Abstract: Cache memory for resistive switching memory modules is provided herein. The cache memory can reside on a separate DIMM from the resistive switching memory, in some embodiments, or can share a common DIMM with the resistive switching memory. Cache management protocols are provided to service read and write policies for managing interaction of data between the cache memory and the resistive switching memory. In various embodiments, memory controllers are optimized for physical characteristics of resistive switching memory, and cache management protocols can be implemented to take advantage of these characteristics.

Abstract: A configuration bit for a switching block routing array comprising a non-volatile memory cell is provided. By way of example, the configuration bit and switching block routing array can be utilized for a field programmable gate array, or other suitable circuit(s), integrated circuit(s), application specific integrated circuit(s), electronic device or the like. The configuration bit can comprise a switch that selectively connects or disconnects a node of the switching block routing array. A non-volatile memory cell connected to the switch can be utilized to activate or deactivate the switch. In one or more embodiments, the non-volatile memory cell can comprise a volatile resistance switching device connected in serial to a gate node of the switch, configured to trap charge at the gate node to activate the switch, or release the charge at the gate node to deactivate the switch.

Abstract: Two-terminal memory devices can be formed in part within a dielectric material that is electrically insulating and operates as a blocking layer to mitigate diffusion of metal particles employed in integrated circuit fabrication. This dielectric material can be protected from other fabrication processes corrosive to the dielectric material (e.g., CMP, HF clean, etc) by a silicon containing liner. Use of the silicon containing liner can enable a minimum thickness of the dielectric material to be preserved and can facilitate step height differences between adjacent material surfaces that form a two-terminal memory device to be on the order of less than about five angstroms. This small step height difference, particularly when underlying a switching layer of the two-terminal memory device, can yield excellent switching characteristics.

Abstract: Various embodiments disclosed herein provide for a neuromorphic logic system, comprising a bitline and a set of wordlines. The neuromorphic logic system also includes a set of resistive switching memory cells, respectively comprising a two-terminal volatile switching device and a two-terminal non-volatile memory device, at each intersection between the bit line and the set of wordlines, wherein the set of resistive switching memory cells are programmed to a set of resistive states and receive a voltage on the bitline above an activation threshold and wherein the magnitude of the voltage applied to the bitline corresponds to a magnitude of a sensory input, resulting in a current that corresponds to the magnitude of the sensor input and the set of resistive states.

Abstract: Providing for improved manufacturing of silver-based electrodes to facilitate formation of a robust metallic filament for a resistive switching device is disclosed herein. By way of example, a silver electrode can be embedded with a non-silver material to reduce surface energy of silver atoms of a silver-based conductive filament, increasing structural strength of the conductive filament within a resistive switching medium. In other embodiments, an electrode formed of a base material can include silver material to provide mobile particles for an adjacent resistive switching material. The silver material can drift or diffuse into the resistive switching material to form a structurally robust conductive filament therein.

Abstract: Two-terminal memory can be formed into a memory array that contains many discrete memory cells in a physical and a logical arrangement. Where each memory cell is isolated from surrounding circuitry by a single transistor, the resulting array is referred to as a 1T1R memory array. In contrast, where a group of memory cells are isolated from surrounding circuitry by a single transistor, the result is a 1TnR memory array. Because memory cells of a group are not isolated among themselves in the 1TnR case, bit disturb effects are theoretically possible when operating on a single memory cell. Read operations are disclosed for two-terminal memory devices configured to mitigate bit disturb effects, despite a lack of isolation transistors among memory cells of an array. Disclosed operations can facilitate reduced bit disturb effects even for high density two-terminal memory cell arrays.

Abstract: A logical NAND memory architecture comprising two-terminal, non-volatile resistive memory is disclosed. By way of example, disclosed logical NAND architectures can comprise non-volatile memory cells having approximately 4F2 area. This facilitates very high memory densities, even for advanced technology nodes. Further, the disclosed architectures are CMOS compatible, and can be constructed among back-end-of-line (BEOL) metal layers of an integrated chip. In some embodiments, subsets of two-terminal memory cells in a NAND array can be constructed between different pairs of BEOL metal layers. In other embodiments, the two-terminal memory cells can be constructed between a single pair of BEOL metal layers.

Abstract: One potential result of differing characteristics for certain two-terminal memory (TTM) is that memory management techniques, such as logical-to-physical (L2P), can differ as well. Previous memory management techniques do not adequately leverage the advantages associated with TTM. For example, by identifying and leveraging certain advantageous characteristics of TTM, L2P tables can be designed to be smaller and more efficient, which can allow the L2P table to be stored in memory that is faster and/or closer (or integrated into) an associated controller. Moreover, other memory management operations such as wear-leveling, recovery from power loss, and so forth, can be more efficient.

Abstract: A non-volatile programmable circuit configurable to perform logic functions, is provided. The programmable circuit can employ two-terminal non-volatile memory devices to store information, thereby mitigating or avoiding disturbance of programmed data in the absence of external power. Two-terminal resistive switching memory devices having high current on/off ratios and fast switching times can also be employed for high performance, and facilitating a high density array. For look-up table applications, input/output response times can be several nanoseconds or less, facilitating much faster response times than a memory array access for retrieving stored data.

Abstract: A retainer node circuit is provided that can retain state information of a volatile circuit element (e.g., a flip-flop, latch, switch, register, etc.) of an electronic device for planned or unplanned power-down events. The retainer node circuit can include a resistive-switching memory cell that is nonvolatile, having very fast read and write performance. Coupled with power management circuitry, the retainer node circuit can be activated to receive and store a signal (e.g., bit) output by the volatile circuit element, and activated to output the stored signal. Various embodiments disclose non-volatile retention of state information for planned shut-down events as well as unplanned shut-down events. With read and write speeds in the tens of nanoseconds, sleep mode can be provided for volatile circuit elements between clock cycles of longer time-frame applications, enabling intermittent power-down events between active periods. This enables reduction in power without loss of activity for an electronic device.

Abstract: Providing for a memory device having a resistive switching memory integrated within backend layers of the memory device is described herein. By way of example, the resistive switching memory can be embedded memory such as cache, random access memory, or the like, in various embodiments. The resistive memory can be fabricated between various backend metallization schemes, including backend copper metal layers and in part utilizing one or more damascene processes. In some embodiments, the resistive memory can be fabricated in part with damascene processes and in part with subtractive etch processing, utilizing four or fewer photo-resist masks. Accordingly, the disclosure provides a relatively low cost, high performance embedded memory compatible with a variety of fabrication processes of integrated circuit foundries.

Abstract: A memory cell that includes a first metal layer formed over a substrate is provided. The substrate includes one or more complementary metal-oxide semiconductor devices. The memory cell also includes a via device that connects at least a portion of the first metal layer and at least another portion of a second metal layer. The first metal layer has a first thickness having an edge thereof that serves as an electrode for a memory cell formed by the via device. The memory cell scales as a function of the first thickness and at least in part independent of a minimum feature size of the memory device.

Abstract: One potential result of differing characteristics for certain two-terminal memory (TTM) is that memory management techniques, such as logical-to-physical (L2P), can differ as well. Previous memory management techniques do not adequately leverage the advantages associated with TTM. For example, by identifying and leveraging certain advantageous characteristics of TTM, L2P tables can be designed to be smaller and more efficient. Moreover, other memory management operations such as wear-leveling, recovery from power loss, and so forth, can be more efficient.

Abstract: Providing for a multi-bank memory with bank-specific status feedback is described herein. By way of example, the multi-bank memory can be configured to output an availability status, pass/fail status, error correction status, or the like, for subsets of multiple memory banks. In some embodiments, the non-volatile memory can provide global status information, representing a status of all banks commonly in conjunction with bank-specific status information. Further, the subject disclosure provides addressing techniques for identifying particular banks of memory, and obtaining status information for subsets of the memory banks, or performing memory operations on targeted subsets of the memory banks.

Abstract: A resistive switching device. The device includes a first electrode comprising a first metal material overlying the first dielectric material and a switching material comprising an amorphous silicon material. The device includes a second electrode comprising at least a second metal material. In a specific embodiment, the device includes a buffer material disposed between the first electrode and the switching material. The buffer material provides a blocking region between the switching material and the first electrode so that the blocking region is substantially free from metal particles from the second metal material when a first voltage is applied to the second electrode.

Abstract: A non-volatile memory device is provided that uses one or more volatile elements. In some embodiments, the non-volatile memory device can include a resistive two-terminal selector that can be in a low resistive state or a high resistive state depending on the voltage being applied. A MOS (“metal-oxide-semiconductor”) transistor in addition to a capacitor or transistor acting as a capacitor can also be included. A first terminal of the capacitor can be connected to a voltage source, and the second terminal of the capacitor can be connected to the selector device. A floating gate of an NMOS transistor can be connected to the other side of the selector device, and a second NMOS transistor can be connected in series with the first NMOS transistor.

Abstract: A first architecture for a volatile resistive-switching device with a selector layer (e.g., a highly resistive layer such as a resistive switching medium) non-planar surfaces is detailed. For example, the selector layer can have a first surface that intersects a second surface at an angle (e.g., oblique angle). The angle can be adjusted to control current-voltage response for the volatile resistive-switching device. A second architecture for volatile resistive-switching device with a first terminal having a high particle diffusivity and a second terminal having a low particle diffusivity. The second architecture can provide diode-like current-voltage responses at a sizes (e.g., sub-20 nanometers) in which conventional diodes do not scale.

Abstract: Providing for a configuration cells for junction nodes of a field programmable gate array (FPGA) is described herein. By way of example, a configuration cell can comprise non-volatile resistive switching memory to facilitate programmable storage of data as an input to a control circuit of a junction node. The control circuit can activate or deactivate a junction node of the FPGA in response to a value of the data stored in the non-volatile resistive switching memory. The control circuit can comprise an SRAM circuit for fast operation of the junction node. Moreover, the non-volatile memory of the configuration cell facilitates fast power-up of the control circuit utilizing data stored in the resistive switching memory, and minimizes power consumption associated with storing the data.

Abstract: A detection circuit that can detect a two-terminal memory cell changing state. For example, in response to electrical stimuli, a memory cell will change state, e.g., to a defined higher resistance state or a defined lower resistance state. Other, techniques do not detect this state change until after the stimuli is completed and a subsequent sensing operation (e.g., read pulse) is performed. The detection circuit can detect the state change during application of the electrical stimuli that cause the state change and can do so by comparing the magnitudes or values of two particular current parameters.

Abstract: A method for forming a resistive switching device. The method includes providing a substrate having a surface region and forming a first dielectric material overlying the surface region. A first wiring structure is formed overlying the first dielectric material. The method forms one or more first structure comprising a junction material overlying the first wiring structure. A second structure comprising a stack of material is formed overlying the first structure. The second structure includes a resistive switching material, an active conductive material overlying the resistive switching material, and a second wiring material overlying the active conductive material. The second structure is configured such that the resistive switching material is free from a coincident vertical sidewall region with the junction material.