Patents Represented by Attorney John J. Piskorski
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Patent number: 6800111Abstract: A method for recovering catalytic metals from compositions containing catalytic metal colloids. Compositions such as rinse solutions or dragout baths containing catalytic metal colloids are passed through a filter that entraps catalytic metal colloids from the solutions. The catalytic metal colloid has a high affinity for the filter in contrast to other components of the solutions. The other components of the solution pass through the filter concentrating the catalytic colloid on the filter. The filter containing the catalytic metal colloid is rinsed with an acid solution to remove the catalytic metal from the filter. The catalytic metal is collected in a suitable container or on an adsorbent such as a resin. The method is economically efficient and environmentally friendly.Type: GrantFiled: January 18, 2002Date of Patent: October 5, 2004Assignee: Shipley Company, L.L.C.Inventors: Jeffrey Doubrava, Eric C. Lundquist, James C. Bohling
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Patent number: 6797033Abstract: A method for recovering catalytic metals from fluids containing catalytic metal colloids. Fluid compositions such as rinse solutions or dragout baths containing catalytic metal colloids are passed through a filter that entraps catalytic metal colloids on the filter. The catalytic metal colloids have a high affinity for the filter in contrast to other components of the fluids. The other components of the fluids pass through the filter while the catalytic colloids concentrate on the filter. The filter containing the catalytic metal colloids is burned, and the catalytic metal is retrieved. The method is economically efficient and environmentally friendly.Type: GrantFiled: November 21, 2002Date of Patent: September 28, 2004Assignee: Shipley Company, L.L.C.Inventors: Jeffrey Doubrava, Anthony Gallegos, Eric G. Lundquist, James C. Bohling, Richard F. Staniunas, Chad Serell
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Patent number: 6797142Abstract: Electrolyte compositions for the deposition of tin and tin-alloys on a substrate are disclosed, along with methods of electroplating tin and tin-alloys using such compositions. These electrolyte compositions are useful for high speed tin plating.Type: GrantFiled: May 6, 2002Date of Patent: September 28, 2004Assignee: Shipley Company, L.L.C.Inventor: Jeffrey N. Crosby
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Patent number: 6790334Abstract: A combined adhesion promotion method of a metal to a non-conductive substrate and directly metallizing the non-conductive substrate with the metal. The method involves texturing a non-conductive substrate with a cobalt etch followed by applying a sulfide to the textured non-conductive substrate to provide an electrically conductive surface on the non-conductive substrate. After the surface of the non-conductive substrate has been made electrically conductive, the surface of the non-conductive substrate can be directly metallized. The method reduces the number of process steps for direct metallization of a non-conductive substrate. Thus, the method is more efficient in contrast to conventional methods of metallizing a non-conductive substrate.Type: GrantFiled: August 2, 2002Date of Patent: September 14, 2004Assignee: Shipley Company, L.L.C.Inventors: Zatoon Begum, Martin T. Goosey, John E. Graves, Mark A. Poole, Amrik Singh
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Patent number: 6773568Abstract: The present invention provides inter alia electroplating compositions, methods for use of the compositions and products formed by the compositions. Electroplating compositions of the invention are characterized in significant part by a grain refiner/stabilizer additive comprising one or more non-aromatic compounds having &pgr; electrons that can be delocalized, e.g., an &agr;,&bgr; unsaturated system or other conjugated system that contains a proximate electron-withdrawing group. Compositions of the invention provide enhanced grain refinement and increased stability in metal plating solutions, particularly in tin and tin alloy plating formulations.Type: GrantFiled: July 16, 2003Date of Patent: August 10, 2004Assignee: Shipley Company, L.L.C.Inventors: Andre Egli, Anja Vinckier, Jochen Heber, Wan Zhang
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Patent number: 6773573Abstract: A metal plating bath containing alcohol compounds that inhibit or retard the consumption of plating bath additives. The additives are chemical compounds that improve the brightness of the plated metal, the physical properties of the plated metal especially with respect to ductility and the micro-throwing power as well as the macro-throwing power of the plating bath. The alcohol compounds that inhibit or retard the consumption of additives increases the life of the plating bath and improves the efficiency of the plating process. The plating baths containing the alcohol compounds that inhibit or retard additive consumption can be employed to plate copper, gold, silver, palladium, platinum, cobalt, cadmium, chromium, bismuth, indium, rhodium, ruthenium, and iridium.Type: GrantFiled: October 2, 2001Date of Patent: August 10, 2004Assignee: Shipley Company, L.L.C.Inventors: David R. Gabe, Andrew J. Cobley, Leon R. Barstad, Mark J. Kapeckas, Erik Reddington, Wade Sonnenberg, Thomas Buckley
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Patent number: 6773485Abstract: A method for recovering catalytic metals from fluid compositions containing catalytic metal colloids. Fluid compositions such as aqueous rinse solutions or dragout baths containing catalytic metal colloids are passed through a porous metal filter that entraps the catalytic metal colloids. The catalytic metal colloids have a high affinity for the porous metal filter in contrast to other components of the fluids. The other components of the fluids pass through the porous metal filter while the catalytic metal colloids concentrate on the porous metal filter. The catalytic metal colloids that are captured on the porous metal filter are removed from the filter by backwashing the filter with a gas and/or a liquid. The backwashing forces the catalytic metal colloids off of the porous metal filter and through a solids discharge valve and into a solids collection container. The method is economically efficient with high catalytic metal recovery and is environmentally friendly.Type: GrantFiled: November 21, 2002Date of Patent: August 10, 2004Assignee: Shipley Company, L.L.C.Inventors: Jeffrey Doubrava, Anthony Gallegos, Eric G. Lundquist, James C. Bohling, Richard F. Staniunas
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Patent number: 6752878Abstract: A method for treating a micro-roughened metal surface to improve bonding between the metal surface and a polymer material. The method involves post-treating the micro-roughened conversion coated metal surface with an aqueous wetting agent composition after having formed the micro-roughened conversion coated metal surface with an adhesion promotion composition. The method can be employed in the circuit board industry to improve bonding between layers in multilayer circuit boards.Type: GrantFiled: September 19, 2001Date of Patent: June 22, 2004Assignee: Shipley Company, L.L.C.Inventors: Joseph R. Montano, Wade Sonnenberg, Mark J. Kapeckas
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Patent number: 6743303Abstract: A method for treating a micro-roughened metal surface to improve bonding between the metal surface and a polymer material. The method involves post-treating the micro-roughened conversion coated metal surface with an aqueous organo-silicon wetting composition after having formed the micro-roughened conversion coated metal surface with an adhesion promotion composition. Suitable organo-silicons include organosilanes, organosiloxanes, organosilizanes and the like. The method can be employed in the circuit board industry to improve bonding between layers in multilayer circuit boards.Type: GrantFiled: November 2, 2001Date of Patent: June 1, 2004Assignee: Shipley Company, L.L.C.Inventors: Joseph R. Montano, John P. Cahalen
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Patent number: 6736954Abstract: A metal plating bath and method of plating a metal on a substrate where the metal plating bath contains heteroatom organic compounds that prevent or inhibit the consumption of metal plating bath additives. The metal plating bath additives improve the brightness of plated metal as well as the ductility, micro-throwing power and macro-throwing power of the plating bath. The addition of the additive consumption inhibiting heteroatom organic compounds improves the physical properties of the plated metal as well as the efficiency of the plating process. The heteroatom organic compounds may contain sulfur, oxygen or nitrogen heteroatoms.Type: GrantFiled: October 2, 2001Date of Patent: May 18, 2004Assignee: Shipley Company, L.L.C.Inventors: Andrew J. Cobley, Mark J. Kapeckas, Erik Reddington, Wade Sonnenberg, Leon R. Barstad, Thomas Buckley
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Patent number: 6706418Abstract: The present invention provides inter alias electroplating compositions, methods for use of the compositions and products formed by the compositions. Electroplating compositions of the invention are characterized in significant part by a grain refiner/stabilizer additive comprising one or more non-aromatic compounds having &pgr; electrons that can be delocalized, e.g., an &agr;,&bgr; unsaturated system or other conjugated system that contains a proximate electron-withdrawing group. Compositions of the invention provide enhanced grain refinement and increased stability in metal plating solutions, particularly in tin and tin alloy plating formulations.Type: GrantFiled: June 29, 2001Date of Patent: March 16, 2004Assignee: Shipley Company L.L.C.Inventors: Andre Egli, Anja Vinckier, Jochen Heber, Wan Zhang
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Patent number: 6679307Abstract: An improved method of and apparatus that is continuously automatically operative in an in-line system is described for applying under heat, vacuum and mechanical pressure a dry film photoresist-forming layer to printed circuit boards (136) that already have been prelaminated by the loose application thereto of the dry film resist as discrete cut sheets within the confines of the surface of the boards whereby a laminate without entrapped air bubbles and closely conforming to the raised circuit traces and irregular surface contours of the printed circuit board is obtained.Type: GrantFiled: July 3, 2002Date of Patent: January 20, 2004Assignee: Shipley Company, L.L.C.Inventors: Charles R. Keil, Osvaldo Novello
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Patent number: 6652731Abstract: A metal plating bath and metal plating process that contains aldehyde compounds that prevent or reduce the consumption of metal plating bath additives. The metal plating baths provide for an efficient plating method because the plating process need not be interrupted to replenish the plating bath with additives. The Metal plating baths may be employed to plate metals such as copper, gold, silver, palladium, cobalt, chromium, cadmium, bismuth, indium, rhodium, iridium, and ruthenium.Type: GrantFiled: October 2, 2001Date of Patent: November 25, 2003Assignee: Shipley Company, L.L.C.Inventors: Andrew J. Cobley, Mark J. Kapeckas, Erik Reddington, Wade Sonnenberg, Leon R. Barstad, Thomas Buckley
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Patent number: 6648977Abstract: Near net shape free standing articles can be produced by chemical vapor deposition techniques when a suitable substrate is suspended in a chemical vapor deposition zone according to the disclosed technique. By suspending such substrates from linear suspension supports such as ropes, cables and wires, multiple near net shape articles can be produced with substantial manufacturing cost savings over previously employed techniques.Type: GrantFiled: July 17, 2001Date of Patent: November 18, 2003Assignee: Shipley Company, L.L.C.Inventors: Jitendra Singh Goela, Zlatko Salihbegovic, Michael A. Pickering, Mitch Boudreaux
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Patent number: 6645698Abstract: The invention provides photoresist compositions comprising a resin binder having acid labile blocking groups requiring an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base additive. It has found that linewidth variation is substantially reduced when using the halogenated sulfonic aced generator in a process involving a high temperature post exposure bake.Type: GrantFiled: December 22, 1999Date of Patent: November 11, 2003Assignee: Shipley Company, L.L.C.Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta
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Patent number: 6616870Abstract: An apparatus for the manufacture of chemical vapor deposited domes. The apparatus has a vapor deposition chamber with a plurality of sides, a base and a top where the base has a reactant port for receiving a flow of chemical reactants. A male mandrel is joined to one of a plurality of sides of the deposition chamber such that the flow of chemical reactants in the vapor deposition chamber does not impinge on the mandrel.Type: GrantFiled: August 7, 2000Date of Patent: September 9, 2003Assignee: Shipley Company, L.L.C.Inventors: Jitendra S. Goela, Zlatko Salihbegovic
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Patent number: 6616976Abstract: A method for treating a micro-roughened metal surface to improve bonding between the metal surface and a polymer material. The method involves post-treating the micro-roughened conversion coated metal surface with an epoxy resin composition after having formed the micro-roughened conversion coated metal surface with an adhesion promotion composition. The method can be employed in the circuit board industry to improve bonding between innerlayers in a multiplayer circuit board.Type: GrantFiled: November 28, 2001Date of Patent: September 9, 2003Assignee: Shipley Company, L.L.C.Inventors: Joseph R. Montano, James G. Shelnut
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Patent number: 6610365Abstract: A method for producing conductor coating on dielectric surface may be used in many areas of industry for preparation of dielectric surfaces for selective electroplating. Using this method, conductor coatings are obtained when dielectric items are etched in acidic solutions containing oxidising agents, then treated in trivalent bismuth compound solution and additionally treated in sulphide solution.Type: GrantFiled: July 20, 2001Date of Patent: August 26, 2003Assignee: Shipley Company, L.L.C.Inventor: Mykolas Baranauskas
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Patent number: 6610459Abstract: An improved method of and apparatus that is continuously automatically operative in an in-line system is described for applying under vacuum, heat and mechanical pressure a dry film photoresist-forming layer to printed circuit boards (200) that already have been prelaminated by the loose application thereto of the dry film resist as discrete cut sheets within the confines of the surface of the boards whereby a laminate without entrapped air bubbles and closely conforming to the raised circuit traces and irregular surface contours of the printed circuit board is obtained. Featured is a conveyorized vacuum applicator (12) comprising two independent vacuum lamination chambers (18,20) in end-to-end relation. The first vacuum chamber operates at ambient temperature to draw off all of the air entrapped between the dry film resist and the surface of the printed circuit board at conditions that do not result in premature tacking of the dry film to the surface of the board.Type: GrantFiled: August 25, 2000Date of Patent: August 26, 2003Assignee: Shipley Company, L.L.C.Inventors: Charles R. Keil, Osvaldo Novello, Roberto Stanich
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Patent number: 6585837Abstract: An improved method of and apparatus that is continuously automatically operative in an in-line system is described for applying under heat, vacuum and mechanical pressure a dry film photoresist-forming layer to printed circuit boards (136) that already have been prelaminated by the loose application thereto of the dry film resist as discrete cut sheets within the confines of the surface of the boards whereby a laminate without entrapped air bubbles and closely conforming to the raised circuit traces and irregular surface contours of the printed circuit board is obtained.Type: GrantFiled: August 25, 2000Date of Patent: July 1, 2003Assignee: Shipley Company, L.L.C.Inventors: Charles R. Keil, Osvaldo Novello