Patents Assigned to Chi Mei Corporation
  • Patent number: 9816032
    Abstract: The invention relates to a liquid crystal alignment agent which provides a polymer composition (A), a solvent (B), and a poly(oxyalkyleneglycol)dialkylether compound (C); wherein the number average molecular weight of the poly(oxyalkyleneglycol)dialkylether compound (C) is from 250 to 2000. The invention also provides a liquid crystal alignment film made by the liquid crystal alignment agent as mentioned above and a liquid crystal display element which provides the liquid crystal alignment film, and the liquid crystal display element has high voltage holding rate and low ion density.
    Type: Grant
    Filed: December 9, 2013
    Date of Patent: November 14, 2017
    Assignee: CHI MEI CORPORATION
    Inventor: Li-Tao Hsu
  • Patent number: 9791773
    Abstract: The present invention relates to a photosensitive resin composition for black matrix, as well as a color filter and a liquid crystal display (LCD) device formed by the composition. The aforementioned photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing vinyl unsaturated group(s) (B), a photo initiator (C), quinonediazide sulfonic acid ester (D), a solvent (E) and black pigment (F). The alkali-soluble resin (A) includes epoxy resin having unsaturated group(s) (A-1), which is obtained by reacting an epoxy resin (i) having at least two epoxy groups with a compound (ii) having at least one vinyl unsaturated group and carboxyl group. The aforementioned photo initiator (C) includes an O-acyloxime compound (C-1).
    Type: Grant
    Filed: December 16, 2013
    Date of Patent: October 17, 2017
    Assignee: CHI MEI CORPORATION
    Inventors: Hao-Wei Liao, I-Chun Hsieh
  • Publication number: 20170235224
    Abstract: The invention provides a photosensitive resin composition, a color filter, and a liquid crystal display element thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a black pigment (E). The compound (B) having an ethylenically unsaturated group contains a compound (B-1) having an acidic group and at least three ethylenically unsaturated groups. The photoinitiator (C) includes a photoinitiator (C-1) represented by formula (1).
    Type: Application
    Filed: October 15, 2015
    Publication date: August 17, 2017
    Applicant: Chi Mei Corporation
    Inventors: Hao-Wei Liao, Yu-Jie Tsai, Hung-Chia Chou
  • Publication number: 20170168390
    Abstract: The invention shows a photosensitive resin composition which can be used in protective film and liquid crystal display element and provides good transparency and high chemical resistance. The composition includes a complex resin (A), an o-naphthoquinone diazide sulfonate (B), and a solvent (C). The complex resin (A) includes a main chain and a side chain. The main chain includes a repeating unit derived from siloxane (meth)acrylate based monomer (a1-2). The side chain includes a repeating unit derived from siloxane based monomer (a2), and is bonded to the repeating unit derived from siloxane (meth)acrylate based monomer (a1-2). The complex resin (A) satisfies at least one of the following conditions (I) and (II): Condition (I): the main chain further includes a repeating unit derived from unsaturated monomer (a1-1) including a carboxylic acid or a carboxylic anhydride. Condition (II): the siloxane based monomer (a2) includes a monomer (a2-1) represented by formula (A-4).
    Type: Application
    Filed: December 7, 2016
    Publication date: June 15, 2017
    Applicant: Chi Mei Corporation
    Inventors: Chih-Hang Hsu, Ming-Ju Wu, Chun-An Shih
  • Publication number: 20170152443
    Abstract: A liquid crystal alignment agent allowing formation of an LCD element having good reliability and less residual image, a liquid crystal alignment film, and an LCD element having the liquid crystal alignment film are shown. The liquid crystal alignment agent includes a polymer (A), a photosensitive polysiloxane (B), and a solvent (C). The polymer (A) is obtained by reacting a mixture that includes a tetracarboxylic dianhydride component (a-1) and a diamine component (a-2). The photosensitive polysiloxane (B) is obtained by reacting a polysiloxane (b-1) having an epoxy group with a cinnamic acid derivative (b-2) and an aromatic heterocyclic derivative (b-3) containing nitride, oxide or sulfide.
    Type: Application
    Filed: November 24, 2016
    Publication date: June 1, 2017
    Applicant: Chi Mei Corporation
    Inventor: Shin-Rong Chiou
  • Patent number: 9644147
    Abstract: A liquid crystal alignment agent capable of forming a liquid crystal alignment film having good ultraviolet reliability, the liquid crystal alignment film, and a liquid crystal display element having the same are provided. The liquid crystal alignment agent includes a polymer (A) and a solvent (B). The polymer (A) is obtained by reacting a mixture. The mixture includes a tetracarboxylic dianhydride component (a) and a component (b). The component (b) includes a diamine compound (b-1) represented by formula (1), a diamine compound (b-2) represented by formula (2), and a compound (b-3), wherein the compound (b-3) is at least one selected from the group consisting of a structure represented by formula (3-1) and a structure represented by formula (3-2).
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: May 9, 2017
    Assignee: Chi Mei Corporation
    Inventor: Shin-Rong Chiou
  • Patent number: 9606436
    Abstract: A photosensitive resin composition includes an alkali-soluble resin (A), a compound having an unsaturated vinyl group (B), a photo initiator (C), solvent (D) and a silane compound (E) having a structure shown as formula (I): in the formula (I), A individually and independently represents a single bond, an alkylene group, or an arylene group, B individually and independently represents an organic group having diphenyl phosphine, hydrogen atom, an alkyl group, an aryl group, or —OR, in which R is a C1-C6 alkyl group or a phenyl group, at least one B is the organic group having diphenyl phosphine and at least one B is —OR. When B is —OR, A connected to B is the single bond. A film formed by the photosensitive resin composition has good refractivity and adhesivity to molybdenum.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: March 28, 2017
    Assignee: CHI MEI CORPORATION
    Inventors: Yu-Jie Tsai, I-Kuang Chen
  • Publication number: 20170066969
    Abstract: A liquid crystal alignment agent capable of forming a liquid crystal alignment film having good environmental resistance, the liquid crystal alignment film, and a liquid crystal display element having the liquid crystal alignment film are provided. The liquid crystal alignment agent includes a polymer (A), a benzotriazole compound (B) containing an epoxy group, and a solvent (C). The polymer (A) is obtained by reacting a mixture including a tetracarboxylic dianhydride component (a1) and a diamine component (a2).
    Type: Application
    Filed: August 31, 2016
    Publication date: March 9, 2017
    Applicant: Chi Mei Corporation
    Inventor: Tsung-Pei Tsai
  • Patent number: 9568763
    Abstract: The invention relates to a photosensitive resin composition that has the advantages of high developability, good hardness, and good sputtered resistance. The invention also provides a method for manufacturing a color filter, color filter and a liquid crystal display device. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing an ethylenically unsaturated group (B), a photoinitiator (C), an organic solvent (D), a pigment (E), and a compound (F).
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: February 14, 2017
    Assignee: CHI MEI CORPORATION
    Inventors: Duan-Chih Wang, Jung-Pin Hsu
  • Patent number: 9568823
    Abstract: The present invention relates to a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), a pigment (D) and an organic solvent (E). The photosensitive resin composition according to the present invention can improve linearity of pattern with high finesse and developing-resistance of the color filter.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: February 14, 2017
    Assignee: CHI MEI CORPORATION
    Inventors: Yu-Ju Wu, Bar-Yuan Hsieh, Jung-Pin Hsu
  • Patent number: 9557443
    Abstract: A photosensitive resin composition, a black matrix, a color filter, and a liquid crystal display device including the resin composition are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photo initiator (C), a solvent (D), and a black pigment (E). The compound (B) containing an ethylenically unsaturated group includes a compound (B-1) represented by the following formula (1). In formula (1), a represents an integer of 1 to 20; each of Ra and Rb independently represents an acryloyloxy phenyl group, an acryloyloxy alkyl group having 4 to 20 carbons, a methacryloyloxy phenyl group, a methacryloyloxy alkyl group having 5 to 20 carbons, an alkenyl group having 3 to 20 carbons, or an alkenyl aryl group having 8 to 30 carbons; when a is 2 or more, a plurality of Ra and Rb are the same or different.
    Type: Grant
    Filed: June 12, 2014
    Date of Patent: January 31, 2017
    Assignee: Chi Mei Corporation
    Inventor: Ching-Yuan Tseng
  • Patent number: 9557444
    Abstract: An alkali-soluble resin, a photosensitive resin composition, a color filter, and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes a specific alkali-soluble resin, a compound containing ethylenic unsaturated group, a photoinitiator, and an organic solvent. The photosensitive resin composition is excellent in developability and high precision pattern linearity and contour angle since the photosensitive resin composition contains a specific alkali-soluble resin.
    Type: Grant
    Filed: August 21, 2014
    Date of Patent: January 31, 2017
    Assignee: Chi Mei Corporation
    Inventor: Bar-Yuan Hsieh
  • Patent number: 9541832
    Abstract: The present invention relates to a photosensitive resin composition, a protective film and an element having the same. The aforementioned photosensitive resin composition includes a polysiloxane resin (A), an alkali-soluble resin (B), an ortho-naphthoquinone diazide sulfonic acid ester (C) and a solvent (D). The alkali-soluble resin (B) is copolymerized by an unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (b1), a fluorene derivative having a double-bond group (b2) and an unsaturated compound having an acid-decomposable group (b3).
    Type: Grant
    Filed: June 9, 2015
    Date of Patent: January 10, 2017
    Assignee: CHI MEI CORPORATION
    Inventors: Ming-Ju Wu, Chun-An Shih
  • Patent number: 9529116
    Abstract: A photosensitive resin composition and application of the same are provided. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound (B) containing vinyl unsaturated group(s), a photo initiator (C), an organic solvent (D), a pigment (E) and a metal chelating agent (F). During a pixel process with an omission of a prebake step, the photosensitive resin composition, which is added with the metal chelating agent (F), can be formed to pixels that is adhered tightly to a substrate.
    Type: Grant
    Filed: October 28, 2013
    Date of Patent: December 27, 2016
    Assignee: CHI MEI CORPORATION
    Inventors: Bo-Hsuan Lin, Jung-Pin Hsu, Duan-Chih Wang
  • Patent number: 9520596
    Abstract: A resin for a negative electrode of a lithium ion battery including a core section and a cladding layer covering the surface of the core section are provided. The cladding layer is obtained by reacting a first monomer mixture. The first monomer mixture includes an ethylenically unsaturated carboxylic acid ester monomer, a first aromatic vinyl monomer, and an ethylenically unsaturated carboxylic acid monomer. Based on 100 wt % of the first monomer mixture, a content of the ethylenically unsaturated carboxylic acid ester monomer is from 45 to 80 wt %, a content of the first aromatic vinyl monomer is from 5 to 25 wt %, and a content of the ethylenically unsaturated carboxylic acid monomer is from 10 to 43 wt %.
    Type: Grant
    Filed: September 3, 2014
    Date of Patent: December 13, 2016
    Assignee: Chi Mei Corporation
    Inventors: Hsiu-Mei Wu, Chan-Li Hsueh, Chung-Ping Li
  • Patent number: 9519208
    Abstract: A photosensitive resin composition for color filter including an alkai-soluble resin (A-1), an alkai-soluble resin (A-2) having a functional group represented by formula (2), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), an organic solvent (D), and a pigment (E) is provided, wherein the alkai-soluble resin (A-1) is formed by copolymerizing an ethylenically unsaturated monomer (a-1) having a carboxylic acid group, a compound (a-2) having a cyclicimide group represented by formula (1), and other copolymerizable ethylenically unsaturated monomers (a-3) except for the ethylenically unsaturated monomer (a-1) having the carboxylic acid group and the compound (a-2) having the cyclicimide group represented by formula (1).
    Type: Grant
    Filed: February 6, 2014
    Date of Patent: December 13, 2016
    Assignee: Chi Mei Corporation
    Inventor: Jung-Pin Hsu
  • Patent number: 9513511
    Abstract: The present invention relates to a liquid crystal alignment agent, a liquid crystal alignment film made by the liquid crystal alignment agent and a liquid crystal display element having the liquid crystal alignment film. The liquid crystal alignment agent includes a polymer composition (A) and a solvent (B). The polymer composition (A) is synthesized by reacting a mixture that includes a tetracarboxylic dianhydride component (a) and a diamine component (b). The aforementioned liquid crystal alignment agent has a better process stability, and the liquid crystal alignment film made by the liquid crystal alignment agent could improve the reliability of the liquid crystal display element.
    Type: Grant
    Filed: September 4, 2014
    Date of Patent: December 6, 2016
    Assignee: CHI MEI CORPORATION
    Inventor: Tsung-Pei Tsai
  • Patent number: 9505981
    Abstract: A liquid crystal alignment agent, a liquid crystal alignment film, and a liquid crystal display device are provided. The liquid crystal alignment agent includes a polymer composition (A-1) and a solvent (B). The polymer composition (A-1) is obtained by reacting a tetracarboxylic acid dianhydride compound (a) with a diamine compound (b). The diamine compound (b) includes at least one type of diamine (b-1) represented by formula (I) and at least one type of diamine (b-2) having the structure represented by formula (II). The liquid crystal alignment agent can be made into a liquid crystal display device having good uniformity of pretilt angle after ultraviolet irradiation.
    Type: Grant
    Filed: March 17, 2015
    Date of Patent: November 29, 2016
    Assignee: Chi Mei Corporation
    Inventor: Shin-Rong Chiou
  • Patent number: 9507261
    Abstract: A photosensitive composition, a protective film, and an element having the protective film are provided. The photosensitive composition includes a polysiloxane (A), an o-naphthoquinonediazidesulfonate (B), and a solvent (C). The polysiloxane (A) is obtained by polycondensing a mixture, wherein the mixture includes a silane monomer (a-1) represented by formula (1), a silane monomer (a-2) represented by formula (2), and a silicon-containing compound (a-3). The silicon-containing compound (a-3) is selected from the group consisting of a silane monomer represented by formula (3), a siloxane prepolymer, and a silica particle. The photosensitive composition can be made into a protective film with excellent chemical resistance.
    Type: Grant
    Filed: April 30, 2015
    Date of Patent: November 29, 2016
    Assignee: Chi Mei Corporation
    Inventors: Wei-Jie Huang, Chun-An Shih
  • Patent number: 9481746
    Abstract: A modified high-cis isoprene polymer, a method for producing the same, and a tire containing the aforementioned polymer are provided. A polymerization reaction is performed on isoprene monomers in an organometallic catalyst system to form a high-cis isoprene polymer having an organometallic active site, wherein the organometallic active site is formed by an organometallic catalyst system. The high-cis isoprene polymer having the organometallic active site is reacted with a modifier mixture including a first modifier and a second modifier via the organometallic active site. The first modifier and the second modifier are compounds represented by formula 1 and formula 2, respectively: X—R1-Si(R2)3??formula 1, and R3-Si(R4)3??formula 2, wherein X, R1, R2, R3, and R4 are defined in the specification.
    Type: Grant
    Filed: December 17, 2014
    Date of Patent: November 1, 2016
    Assignee: Chi Mei Corporation
    Inventors: Chih-Cheng Lee, Hung-Jui Kuo