Patents Assigned to Chi Mei Corporation
  • Patent number: 10100255
    Abstract: A liquid crystal alignment agent contains a polymer composition, a polysiloxane, and a solvent. The polymer composition is obtained by subjecting a mixture including a tetracarboxylic dianhydride component and a diamine component to a reaction. The diamine component includes first and second diamine compounds. The polysiloxane contains an epoxy-based group. A liquid crystal display element made from the aforesaid liquid crystal alignment agent has reduced ion density.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: October 16, 2018
    Assignee: CHI MEI CORPORATION
    Inventors: Shin-Rong Chiou, Wan-Ting Huang, Tsung-Pei Tsai
  • Patent number: 10100254
    Abstract: A liquid crystal alignment agent contains a polymer composition, a polysiloxane, and a solvent. The polymer composition is obtained by subjecting a mixture including a tetracarboxylic dianhydride component and a diamine component to a reaction. The diamine component includes first and second diamine compounds defined herein. The polysiloxane contains an epoxy-based group and a polymerizable unsaturated group defined herein. A liquid crystal display element made from the aforesaid liquid crystal alignment agent has reduced ion density.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: October 16, 2018
    Assignee: CHI MEI CORPORATION
    Inventors: Shin-Rong Chiou, Wan-Ting Huang, Tsung-Pei Tsai
  • Patent number: 10088612
    Abstract: The present invention relates to an alkali-soluble resin (A) and a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes the alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C) and an organic solvent (D). The photosensitive resin composition according to the present invention can improve the change rate of film thickness in thermal solvent and linearity of pattern with high finesse of the color filter.
    Type: Grant
    Filed: November 17, 2015
    Date of Patent: October 2, 2018
    Assignee: CHI MEI CORPORATION
    Inventors: Cheng-Chang Hsu, Bar-Yuan Hsieh
  • Patent number: 10082704
    Abstract: A liquid crystal alignment agent which is capable of forming a liquid crystal alignment film with excellent ultraviolet reliability, the liquid crystal alignment film, and a liquid crystal display element having the same are provided. The liquid crystal alignment agent includes a polymer composition (A) and a solvent (B). The polymer composition (A) is obtained by reacting a mixture, wherein the mixture includes a tetracarboxylic dianhydride component (a) and a diamine component (b). The tetracarboxylic dianhydride component (a) includes a tetracarboxylic dianhydride compound (a-1) represented by formula (1). The diamine component (b) includes a diamine compound (b-1) represented by formula (2) and a diamine compound (b-2) containing the structure represented by formula (3).
    Type: Grant
    Filed: March 28, 2016
    Date of Patent: September 25, 2018
    Assignee: Chi Mei Corporation
    Inventors: Shin-Rong Chiou, Tsung-Pei Tsai
  • Patent number: 10017635
    Abstract: A thermoplastic resin composition includes a rubber-modified polystyrene-based resin, a pentaerythritol ester compound and a fatty acid amide compound, wherein a total content of the pentaerythritol ester compound and the fatty acid amide compound is ranging from 4 parts to 8 parts by weight based on 100 parts by weight of the rubber-modified polystyrene-based resin, and a ratio of a content of the pentaerythritol ester compound to the total content of the pentaerythritol ester compound and the fatty acid amide compound is in a range of larger than 0.2 to less than 0.83.
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: July 10, 2018
    Assignee: CHI MEI CORPORATION
    Inventor: Chih-Cheng Lee
  • Publication number: 20180179312
    Abstract: A thermoplastic resin composition and a molding product made therefrom are provided in the invention. The thermoplastic resin composition includes a branched copolymer obtained from a copolymerization of an unsaturated urethane compound and a copolymerizable monomer, wherein the unsaturated urethane compound includes a compound obtained from a reaction of a compound containing three hydroxyl groups and an isocyanate compound having an unsaturated group.
    Type: Application
    Filed: November 22, 2017
    Publication date: June 28, 2018
    Applicant: Chi Mei Corporation
    Inventors: An-Kai Su, Jui-Hsi Hsu, Po-Shih Wang
  • Publication number: 20180179313
    Abstract: A thermoplastic resin composition and a molding product made therefrom are provided in the invention. The thermoplastic resin composition includes a branched copolymer obtained from a copolymerization of an unsaturated urethane compound and a copolymerizable monomer, wherein the unsaturated urethane compound includes a compound obtained from a reaction of a methacrylate compound containing a hydroxyl group and a triisocyanate cyclic compound.
    Type: Application
    Filed: November 27, 2017
    Publication date: June 28, 2018
    Applicant: Chi Mei Corporation
    Inventors: An-Kai Su, Jui-Hsi Hsu, Po-Shih Wang
  • Publication number: 20180171110
    Abstract: The invention provides a terminal-modified conjugated diene-vinyl aromatic hydrocarbon copolymer and a synthesis method and application thereof. The synthesis method of the terminal-modified conjugated diene-vinyl aromatic hydrocarbon copolymer includes producing a conjugated diene-vinyl aromatic hydrocarbon copolymer having active terminals; and reacting the conjugated diene-vinyl aromatic hydrocarbon copolymer having the active terminals with a compound represented by formula (1) to produce the conjugated diene-vinyl aromatic hydrocarbon copolymer having terminals modified by the compound represented by formula (1).
    Type: Application
    Filed: October 18, 2017
    Publication date: June 21, 2018
    Applicant: Chi Mei Corporation
    Inventors: Chia-Hon Tai, Kuan-Lin Hsieh
  • Patent number: 10000702
    Abstract: A liquid crystal alignment agent capable of forming a liquid crystal display element having good resistance to ultraviolet decay and no mura effect, a liquid crystal alignment film, and a liquid crystal display element having the same are provided. The liquid crystal alignment agent includes a polymer (A), a polysiloxane (B), a polymerizable compound (C) containing a benzophenone structure, and a solvent (D). The polymer (A) is obtained by reacting a mixture. The mixture includes a tetracarboxylic dianhydride component (a1) and a diamine component (a2). The polysiloxane (B) contains a polymerizable unsaturated group, wherein the polymerizable unsaturated group includes a group represented by formula (1-1), a group represented by formula (1-2), or a combination of the two.
    Type: Grant
    Filed: November 5, 2015
    Date of Patent: June 19, 2018
    Assignee: Chi Mei Corporation
    Inventor: Wan-Ting Huang
  • Patent number: 9976085
    Abstract: A liquid crystal alignment agent capable of forming a liquid crystal display element having good resistance to ultraviolet decay and no mura effect, a liquid crystal alignment film, and a liquid crystal display element having the same are provided. The liquid crystal alignment agent includes a polymer (A), a polysiloxane (B), a photopolymerizable compound (C), and a solvent (D). The polymer (A) is obtained by reacting a first mixture. The first mixture includes a tetracarboxylic dianhydride component (a1) and a diamine component (a2). The polysiloxane (B) is obtained by reacting a polysiloxane compound and a carboxylic acid compound (b4) having a C4 to C50 long chain. The polysiloxane compound is obtained by reacting a second mixture including a silane compound (b1) containing a polymerizable unsaturated group and a silane compound (b2) containing an epoxy group.
    Type: Grant
    Filed: November 5, 2015
    Date of Patent: May 22, 2018
    Assignee: Chi Mei Corporation
    Inventor: Wan-Ting Huang
  • Patent number: 9976088
    Abstract: A liquid crystal alignment agent of the present invention includes a polymer composition (A) synthesized by tetracarboxylic dianhydride compound (a) and diamine compound (b), and a solvent (B). The diamine compound (b) includes diamine (b-1) shown as following formula (I) and diamine (b-2): in formula (I), R1 represents a linear or branched alkyl of 1 to 6 carbons, a linear or branched hydroxyl alkyl of 1 to 6 carbons, an alkoxy of 1 to 6 carbons, an alkylthio of 1 to 6 carbons, a halogen atom, an amino group or a nitro group; R2 represents a methylene group, a divalent alkyl of 2 to 10 carbons, a divalent alkenyl of 2 to 7 carbons or a divalent alkynyl of 2 to 6 carbons; and a represents an integer of 0 to 3.
    Type: Grant
    Filed: July 11, 2016
    Date of Patent: May 22, 2018
    Assignee: CHI MEI CORPORATION
    Inventor: Shin-Rong Chiou
  • Patent number: 9939568
    Abstract: The present invention relates to a photosensitive resin composition for a color filter and an application of the same. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), an organic solvent (D) and a pigment (E). The alkali-soluble resin (A) includes a first alkali-soluble resin (A-1) having the structure represented by formula (1). The aforementioned photosensitive resin composition is advantageously applied for the color filer with better contrast.
    Type: Grant
    Filed: May 6, 2016
    Date of Patent: April 10, 2018
    Assignee: Chi Mei Corporation
    Inventors: Jung-Pin Hsu, Bo-Hsuan Lin
  • Patent number: 9932428
    Abstract: A thermoplastic resin composition and a molding product made therefrom are provided. The thermoplastic resin composition includes a branched copolymer obtained from a copolymerization of a urethane compound and a copolymerizable monomer, wherein the urethane compound is obtained from reaction of a (meth)acrylate compound containing hydroxyl group and a triisocyanate compound.
    Type: Grant
    Filed: June 8, 2016
    Date of Patent: April 3, 2018
    Assignee: Chi Mei Corporation
    Inventors: Chia-Hon Tai, Po-Shih Wang, Chen-Dao Wu, Jui-Hsi Hsu
  • Publication number: 20180072839
    Abstract: A resin composition for an optical material contains a thiol compound and an isocyanate compound. The thiol compound includes a trithiol compound and a tetrathiol compound, and based on 100% of the total mole equivalent of the thiol group of the thiol compound, the total mole equivalent of the thiol group of the trithiol compound is fro 85% to 95%, and the total mole equivalent of the thiol group of the tetrathiol compound is from 5% to 15%. The isocyanate compound includes dicyclohexylmethane diisocyanate, and based on 100% of the total mole equivalent of the isocyanate group of the isocyanate compound, the total mole equivalent of the isocyanate group of the dicyclohexylmethane diisocyanate is from 90% to 100%.
    Type: Application
    Filed: August 20, 2017
    Publication date: March 15, 2018
    Applicant: Chi Mei Corporation
    Inventors: Hsiu-Mei Wu, Yi-Hsiu Huang, Chan-Li Hsueh
  • Patent number: 9897729
    Abstract: The present invention relates to a photosensitive resin composition for color filter and application thereof. The aforementioned photosensitive resin composition includes an alkali-soluble resin (A), a compound having a vinyl unsaturated group (B), a photo-initiator (C), an organic solvent (D), and a pigment (E). The alkali-soluble resin (A) is obtained by copolymerizing a vinyl unsaturated monomer having a carboxylic group (a1), a vinyl unsaturated monomer having a silane group (a2), a vinyl unsaturated monomer having an oxetanyl group (a3) and an other copolymerizable vinyl unsaturated monomer (a4).
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: February 20, 2018
    Assignee: CHI MEI CORPORATION
    Inventors: Bar-Yuan Hsieh, Jung-Pin Hsu
  • Patent number: 9884991
    Abstract: A phosphor is disclosed, including a formula of A3-aCeaQ5-eEeO12. The A, the Q and the E independently comprise elements aluminum (Al), gallium (Ga), indium (In), scandium (Sc), yttrium (Y), lanthanum (La), gadolinium (Gd), terbium (Tb), lutetium (Lu), or a combination thereof. Ce is cerium. O is oxygen. 0<a?3. 0?e?5. A diameter distribution span of the phosphor is less than 0.7.
    Type: Grant
    Filed: October 23, 2014
    Date of Patent: February 6, 2018
    Assignee: CHI MEI CORPORATION
    Inventors: Szu-Chun Yu, Jen-Shrong Uen
  • Publication number: 20180004086
    Abstract: A negative photosensitive resin composition including an alkali-soluble resin (A), a compound (B) containing an ethylenically-unsaturated group, a photoinitiator (C), a solvent (D), and a silicone compound (E) is provided. The silicone compound (E) contains the structure represented by formula (E-1). The negative photosensitive resin composition has good sputtering resistance, by using the negative photosensitive resin composition, the issue of poor sputtering resistance of the spacer or a protective film formed by the negative photosensitive resin composition can be solved.
    Type: Application
    Filed: June 20, 2017
    Publication date: January 4, 2018
    Applicant: Chi Mei Corporation
    Inventors: I-kuang Chen, Hao-Wei Liao
  • Patent number: 9856416
    Abstract: The present invention provides a phosphor, including a constituent having the formula CapSrqMmAaBbOtNn:Zr, in which M selected from the group consisting of magnesium, barium, beryllium and zinc; A selected from the group consisting of aluminum, gallium, indium, scandium, yttrium, lanthanum, gadolinium and lutetium; B selected from the group consisting of silicon, germanium, tin, titanium, zirconium and hafnium; Z selected from the group consisting of europium and cerium; 0<p<1; 0?q<1; 0?m<1; 0?t?0.3; 0.00001?r?0.1; a=1, 0.8?b?1.2; and 2.7?n?3.1. Moreover, the normalized dissolved content of calcium of the phosphor is 1˜25 ppm, thereby obtaining a phosphor of high brilliance in the 600˜680 nm region. In addition, the present invention at the same time provides a high brilliance light emitting device.
    Type: Grant
    Filed: June 13, 2011
    Date of Patent: January 2, 2018
    Assignee: Chi-Mei Corporation
    Inventors: Yuan-Ren Juang, Jen-Shrong Uen, Chih-Lung Lin
  • Patent number: 9851638
    Abstract: The invention relates to a photosensitive polysiloxane composition and a thin film formed by the aforementioned photosensitive polysiloxane composition. The thin film is a planarization film of a TFT substrate, an interlayer insulating film or an overcoat of a core material or a protective material in a waveguide. The invention is to provide a photosensitive polysiloxane composition having excellent surface flatness and high tapered angle of a pattern. The photosensitive polysiloxane composition comprises a polysiloxane (A), an o-naphthoquinone diazide sulfonic acid ester (B), an alkali-soluble resin containing a silyl group (C) and a solvent (D).
    Type: Grant
    Filed: October 6, 2016
    Date of Patent: December 26, 2017
    Assignee: CHI MEI CORPORATION
    Inventors: Wei-Jie Huang, Chun-An Shih
  • Publication number: 20170358745
    Abstract: A light-emitting material, a method for producing the light-emitting material and a display apparatus are provided. An average particle size of the light-emitting material is 0.1 ?m to 30 ?m, and an average distance between outermost quantum dots of a particle of the light-emitting material and a surface of the particle of the light-emitting material is 0.5 nm to 25 nm, or a minimum distance between the outermost quantum dots of a particle of the light-emitting material and the surface of the particle of the light-emitting material is 0.1 nm to 20 nm.
    Type: Application
    Filed: June 7, 2017
    Publication date: December 14, 2017
    Applicant: Chi Mei Corporation
    Inventors: Yuan-Ren Juang, Szu-Chun Yu, Jen-Shrong Uen