Abstract: A surface profile measuring instrument (1), and method, for measuring the surface profile of a substrate (13). The surface profile measuring instrument (1) comprises an electromagnetic probe (8), the electromagnetic probe (8) comprising a probe tip operable to be brought into proximity with a surface of a substrate (13) to be measured, a drive unit (2) operable to generate a low frequency magnetic field penetrating the surface of the substrate (13), a pick up unit (3) operable to detect the strength of the magnetic field and output a magnetic field strength reading and a computation unit (4) operable to determine a surface profile measurement based on the magnetic field strength reading.

Abstract: Systems, apparatuses, and methods for realizing a peak-force scattering scanning near-field optical microscopy (PF-SNOM). Conventional scattering-type microscopy (s-SNOM) techniques uses tapping mode operation and lock-in detections that do not provide direct tomographic information with explicit tip-sample distance. Using a peak force scattering-type scanning near-field optical microscopy with a combination of peak force tapping mode and time-gated light detection, PF-SNOM enables direct sectioning of vertical near-field signals from a sample surface for both three-dimensional near-field imaging and spectroscopic analysis. PF-SNOM also delivers a spatial resolution of 5 nm and can simultaneously measure mechanical and electrical properties together with optical near-field signals.

Abstract: Described herein is a ruggedized microelectromechanical (“MEMS”) force sensor. The sensor employs piezoresistive or piezoelectric sensing elements for force sensing where the force is converted to strain and converted to electrical signal. In one aspect, both the piezoresistive and the piezoelectric sensing elements are formed on one substrate and later bonded to another substrate on which the integrated circuitry is formed. In another aspect, the piezoelectric sensing element is formed on one substrate and later bonded to another substrate on which both the piezoresistive sensing element and the integrated circuitry are formed.

Abstract: A method and a system are for sparse sampling utilizing a programmatically randomized signal for modulating a carrier signal. The system includes a compound sparse sampling pattern generator that generates at least one primary carrier signal, and at least one secondary signal. The at least one secondary signal modulates the at least one primary signal in a randomized fashion.

Abstract: To easily measure a voltage to ground of electromagnetic interference waves generated on a cable. A capacitance-to-ground measurement mechanism 10 includes a first electrode 11 and a second electrode 12 positioned at equal altitudes to be opposed to the earth, and a first voltage measurement device 15 to measure a voltage generated in a first resistance 14 connected between the first electrode 11 and the second electrode 12 by an output signal from an oscillation circuit 13. A voltage-to-ground measurement mechanism 30 includes a GND electrode 31 positioned at an altitude equal to that of the first electrode 11 and the second electrode 12 to be opposed to the earth, and a second voltage measurement device 33 to measure a voltage generated in a second resistance 32 connected between the GND electrode 31 and a probe 34 that is brought into contact with a cable core 106 as a measurement target.

Abstract: Provided is a probe configured to detect a near field, the probe including a probe substrate having a tip region at an end portion of the probe substrate, a width of the tip region being less than a width of a remaining region of the probe substrate, a first electrode and a second electrode disposed on a surface of the probe substrate, the first electrode and the second electrode being spaced apart from each other and extending from the tip region along the probe substrate, an emitter and a detector disposed between the first electrode and the second electrode, the emitter and the detector being spaced apart from each other in a direction in which the probe substrate extends, and being configured to be photo switched, and a reflector disposed above the emitter and the detector in the direction in which the probe substrate extends opposite to the tip region, and configured to reflect an electromagnetic wave emitted from the emitter.

Abstract: A scanning probe microscope 1 is provided with a control unit 15. The control unit 15 includes a signal acquisition processing unit 151, an image acquisition processing unit 152, a scanning condition change processing unit 154, a scanning processing unit 155, and a noise determination processing unit 156. In the scanning probe microscope 1, when removing noise included in a surface image of a sample, the scanning condition change processing unit 154 changes a scanning condition. And, the signal acquisition processing unit 151 acquires an output signal from a detection unit 12. The image acquisition processing unit 152 acquires a surface image of a sample S based on the output signal. The noise determination processing unit 156 determines whether or not noise is inclined in the output signal contains noise based on the change in the output signal or the change in the surface image of the sample S when the scanning condition is changed by the scanning condition change processing unit 154.

Abstract: The invention relates to a scanning probe microscope comprising: a specimen holder holding a specimen; and a probe for scanning the relief of the upper surface of the specimen, which probe is movable in a vertical direction and two orthogonal horizontal directions, wherein the upper surface of the specimen is tilted relative to at least one of the two orthogonal horizontal directions.

Abstract: A method includes generating, using a sensor, a data signal. The data signal includes a first component based on a motion in a first direction of an actuator configured to provide motion between a sample and a probe in the first direction, the first direction substantially in the plane of the sample; and a second component based on at least one of topographic variations of the sample in a second direction, and a materials property of the sample. The method further includes generating, using a processor, a compensatory signal based on the first component of the data signal generated by the sensor; and providing the compensatory signal to the actuator.

Abstract: An atomic force microscope (AFM) (1) is one type of SPM, and detects a resonance frequency shift as an amount of interaction between a probe and a sample. The AFM (1) performs distance modulation control while performing feedback control of a probe-sample distance so as to keep the amount of interaction constant. The distance modulation control varies the probe-sample distance at a distance modulation frequency higher than a response speed of the feedback control. The AFM (1) further acquires the interaction amounts detected during the variation of the probe-sample distance by the distance modulation control while performing relative scanning between the probe and the sample, and detects a distribution of the interaction amounts in a three-dimensional space having a dimension within a scanning range and a thickness within a variation range of the probe-sample distance.

Abstract: An atomic force microscopy (AFM) method includes a scanning probe that scans a surface of a structure to produce a first structure image. The structure is then rotated by 90° with respect to the scanning probe. The scanning probe scans the surface of the structure again to produce a second structure image. The first and second structure images are combined to produce best fit image of the surface area of the structure. The same method is used to produce the best fit image of a flat standard. The best fit image of the flat standard is subtracted from the best fit image of the structure to obtain a true topographical image in which Z direction run out error is substantially reduced or eliminated.

Abstract: Improved actuated probes suitable for scanning probe lithography or microscopy, and especially direct-write nanolithography and method of fabrication thereof. In one embodiment, thermomechanically actuated cantilevers with oxide-sharpened microcast tips are inexpensively fabricated by a process that comprises low-temperature wafer bonding, such as (gold) thermocompressive bonding, eutectic or adhesive bonding. Also provided is a flexcircuit that electrically interconnects the actuated probes to external circuitry and mechanically couples them to the instrument actuator. An improved scanning probe lithography instrument, hardware and software, can be built around the actuated cantilevers and the flexcircuit. Finally, provided is an improved microfluidic circuit to deliver chemical compounds to the tips of (actuated) probes and a fabrication method for tall, high-aspect-ratio tips.

Abstract: A scanning probe microscope tilts the scanning direction of a z-scanner by a precise amount and with high repeatability using a movable assembly that rotates the scanning direction of the z-scanner with respect to the sample plane. The movable assembly is moved along a curved guide by a rack-and-pinion drive system and has grooves that engage with corresponding ceramic balls formed on a stationary frame to precisely position the movable assembly at predefined locations along the curved guide. The grooves are urged against the ceramic balls via a spring force and, prior to movement of the movable assembly, a pneumatic force is applied to overcome the spring force and disengage the grooves from the ceramic balls.

Abstract: An all-additive method for direct fabrication of nanometer-scale planar and multilayer structures comprises the steps of acquiring a transferable material with a submillimeter-scale tip, depositing at least a portion of the acquired first transferable material at a predetermined location onto a substrate without a bridging medium, and repeating to create a structure using the transferable material.

Abstract: A scanning probe microscope is provided, which can be stably used for a long time even if excitation efficiency varies during scan. A cantilever (5) is excited, and the cantilever (5) and a sample are subjected to relative scanning. A second-harmonic component detection circuit (31) detects second-harmonic component amplitude of oscillation of the cantilever (5) as integral-multiple component amplitude. The second-harmonic component amplitude is amplitude of a second-harmonic component having a frequency twice as high as excitation frequency. An excitation intensity adjustment circuit (33) controls excitation intensity based on the detected second-harmonic component amplitude such that the second-harmonic component amplitude is kept constant.

Abstract: There is provided a scanning probe microscope apparatus which has a high sensitivity for the interaction between the cantilever and the sample and comprises a cantilever that can oscillate stably in dynamic mode even when a mechanical Q value is low. A driving signal having a frequency close to the resonant frequency of the cantilever (4) is supplied from the signal generator (9) to the oscillation exciting means (10) to separately (forcibly) oscillate the cantilever (4). And the frequency of the driving signal or the resonant frequency of the cantilever is controlled (by adjusting the distance between the cantilever (4) and the sample (1)), such that the phase difference between the oscillation of the cantilever (4) detected by the oscillation detecting means (5) and the driving signal becomes zero, i.e. the frequency of the driving signal and the resonant frequency of the cantilever (4) match.

Abstract: Microscope, in particular a scanning probe microscope, comprising a programmable logic device.

Abstract: A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed are methods that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages.

Abstract: The present invention provides a self-sensing tweezer device for micro and nano-scale manipulation, assembly, and surface modification, including: one or more elongated beams disposed in a first configuration; one or more oscillators coupled to the one or more elongated beams, wherein the one or more oscillators are operable for selectively oscillating the one or more elongated beams to form one or more “virtual” probe tips; and an actuator coupled to the one or more elongated beams, wherein the actuator is operable for selectively actuating the one or more elongated beams from the first configuration to a second configuration.

Abstract: Provided is a scanning probe microscope capable of precisely analyzing characteristics of samples having an overhang surface structure. The scanning probe microscope comprises a first probe, a first scanner changing a position of the first probe along a straight line, and a second scanner changing a position of a sample in a plane, wherein the straight line in which the position of the first probe is changed by using the first scanner is non-perpendicular to the plane in which the position of the sample is changed by using the second scanner.

Abstract: A scanning probe microscope system comprising a hollow probe 3, a tube 4 connected to a rear end 32 of the hollow probe 3, a support table 1 provided under the hollow probe 3, and a substrate 2 and a means 5 for washing the hollow probe 3 that are fixed to the support table 1, a sample S passing through the tube 4 and the hollow probe 3, and the substrate 2 and the washing means 5 being moved by the support table 1 such that each of them opposes the hollow probe 3.

Abstract: In a scanning probe apparatus capable of always effectively canceling an inertial force to suppress vibration even in repetitive use while replacing a sample holding table or a probe, a stage for a sample or the probe includes a drive element for moving the sample holding table and movable portions movable in a direction in which an inertial force generated during movement of the sample holding table. The stage is configured so that the drive element, the movable portions, and the sample holding table or the probe are integrally detachably mountable to a main assembly of the scanning probe apparatus.

Abstract: The present invention describes an apparatus for nanolithography and a process for thermally controlling the deposition of a solid organic “ink” from the tip of an atomic force microscope to a substrate. The invention may be used to turn deposition of the ink to the substrate on or off by either raising its temperature above or lowing its temperature below the ink's melting temperature. This process may be useful as it allows ink deposition to be turned on and off and the deposition rate to change without the tip breaking contact with the substrate. The same tip can then be used for imaging purposes without fear of contamination. This invention can allow ink to be deposited in a vacuum enclosure, and can also allow for greater spatial resolution as the inks used have lower surface mobilities once cooled than those used in other nanolithography methods.

Abstract: A method of approaching a probe to a target position on a sample mounted on a sample stage tilted at a preselected tilt angle about a tilt axis of the sample stage. A distance between the tip of the probe and the target position of the sample is observed with a charged particle beam microscope while approaching the tip of the probe to the target position on the sample. The probe is moved in a direction so that on a display of the charged particle beam microscope, the tip of the probe and the tip of a shadow of the probe on the sample coincide at the target position on the sample.

Abstract: A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed is a method that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages.

Abstract: A scanning probe microscope has a probe needle and a control section that controls relative scanning movement between the probe needle and a surface of a sample in at least one direction parallel to the sample surface and controls relative movement between the probe needle and the sample surface in a direction perpendicular to the sample surface. A vibration source vibrates the probe needle at a vibrating frequency relative to the sample surface. An approach/separation drive section causes the probe needle to relatively approach to and separate from the sample surface at a predetermined distance while the probe needle is vibrated at the vibrating frequency relative to the sample surface by the vibration source. A detection section detects a rate of change in a vibration state of the probe needle in accordance with a distance between the probe needle and the sample surface.

Abstract: Disclosed herein are an apparatus for and a method of bonding a nano-tip using electrochemical etching, in which a good bonding stability can be provided. The nano-tip bonding apparatus comprises a glass plate having a top surface of a certain desired area. An electrolytic solution having conductivity is placed on the top surface of the glass plate by means of surface tension. Means for moving reciprocally a base material having conductivity in opposite direction is provided. A carbon nano-tube is adhered to a pointed tip of the base material by means of an adhesive. An end portion of the carbon nano-tube is to be immersed in the electrolytic solution. A power supply is provided for applying an electric power to the electrolytic solution and the base material.

Abstract: A system that includes an optical subsystem and an atomic force microscope probe is provided. The optical subsystem is configured to generate positional information about a location on a surface of the specimen. The system is configured to position the probe proximate the location based on the positional information. One method includes generating positional information about a location on a surface of a specimen with an optical subsystem. The method also includes positioning an atomic force microscopy probe proximate the location based on the positional information. Another system includes an optical subsystem configured to measure overlay of a wafer using scatterometry. The system also includes an atomic force microscope configured to measure a characteristic of a feature on the wafer. An additional method includes measuring overlay of a wafer using scatterometry. The method also includes measuring a characteristic of a feature on the wafer using atomic force microscopy.

Abstract: The preferred embodiments are directed to a method and apparatus of operating a scanning probe microscope (SPM) to perform sample measurements using a survey scan that is less than five lines, and more preferably two lines, to accurately locate a field of features of a sample. This is accomplished by selecting a step distance between adjacent lines of the survey scan that does not equal the pitch of the features in a direction orthogonal to the direction the survey scan traverses, i.e., does not equal the pitch of the features in the scan direction, XPO. The aspect ratio of the scans can also be modified to further improve sample throughput.

Abstract: A conductive atomic force microscopy (cAFM) technique which can concurrently monitor topography, charge transport, and electroluminescence with nanometer spatial resolution. This cAFM approach is particularly well suited for probing the electroluminescent response characteristics of operating organic light-emitting diodes (OLEDs) over short length scales.

Abstract: A method for manufacturing a microstructure device using a near field scanning optical microscope (NSOM) laser micromachining system. A microstructure device preform, including an existing feature, is provided. The NSOM probe tip is scanned over a portion of the preform selected such that a plurality of scan lines cross the existing feature. Scanned locations of the existing feature in at least two scan lines are determined. The orientation of the existing feature is determined based on the scanned locations and the shape of the existing feature. At least one expected machining location in a subsequent scan line is determined based on the shape and orientation of the existing feature. The micro-machining laser is pulsed as the NSOM probe is scanned through the expected machining location(s) during the subsequent scan lines to form at least one fine feature on the microstructure device preform, thus, completing the microstructure device.

Abstract: A method for manufacturing a microstructure, which includes at least one fine feature on an existing feature, using an NSOM laser micromachining system. A microstructure device preform is provided. A portion of its top surface is profiled with the NSOM to produce a topographical image. This profiled portion is selected to include the existing feature. An image coordinate system is defined for the profiled portion of top surface based on the topographical image. Coordinates of a reference point and the orientation of the existing feature in the image coordinate system are determined using the topographical image. The probe tip of the NSOM is aligned over a portion of the existing feature using the determined coordinates of the reference point and the orientation of the existing feature. The top surface of the microstructure device preform is machined with the micro-machining laser to form the fine feature(s) on the existing feature.