Abstract: A method and structure for a EEPROM memory device integrated with high performance logic or NVRAM. The EEPROM device includes a floating gate and program gate self-aligned with one another. During programming, electron tunneling occurs between the floating gate and the program gate.

Abstract: A system and method is disclosed for writing early within a memory cycle by injecting a small voltage difference signal prior to setting a sense amplifier, and thereafter setting the sense amplifier which amplifies the small voltage signal to predetermined high and low voltage logic levels for writing to the memory cell. In this way, writing can complete in about the same time as reading, without risking corruption of data on adjacent bitlines in the memory. Local bitswitches apply first and second write voltages having a small voltage difference to a true bitline and a reference bitline prior to setting the sense amplifier.

Abstract: A fast DRAM memory uses ground-sensing as opposed to traditional Vdd/2 sensing. A selected DRAM cell connects to a bit-line true (BLT) or a bit-line complement (BLC). At the start of each cycle the BLT and BLC are restored to ground potential. A pair of alternating reference cells are provided for each bit-line. When a selected DRAM cell is connected either BLT or BLC the first reference cell in the pair is connected to the other bitline to provide a reference voltage to the other bitline which can be compared to the voltage provided by the selected DRAM cell. On a subsequent cycle using the same bitline the second reference cell in the pair is used. Thus it is not necessary to wait for the first reference cell to recharge prior to beginning the next cycle. Switching between the first and second reference cells in the pair alternates in this manner resulting in faster cycle time.

Abstract: A method and structure for a content addressable memory (CAM) array having a plurality of memory cells. Each of the memory cells has capacitive storage devices, transistors connected to the storage devices, a wordline connected to and controlling the transistors, bitlines connected to the storage devices through the transistors, combined search and global bitlines connected to the capacitive storage devices. These cells are further arranged into columns, each containing multiplexers connected to the combined search and global bitlines, data-in lines connected to the multiplexers, and search-data lines connected to the multiplexers. Further, the multiplexers select between the data-in lines and the search-data lines to allow the combined search and global bitlines to be alternatively used as data lines and search lines. Also, in the invention each of the columns further has drivers between the multiplexers and the combined search and global bitlines.

Abstract: Motion of a block carrying a grid for backscattering portions of a pattern of charged particles incident on the grid is moved generally axially of a charged particle beam tool while the position of the block is measured, preferably to optically, with a grazing incidence laser beam or interferometer, in the axial direction for any or all of the degrees of freedom of the block. Backscatter is correlated with known grid position to correct the backscatter measurement to compensate for lateral components of motion parallel to the target plane in measurement of actual beam position at different axial locations. Telecentricity and landing angle can thus be observed to an accuracy of 0.003 milliradians in substantially real time; permitting substantially real time adjustment thereof. The basic principles of this process and apparatus can be extended to measurement of numerical aperture and are equally applicable to probe-forming and beam projection lithography tools.

Abstract: A wafer polishing tool is disclosed which includes a polishing platen which is rotatable about a central platen axis, and a wafer carrier which supports a wafer for rotational movement to cause a portion of a surface of the wafer to only intermittently contact a polishing surface of the platen while the wafer rotates. The polishing tool may include a plurality of vertically stacked polishing platens which are rotatable about a central platen axis, and a plurality of stacked wafer carriers, wherein each carrier supports a wafer for rotational movement and vertical movement into contact with one of the polishing platens. During polishing, the carrier pack maintains the wafers in uninterrupted contact with the platen over less than entire surfaces of the wafers.

Abstract: A memory structure comprises a plurality of banks (each of the banks including a plurality of blocks) a plurality of timing critical address lines connected to all of the blocks in respective ones of the banks (a number of the critical address lines being equal to a number of the banks), and a plurality of dedicated address lines connected to respective ones of the blocks.

Abstract: A MOSFET device and method, the method involves forming the MOSFET device by selectively doping bordering channel regions in the device such that, in operation, the threshold, or turn-on, voltage is equalized across the channel. The device structure comprises a self-aligned channel edge implant region for equalizing threshold voltages in the channel edge region with threshold voltages in the channel interior region, thereby virtually eliminating sub-threshold leakage current in low voltage applications.

Abstract: A memory device structure including an array device region having one or more asymmetric gates formed therein, wherein each asymmetric gate comprises a first edge having a substantially vertical sidewall and a second edge having a polysilicon step segment, and a support device region including one or more patterned gate conductors formed therein, wherein each patterned gate conductor in the support device region includes edges having substantially vertical sidewalls. The structure may further include a circuit device region located between the array device region and the support device region, said core device region including one or more patterned gates, each gate including a polysilicon step segment on each side of the gate.

Abstract: A multistack 3-D semiconductor structure comprising a first level structure comprising a first semiconductor substrate and first active devices; and a second level structure comprising a SOI semiconductor structure bonded to the first level structure and further comprising second active devices; and wherein the first active devices are more heat tolerant than the second active devices is provided along with a method for its fabrication.

Abstract: A process for forming a buried strap self-aligned to a deep storage trench. Spacers are formed on walls of a recess over a filled deep trench capacitor and a substrate. A plug is formed in a region between the spacers. Photoresist is deposited over the spacers, the plug, and material surrounding the spacers of the plug. The photoresist is patterned, thereby exposing portions of the plug, the spacers, and the surrounding material. The spacers in the surrounding material not covered by the photoresist are selectively etched, leaving a remaining portion of the spacers. The substrate and the portion of the filled deep trench exposed by the spacer removal are selectively etched. An isolation region is formed in a space created by etching of the spacers, surrounding material, substrate, and filled deep trench.

Abstract: A direct sensing circuit and method for reading data from a memory cell connected to a bitline, with open bitline sensing without using a reference bitline signal, onto a data line in a data read operation. Prior to the data read operation, both the bitline and the data line are precharged to precharge voltages and a sense node is precharged to ground. A pFET device has its gate coupled to a signal developed on the bitline from the memory cell to detect and amplify the signal level thereof, and has its source coupled to a voltage source and its drain coupled to a sense node, such that the signal developed on the bitline determines the degree of turn-on of the pFET device. An nFET device has its gate coupled to the sense node to detect and amplify the signal level thereof, and has its drain coupled to the data line.

Abstract: An arrangement and method is disclosed which works toward shortening the machine cycle of a DRAM. A data value is written to a storage capacitor of a memory cell of the DRAM, the data value being stored in the storage capacitor as one of low state and high state. During a first wordline activation cycle, a storage capacitor is preconditioned to a preconditioned voltage level. In a subsequent wordline activation cycle, a low state or a high state is written to the storage capacitor. In an aspect of the invention, the wordline is activated in a first wordline activation cycle to begin clearing any previously stored state of the storage capacitor. This cycle may include the reading of a stored data value from the storage capacitor. Then, immediately thereafter, while maintaining the wordline activated, the storage capacitor is preconditioned to a preconditioned voltage level, as by clamping the bitline through a bitline restore device. The wordline is then deactivated.

Abstract: In a method for forming an array of dynamic random access memory (DRAM) cells, each DRAM cell having one or more field effect transistors (FETs) and a deep trench capacitor, first, a substrate is prepared. Line type active areas (AAs) are patterned on the substrate to thereby provide AA lines (AALs). Next, deep trench capacitors (DTCs) are fabricated in an AAL in a predetermined configuration to thereby define deep trench areas (DTAs) for the DTCs, each DTC having a storage node, a collar insulator and a buried strap. In subsequent step, a node isolation area (NIA) is defined to isolate a storage node of a DTC and a storage node of its adjacent DTC and then a trench isolation area (TIA) for each of the DRAM cell is defined. Further, one or more FETs are fabricated in each AA to thereby form the array of DRAM cells, wherein a conductive path is formed from an electrode of one of the FETs to the buried strap of a corresponding DTC.

Abstract: A system and method is disclosed for operating a content addressable memory (CAM) within an integrated circuit using search signals at search input voltages which are substantially independent from an operating voltage of the CAM. A method is disclosed in which search signals are input to CAM cells of the CAM at search input voltages which are substantially independent of an operating voltage of storage elements within the CAM cells. A match signal is output upon detecting a matching condition between the search signals and data stored in the storage elements. The search input voltage can be within about 0.2V above a threshold voltage of a search input device of the CAM memory cell. Search input devices can be selected to have a lower threshold voltage than other devices included within the CAM cell.

Abstract: A method for removing scratches from a dielectric layer comprising the steps of: providing a layer of a reflowable dielectric material; and heating the dielectric layer to a temperature sufficient to cause the reflowable dielectric material to reflow is provided. This method provides a manner to remove the scratches created during the chemical mechanical polish steps, which can later become filled with metallization, causing shorts in the circuitry and subsequent integrated circuit chip failure.

Abstract: A voltage control system and methodology for maintaining internally generated voltage levels in a semiconductor chip. The method comprises the steps of intermittently sampling an internal voltage supply level during a low power or “sleep” mode of operation; comparing the internal voltage supply level against a predetermined voltage reference level; and, activating a voltage supply generator for increasing the internal voltage supply level when the internal voltage supply level falls below the predetermined voltage reference level. The voltage supply generator is subsequently deactivated when the voltage supply level is restored to the predetermined voltage reference level. The sampling cycle may be appropriately tailored according to chip condition, chip temperature, and chip size. In one embodiment, the voltage control system and methodology is implemented in DRAM circuits during a refresh operation.

Abstract: Two different gate conductor dielectric caps are used in the array and support device regions so that the bitline contact can be fabricated in the array region, but a thinner hard mask can be used for better linewidth control in the support device region. The thinner dielectric cap is made into dielectric spacers in the array device regions during support mask etching. These dielectric spacers allow for the array gate conductor resist line to be made-smaller than the final gate conductor linewidth. This widens the array gate conductor processing window. The second dielectric cap layer improves linewidth control for the support devices and the array devices. Two separate gate conductor lithography steps and gate conductor dielectric etches are carried out in the present invention to optimize the gate conductor linewidth control in the array and support device regions. The gate conductors in the array and support devices regions are etched simultaneously to reduce production cost.

Abstract: A system and method is disclosed for writing early within a memory cycle by holding only one of a true bitline and a reference bitline at a fixed potential, e.g. ground, when the sense amplifier is set. The sense amplifier amplifies a small voltage difference between the true bitline and the reference bitline to predetermined high and low voltage logic levels to write a datum to the memory cell. In this way, writing can complete in about the same time as reading, without risking corruption of data on adjacent bitlines in the memory. The bitlines are precharged to a fixed potential in a conduction path through the bitswitches, rather than using local precharge devices at the sense amplifier. To write, bitswitches and write path transistors apply the fixed potential to one of the true bitline and the reference bitline.

Abstract: An integrated circuit device is presented. The integrated circuit device of the present invention comprises a semiconductor substrate having a combination of transistor gates formed using a conventional dielectric-capped gate stack for self-aligned diffusion contacts (SAC) as well as a transistor gate structure formed by removing the dielectric-cap gate stack from selected regions of the semiconductor substrate and replacing the dielectric-cap gate stack with a second gate conductor which is patterned using a damascene process.