Abstract: A quantum dot, a light emitting material, and a manufacturing method of quantum dot are provided. A ratio of an emission intensity to an absorption intensity of the quantum dot at a characteristic wavelength ranges from 1.5×108 CPS/Abs. to 2.0×109 CPS/Abs. The characteristic wavelength is a shorter wavelength of two wavelengths corresponding to half of a maximum intensity of an emission peak of the quantum dot.

Abstract: A polymethacrylate composition, an optical device made therefrom, and a display apparatus are provided. The polymethacrylate composition includes 50 to 85 parts by weight of methacrylate series polymer, 15 to 50 parts by weight of styrene series-maleic anhydride series copolymer, and an aromatic compound having a phosphite group. The methacrylate series polymer includes methacrylate series monomer unit and acrylate series monomer unit and has a weight average molecular weight (Mw) in a range between 20,000 and 200,000. The styrene series-maleic anhydride series copolymer includes 65 wt %-85 wt % of styrene series monomer unit, 15 wt %-35 wt % of maleic anhydride series monomer unit, and 0-20 wt % of second copolymerizable monomer unit. The content of the aromatic compound having a phosphite group in the polymethacrylate composition is 200 ppm-900 ppm.

Abstract: A quantum dot, a light emitting material, and a manufacturing method of quantum dot are provided. A ratio of an emission intensity to an absorption intensity of the quantum dot at a characteristic wavelength ranges from 1.5×108 CPS/Abs. to 2.0×109 CPS/Abs. The characteristic wavelength is a shorter wavelength of two wavelengths corresponding to half of a maximum intensity of an emission peak of the quantum dot.

Abstract: A quantum dot, a light emitting material, and a manufacturing method of quantum dot are provided. A ratio of an emission intensity to an absorption intensity of the quantum dot at a characteristic wavelength ranges from 1.5×108 CPS/Abs. to 2.0×109 CPS/Abs. The characteristic wavelength is a shorter wavelength of two wavelengths corresponding to half of a maximum intensity of an emission peak of the quantum dot.

Abstract: The present disclosure provides a modified polymethylhydrosiloxane, a modified high-cis conjugated diene polymer, and a manufacturing method for the same, and a rubber composition and a tire using the same. The manufacturing method for the modified high-cis conjugated diene polymer comprises: performing a polymerization reaction to form a high-cis conjugated diene polymer; and making the high-cis conjugated diene polymer react with a first modifier, and then react with a condensation accelerator and a second modifier to generate a modified high-cis conjugated diene polymer; wherein the modified high-cis conjugated diene polymer has over 97% of cis-1,4 structure. The second modifier comprises a compound represented by the following formula (1).

Abstract: A light-emitting material, a method for producing the light-emitting material and a display apparatus are provided. An average particle size of the light-emitting material is 0.1 ?m to 30 ?m, and an average distance between outermost quantum dots of a particle of the light-emitting material and a surface of the particle of the light-emitting material is 0.5 nm to 25 nm, or a minimum distance between the outermost quantum dots of a particle of the light-emitting material and the surface of the particle of the light-emitting material is 0.1 nm to 20 nm.

Abstract: A light-emitting material, a method for producing the light-emitting material and a display apparatus are provided. An average particle size of the light-emitting material is 0.1 ?m to 30 ?m, and an average distance between outermost quantum dots of a particle of the light-emitting material and a surface of the particle of the light-emitting material is 0.5 nm to 25 nm, or a minimum distance between the outermost quantum dots of a particle of the light-emitting material and the surface of the particle of the light-emitting material is 0.1 nm to 20 nm.

Abstract: A polymethacrylate composition, an optical device made therefrom, and a display apparatus are provided. The polymethacrylate composition includes 50 to 85 parts by weight of methacrylate series polymer, 15 to 50 parts by weight of styrene series-maleic anhydride series copolymer, and an aromatic compound having a phosphite group. The methacrylate series polymer includes methacrylate series monomer unit and acrylate series monomer unit and has a weight average molecular weight (Mw) in a range between 20,000 and 200,000. The styrene series-maleic anhydride series copolymer includes 65 wt %-85 wt % of styrene series monomer unit, 15 wt %-35 wt % of maleic anhydride series monomer unit, and 0-20 wt % of second copolymerizable monomer unit. The content of the aromatic compound having a phosphite group in the polymethacrylate composition is 200 ppm-900 ppm.

Abstract: A resin composition and an application thereof are provided, wherein the resin composition includes a thermoplastic elastomer, a styrene-based resin, a processing oil, and a filler. Based on 100 wt % of the resin composition, the content of the thermoplastic elastomer is 20 wt % to 55 wt %, the content of the styrene-based resin is 25 wt % to 55 wt %, the content of the processing oil is 6 wt % to 18 wt %, and the content of the filler is 5 wt % to 20 wt %. A printing material made by the resin composition has good adhesion with a substrate.

Abstract: The invention provides a photosensitive resin composition, a color filter, and a liquid crystal display element thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a black pigment (E). The compound (B) having an ethylenically unsaturated group contains a compound (B-1) having an acidic group and at least three ethylenically unsaturated groups. The photoinitiator (C) includes a photoinitiator (C-1) represented by formula (1).

Abstract: A manufacturing method of a quantum dot, a light-emitting material, a light-emitting device, and a display apparatus are provided. The manufacturing method of a quantum dot includes the following steps. A first solution including at least one element selected from the group consisting of an element in Group XII and an element in Group XIII is provided. A second solution including at least one element selected from the group consisting of an element in Group XV and an element in Group XVI is provided. The first solution and the second solution are mixed. A thermal treatment is performed on the mixed solution. A range of the heating rate of the thermal treatment is 2° C./min to 10° C./min.

Abstract: A photosensitive resin composition and a manufacturing method thereof, a black matrix, a pixel layer, a protective film, a color filter, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically-unsaturated group, a photoinitiator (C), and a solvent (D), wherein the alkali-soluble resin (A) contains a first alkali-soluble resin (A-1) having all of a fluorene group, a polymerizable unsaturated group, and a carbamate group. The photosensitive resin composition contains a specific alkali-soluble resin (A-1), so that a pattern formed by the photosensitive resin composition has no development residue and good sputtering resistance.

Abstract: The invention provides a terminal-modified conjugated diene-vinyl aromatic hydrocarbon copolymer and a synthesis method and application thereof. The synthesis method of the terminal-modified conjugated diene-vinyl aromatic hydrocarbon copolymer includes producing a conjugated diene-vinyl aromatic hydrocarbon copolymer having active terminals; and reacting the conjugated diene-vinyl aromatic hydrocarbon copolymer having the active terminals with a compound represented by formula (1) to produce the conjugated diene-vinyl aromatic hydrocarbon copolymer having terminals modified by the compound represented by formula (1).

Abstract: A quantum dot, a light emitting material, and a manufacturing method of quantum dot are provided. A ratio of an emission intensity to an absorption intensity of the quantum dot at a characteristic wavelength ranges from 1.5×108 CPS/Abs. to 2.0×109 CPS/Abs. The characteristic wavelength is a shorter wavelength of two wavelengths corresponding to half of a maximum intensity of an emission peak of the quantum dot.

Abstract: A resin composition for laser marking includes a resin and laser absorbers. The resin includes 40%˜83% (methyl)acrylate-styrene based copolymers (A), greater than 0 to 45% (methyl)acrylate based copolymers (B) and 5˜35% core-shell copolymers (C) by weight. The laser absorbers include 0.01˜0.25 parts of carbon black (D) for each 100 parts by weight of the resin. The (methyl)acrylate-styrene based copolymer (A) includes 40˜80% (methyl)acrylate-containing monomer units, 20% to 60% styrene series monomer units and 0% to 30% other-polymerizable monomer units by weight. The (methyl)acrylate based copolymers (B) includes 92˜99% methacrylate-type monomer units, 1˜8% acrylate series monomer units and 0˜7% vinyl-group-containing polymerizable monomer units by weight and has a weight-average molecular weight ranging from 70,000 to 150,000.

Abstract: A photosensitive resin composition and a manufacturing method thereof, a black matrix, a pixel layer, a protective film, a color filter, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically-unsaturated group, a photoinitiator (C), and a solvent (D), wherein the alkali-soluble resin (A) contains a first alkali-soluble resin (A-1) having all of a fluorene group, a polymerizable unsaturated group, and a carbamate group. The photosensitive resin composition contains a specific alkali-soluble resin (A-1), so that a pattern formed by the photosensitive resin composition has no development residue and good sputtering resistance.

Abstract: A manufacturing method of a quantum dot, a light-emitting material, a light-emitting device, and a display apparatus are provided. The manufacturing method of a quantum dot includes the following steps. A first solution including at least one element selected from the group consisting of an element in Group XII and an element in Group XIII is provided. A second solution including at least one element selected from the group consisting of an element in Group XV and an element in Group XVI is provided. The first solution and the second solution are mixed. A thermal treatment is performed on the mixed solution. A range of the heating rate of the thermal treatment is 2° C./min to 10° C./min.

Abstract: A resin composition and an application thereof are provided, wherein the resin composition includes a thermoplastic elastomer, a styrene-based resin, a processing oil, and a filler. Based on 100 wt % of the resin composition, the content of the thermoplastic elastomer is 20 wt % to 55 wt %, the content of the styrene-based resin is 25 wt % to 55 wt %, the content of the processing oil is 6 wt % to 18 wt %, and the content of the filler is 5 wt % to 20 wt %. A printing material made by the resin composition has good adhesion with a substrate.

Abstract: The invention shows a photosensitive resin composition which can be used in protective film and liquid crystal display element and provides good transparency and high chemical resistance. The composition includes a complex resin (A), an o-naphthoquinone diazide sulfonate (B), and a solvent (C). The complex resin (A) includes a main chain and a side chain. The main chain includes a repeating unit derived from siloxane (meth)acrylate based monomer (a1-2). The side chain includes a repeating unit derived from siloxane based monomer (a2), and is bonded to the repeating unit derived from siloxane (meth)acrylate based monomer (a1-2). The complex resin (A) satisfies at least one of the following conditions (I) and (II): Condition (I): the main chain further includes a repeating unit derived from unsaturated monomer (a1-1) including a carboxylic acid or a carboxylic anhydride. Condition (II): the siloxane based monomer (a2) includes a monomer (a2-1) represented by formula (A-4).

Abstract: A liquid crystal alignment agent allowing formation of an LCD element having good reliability and less residual image, a liquid crystal alignment film, and an LCD element having the liquid crystal alignment film are shown. The liquid crystal alignment agent includes a polymer (A), a photosensitive polysiloxane (B), and a solvent (C). The polymer (A) is obtained by reacting a mixture that includes a tetracarboxylic dianhydride component (a-1) and a diamine component (a-2). The photosensitive polysiloxane (B) is obtained by reacting a polysiloxane (b-1) having an epoxy group with a cinnamic acid derivative (b-2) and an aromatic heterocyclic derivative (b-3) containing nitride, oxide or sulfide.