Abstract: A rubber composition and a method for manufacturing the same are provided. The rubber composition includes a main chain modified conjugated diene based polymer and a stabilizer. A weight ratio of the main chain modified conjugated diene based polymer to the stabilizer is 100:0.2˜2.

Abstract: The invention relates to a horizontal liquid crystal alignment agent which provides a polymer (A) and a solvent (B). The polymer (A) is obtained by reacting a mixture comprising a tetracarboxylic acid dianhydride component (a) and a diamine component (b). The invention also provides a liquid crystal alignment film made by the liquid crystal alignment agent as mentioned above and a liquid crystal display element having the liquid crystal alignment film. The liquid crystal alignment film has high rubbing resistance.

Abstract: A positive photosensitive resin composition, a pattern forming method, a thin film transistor array substrate, and a liquid crystal display device are provided. The positive photosensitive resin includes a novolac resin (A), an alkali-soluble resin (B), an ester (C) of an o-naphthoquinone diazide sulfonic acid, and a solvent (D). The alkali-soluble resin (B) includes a first alkali-soluble resin (B-1) produced by polymerizing a mixture. The mixture includes an epoxy compound (i) and a compound (ii), wherein the epoxy compound (i) has at least two epoxy groups, and the compound (ii) has at least one carboxylic acid group and at least one ethylenically unsaturated group.

Abstract: A phosphor, a preparing method for the phosphor, and a light emitting device are provided. The phosphor has a formula of A3?xCexQ5O12. A and Q are independently comprise Al, Ga, In, Sc, Y, La, Gd, Tb, Lu elements or combinations thereof. Ce represents a cerium element. O represents an oxygen element. 0<x?3. The phosphor contains 100 ppm˜2000 ppm of Ba element.

Abstract: The present invention relates to a photosensitive resin composition, a protective film and an element having the same. The aforementioned photosensitive resin composition includes an alkali-soluble resin (A), an ortho-naphthoquinone diazide sulfonic acid ester (B) and a solvent (C). The alkali-soluble resin (A) is copolymerized by an unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a1), a fluorene derivative having a double-bond group (a2) and an unsaturated compound having an acid-decomposable group (a3).

Abstract: A liquid crystal alignment agent capable of forming a liquid crystal alignment film having good ultraviolet reliability, the liquid crystal alignment film, and a liquid crystal display element having the same are provided. The liquid crystal alignment agent includes a polymer (A) and a solvent (B). The polymer (A) is obtained by reacting a mixture. The mixture includes a tetracarboxylic dianhydride component (a) and a diamine component (b). The diamine component (b) includes a diamine compound (b-1) represented by formula (1) and a diamine compound (b-2) represented by formula (2).

Abstract: A phosphor and a light emitting device are provided. The phosphor comprises a composition having a formula of (BaaSr1-a)2-zSi5ObNn:EuZ, 0.03<a<0.75, 0<b<1, 7<n<9, and 0.03<z<0.3.

Abstract: The present invention relates to a positive photosensitive resin composition and a method for forming a pattern by using the same. The positive photosensitive resin composition includes a novolac resin (A), a polysiloxane (B), an ortho-naphthoquinone diazide sulfonic acid ester (C) and a solvent (D). The novolac resin (A) includes a xylenol-type novolac resin (A-1). The xylenol-type novolac resin (A-1) is synthesized by polycondensing an aldehyde compound with a xylenol compound.

Abstract: A photosensitive polysiloxane composition, a protecting film and an element having the protecting film are provided. The photosensitive polysiloxane composition includes a polysiloxane (A), an o-naphthoquinonediazidesulfonate (B), a silane compound (C) containing an amic acid group and a solvent (D). When the photosensitive polysiloxane composition is used for forming a protecting film, the protecting film shows favorable cross-section shape and heat resistance.

Abstract: A polycarbonate composition includes a terminal hydroxy-containing polycarbonate and a halogen-containing alkali metal tungsten oxide of formula (I) in an amount ranging from 0.007 wt % to 0.09 wt % based on a total weight of the polycarbonate composition. The Formula (I) is represented as follows: MxWO3-yLy??(I) where M represents an alkali metal, W represents tungsten, L represents halogen, 0.001?x?1, and 0<y?0.5.

Abstract: A liquid crystal alignment agent contains a polymer composition, a polysiloxane, and a solvent. The polymer composition is obtained by subjecting a mixture including a tetracarboxylic dianhydride component and a diamine component to a reaction. The diamine component includes first and second diamine compounds. The polysiloxane contains an epoxy-based group. A liquid crystal display element made from the aforesaid liquid crystal alignment agent has reduced ion density.

Abstract: A negative photosensitive resin composition including an alkali-soluble resin (A), a photoacid generator (B), a basic compound (C), a cross-linking agent (D), and a solvent (E) is provided. The alkali-soluble resin (A) includes an acrylate resin (A-1) and a novolac resin (A-2). The acrylate resin (A-1) is synthesized by polymerizing a monomer for polymerization, wherein the monomer for polymerization includes an unsaturated carboxylic acid or unsaturated carboxylic acid anhydride monomer (a-1-1) and a monomer (a-1-2). The monomer (a-1-2) includes a compound (a-1-2-1) with a tricyclodecane or dicyclopentadiene structure, a compound (a-1-2-2) represented by formula (1), or a combination of both. The novolac resin (A-2) is synthesized by polymerizing an aldehyde compound with an aromatic hydroxy compound, wherein the aromatic hydroxy compound includes a xylenol compound.

Abstract: A modified high cis butadiene-isoprene copolymer, a method for producing the same, and a tire having the aforementioned polymer are provided. The method includes performing a polymerization step for forming a high cis butadiene-isoprene copolymer having an organometallic active site and reacting which copolymer with a modifier mixture via the organometallic active site for forming the modified high cis butadiene-isoprene copolymer. The modifier mixture comprises a first modifier and a second modifier. The first modifier has a chemical formula of X—R1-Si(R2)3, wherein X is an glycidoxy functional group, an isocyanate functional group, or a 2-(3,4-epoxycyclohexyl group), R1 is an alkylene group, and R2 is an alkyl group or an alkoxy group. The second modifier has a chemical formula of R3-Si(R4)3, wherein R3 is an alkoxy group or an aryloxy group, and R4 is an alkyl group, an alkoxy group, an aryloxy group or a cycloalkyl group.

Abstract: An optical plate includes a substrate having a light emitting surface, a rear surface opposite to the light emitting surface, and a plurality of microstructures that cooperatively define the light emitting surface and each of which parallelly extends in a light traveling direction. Each of the microstructures includes first and second convex portions and a concave portion disposed between and interconnecting the first and second convex portions, and two adjacent ones of the microstructures are connected. Intersections between the microstructures cooperatively define an imaginary plane, and a lowest point of the concave portion is disposed at one side of the imaginary plane opposite to the rear surface of the substrate.

Abstract: The invention relates to a photosensitive resin composition that has good heat resistance and good humidity resistance. The invention also provides a method for forming a thin film on a substrate, a thin film on a substrate and an apparatus.

Abstract: The invention relates to a photosensitive resin composition; especially relates to a photosensitive resin composition that has good heat-yellowing resistance, surface roughness resistance, developability and brightness. The invention also provides a white matrix, a color filter and a reflective display element.

Abstract: The invention relates to a photosensitive resin composition, and an overcoat and/or spacer for a liquid crystal display component. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound having an ethylenically unsaturated group (B); a photoinitiator (C); a solvent (D); and an organic acid (E). The alkali-soluble resin (A) comprises a resin having an unsaturated group (A-1) synthesized by polymerizing a mixture, and the mixture comprises an epoxy compound having at least two epoxy groups (i) and a compound having at least one carboxyl group and at least one vinyl unsaturated group (ii). A molecular weight of said organic acid (E) is below 1000.

Abstract: The present invention relates to a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes a pigment (A), an alkali-soluble resin (B), a cationic polymeric compound (C), a compound (D) having an ethylenically unsaturated group, a photoinitiator (E) and an organic solvent (F). The photosensitive resin composition according to the present invention can improve voltage holding ratio and developing-resistance of the color filter.

Abstract: The present invention relates to a blue photosensitive resin composition for a color filter and an application thereof. The blue photosensitive resin composition includes an organic pigment (A), a dye (B), an alkali-soluble resin (C), a compound having an ethylenically unsaturated group (D), a photo-initiator (E) and a solvent (F). The alkali-soluble resin (C) includes a first alkali-soluble resin (C-1) having a hindered amine structure. The blue photosensitive resin composition of the present invention can improve a voltage holding ratio and a contrast ratio of the color filter.

Abstract: The present invention relates to a photosensitive resin composition for a color filter and an application thereof. The photosensitive resin composition includes a pigment (A), an alkali-soluble resin (B), a compound having an ethylenically unsaturated group (C), a photo initiator (D) and an organic solvent (E). The alkali-soluble resin (B) includes a first alkali-soluble resin (B-1), and the first alkali-soluble resin (B-1) is copolymerized by a first mixture. The first mixture at least includes an ethylenically unsaturated monomer having a structure of hindered amine (b1-1), an ethylenically unsaturated monomer having an oxetanyl (b1-2) and an ethylenically unsaturated monomer having a carboxylic acid group (b1-3).