Patents Represented by Attorney John J. Piskorski
-
Patent number: 7144676Abstract: Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be applied to a work piece to mark it and removed from the work piece by peeling.Type: GrantFiled: July 12, 2004Date of Patent: December 5, 2006Assignee: Rohm and Haas Electronic Materials LLCInventors: Robert K. Barr, Corey O'Connor
-
Patent number: 7122108Abstract: A tin-silver electrolyte and methods of depositing tin-silver alloys on a substrate.Type: GrantFiled: April 11, 2003Date of Patent: October 17, 2006Assignee: Shipley Company, L.L.C.Inventors: Jochen Heber, André Egli
-
Patent number: 7033639Abstract: A coating composition including a polyaniline particle and a binder is provided. The polyaniline particle contains a core polymer particle with strong acid groups and an attached polyaniline polymer, and has a particle diameter in a select range. Coatings prepared from the coating composition may be employed to provide corrosion resistance to metal substrates. A process for preparing the polyaniline particle and an article including a coating prepared from the coating composition are also provided.Type: GrantFiled: April 19, 2002Date of Patent: April 25, 2006Assignee: Rohm and Haas CompanyInventors: Michael DeWayne Kelly, Thomas Glenn Madle, Paul Ralph Van Rheenen
-
Patent number: 7026093Abstract: Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base.Type: GrantFiled: June 9, 2003Date of Patent: April 11, 2006Assignee: Shipley Company, L.L.C.Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta
-
Patent number: 7018947Abstract: Free standing articles of chemical vapor deposited silicon carbide with electrical resistivities of less than 0.9 ohm-cm are provided without substantially degrading its thermal conductivity or other properties.Type: GrantFiled: February 21, 2001Date of Patent: March 28, 2006Assignee: Shipley Company, L.L.C.Inventors: Jitendra S. Goela, Michael A. Pickering
-
Patent number: 6971429Abstract: An improved method of and apparatus that is continuously automatically operative in an in-line system is described for applying under vacuum, heat and mechanical pressure a dry film photoresist-forming layer to printed circuit boards (200) that already have been prelaminated by the loose application thereto of the dry film resist as discrete cut sheets within the confines of the surface of the boards whereby a laminate without entrapped air bubbles and closely conforming to the raised circuit traces and irregular surface contours of the printed circuit board is obtained. Featured is a conveyorized vacuum applicator (12) comprising two independent vacuum lamination chambers (18,20) in end-to-end relation. The first vacuum chamber operates at ambient temperature to draw off all of the air entrapped between the dry film resist and the surface of the printed circuit board at conditions that do not result in premature tacking of the dry film to the surface of the board.Type: GrantFiled: December 11, 2002Date of Patent: December 6, 2005Assignee: Shipley Company, L.L.C.Inventors: Charles R Keil, Osvaldo Novello, Roberto Stanich
-
Patent number: 6939821Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is doped with a sufficient amount of nitrogen to provide the desired properties of the silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.Type: GrantFiled: June 6, 2002Date of Patent: September 6, 2005Assignee: Shipley Company, L.L.C.Inventors: Jitendra S. Goela, Michael A. Pickering
-
Patent number: 6923899Abstract: Provided for is a solution for use in the electroplating of tin and tin alloys comprising a basis solution comprising an acid, optionally a salt thereof, the acid selected from the group consisting of fluoboric acid, an organic sulfonic acid, a mineral acid, or a combination thereof; divalent tin ions; and an antioxidant comprising a hydroxy benzene sulfonic acid or salt thereof, in an amount effective to prevent the oxidation of divalent tin ions. Also provided for is a method for electroplating comprising electroplating a substrate using an electroplating solution comprising a hydroxy benzene sulfonic acid or salt thereof in an amount effective to decrease the oxidation of tin ions.Type: GrantFiled: March 5, 2003Date of Patent: August 2, 2005Assignee: Shipley Company, L.L.C.Inventors: Neil D. Brown, Angelo Chirafisi, Peter R. Levey
-
Patent number: 6911068Abstract: A metal plating bath containing organic compounds that inhibit or retard the consumption of plating bath additives. The additives are chemical compounds that improve the brightness of the plated metal, the physical properties of the plated metal especially with respect to ductility and the micro-throwing power as well as the macro-throwing power of the plating bath. The organic compounds that inhibit or retard the consumption of additives increases the life of the plating bath and improves the efficiency of the plating process. The plating baths containing the organic compounds that inhibit or retard additive consumption can be employed to copper, gold, silver, palladium, platinum, cobalt, cadmium, chromium, bismuth, indium, rhodium, ruthenium, and iridium.Type: GrantFiled: October 2, 2001Date of Patent: June 28, 2005Assignee: Shipley Company, L.L.C.Inventors: Andrew J. Cobley, Mark J. Kapeckas, Erik Reddington, Wade Sonnenberg, Leon R. Barstad, Thomas Buckley
-
Patent number: 6911230Abstract: Disclosed are methods of depositing electroless gold layers on a metal substrate using a catalytic palladium deposit. Such electroless gold layers have increased adhesion as compared to conventional electroless gold deposits.Type: GrantFiled: November 23, 2002Date of Patent: June 28, 2005Assignee: Shipley Company, L.L.C.Inventor: Miriana Kanzler
-
Patent number: 6899829Abstract: A conductive polymer colloidal composition that selectively forms a coating on a non-conductive surface. The conductive polymer colloidal composition is composed of a polymer and a sulfonate dopant. The conductive polymer colloidal composition may also contain conductive colloidal particles such as conductive carbon or metal salt particles, oxidants, stabilizers, and preservatives. The conductive polymer colloidal composition may be employed to selectively coat the non-conductive parts of printed wiring boards such that a uniform metal layer can be deposited on the conductive polymer coat. In addition to a uniform metal layer being formed over the conductive polymer, adhesion between the metal layer and the printed wiring board is improved.Type: GrantFiled: November 30, 2001Date of Patent: May 31, 2005Assignee: Shipley Company, L.L.C.Inventors: James G. Shelnut, Wade Sonnenberg, Patrick J. Houle
-
Patent number: 6900003Abstract: A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.Type: GrantFiled: April 7, 2003Date of Patent: May 31, 2005Assignee: Shipley Company, L.L.C.Inventors: Edgardo Anzures, Daniel E. Lundy, Robert K. Barr, Corey O'Connor
-
Patent number: 6887654Abstract: A composition and method to reduce or to prevent residue and scum formation on a substrate or in a solution. The composition contains an aromatic alkoxylate in combination with a polyol or ether or ester of a polyol. The composition also reduces or prevents foam formation such as in developing processes in the manufacturing of printed wiring boards.Type: GrantFiled: May 7, 2003Date of Patent: May 3, 2005Assignee: Shipley Company, L.L.C.Inventors: Daniel E. Lundy, Robert K. Barr, Edgardo Anzures, Edward J. Brady, James G. Shelnut
-
Patent number: 6887561Abstract: A method for producing conductor coating on dielectric surface may be used in many areas of industry for preparation of dielectric surfaces for selective electroplating. Using this method, conductor coatings are obtained when dielectric items are etched in acidic solutions containing oxidizing agents, then treated in trivalent bismuth compound solution and additionally treated in sulphide solution.Type: GrantFiled: March 31, 2003Date of Patent: May 3, 2005Assignee: Shipley Company, L.L.C.Inventor: Mykolas Baranauskas
-
Patent number: 6872637Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.Type: GrantFiled: July 16, 2003Date of Patent: March 29, 2005Assignee: Shipley Company, L.L.C.Inventors: Michael A. Pickering, Jitendra S. Goela
-
Patent number: 6855480Abstract: Disclosed are photoimageable compositions having improved stripping properties as well as methods for manufacturing printed wiring boards using such photoimageable compositions.Type: GrantFiled: April 6, 2002Date of Patent: February 15, 2005Assignee: Shipley Company, L.L.C.Inventors: Stephen H. Wheeler, Randall W. Kautz, Robert K. Barr
-
Patent number: 6824597Abstract: Disclosed are electroless nickel plating composition including nickel, a reducing agent, a complexing agent, and an accelerator, wherein the accelerator is a mesoionic compound in an amount sufficient to accelerate the rate of deposition the composition.Type: GrantFiled: October 24, 2002Date of Patent: November 30, 2004Assignee: Shipley Company, L.L.C.Inventors: Jochen Heber, André Egli
-
Patent number: 6811761Abstract: A chemical vapor deposited, &bgr; phase polycrystalline silicon carbide having a high thermal conductivity and reduced stacking faults. The silicon carbide is synthesized under specific conditions using hydrogen gas and methyltrichlorosilane gas as reactants. The thermal conductivity of the silicon carbide is sufficiently high such that it can be employed as parts of apparatus and components of electrical devices where a high heat load is generated. Such components may include active thermoelectric coolers, heat sinks and fans.Type: GrantFiled: November 9, 2001Date of Patent: November 2, 2004Assignee: Shipley Company, L.L.C.Inventors: Nathaniel E. Brese, Jitendra S. Goela, Michael A. Pickering
-
Patent number: 6811040Abstract: A wafer holding apparatus composed of a plurality of rods joined at opposite ends by endplates. Each rod at each end is secured to the endplates by a mechanical dovetail joint. The dovetail joint secures the rods to the endplates without the need for sealing or coating agents. Also, auxiliary mechanical components such as nuts and bolts to secure the joint components need not be employed to secure the joint. Each rod has multiple grooves or slits for placing multiple semiconductor wafers that are to be processed in processing chambers. The wafer holding apparatus is oxidation resistant, chemical resistant and thermal shock resistant.Type: GrantFiled: July 9, 2002Date of Patent: November 2, 2004Assignee: Rohm and Haas CompanyInventors: Thomas Payne, Jitendra S. Goela, Lee E. Burns, Michael A. Pickering
-
Patent number: RE38980Abstract: The invention provides photoresist compositions comprising a resin binder having acid labile blocking groups requiring an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base additive. It has been found that linewidth variation is substantially reduced when using the halogenated sulfonic acid generator in a process involving a high temperature post exposure bake.Type: GrantFiled: March 14, 2002Date of Patent: February 14, 2006Assignee: Shipley Company, L.L.C.Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta