Abstract: This invention relates to copper(+1)(?-diketonate)(L) and related copper complexes such as copper (+1)(?-ketoiminate)(L) represented by the formula: wherein X represents O or NR9, R1 and R3 are each independently comprised of the group C1-8 alkyl, C1-8 fluoroalkyl, aryl, C1-8 alkoxy, and C1-8 alkyl ethers and R2 is H, C1-8 alkyl, C1-8 alkoxy, and halogen, R9 is C1-8 alkyl, C1-8 fluoroalkyl, phenyl, alkylphenyl, trialkylsilyl, and L represents a ligand having the structure: (R4)(R5)C?(R6)(R7) or R4—C?C—R7 wherein R4, is comprised of the group C1-8 alkanol, C1-8 alkoxyalkanol, C1-8 unsaturated alkoxyalkanol, trialkylsilanol, C1-8 aalkylamine, phenylamine; R5, R6, and R7 are comprised of the group H, C1-8 alkyl, triakylsilyl, alkoxy or phenyl.

Abstract: A process and apparatus to deliver both process chemical and solvent for cleaning the process chemical in a solvent purge refill system along with an integral solvent sorption module, in a single “assembly” that permits ease of shipping, minimal end-user interaction, sufficient solvent for the solvent purge operation, without residual solvent, requiring disposal. This eliminates customer handling of the solvent, and eliminates the customer's need to find a solvent waste facility, as residual solvent can be returned in the same package in one piece/one step.

Abstract: A method of using PFCs recovered from the effluent of a CVD chamber cleaning process as an influent for the cleaning process is provided which includes the steps of selecting a first PFC gas mixture having a first ratio of C2F6 to CF4, providing the first PFC gas mixture as the influent gas to the CVD chamber to create a CVD chamber effluent gas of a second PFC gas mixture having a second ratio of C2F6 to CF4, adding virgin C2F6 or CF4 to the CVD chamber effluent gas in sufficient quantity to create a third PFC gas mixture having the first ratio of C2F6 to CF4, and using the third PFC gas mixture as the influent gas to the CVD chamber.

Abstract: A process for separating a feed gas into at least one product gas includes: (a) providing a gas separation apparatus with at least one adsorption layer including a lithium-exchanged FAU adsorbent having water desorption characteristics, defined by drying curves, similar to those for the corresponding fully sodium-exchanged FAU, a heat of adsorption for carbon dioxide equal to or lower than that for the corresponding fully sodium-exchanged FAU at high loadings of carbon dioxide, and onto which the adsorption layer water and/or carbon dioxide adsorb; (b) feeding into the gas separation apparatus a feed gas including nitrogen, oxygen, and at least one of water and carbon dioxide; and (c) collecting from a product end of the gas separation apparatus at least one product gas containing oxygen.

Abstract: A process provides a ceramic film, such as a mesoporous silica film, on a substrate, such as a silicon wafer. The process includes preparing a film-forming fluid containing a ceramic precursor, a catalyst, a surfactant and a solvent, depositing the film-forming fluid on the substrate, and removing the solvent from the film-forming fluid on the substrate to produce the ceramic film on the substrate. The ceramic film has a dielectric constant below 2.3, a halide content of less than 1 ppm and a metal content of less than 500 ppm, making it useful for current and future microelectronics applications.

Abstract: The present invention describes a pressure swing adsorption (PSA) apparatus and process for the production of purified hydrogen from a feed gas stream containing heavy hydrocarbons (i.e., hydrocarbons having at least six carbons). The apparatus comprises at least one bed containing at least three layers. The layered adsorption zone contains a feed end with a low surface area adsorbent (20 to 400 m2/g) which comprises 2 to 20% of the total bed length followed by a layer of an intermediate surface area adsorbent (425 to 800 m2/g) which comprises 25 to 40% of the total bed length and a final layer of high surface area adsorbent (825 to 2000 m2/g) which comprises 40 to 78% of the total bed length.

Abstract: A process and system for conditioning a bulk container for ultra-high purity liquefied gas. Vapor is generated in the container from a conditioning quantity of the ultra-high purity liquefied gas by imposing a temperature difference on the container so that the vapor condenses when a temperature difference is achieved. The resulting liquid reflux, e.g., the condensed liquid drips or flows back to the conditioning quantity of the liquified gas, washes or removes contaminants, e.g., particles, metal and moisture, from the interior surface of the container. A portion of the vapor is vented from the container for reclamation. The used conditioning liquid may also be reclaimed.

Abstract: An apparatus for purifying a gaseous product delivered from a horizontal container containing a supply of a fluid includes an elongated hollow tube inside the container and a purifying medium inside the tube. The tube has a first opening, a second opening spaced apart from the first opening, and an internal axis between the first and second openings. The first opening is in fluid communication with a port and the second opening is in fluid communication with a vapor space in the container. A portion of the internal axis adjacent the second opening is at an angle greater than zero degrees relative to the horizontal longitudinal axis of the container.

Abstract: A process for reducing or eliminating NH3/HF/MFz liquid waste melt in the manufacture of NF3 is provided which includes the steps of providing an NF3 reactor for a reaction of F2 with a liquid NH3/HF/MFz mixture that produces NF3, HF, N2 and other nitrogen fluorides as gaseous products and a liquid NH3/HF/MFz mixture as the liquid waste melt. The process further provides for reduction or elimination of the liquid NH3/HF/MFz waste melt produced by the reactor.

Abstract: A method of dry fluxing metal surfaces of one or more components to be soldered, comprising the steps of: a) providing one or more components to be soldered which are connected to a first electrode as a target assembly; b) providing a second electrode adjacent the target assembly; c) providing a gas mixture comprising a reducing gas between the first and second electrodes; d) providing a direct current (DC) voltage to the first and second electrodes and donating electrons to the reducing gas to form negatively charged ionic reducing gas; e) contacting the target assembly with the negatively charged ionic reducing gas and reducing oxides on the target assembly.

Abstract: This invention relates to an improved process for removing trace levels of Group IVb contaminants from a Group IVb metal tetrahalide of and particularly to a process for removing zirconium tetrachloride from titanium tetrachloride. The improvement resides in contacting a titanium tetrachloride feedstock containing trace impurities of zirconium tetrachloride or hafnium tetrachloride with a sufficient amount of titanium hydride to convert any zirconium tetrachloride or hafnium tetrachloride to a lower volatile compound. The resultant mixture is distilled and the titanium tetrachloride separated from the lower volatile zirconium or hafnium compounds.

Abstract: A method and an apparatus are disclosed for detecting an occurrence of a liquid dry condition in a container containing a liquefied compressed gas while the gaseous phase of the liquefied compressed gas is being removed from the container over time. The apparatus includes a first sensor, a second sensor, and a computer, preferably a programmed logic controller (PLC). The first sensor senses temperature (T) inside the container and provides a signal indicative thereof. The second sensor senses pressure (P) inside the container and provides a signal indicative thereof. The computer receives signals from the first and second sensors, and determines the rates of change in the pressure (dP/dt) and the temperature (dT/dt) inside the container over time.

Abstract: Gel-free colloidal abrasive polishing compositions and associated methods for polishing (e.g., chemical mechanical polishing) are described. These abrasive polishing compositions are comprised of a surface-modified colloidal abrasive that has been modified with a boron-containing compound(s), such as boron surface-modified colloidal ceria or silica. These compositions are useful in chemical mechanical planarization (CMP) applications as well as in substrate polishing applications. These abrasive compositions are most often negatively-charged colloids, which remain as stable negatively-charged colloids even in acidic media.

Abstract: Using a nebulizer gas, sub micron and micron size particulates can be generated from a solution containing salts covering a broad range of elements. The fractional concentration of elements can be determined by bubbling the aerosol through aqueous acid and analyzing the aqueous acid for metals. The nebulizer can be coupled to an ICP (Inductively Coupled Plasma) torch and the ICPMS (Inductively Coupled Plasma Mass Spectrometer) or ICPOES (Inductively Coupled Plasma Optical Emission Spectrometer) response to different elements can be determined. This provides the response factor of the ICPMS or ICPOES for different elements.

Abstract: An on-line halogen analyzer system and method of use for semiconductor processing effluent monitoring. The system includes sampling the effluent stream into an absorption cell, and passing UV-Visible light through the effluent sample in the cell. After passing through the sample the light is collected by a photo detector for real-time wavelength-selective absorption analysis. The system provides simultaneous determination of the concentrations of multiple halogen gases (e.g. F2, Cl2, Br2, and I2) in semiconductor processing effluent streams. The invention can be used for chemical vapor deposition (CVD) chamber cleaning endpoint determination and to improve fluorine utilization efficiency in remote plasma downstream CVD chamber cleaning processes.

Abstract: An improved method of processing both primary and secondary nonferrous metal and alloys of said metals using a refining gas is provided. The improvement involves refining said non-ferrous metal and alloys with a gaseous mixture including at least one compound selected from the group consisting of ClF3, ClF, COF2, F3COF, CF2(OF)2, SO2F2, NF3, SO2ClF, SOF2, SOF4, NOF, F2 and SF4.

Abstract: This invention relates to an improvement in a process for removing C2F6 as an impurity from a CF4 containing gas, preferably CF4 produced by the reaction of F2 with carbon. The improvement in the process comprises the steps: contacting the CF4 containing gas, containing C2F6 impurity, with an activated carbon having a CCl4 activity from 43 to 55 in an adsorption bed to effect adsorption of the C2F6 impurity; and, recovering purified CF4 product in the effluent from the adsorbent bed.

Abstract: A manifold comprising a container having two ports; a conduit connecting the container to a source/dispense of chemical having a first end and a second end and a connector for the ends; first block valve having two diaphragm valves, each valve having a valve seat side and a diaphragm side, each valve seat side faces the other valve seat side, and connected to the first end of the conduit, one diaphragm side connected to a first port, and another diaphragm side connected to vent; a second block valve having two diaphragm valves, having a valve seat side and a diaphragm side, wherein each valve seat side faces the other valve seat side, and each valve seat side connected to the second end of the conduit, the diaphragm side of one valve connected to purge, and the diaphragm side of another valve connected to push gas or chemical outlet.

Abstract: A method and an apparatus are disclosed for detecting an occurrence of a liquid dry condition in a container containing a liquefied compressed gas while the gaseous phase of the liquefied compressed gas is being removed from the container over time. The apparatus includes a first sensor, a second sensor, and a computer, preferably a programmed logic controller (PLC). The first sensor senses temperature (T) inside the container and provides a signal indicative thereof. The second sensor senses pressure (P) inside the container and provides a signal indicative thereof. The computer receives signals from the first and second sensors, and determines the rates of change in the pressure (dP/dt) and the temperature (dT/dt) inside the container over time.

Abstract: A mobile, self-evacuating, micro-environment system for transit and storage of substrates between two or more processing chambers in the manufacture of semiconductor devices is provided where the system includes a mobile cart, a vacuum sealable container to hold the substrates, a vacuum source having a portable power source, located on the cart and capable of generating a vacuum in the container, and a docking valve to mate with a corresponding valve on each of the processing chambers, where the docking valve and the corresponding valve are securable to one another to form a substantially vacuum-tight seal and openable, while mated, to permit unloading and loading of substrates between the container and the processing chamber. A method of using the system is also provided.