Scanning Probe Control Process Patents (Class 977/850)
  • Patent number: 8673621
    Abstract: The present patent application describes a cantilever for atomic force microscopy (AFM), which includes a cantilever body having a fixed end and a free end, the free end having a surface region being chemically modified by a dendron in which a plurality of termini of the branched region of the dendron are bound to the surface, and a terminus of the linear region of the dendron is functionalized.
    Type: Grant
    Filed: February 12, 2007
    Date of Patent: March 18, 2014
    Assignees: POSTECH Foundation, POSCO
    Inventors: Joon Won Park, Yu Jin Jung, Bong Jin Hong, Saul Tendler, Stephanie Allen
  • Patent number: 8347409
    Abstract: A method includes generating, using a sensor, a data signal. The data signal includes a first component based on a motion in a first direction of an actuator configured to provide motion between a sample and a probe in the first direction, the first direction substantially in the plane of the sample; and a second component based on at least one of topographic variations of the sample in a second direction, and a materials property of the sample. The method further includes generating, using a processor, a compensatory signal based on the first component of the data signal generated by the sensor; and providing the compensatory signal to the actuator.
    Type: Grant
    Filed: May 24, 2010
    Date of Patent: January 1, 2013
    Assignee: Massachusetts Institute of Technology
    Inventors: Daniel James Burns, Georg Ernest Fantner, Kamal Youcef-Toumi
  • Patent number: 8341760
    Abstract: An atomic force microscope (AFM) (1) is one type of SPM, and detects a resonance frequency shift as an amount of interaction between a probe and a sample. The AFM (1) performs distance modulation control while performing feedback control of a probe-sample distance so as to keep the amount of interaction constant. The distance modulation control varies the probe-sample distance at a distance modulation frequency higher than a response speed of the feedback control. The AFM (1) further acquires the interaction amounts detected during the variation of the probe-sample distance by the distance modulation control while performing relative scanning between the probe and the sample, and detects a distribution of the interaction amounts in a three-dimensional space having a dimension within a scanning range and a thickness within a variation range of the probe-sample distance.
    Type: Grant
    Filed: January 14, 2010
    Date of Patent: December 25, 2012
    Assignees: National University Corporation
    Inventors: Takeshi Fukuma, Yasumasa Ueda
  • Patent number: 8296860
    Abstract: An atomic force microscopy (AFM) method includes a scanning probe that scans a surface of a structure to produce a first structure image. The structure is then rotated by 90° with respect to the scanning probe. The scanning probe scans the surface of the structure again to produce a second structure image. The first and second structure images are combined to produce best fit image of the surface area of the structure. The same method is used to produce the best fit image of a flat standard. The best fit image of the flat standard is subtracted from the best fit image of the structure to obtain a true topographical image in which Z direction run out error is substantially reduced or eliminated.
    Type: Grant
    Filed: March 16, 2009
    Date of Patent: October 23, 2012
    Assignee: Seagate Technology LLC
    Inventors: Huiwen Liu, Lin Zhou, Dale Egbert, Jonathan Arland Nelson, Peter Gunderson
  • Patent number: 7998528
    Abstract: An all-additive method for direct fabrication of nanometer-scale planar and multilayer structures comprises the steps of acquiring a transferable material with a submillimeter-scale tip, depositing at least a portion of the acquired first transferable material at a predetermined location onto a substrate without a bridging medium, and repeating to create a structure using the transferable material.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: August 16, 2011
    Assignee: Massachusetts Institute of Technology
    Inventors: Brian Hubert, Joseph Jacobson, Aggelos Bletsas
  • Patent number: 7877816
    Abstract: Microscope, in particular a scanning probe microscope, comprising a programmable logic device.
    Type: Grant
    Filed: October 23, 2006
    Date of Patent: January 25, 2011
    Assignee: Witec Wissenschaftliche Instrumente und Technologie GmbH
    Inventors: Peter Spizig, Detlef Sanchen, Jörg Förstner, Joachim Koenen, Othmar Marti, Gerhard Volswinkler
  • Patent number: 7865966
    Abstract: A method of operating a scanning probe microscope (SPM) includes scanning a sample as a probe of the SPM interacts with a sample, and collecting sample surface data in response to the scanning step. The method identifies a feature of the sample from the sample surface data and automatically performs a zoom-in scan of the feature based on the identifying step. The method operates to quickly identify and confirm the location of features of interest, such as nano-asperities, so as to facilitate performing a directed high resolution image of the feature.
    Type: Grant
    Filed: September 12, 2008
    Date of Patent: January 4, 2011
    Assignee: Veeco Metrology Inc.
    Inventors: Chanmin Su, Sergey Belikov
  • Patent number: 7862858
    Abstract: A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed are methods that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages.
    Type: Grant
    Filed: December 17, 2008
    Date of Patent: January 4, 2011
    Assignee: International Business Machines Corporation
    Inventors: Michel Despont, Urs T. Duerig, Jane E. Frommer, Bernd W. Gotsmann, James L. Hedrick, Craig Jon Hawker, Robert D. Miller
  • Patent number: 7744963
    Abstract: In one aspect, a method of nanolithography is provided, the method comprising providing a substrate; providing a scanning probe microscope tip; coating the tip with a deposition compound; and subjecting said coated tip to a driving force to deliver said deposition compound to said substrate so as to produce a desired pattern. Another aspect of the invention provides a tip for use in nanolithography having an internal cavity and an aperture restricting movement of a deposition compound from the tip to the substrate. The rate and extent of movement of the deposition compound through the aperture is controlled by a driving force.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: June 29, 2010
    Assignee: Northwestern University
    Inventors: Chad A. Mirkin, Seunghun Hong, Vinayak P. Dravid
  • Patent number: 7735358
    Abstract: The present invention provides a self-sensing tweezer device for micro and nano-scale manipulation, assembly, and surface modification, including: one or more elongated beams disposed in a first configuration; one or more oscillators coupled to the one or more elongated beams, wherein the one or more oscillators are operable for selectively oscillating the one or more elongated beams to form one or more “virtual” probe tips; and an actuator coupled to the one or more elongated beams, wherein the actuator is operable for selectively actuating the one or more elongated beams from the first configuration to a second configuration.
    Type: Grant
    Filed: June 15, 2007
    Date of Patent: June 15, 2010
    Assignee: Insitutec, Inc.
    Inventors: Marcin B. Bauza, Shane C. Woody, Stuart T. Smith
  • Patent number: 7644447
    Abstract: Provided is a scanning probe microscope capable of precisely analyzing characteristics of samples having an overhang surface structure. The scanning probe microscope comprises a first probe, a first scanner changing a position of the first probe along a straight line, and a second scanner changing a position of a sample in a plane, wherein the straight line in which the position of the first probe is changed by using the first scanner is non-perpendicular to the plane in which the position of the sample is changed by using the second scanner.
    Type: Grant
    Filed: November 17, 2006
    Date of Patent: January 5, 2010
    Assignee: Park Systems Corp.
    Inventors: Sang-il Park, Yong-Seok Kim, Jitae Kim, Sang Han Chung, Hyun-Seung Shin, Jung-Rok Lee, Euichul Hwang
  • Patent number: 7569817
    Abstract: In a scanning probe apparatus capable of always effectively canceling an inertial force to suppress vibration even in repetitive use while replacing a sample holding table or a probe, a stage for a sample or the probe includes a drive element for moving the sample holding table and movable portions movable in a direction in which an inertial force generated during movement of the sample holding table. The stage is configured so that the drive element, the movable portions, and the sample holding table or the probe are integrally detachably mountable to a main assembly of the scanning probe apparatus.
    Type: Grant
    Filed: December 18, 2006
    Date of Patent: August 4, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takao Kusaka, Nobuki Yoshimatsu, Susumu Yasuda, Junichi Seki
  • Patent number: 7491425
    Abstract: A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed is a method that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages.
    Type: Grant
    Filed: October 29, 2004
    Date of Patent: February 17, 2009
    Assignee: International Business Machines Corporation
    Inventors: Michel Despont, Urs T. Duerig, Jane E. Frommer, Bernd W. Gotsmann, James L. Hedrick, Craig Jon Hawker, Robert D. Miller
  • Patent number: 7478552
    Abstract: A method of operating a probe based instrument includes a light source that generates and directs a beam of light towards a probe of the instrument to detect a property of probe deflection. The method automatically adjusts the position of the light beam on the probe based on movement of the probe by a Z actuator so as to eliminate apparent parasitic deflection of the probe. A light source assembly for detecting deflection of a probe preferably includes a base, a tip/tilt stage mounted on the base and a light source supported by the tip/tilt stage. The tip/tilt stage includes at least one electrically actuated fine adjustment actuator that controls the tip/tilt stage, preferably independently of movement of the AFM scanner used to move the probe.
    Type: Grant
    Filed: March 21, 2006
    Date of Patent: January 20, 2009
    Assignee: Veeco Instruments Inc.
    Inventors: Doug Gotthard, Ben Ohler
  • Patent number: 7435955
    Abstract: A system for controlling the operation of a scanning probe microscope that greatly simplifies the microscope's operation is disclosed. The software design incorporates several advanced features such as a sample designator file, video tutorials, automation algorithms, and the ability to remotely load sample designator files and video tutorials.
    Type: Grant
    Filed: July 29, 2005
    Date of Patent: October 14, 2008
    Inventor: Paul E. West
  • Patent number: 7429732
    Abstract: The preferred embodiments are directed to a method and apparatus of operating a scanning probe microscope (SPM) to perform sample measurements using a survey scan that is less than five lines, and more preferably two lines, to accurately locate a field of features of a sample. This is accomplished by selecting a step distance between adjacent lines of the survey scan that does not equal the pitch of the features in a direction orthogonal to the direction the survey scan traverses, i.e., does not equal the pitch of the features in the scan direction, XPO. The aspect ratio of the scans can also be modified to further improve sample throughput.
    Type: Grant
    Filed: September 30, 2005
    Date of Patent: September 30, 2008
    Assignee: Veeco Instruments Inc.
    Inventors: David A. Kneeburg, Rohit Jain, Jason R. Osborne, Wei Yao, Matthew T. Klonowski, Ingo Schmitz
  • Patent number: 7402736
    Abstract: A probe of a scanning probe microscope having a sharp tip and an increased electric characteristic by fabricating a planar type of field effect transistor and manufacturing a conductive carbon nanotube on the planar type field effect transistor. To achieve this, the present invention provides a method for fabricating a probe having a field effect transistor channel structure including fabricating a field effect transistor, making preparations for growing a carbon nanotube at a top portion of a gate electrode of the field effect transistor, and generating the carbon nanotube at the top portion of the gate electrode of the field effect transistor.
    Type: Grant
    Filed: December 23, 2005
    Date of Patent: July 22, 2008
    Assignee: POSTECH Foundation
    Inventors: Wonkyu Moon, Geunbae Lim, Sang Hoon Lee
  • Patent number: 7207119
    Abstract: The present invention relates to a controller comprising: at least two input terminals, each of which is configured to receive one of at least two input signals comprising information on a positioning of a scanner relative to a reference medium, and an output terminal, which is connectable to the scanner and configured to transmit an output signal, which is used for controlling the positioning of the scanner, wherein the controller further comprises: a processing unit being operable to designate a corresponding weighting function to each of the at least two input signals, a magnitude of the corresponding weighting function being selected to be in accordance with a noise profile of the input signal to which it has been designated; the processing unit further being operable to simultaneously use the at least two input signals, each with the corresponding weighting function designated thereto, to design a transfer function of the controller for use in the production of the output signal.
    Type: Grant
    Filed: December 8, 2005
    Date of Patent: April 24, 2007
    Assignee: International Business Machines Corporation
    Inventors: Evangelos S. Eleftheriou, Angeliki Pantazi, Charalampos Pozidis, Abu Sebastian
  • Patent number: 7161286
    Abstract: A carbon nanotube-based device (40) includes a substrate (10), a number of catalytic nano-sized particles (131) formed on the substrate, and an aligned carbon nanotube array (15) extending from the alloy catalytic nano-sized particles. The aligned carbon nanotube array progressively bends in a predetermined direction. A method for making the carbon nanotube-based device includes the steps of: providing a substrate; depositing a layer of catalyst on the substrate; depositing a layer of catalyst dopant material on the catalyst layer, for varying a reaction rate of synthesis of the aligned carbon nanotube array; annealing the catalyst and the catalyst dopant material in an oxygen-containing gas at a low temperature; and exposing the nano-sized particles and catalyst dopant material to a carbon-containing source gas at a predetermined temperature such that the aligned carbon nanotube array grows from the substrate.
    Type: Grant
    Filed: August 12, 2003
    Date of Patent: January 9, 2007
    Assignees: Tsinghua University, Hon Hai Precision Ind. Co., Ltd.
    Inventors: Liang Liu, Shou-Shan Fan