Nanoimprint Lithography (i.e., Nanostamp) Patents (Class 977/887)
-
Patent number: 7699598Abstract: The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.Type: GrantFiled: January 31, 2007Date of Patent: April 20, 2010Assignee: Molecular Imprints, Inc.Inventors: Sidlgata V. Sreenivasan, Byung-Jin Choi, Ronald D. Voisin
-
Publication number: 20100055620Abstract: Techniques for fabricating nanostructures are provided. In one embodiment a method includes forming a multilayer stack including at least one pair of a structural layer and a sacrificial layer on a substrate, patterning the multilayer stack in order to fabricate a nanostructure, and releasing the nanostructure from the patterned multilayer stack.Type: ApplicationFiled: November 25, 2008Publication date: March 4, 2010Applicant: Seoul National University Research and Development Business Foundation (SNU R&DB FOUNDATIInventor: Sunghoon Kwon
-
Patent number: 7670530Abstract: The present invention is directed towards a method for patterning first and second substrates in a nanoimprint lithography system, the method including, inter alia, positioning the first substrate on a first substrate chuck; positioning a nanoimprint material on the first substrate; obtaining a spatial relationship between the first substrate and a nanoimprint mold assembly and imprinting a pattern in the nanoimprint material on the first substrate with the nanoimprint mold assembly while concurrently positioning the second substrate on a second substrate chuck; separating the nanoimprint mold assembly from the nanoimprint material on the first substrate; positioning a nanoimprint material on the second substrate; removing the first substrate from the first substrate chuck while concurrently obtaining a spatial relationship between the second substrate and the nanoimprint mold assembly and imprinting a pattern in the nanoimprint material on the second substrate with the nanoimprint mold assembly; and separatiType: GrantFiled: January 19, 2007Date of Patent: March 2, 2010Assignee: Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Sidlgata V. Sreenivasan
-
Patent number: 7670529Abstract: The present invention is directed towards a method and a system of patterning first and second opposed sides of a substrate. The method and system may employ a mold assembly and obtaining a desired spatial relationship between the first and second opposed sides of the substrate and the mold assembly. In a further embodiment, the method and system may employ a first and a second mold assembly.Type: GrantFiled: November 30, 2006Date of Patent: March 2, 2010Assignee: Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Sidlgata V. Sreenivasan
-
Patent number: 7662299Abstract: A method for forming a template useful for nanoimprint lithography comprises forming at least one pillar which provides a topographic feature extending from a template base. At least one conformal pattern layer and one conformal spacing layer, and generally a plurality of alternating pattern layers and spacing layers, are formed over the template base and pillar. A planarized filler layer is formed over the pattern and spacing layers, then the filler, the spacing layer and the pattern layer are partially removed, for example using mechanical polishing, to expose the pillar. One or more etches are performed to remove at least a portion of the pillar, the filler, and the spacing layer to result in the pattern layer protruding from the spacing layer and providing the template pattern.Type: GrantFiled: August 30, 2005Date of Patent: February 16, 2010Assignee: Micron Technology, Inc.Inventors: Krupakar M. Subramanian, Mirzafer Abatchev
-
Patent number: 7658601Abstract: A pattern forming apparatus maintaining alignment between a mold and a substrate. The pattern forming apparatus includes a press pressing the mold against the substrate in a pressing direction, and a mechanism to maintain orientation of the mold and the substrate perpendicular to the pressing direction.Type: GrantFiled: September 15, 2004Date of Patent: February 9, 2010Assignee: Canon Kabushiki KaishaInventor: Kazuyuki Kasumi
-
Patent number: 7654815Abstract: There is provided a fine pattern transfer, belt-shaped mold, with which a fine structure having a high aspect ratio can be formed rapidly and stably using nanoimprinting, and a fine pattern transfer system (a nanoimprint system) that employs this mold. According to the present invention, a nanoimprint mold includes: a belt-shaped support member; a plurality of stampers, for each of which a fine convex-and-concave pattern, to be transferred, is formed on one surface; and an adhesive member, to which the belt-shaped support member and the stampers are to be securely adhered, wherein the adhesive member includes a porous member and adhesive layers, which are deposited on either face of the porous member, for impregnating one part of the porous member, and wherein, for the porous member, a porous area that is not impregnated with the adhesive layers, is provided and positioned so as to sandwich the porous member between portions impregnated with the adhesive layers.Type: GrantFiled: August 14, 2008Date of Patent: February 2, 2010Assignee: Hitachi, Ltd.Inventors: Mitsuru Hasegawa, Masahiko Ogino
-
Patent number: 7645411Abstract: An imprinting apparatus, for transferring a microstructure of a mold onto a forming material by pressing and mold-releasing, includes a plurality of driving devices which relatively move the mold the forming material to each other along an axis of a pressing direction, wherein the plurality of driving devices make different relative moving speeds of the mold and the forming material during the relative motion.Type: GrantFiled: November 16, 2006Date of Patent: January 12, 2010Assignee: Konica Minolta Holdings, Inc.Inventor: Hiroshi Miyakoshi
-
Patent number: 7645413Abstract: A method of forming a pattern is disclosed, which can improve the interfacial properties between a soft mold and a substrate including a pattern-formation material, the method comprising loading a substrate coated with a pattern-formation material into a chamber; positioning a soft mold, whose surface is provided with embossing and depressed patterns, in opposite to the substrate inside the chamber; forming an adsorption layer by evaporating some components of the pattern-formation material and adsorbing the components evaporated from the pattern-formation material to the surface of soft mold; forming a pattern layer with a shape being inverted to the embossing and depressed patterns included in the surface of soft mold by bring the soft mold including the adsorption layer into contact with the remaining pattern-formation material; and separating the soft mold from the pattern layer.Type: GrantFiled: November 27, 2007Date of Patent: January 12, 2010Assignee: LG Display Co., Ltd.Inventor: Tae Joon Song
-
Patent number: 7635445Abstract: The present invention is directed towards a method of separating a mold, included in a template, from a layer disposed on a substrate, the method including, inter alia, applying a separation force to the template to separate the template from the layer; and facilitating localized deformation in the substrate to reduce the separation force required to achieve separation.Type: GrantFiled: April 18, 2005Date of Patent: December 22, 2009Assignee: Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Anshuman Cherala, Yeong-jun Choi, Mario J. Meissl, Sidlgata V. Sreenivasan, Norman E. Schumaker, Xiaoming Lu, Ian M. McMackin, Daniel A. Babbs
-
Patent number: 7625513Abstract: A hot embossing lithography method includes the steps of: providing a press mold (20) having a press surface, the press surface having a pattern defined therein; providing a substrate (10?) having a polymer thin film (30) formed thereon; aligning the press mold with the polymer thin film; introducing a vapor to moisten the press surface for lowering a surface adsorption energy of the press surface; heating the polymer thin film to a temperature above a glass transition temperature of the polymer thin film, thereby softening the polymer thin film; pressing the press mold into the softened polymer thin film to transfer the pattern of the press mold into the polymer thin film; cooling the polymer thin film and the press mold to a temperature near the glass transition temperature of the polymer thin film; and separating the press mold from the polymer thin film.Type: GrantFiled: September 30, 2005Date of Patent: December 1, 2009Assignee: Hon Hai Precision Industry Co., Ltd.Inventor: Tai-Cherng Yu
-
Patent number: 7617769Abstract: A nanoimprinting system incorporates a patterned media contact architecture to provide a uniform imprinting pressure across the target imprinting area on a disk substrate. The system leverages the unique disk substrate characteristic of an inner diameter hole by incorporating a membrane suspension, gel-pad buffering, and air cushion loading that exploits the inner diameter hole characteristics of the disk substrate. This design dramatically increases the uniformity of the pressing pressure across the target imprinting area. As a result, a simple and effective improvement of the quality of the patterns imprinted on the recording disk substrate is realized.Type: GrantFiled: October 27, 2008Date of Patent: November 17, 2009Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventor: Tsai-Wei Wu
-
Patent number: 7597813Abstract: A method of manufacturing an element substrate including: forming a release layer on a first support substrate; forming a metal layer having a predetermined pattern on the release layer; disposing a second support substrate on the first support substrate so that the metal layer is interposed between the first and second support substrates; pouring a resin material in a fluid state between the first and second support substrates; curing the resin material to form a resin substrate; and removing the metal layer from the first support substrate by decomposing the release layer to transfer the metal layer to the resin substrate.Type: GrantFiled: October 2, 2007Date of Patent: October 6, 2009Assignee: Seiko Epson CorporationInventors: Toshihiko Kaneda, Satoshi Kimura, Hidemichi Furihata, Takeshi Kijima
-
Patent number: 7596420Abstract: A method is provided wherein a lithographic projection apparatus is used to print a series of test patterns on a test substrate to measure printed critical dimension as function of exposure dose setting and focus setting. A full-substrate analysis of measured critical dimension data is modeled by a response model of critical dimension. The response model includes an additive term which expresses a spatial variability of the response with respect to the surface of the test substrate. The method further includes fitting the model by fitting model parameters using measured critical dimension data, and controlling critical dimension using the fitted model.Type: GrantFiled: June 19, 2006Date of Patent: September 29, 2009Assignee: ASML Netherlands B.V.Inventors: Antoine Gaston Marie Kiers, Johannes Anna Quaedackers
-
Patent number: 7592269Abstract: A method of forming a charge pattern includes treating a stamp layer with a plasma, applying the treated stamp layer to a surface of a substrate to thereby form a charge pattern on the surface of the substrate, and separating the stamp layer from the surface of the substrate. In one aspect, the method includes depositing nanoparticles on the surface of the substrate. An apparatus made in accordance with the method is also provided.Type: GrantFiled: June 19, 2007Date of Patent: September 22, 2009Assignee: Regents of the University of MinnesotaInventor: Heiko O. Jacobs
-
Patent number: 7575705Abstract: An imprint stamper for manufacturing a recording medium includes a first transfer region which corresponds to a servo region of a recording medium using a sector servo system and has a pattern with a plurality of quadrilateral recess or protrusion portions formed in a surface thereof, and a second transfer region which corresponds to a data region of the recording medium and has a pattern with a plurality of dots of recess or protrusion portions arrayed in a form of a hexagonal lattice in a surface thereof.Type: GrantFiled: March 27, 2007Date of Patent: August 18, 2009Assignee: Kabushiki Kaisha ToshibaInventors: Masatoshi Sakurai, Yoshiyuki Kamata
-
Publication number: 20090201722Abstract: A method for defining magnetic domains in a magnetic thin film on a substrate, includes: coating the magnetic thin film with a resist; patterning the resist, wherein areas of the magnetic thin film are substantially uncovered; and exposing the magnetic thin film to a plasma, wherein plasma ions penetrate the substantially uncovered areas of the magnetic thin film, rendering the substantially uncovered areas non-magnetic.Type: ApplicationFiled: January 16, 2009Publication date: August 13, 2009Inventors: Kamesh Giridhar, Omkaram Nalamasu, Steven Verhaverbeke, Mahalingam Venkatesan
-
Publication number: 20090174118Abstract: A nanoimprint system according to one embodiment of the present invention is a system for performing a pattern transfer onto an object to be molded by pressing a mold against the object to be molded using a head, characterized in that the head has a flat pressing surface during pressing the mold and is slid onto the mold while pressing the mold.Type: ApplicationFiled: May 31, 2006Publication date: July 9, 2009Inventors: Ryutaro Maeda, Harutaka Mekaru, Hiroshi Goto
-
Publication number: 20090136583Abstract: Discrete microstructures of predefined size and shape are prepared using sol-gel phase-reversible hydrogel templates. An aqueous solution of hydrogel-forming material is covered onto a microfabricated silicon wafer master template having predefined microfeatures, such as pillars. A hydrogel template is formed, usually by lowering the temperature, and the formed hydrogel template is peeled away from the silicon master template. The wells of predefined size and shape on the hydrogel template are filled with a solution or a paste of a water-insoluble polymer, and the solvent is removed to form solid structures. The formed microstructures are released from the hydrogel template by simply melting the hydrogel template in water. The microstructures are collected by centrifugation. The microstructures fabricated by this method exhibit pre-defined size and shape that exactly correspond to the microwells of the hydrogel template.Type: ApplicationFiled: September 27, 2008Publication date: May 28, 2009Inventors: Kinam Park, Ghanashyam Acharya, Haesun Park
-
Publication number: 20090131858Abstract: The present invention relates to ultrafiltration. In particular, the present invention provides nanoporous membranes having pores for generating in vitro and in vivo ultrafiltrate, devices and bioartificial organs utilizing such nanoporous membranes, and related methods (e.g., diagnostic methods, research methods, drug screening). The present invention further provides nanoporous membranes configured to avoid protein fouling with, for example, a polyethylene glycol surface coating.Type: ApplicationFiled: January 10, 2008Publication date: May 21, 2009Applicant: The Regents of the University of MichiganInventors: William H. Fissell, Shuvo Roy, Aaron Fleischman, Kenneth G. Goldman
-
Patent number: 7520742Abstract: A pillar with a high aspect ratio is transferred by a nanoprinting method. In order to form a fine structure on a substrate, a nanoprinting apparatus heats and presses the substrate and a mold with a fine concave-convex pattern formed thereon, the mold having a mechanism for transferring and applying a mold-releasing agent. A method for transferring a fine structure using the aforementioned nanoprinting apparatus.Type: GrantFiled: March 17, 2004Date of Patent: April 21, 2009Assignee: Hitachi, Ltd.Inventors: Shigehisa Motowaki, Akihiro Miyauchi, Masahiko Ogino, Kosuke Kuwabara
-
Patent number: 7500431Abstract: A nanoimprinting system incorporates a patterned media contact architecture to provide a uniform imprinting pressure across the target imprinting area on a disk substrate. The system leverages the unique disk substrate characteristic of an inner diameter hole by incorporating a membrane suspension, gel-pad buffering, and air cushion loading that exploits the inner diameter hole characteristics of the disk substrate. This design dramatically increases the uniformity of the pressing pressure across the target imprinting area. As a result, a simple and effective improvement of the quality of the patterns imprinted on the recording disk substrate is realized.Type: GrantFiled: January 12, 2006Date of Patent: March 10, 2009Inventor: Tsai-Wei Wu
-
Patent number: 7491423Abstract: A method for controllably forming zinc oxide nanostructures on a surface via an organic template, which is formed using a stamp prepared from pre-defined relief structures, inking the stamp with a solution comprising self-assembled monolayer (SAM) molecules, contacting the stamp to the surface, such as Ag sputtered on Si, and immersing the surface with the patterned SAM molecules with a zinc-containing solution with pH control to form zinc oxide nanostructures on the bare Ag surface.Type: GrantFiled: May 1, 2006Date of Patent: February 17, 2009Assignee: Sandia CorporationInventors: Julia Hsu, Jun Liu
-
Publication number: 20080272516Abstract: A stepwise contraction and adsorption nanolithography (SCAN) patterning process can shrink complex microstructures (produced by current microfabrication technology) into the nanometer region. The basis of SCAN is to transfer a pre-engineered microstructure onto a extended elastomer. This extended elastomer is then allowed to relax, reducing the microstructure accordingly. The new miniaturized structure is then used as a stamp to transfer the structure onto another stretched elastomer. Through iterations of this procedure, patterns of materials with pre-designed geometry are miniaturized to the desired dimensions, including sub-100 ran. The simplicity and high throughput capability of SCAN make the platform a competitive alternative to other micro- and nanolithography techniques for potential applications in multiplexed sensors, non-binary optical displays, biochips, nanoelectronics devices, and microfluidic devices.Type: ApplicationFiled: May 30, 2006Publication date: November 6, 2008Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIAInventors: Gang-Yu Liu, Jun Hu, Li Tan, Maozi Liu
-
Patent number: 7445971Abstract: The present invention provides a thin-film transistor that is formed by using a patterning method capable of forming a semiconductor channel layer in sub-micron order and a method for manufacturing thereof that provides a thin-film transistor with a larger area, and suitable for mass production. These objects are achieved by a thin-film transistor formed on a substrate 1 with a finely processed concavoconvex surface 2, in which a source electrode and a drain electrode are formed on adjacent convex portions of the concavoconvex surface 2, with a channel and a gate being formed on a concave area between the convex portions. A gate electrode 5, a gate insulating film 6 and a semiconductor channel layer 7 are laminated in this order on the concave area from the bottom surface of the concave portion toward the top surface.Type: GrantFiled: January 10, 2007Date of Patent: November 4, 2008Assignee: Dai Nippon Printing Co., Ltd.Inventors: Wataru Saito, Yudai Yamashita
-
Patent number: 7445742Abstract: A method and mold for creating nanoscale patterns in an ion-selective polymer membrane is provided, in which a mold comprising a substrate and a molding layer having at least one protruding feature is imprinted on the ion-selective polymer membrane, thereby creating a recessed feature in the membrane. Protruding features having nanoscale dimensions can be created, e.g., by using self-assembled nanostructures as a shadow mask for etching a molding layer. In one embodiment, an imprinted ion selective polymer membrane, suitable for use as a solid electrolyte, is adapted for use in an electrochemical device or fuel cell by adding a metal catalyst to one portion of the membrane to serve as a catalytic electrode.Type: GrantFiled: August 15, 2003Date of Patent: November 4, 2008Assignee: Hewlett-Packard Development Company, L.P.Inventors: Yong Chen, David Hacklernan, Laurie S. Mittelstadt, Yoocham Jeon, Richard Stanley Williams
-
Patent number: 7434512Abstract: A method for transferring a pattern from an elastic stamp to a substrate in the presence of a third medium is described. A proximity contact is achieved between the stamp and the substrate. A layer of the third medium between the stamp and the substrate is controlled to a predetermined thickness. Stamps for carrying out this method are also described.Type: GrantFiled: August 28, 2003Date of Patent: October 14, 2008Assignee: International Business Machines CorporationInventors: Alexander Bietsch, Emmanuel Delamarche, Bruno Michel, Heinz Schmid, Heiko Wolf
-
Patent number: 7410901Abstract: A method for fabricating substrate material to include trenches and unreleased beams with submicron dimensions includes etching a first oxide layer on the substrate to define a first set of voids in the first oxide layer to expose the substrate. A second oxide layer is accreted to the first oxide layer to narrow the first set of voids to become a second set of voids on the substrate. A polysilicon layer is deposited over the second oxide layer, the first oxide layer and the substrate. A third set of voids is etched into the polysilicon layer. Further etching widens the third set of voids to define a fourth set of voids to expose the first oxide layer and the substrate. The first oxide layer and the substrate is deeply etched to define beams and trenches in the substrate.Type: GrantFiled: April 27, 2006Date of Patent: August 12, 2008Assignee: Honeywell International, Inc.Inventor: Jorg Pilchowski
-
Patent number: 7407890Abstract: A method of processing a substrate of a device comprises the as following steps. Form a cap layer over the substrate. Form a dummy layer over the cap layer, the cap layer having a top surface. Etch the dummy layer forming patterned dummy elements of variable widths and exposing sidewalls of the dummy elements and portions of the top surface of the cap layer aside from the dummy elements. Deposit a spacer layer over the device covering the patterned dummy elements and exposed surfaces of the cap layer. Etch back the spacer layer forming sidewall spacers aside from the sidewalls of the patterned dummy elements spaced above a minimum spacing and forming super-wide spacers between sidewalls of the patterned dummy elements spaced less than the minimum spacing. Strip the patterned dummy elements. Expose portions of the substrate aside from the sidewall spacers. Pattern exposed portions of the substrate by etching into the substrate.Type: GrantFiled: April 21, 2006Date of Patent: August 5, 2008Assignee: International Business Machines CorporationInventor: Haining S. Yang
-
Patent number: 7399422Abstract: A system and method form a nanodisk that can be used to form isolated data bits on a memory disk. The imprint stamp is formed from first and second overlapping patterns, where the patterns are selectively etched. The selective etching leaves either pits or posts on the imprint stamp. The pits or posts are imprinted on the memory disk, leaving either pits or posts on the memory disk. The pits or posts on the memory disk are processed to form relatively small and dense isolated data bits. Instability of the isolated data bits caused by outside magnetic and thermal influences is substantially eliminated.Type: GrantFiled: November 29, 2005Date of Patent: July 15, 2008Assignee: ASML Holding N.V.Inventor: Harry Sewell
-
Publication number: 20080143019Abstract: The addition of thin coatings (less than and approaching monomolecular coatings) of persistent release materials comprising preferred compounds of the formula: RELEASE-M(X)n?1- RELEASE-M(X)n?m?1 Qm, Or RELEASE-M(OR)n?1-, wherein RELEASE is a molecular chain of from 4 to 20 atoms in length, preferably from 6 to 16 atoms in length, which molecule has either polar or non-polar properties; M is a metal atom, semiconductor atom, or semimetal atom; X is a halogen or cyano, especially Cl, F, or Br; Q is hydrogen or alkyl group; M is the number Q represents R is hydrogen, alkyl or phenyl, preferably hydrogen or alkyl of 1 to 4 carbon atoms; and N is the valence ?1 of M, and n?m?1 is at least 1 provides good release properties.Type: ApplicationFiled: October 31, 2007Publication date: June 19, 2008Inventor: Stephen Y. Chou
-
Patent number: 7387508Abstract: The present invention is directed to a compliant device comprising a support body, a floating body, and a plurality of flexure arms. Each of the plurality of flexure arms is connected between the support body and the floating body to transfer a load therebetween in parallel. To that end, the flexure arms have first and second sets of flexure joints. The first set of flexure joints facilitate rotational movement of said flexure arm about a first axis extending along a first direction. The second set of flexure joints are arranged to facilitate rotational movement of the flexure arm about a second axis, extending along a second direction that is transverse to the first direction. The flexure joints are resolute joints.Type: GrantFiled: June 1, 2005Date of Patent: June 17, 2008Assignee: Molecular Imprints Inc.Inventors: Byung-Jin Choi, Sidigata V. Sreenivasan
-
Publication number: 20080131705Abstract: A method (and system) of nanostructure placement using imprint lithography, includes applying a mixture containing an additive exhibiting predetermined properties, to a substrate, bringing one of the substrate and a template containing a relief structure into contact with the other of the substrate and the template containing the relief structure, transferring the relief structure of the template into the patternable material, one of curing and fixing the patternable material, and removing the template, thereby leaving a negative of the relief structure of the template.Type: ApplicationFiled: December 1, 2006Publication date: June 5, 2008Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Matthew E. Colburn, Yves C. Martin, Theodore G. van Kessel
-
Publication number: 20080083926Abstract: The specification and drawings present a new apparatus and method for printing transistor or diode structures using nanoparticles (e.g., silicon nanoparticles). Si-based electronic structures (e.g., transistors, diodes) can be printed in a simple low cost process and thus being a potential alternative to obtain a low cost manufacturing process for, e.g., Si-based active matrix (AM) backplanes as well as other applications.Type: ApplicationFiled: October 10, 2006Publication date: April 10, 2008Inventor: Toni Ostergard
-
Patent number: 7341441Abstract: Provided is a nanoprint apparatus in which a substrate and a mold formed on its surface with fine concavities and convexities are heated and pressed with each other through the intermediary of a buffer member interposed therebetwen, including a mechanism for successively replacing the buffer member with new one at each time which the mold and the substate are heated and pressed, thereby it is possible to form a fine structure on the substrate.Type: GrantFiled: March 19, 2004Date of Patent: March 11, 2008Assignee: Hitachi Industries Co., Ltd.Inventors: Masahiko Ogino, Akihiro Miyauchi, Shigehisa Motowaki, Kosuke Kuwabara
-
Patent number: 7335579Abstract: A memory device including a substrate, and multiple self-aligned nano-rectifying elements disposed over the substrate. Each nano-rectifying element has multiple first electrode lines, and multiple device structures disposed on the multiple first electrode lines forming the multiple self-aligned nano-rectifying elements. Each device structure has at least one lateral dimension less than about 75 nanometers. The memory device also includes multiple switching elements disposed over the device structures and self-aligned in at least one direction with the device structures. In addition, the memory device includes multiple second electrode lines disposed over, electrically coupled to, and self-aligned to the switching elements, whereby a memory device is formed.Type: GrantFiled: January 12, 2006Date of Patent: February 26, 2008Assignee: Hewlett-Packard Development Company, L.P.Inventors: James Stasiak, Kevin F Peters, Jennifer Wu, Pavel Kornilovich, Yong Chen
-
Patent number: 7335520Abstract: A fabricating method of a flat panel display includes the steps of spreading an etch-resist on a thin film formed on a substrate, a polarity of the etch-resist changed by irradiation with a first light; providing a soft mold having a projected surface and a groove at an upper surface of the etch-resist at a distance from the substrate, the soft mold surface treated to be the same polarity as the etch-resist; performing a first and a second alignments of the soft mold and substrate; changing the polarity of the etch-resist by irradiation with the first light such that the etch-resist moves into a groove of the soft mold; forming an etch-resist pattern by irradiating a second light onto the etch-resist in the groove; separating the soft mold from the etch-resist pattern; and forming a thin film pattern by etching a portion of the thin film and the etch-resist pattern.Type: GrantFiled: June 17, 2005Date of Patent: February 26, 2008Assignee: LG.Philips LCD Co., Ltd.Inventor: Jin Wuk Kim
-
Patent number: 7329568Abstract: There are provided the steps of forming, on a substrate 10, a semiconductor layer 12 to be a base of a device, forming each of electrodes 14 to be a source electrode and a drain electrode on a surface of the semiconductor layer 12 provided on the substrate, covering a surface of the substrate 10 having the electrode 14 formed thereon with a resin having an electrical insulating property, thereby forming an insulating layer 16, embossing the insulating layer 16 by using a metal mold, thereby forming an insulating resin film layer 16a on a channel of the semiconductor layer 12, and forming a gate electrode 18 on the insulating resin film layer 16a.Type: GrantFiled: June 7, 2005Date of Patent: February 12, 2008Assignee: Shinko Electric Industries Co., Ltd.Inventor: Masahiro Kyozuka
-
Patent number: 7320283Abstract: Patterns of nanometer and micrometer dimensions are printed on a substrate by first forming a solution or suspension of a liquid and a printing material and then applying a layer of the solution or suspension to the substrate. Then, without applying pressure, a stamp provided with relief patterns is positioned at a distance of 0 nm to 500 ?m from the substrate with the relief patterns in contact with the layer of the solution or suspension. The liquid is then evaporated from the solution or suspension from between the substrate and the stamp so as to draw the suspension or solution by capillarity to the relief patterns and deposit the material on the substrate in accordance with the relief patterns of the stamp. Thereafter the stamp is separated from the substrate.Type: GrantFiled: September 15, 2003Date of Patent: January 22, 2008Assignee: Consiglio Nazionale Delle RicercheInventors: Massimiliano Cavallini, Fabio Biscarini
-
Patent number: 7303703Abstract: A system for nano-imprint with mold deformation detector is disclosed for real-time monitoring of the deformation of the mold. An electrostatic plate capacitor is embedded in the mold, serving as the deformation detector. The capacitor includes two opposite metal film electrodes formed by silicon micromachining technique on opposite surfaces of the mold and connected by a metal lead. During imprinting, the mold is acted upon by an external force and deformation occurs, which induces change of distance between the metal film electrodes and thus variation of the capacitance of the capacitor. The amount of deformation of the mold can then be assessed by comparing the capacitance with a reference. Thus, real-time detection and monitoring of the deformation of the nano-imprint mold is realized. Also disclosed is a method for carrying out the real-time monitoring of the deformation of the mold.Type: GrantFiled: March 2, 2004Date of Patent: December 4, 2007Inventors: Hong Hocheng, Chin Chung Nien
-
Publication number: 20070269924Abstract: The present invention relates to a method of depositing nanowires on the surface of a substrate, comprising the steps of: contacting defined regions of the substrate with at least one compound (C1) capable of binding to the surface of the substrate and of binding the nanowires to provide a pattern of binding sites on the surface of the substrate and/or contacting defined regions of the substrate with at least one compound (C2) capable of binding to the surface of the substrate and preventing the binding of nanowires to provide a pattern of non-binding sites on the surface of the substrate, and contacting the surface of the substrate with a suspension of nanowires in a liquid medium to enable at least a portion of the applied nanowires to bind to at least a portion of the surface of the substrate covered with (C1) and/or not covered with (C2).Type: ApplicationFiled: May 18, 2006Publication date: November 22, 2007Applicant: BASF AktiengesellschaftInventors: Marcos Gomez, Frauke Richter, Peter Erk, Zhenan Bao, Shuhong Liu
-
Publication number: 20070243655Abstract: A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures have been created, it is possible that the various structures will exist at different planes/elevations relative to the template surface. The elevations of the various structures may be adjusted independently by selectively exposing “higher” structures to an anisotropic etch that reduces the overall elevation of the structures, while preserving the structural topography.Type: ApplicationFiled: March 29, 2007Publication date: October 18, 2007Applicant: MOLECULAR IMPRINTS, INC.Inventors: Gerard M. Schmid, Nicholas A. Stacey, Douglas J. Resnick, Ronald D. Voisin, Lawrence J. Myron
-
Publication number: 20070210460Abstract: A substrate can efficiently be manufactured by separating the alignment and the actual processing when an alignment mark is provided, which is fixed with respect to the substrate and when position information on a position of a process area on the substrate is retrieved with respect to the alignment mark before the substrate is processed. During the processing alignment can then be performed by redetermining the position of the alignment mark only once and by using the stored position information on the position of the process area.Type: ApplicationFiled: March 7, 2007Publication date: September 13, 2007Inventor: Erich Thallner
-
Publication number: 20070164458Abstract: In a mold in which a pattern is formed of a fine concavo-convex shape, two or more of alignment marks for determining a relative positional relation between a substrate and a mold are formed concentrically. Moreover, a damaged mark is identified from the positional information and shape of the respective marks, and an alignment between the mold and the substrate to which a resin film is applied is carried out excluding the damaged mark.Type: ApplicationFiled: January 17, 2007Publication date: July 19, 2007Inventors: Masahiko Ogino, Akihiro Miyauchi, Takashi Ando, Chiseki Haginoya, Susumu Komoriya, Yasunari Sohda, Souichi Katagiri, Hiroya Ohta, Yoshinori Nakayama
-
Patent number: 7229273Abstract: The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality of recessions being less than 250 nm.Type: GrantFiled: January 13, 2004Date of Patent: June 12, 2007Assignee: Board of Regents, The University of Texas SystemInventors: Todd C. Bailey, Byung-Jin Choi, Matthew E. Colburn, Sidlgata V. Sreenivasan, Carlton G. Willson, John G. Ekerdt
-
Patent number: 7080596Abstract: A micro-casted silicon carbide nano-imprinting stamp and method of making a micro-casted silicon carbide nano-imprinting stamp are disclosed. A micro-casting technique is used to form a foundation layer and a plurality of nano-sized features connected with the foundation layer. The foundation layer and the nano-sized features are unitary whole that is made entirely from a material comprising silicon carbide (SiC) which is harder than silicon (Si) alone. As a result, the micro-casted silicon carbide nano-imprinting stamp has a longer service lifetime because it can endure several imprinting cycles without wearing out or breaking. The longer service lifetime makes the micro-casted silicon carbide nano-imprinting stamp economically feasible to manufacture as the manufacturing cost can be recouped over the service lifetime.Type: GrantFiled: March 5, 2004Date of Patent: July 25, 2006Assignee: Hewlett-Packard Development Company, LP.Inventors: Heon Lee, Gun-Young Jung
-
Patent number: 7074380Abstract: To provide an ink for producing a catalyst capable of stably forming metal particles which act as catalysts suitable for growth of carbon fibers by applying them onto a substrate. A solution containing a metal organic compound containing any one metal of Pd, Fe, Co and Ni and a water-soluble polymer compound is formed by using water or an organic solvent as a main solvent.Type: GrantFiled: September 15, 2003Date of Patent: July 11, 2006Assignee: Canon Kabushiki KaishaInventors: Takashi Iwaki, Takeo Tsukamoto