstract: Image reproduction process utilizing an imagewise exposed photosensitive element comprising a solvent-processable photosensitive layer and a nonphotosensitive elastomeric tonable contiguous layer. Color proofs can be made by the process.

Abstract: A multilayer image-forming material which comprises an organic sulfur compound and a metal capable of interreacting upon irradiation with electromagnetic radiation to form an interreaction product or products (hereinafter product and products will simply termed "product"). When the image-forming material is imagewise irradiated with electromagnetic radiation, an interreaction product of the organic sulfur compound and the metal is formed in the irradiated portions of the material, and the physical, chemical and pysico-chemical properties of the thus formed interreaction product are different from those of the respective organic sulfur compound and metal in the non-irradiated portions. Utilizing this difference in properties, the present image-forming material is useful for various applications.

Abstract: Disclosed is a photomask and a method for the manufacture thereof. A metal stencil is disposed on a glass substrate such that only preselected areas of the glass which are to be made opaque are exposed. A grit-etch step follows in which depressions are formed in the glass substrate in the preselected areas. Fusible masking material is sprayed in the depressions through the metal stencil. The masking material is preferably in particulate form in a volatile carrier liquid. The carrier liquid is preferably first driven off and, then, the combination is exposed to a relatively high temperature that fuses the masking material to the substrate.

Abstract: A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.

Abstract: This invention pertains to a method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer wherein the poly(olefin sulfone) layer is exposed to ultra violet radiation prior to sputter etching the surface relief pattern into the metal layer.

Abstract: A cathode ray storage tube provided with a storage target having a multiplicity of segments of the collector electrode extending through the dielectric layer of the storage target. These segments comprise glass beads secured together and to a surface of an insulating support plate, a conductive collector electrode coating is applied onto the support plate surface and glass bead segments and then the storage dielectric layer is applied thereover which has proper thickness so that the segments extend above the dielectric thereby providing collector areas for collecting secondary emitted electrons from the dielectric.

Abstract: A flexible fine lattice-like grid structure is formed by etching a metal foil printed with a pattern of intersecting webs crossing at junction points. The sections of the webs extending between the junction points have a length greater than the shortest between the junction points. The web sections between junction points can be curvilinear or made up of a plurality of angularly disposed rectilinear sub-sections. The shape and length of web sections can be varied to achieve different expansion limits in different directions.

Abstract: Carboxylic acids are included in resists to increase their speed and adhesion.

Abstract: A photo-voltaic hetero-junction is formed by chemical conversion of surface regions of a sheet of one conductivity type into material of a second conductivity type, the areas which are not to be converted being covered by a developed photo-resist layer which has previously been exposed to light through a mask. Electrical contacts are deposited on the regions of the second type and contacts to the material of the first type are formed by a layer deposited on a substrate under the sheet of material of the first type. This deposited layer of electrically-conductive material can also form the mask for initial exposure of the photo-resist layer.

Abstract: An exposure method for exposing to a pattern a photosensitive material formed over a substrate having a reflective surface uses a light source having beam components of different wavelengths. The beam from the light source is used to project an exposure pattern upon the photosensitive material through a predetermined mask pattern to thereby form a combined standing wave pattern with the aid of the light beam incident on the photosensitive material and the light beam reflected by the reflective surface. The photosensitive material is disposed in the reduced peak value region of the combined standing wave pattern as the result of the interposition of a transparent layer between the reflecting surface and the photosensitive layer. Thus, the photosensitive material is pattern-exposed to a substantially uniform sensitizing energy.

Abstract: A method of preparing transparent artworks by forming a predetermined topological relief pattern by way of local layer-by-layer removal of the material on the side of the masking layer which is translucent to actinic radiation, with concurrent measurement of the optical phase difference between actinic light rays passing through the masking layer and a substrate transparent to actinic light, until the geometrical relief of the pattern becomes deep enough to ensure the required optical phase difference which is a multiple of 2.pi..

Abstract: Process for preparing photographic materials yielding on imagewise exposure to radiation a direct positive image is provided, which comprises the deposition of a thin layer of catalytically active metal onto a carrier base on the surface of which has been deposited an intermediate adhesive layer or surface filled by the deposition thereon and in direct contact therewith of a second thin layer of a photosensitive inorganic compound capable of reacting catalytically with the metal layer when activated upon exposure to radiation, so that the metal layer is destroyed on the illuminated areas but remains intact on the nonilluminated areas of the photographic material, creating in this way a direct positive metal image, capable of being stabilized and intensified.

Abstract: A photosensitive composition comprising (1) a maleic anhydride adduct of 1,2-polybutadiene having a molecular weight of 10,000 or higher, (2) at least one photosensitizer and/or at least one photosensitive crosslinking agent, and, if necessary, (3) at least one acrylic monomer. This composition can be developed with water or a polar solvent such as an alcohol, and its layer formed on a support provides a printing plate. When the acrylic monomer is contained, the composition is suitable for use in flexographic printing.

Abstract: The method for making patterned resist masks having minimum opening dimensions. The mask is prepared initially using standard photo or electron beam lithography techniques to yield the smallest aperture dimensions consistent with the state-of-the-art. Then, the resulting mask is placed within a chamber containing an atmosphere of resist solvent vapor. The vapor is absorbed by the patterned resist mask causing controlled resist reflow which uniformly reduces the dimensions of the resist openings by an amount determined by time, temperature, resist thickness, resist type and solvent used.

Abstract: A composite developer-etch composition for chromium-plated lithographic printing plates comprises an aqueous solution of aluminum chloride, a water-soluble chloride other than aluminum chloride, phosphoric acid, and an acid-stable water-soluble reducing agent; the composition having a particular specific gravity range.

Abstract: A composition suitable as a negative working photoresist composition comprising an N-vinyl compound such as N-vinyl carbazole, an organic halogen compound which is a source of free radicals, and as a binder, a maleic acid anhydride modified rosin. The resist composition is deposited on a suitable support and is exposed to a pattern of radiation in the usual way. A negative image is obtained by development with an alkaline liquid.

Abstract: This invention relates to a photopolymerizable copying composition comprising at least one binder, at least one photoinitiator, and at least one polymerizable, acid amide group-containing acrylic acid derivative or alkyl acrylic acid derivative which is not volatile at 100.degree. C and contains at least two polymerizable groups in the molecule, the polymerizable compound containing at least one compound of the following general formulaA(--X--NH--CO--G).sub.pwherein:A stands for Z(--CO--NH--).sub.2 wherein Z is ##STR1## --O--CH.sub.2 --C.sub.q H.sub.2q --O--, or --O--(CH.sub.2 CH.sub.2 --O--).sub.rWhereinq is a whole number from 1 to 11, andr is a whole number from 1 to 5, or forE--C(--CH.sub.2 --O--CO--NH--).sub.3whereinE is CH.sub.3 --, C.sub.2 H.sub.5 -- or --NH--CO--O--CH.sub.2 --,G stands for ##STR2## or ##STR3## whereinn is 0, 1, or 2,m is a whole number from 1 to 11,k is 0 or a whole number from 1 to 4,R.sub.1 is alkyl with 1 to 3 carbon atoms, or --R.sub.4 or --CH.sub.2 --R.sub.4,R.sub.2 and R.sub.

Abstract: Recording medium comprising a film of a polymer of 1-methylvinyl methyl ketone on a support is suitable for recording information with electron beams. This recording medium has high resolution and good sensitivity.

Abstract: Baked novolak resin based positive photoresists are either developed after exposure or stripped, following the use of the pattern resist layer as an etch mask, in aqueous solutions of a combination of permanganate and phosphoric acid.

Abstract: A process for making chip carriers using an anodized aluminum substrate iudes punching registration holes and center holes in the aluminum substrate, anodizing the aluminum and laminating copper foil to the substrate. Photo resist, etching and plating steps follow.

Abstract: A method of forming a circuit mask is disclosed. The method comprises selectively heating a portion of a cell comprising a liquid crystal above the transition temperature of the liquid crystal material to render the portion capable of scattering a desired radiant energy. An artwork master is thus formed having a pattern delineated therein capable of transmitting the desired radiant energy therethrough. A member having a surface sensitive to the desired radiant energy is positioned in a desired spatial relationship with the master. The master is exposed to the desired radiant energy whereby the radiant energy is transmitted through the pattern to expose at least a portion of the sensitive surface thereto. The exposed sensitive surface is treated to form the circuit mask having a pattern capable of transmitting light therethrough.

Abstract: A method of producing a surface having a reduced reflectance to electromagnetic radiation in a predetermined wavelength band which comprises arranging on the surface a regular array of protuberances having a height which is not less than one third of the length of the longest wavelength in the band and at a spacing which is less than the length of the shortest wavelength of the band divided by the refractive index of the material of which the protuberances consist.

Abstract: Recording medium comprising a film of a polymer of 1-methylvinyl methyl ketone on a support is suitable for recording information with electron beams. This recording medium has high resolution and good sensitivity.

Abstract: A positive photoresist having increased sensitivity to light and formed by the addition of an acidic compound to a 1,2-quinone-diazide sulphonic acid ester sensitizer.

Abstract: Positive photoresist layers including a base soluble resin and a diazo ketone sensitizer are treated with hydrogen ion following initial exposure to achieve changes in the developed resist profile and/or development in a negative mode.

Abstract: A photomask comprising a support that is transparent to ultra-violet radiation and visible light and a layer incorporating a photomask image, the image parts of which contain a complex compound of a silver halide and a diazonium, pyrylium, or thiapyrylium salt, wherein said complex compound is substantially opaque to ultra-violet radiation and blue light but substantially transmitting visible light in the wavelength range above 500 nm.

Abstract: Recording media comprising a mixture of 4,4'-bis(3-diazo-3,4-dihydro-4-oxo-1-naphthalenesulfonyloxy)benzil and an alkali soluble resin are suitable for recording information with electron beams. These recording media have high sensitivity, high resolving power and can be reproducibly formulated.