Patents Assigned to HITACHI HIGH-TECH CORPORATION
  • Patent number: 11955327
    Abstract: The present invention implements an ion detector with which it is possible to avoid direct collisions of negative ions with a scintillator, prevent degradation of the scintillator, prolong life of the scintillator, reduce the need for maintenance, and perform highly sensitive detection of both positive and negative ions. With respect to a reference line 65 connecting a central point 63 of a positive ion CD 52 and a central point 64 of a counter electrode 54, a central point 66 of a negative ion CD 53 is provided in a region of a side opposite to a region of a side of a central point 67 of a scintillator 56. Positive ions entering from an ion entrance 62 receive a deflection force and collide with the positive ion CD 52 to generate secondary electrons. The generated secondary electrons collide with the scintillator 56 to generate light. The generated light passes through a light guide 59 and is detected by a photomultiplier tube 58. A negative potential barrier is generated along the reference line 65.
    Type: Grant
    Filed: January 22, 2020
    Date of Patent: April 9, 2024
    Assignee: Hitachi High-Tech Corporation
    Inventors: Kiyomi Yoshinari, Masuyuki Sugiyama, Yuichiro Hashimoto, Shin Imamura
  • Patent number: 11953461
    Abstract: An electrode formed by molding a semiconductor device with resin. The electrode comprises: a first resin mold portion formed on a front surface of the semiconductor device and having a first thickness (t1); a second resin mold portion formed on a back surface of the semiconductor device and having a second thickness (t2) greater than the first thickness; and an exposed portion formed in a part of the first resin mold portion corresponding to an end of the semiconductor device.
    Type: Grant
    Filed: April 8, 2019
    Date of Patent: April 9, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Ukyo Ikeda, Tetsuyoshi Ono, Hiroki Nakatsuchi, Masafumi Miyake
  • Patent number: 11953508
    Abstract: An automatic analysis device includes a processing unit 3 which performs the treatment on a specimen before analysis of the specimen, supply equipment which supplies a reagent to a reaction vessel 11 disposed in the processing unit 3, a liquid temperature adjusting unit 1 which adjusts a temperature of the reagent supplied to the reaction vessel 11 by the supply equipment, a control unit 201, and a first temperature detection unit 4 which detects at least one temperature of a temperature of the air within the processing unit 3 and a temperature of the reagent supplied to the reaction vessel 11, in which the liquid temperature adjusting unit 1 and the control unit 201 execute temperature adjustment of the reagent based on a first temperature detected by the first temperature detection unit 4.
    Type: Grant
    Filed: October 9, 2019
    Date of Patent: April 9, 2024
    Assignee: Hitachi High-Tech Corporation
    Inventors: Sunao Funakoshi, Takenori Okusa, Nobuyuki Isoshima, Koki Yokoyama
  • Patent number: 11953509
    Abstract: The automatic analyzer includes a housing unit capable of housing a plurality of reagent bottles each of which has an IC tag on one surface of short-side side surfaces thereof, an antenna used to communicate with the IC tag, a detector that detects the presence or absence of a reagent bottles, and a control unit. The housing unit includes a housing container cooled by a cooling machine, a heat insulating material, a reagent tray provided with a plurality of reagent bottle holding portions that hold the reagent bottles, a disk rotatably holding the reagent tray, and a driving unit driving the disk, and when it is unable to communicate with the IC tag of the reagent bottle installed in the reagent bottle holding portion where the reagent bottle is detected by the detector, the control unit determines that the reagent bottle is installed in a reverse direction.
    Type: Grant
    Filed: January 20, 2020
    Date of Patent: April 9, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yudai Fukushi, Ryosuke Funahashi
  • Patent number: 11953513
    Abstract: An automated analyzer is provided that includes a sample probe for dispensing a substance to be dispensed into a plurality of reaction vessels for causing a sample to be analyzed to react with a reagent, a measurement unit (e.g., light source, spectrophotometer, and control device) for measuring a reaction liquid produced from the sample and reagent in a reaction vessel, a cleaning tank for probe cleaning, and a control device for controlling the operation of the probe, measurement unit, and cleaning tank. The cleaning tank includes a cleaning pool for storing cleaning water for immersing and cleaning the probe and a drying tank for sucking up the cleaning water on the surface of the probe after the probe has been immersed in the cleaning water of the cleaning water pool and cleaned. As a result, it is possible to reduce the amount of cleaning water used to clean the probe.
    Type: Grant
    Filed: September 20, 2019
    Date of Patent: April 9, 2024
    Assignee: Hitachi High-Tech Corporation
    Inventors: Yudai Fukushi, Takamichi Mori
  • Patent number: 11946858
    Abstract: The purpose of the present invention is to allow a clean airflow around a substrate to reliably move downward of the substrate in an examination device in which clean air is supplied to an inspection chamber. This examination device is provided with a rectifying plate (see FIG. 4A) which covers a part of the upper surface of a stage for mounting a substrate, and is disposed between a gas supply unit and the stage to block an airflow toward the substrate.
    Type: Grant
    Filed: October 7, 2019
    Date of Patent: April 2, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yoshihiro Satou, Toshio Masuda, Hitoshi Matsuno, Kei Shibayama, Osamu Yoshimura, Yuichirou Iijima
  • Patent number: 11946941
    Abstract: The automatic analysis device 100 is provided with: a specimen dispensing mechanism 101 that dispenses subject blood plasma and/or normal blood plasma to be added to correct the coagulation time of the subject blood plasma, into a plurality of specimen containers 103; reaction containers 104 that contain the subject blood plasma and/or the normal blood plasma; a reagent dispensing mechanism 106 that dispenses a reagent into the reaction containers 104; and a detecting unit 113 which applies light from a light source 115 to the subject blood plasma and/or the normal blood plasma to which the reagent is added in the reaction containers 104, and which measures the coagulation time on the basis of the obtained scattered light and/or transmitted light.
    Type: Grant
    Filed: June 26, 2020
    Date of Patent: April 2, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Chie Yabutani, Naoto Suzuki, Akihisa Makino
  • Patent number: 11947703
    Abstract: Provided are a program and personal information protection method which are executed by a system which is operated by a medical practitioner, said program and method comprising: a display process of causing a monitor part 2 to display an examination result screen 3 including personal information which identifies a subject; an identification process of identifying the personal information in the examination result screen 3 which is displayed in the display process; and an invalidation process of invalidating the personal information identified in the identification process in a captured image which includes the examination result screen 3. Instances of personal information being displayed in error to outside users are thus reduced in comparison to the prior art, and sharing of examination result information is implemented smoothly.
    Type: Grant
    Filed: August 28, 2019
    Date of Patent: April 2, 2024
    Assignee: Hitachi High-Tech Corporation
    Inventors: Masaharu Nishida, Hitoshi Ohtake, Isao Yamazaki
  • Patent number: 11948776
    Abstract: A plasma processing apparatus adapted to reduce non-uniformity of plasma distribution in a process chamber and to adjust the plasma distribution to “centrally high density”, “circumferentially high density”, or “uniform density” in accordance with a desired etching process, a process chamber; a radio frequency power source; a rectangular waveguide; and a circular waveguide connected to the rectangular waveguide, in which the rectangular waveguide includes an upper rectangular waveguide and a lower rectangular waveguide formed by vertically dividing the rectangular waveguide; and a cutoff section which cuts off the microwave frequency power and which has a dielectric body. The circular waveguide includes an inner waveguide connected to the upper rectangular waveguide and formed inside; and an outer waveguide connected to the lower rectangular waveguide and formed on an outer side of the inner waveguide. The cutoff section has a width narrower than those of the rectangular waveguides except the cutoff section.
    Type: Grant
    Filed: January 21, 2021
    Date of Patent: April 2, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Chen Pin Hsu, Hitoshi Tamura
  • Publication number: 20240096599
    Abstract: In order to execute stable processing by suppressing plasma diffusion and non-stationary discharge generation, there is provided a plasma processing device which includes a processing chamber in which a sample stage is provided for placing a sample thereon, an exhaust unit for evacuating the processing chamber, a magnetic field forming mechanism for forming a magnetic field in the processing chamber, and a power supply unit that supplies radio frequency power for generating plasma to the inside of the processing chamber evacuated by the exhaust unit and has the magnetic field formed by the magnetic field forming mechanism. The processing chamber includes a shielding section which divides an inner part of the processing chamber into a first area at a side for supplying the radio frequency power from the power supply unit and a second area at a side where the sample stage is disposed.
    Type: Application
    Filed: February 8, 2021
    Publication date: March 21, 2024
    Applicant: Hitachi High-Tech Corporation
    Inventors: Koichi Takasaki, Taku Iwase
  • Publication number: 20240094134
    Abstract: In an automatic analyzer, an influence due to a disturbance component on a measurement result can be appropriately prevented. An automatic analyzer 1 includes: a first light source 102 configured to emit light toward a sample 44; a drive circuit 101 configured to supply a first drive current I3 whose frequency changes from f1 to f2 intermittently or continuously to the first light source 102; a light receiver 113 configured to output a light detection signal IR based on the light transmitted through the sample 44; and a signal processing circuit 111 configured to demodulate the light detection signal IR in accordance with the frequency f1 to f2 of the first drive current I3 and output a measurement signal VL based on a demodulation result.
    Type: Application
    Filed: December 13, 2021
    Publication date: March 21, 2024
    Applicant: HITACHI HIGH-TECH CORPORATION
    Inventors: Hikaru Karo, Kenichi Nishigaki
  • Publication number: 20240094160
    Abstract: Problem Provided is an electrolyte analyzer that allows reducing a load of a user in a replacement work compared with conventional one. Solution An electrolyte analyzer includes an ISE electrode 1 that includes at least one electrode, a reference electrode 2 that includes at least one electrode different from the ISE electrode 1, and a housing 200 that houses the electrodes of the ISE electrode 1 and the reference electrode 2. The housing 200 includes a pressing unit that presses the electrodes to one another, a first press switching unit 210 that switches the ISE electrode 1 between a secured state and a released state, and a second press switching unit 215 that switches the reference electrode 2 between a secured state and a released state. The ISE electrode 1 and the reference electrode 2 are each switched between the secured state and the released state. Selected Drawing: FIG.
    Type: Application
    Filed: December 7, 2021
    Publication date: March 21, 2024
    Applicant: Hitachi High-Tech Corporation
    Inventors: Takushi MIYAKAWA, Taichiro YAMASHITA
  • Patent number: 11933801
    Abstract: The present invention provides a transport device and a specimen analysis system including the transport device that reduce the pulsation of thrust for moving an object to be transported, reduce vibration of the object to be transported during transport, and realize stable transport. The transport device of the present invention includes a first electromagnet unit including a first tooth made of a magnetic body, a first core connected to the first tooth and made of a magnetic body, and a first winding formed around the first core; a second electromagnet unit including a second tooth installed adjacent to the first electromagnet unit and made of a magnetic body, a second core connected to the second tooth and made of a magnetic body, a second winding formed around the second core; and a magnetic coupling unit made of a magnetic body between the first tooth of the first electromagnet unit and the second tooth of the second electromagnet unit.
    Type: Grant
    Filed: November 10, 2020
    Date of Patent: March 19, 2024
    Assignee: Hitachi High-Tech Corporation
    Inventors: Yasuaki Aoyama, Ryosuke Hoshi, Satoru Kaneko, Hiroyuki Kobayashi, Takeshi Tamakoshi, Hiroshi Watanabe, Katsuhiro Kambara, Kuniaki Onizawa
  • Patent number: 11933804
    Abstract: In a case where a dispensing tip is imaged from below, liquid attached to the tip falls downward and contaminates an imaging mechanism. An automatic analyzer includes: a buffer that has a hole for holding a tip for dispensing, the hole passing through the tip; a probe for dispensing having a tip to which the tip is attached; an imaging unit that images the tip; and a controller that controls the tip such that the tip is mounted on the probe by pressing the probe against the tip that passes through the hole to be held by the buffer, in which the imaging unit is disposed to image the tip from an upper side to a lower side in a gravity direction.
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: March 19, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Takahiro Kumagai, Kazuhiro Noda, Yukinori Sakashita
  • Patent number: 11933802
    Abstract: There is provided an automatic analysis device with a structure in which a measurement unit is less susceptible to disturbance as compared to a device in the related art, and a method of designing the automatic analysis device. A first rotation axis 301 of a reaction disk 1, a second rotation axis 302 of a reagent disk 9, and a measurement unit are arranged on the same straight line 311 when an automatic analysis device 100 is viewed from an upper surface side, the first rotation axis 301 of the reaction disk 1 is arranged between the second rotation axis 302 of the reagent disk 9 and the measurement unit, and the measurement unit is arranged on a front side to be accessed by a user of the automatic analysis device 100.
    Type: Grant
    Filed: March 5, 2020
    Date of Patent: March 19, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Akihiro Yasui, Takeshi Setomaru, Akinori Kiyokawa, Masashi Fukaya
  • Patent number: 11933803
    Abstract: Provided is an automated analysis device capable of a more accurate determination of the sizes of bubbles included in a liquid. The automated analysis device includes a detection unit which detects bubbles included in a liquid, an internal standard solution syringe which executes a first liquid supply operation in which a liquid is supplied via the detection unit, a diluent syringe, a sipper syringe, solenoid valves, and a control device which determines whether the size of the bubbles detected during the first liquid supply operation is normal or not based on the operation speed of the liquid supply unit, and controls the operation of the liquid supply unit according to the determination.
    Type: Grant
    Filed: March 10, 2020
    Date of Patent: March 19, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Akinao Fujita, Takushi Miyakawa, Tetsuji Kawahara
  • Patent number: 11927032
    Abstract: An automated analysis device is provided with a casing accommodating an analysis device. A cover is axially supported with freedom to pivot, between a closed position and an upwardly-open open position, about a support shaft provided at one side of the casing. A closing device is capable of inhibiting opening of the cover in the closed position, and is provided with a projecting portion that protrudes from a front surface of the cover toward the rear, a lock lever which is axially supported with freedom to pivot about a pivoting support shaft, and which pivots from the work surface in a direction approaching the projecting portion to engage with the projection portion, thereby inhibiting opening of the cover. A safety cover can thus be locked securely.
    Type: Grant
    Filed: February 13, 2019
    Date of Patent: March 12, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Taichiro Yamashita, Takenori Okusa, Susumu Sakairi
  • Patent number: 11928801
    Abstract: With respect to a charged particle beam apparatus, provided is a technology capable of preventing a deterioration in image quality of a captured image. The charged particle beam apparatus includes an imaging device that irradiates a sample with a charged particle beam and forms an image from information of the sample and a computer. The computer stores each of images (scanned images) obtained by scanning the same area multiple times, classifies each of images into an image including a deteriorated image and an image not including the deteriorated image, and stores a target image obtained by performing image integration from the image not including the deteriorated image. The charged particle beam apparatus includes a database that stores data such as information obtained from an imaging device including the scanned image, classification results, and the target image.
    Type: Grant
    Filed: April 18, 2019
    Date of Patent: March 12, 2024
    Assignee: Hitachi High-Tech Corporation
    Inventor: Ryo Komatsuzaki
  • Patent number: 11929231
    Abstract: A charged particle beam device suppresses sample deformation caused by placing a sample on a suctioning surface of an electrostatic chuck mechanism, the sample having a temperature different from the suctioning surface. The charged particle beam device includes the electrostatic chuck mechanism; a stage (200) which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam; an insulating body (203) which is disposed on the stage and constitutes a dielectric layer of the electrostatic chuck; a first support member (402) which supports the insulating body on the stage; a ring-shaped electrode (400) which encloses the surroundings of the sample and is installed on the insulating body in a contactless manner, and to which a predetermined voltage is applied; and a second support member (405) which supports the ring-shaped electrode.
    Type: Grant
    Filed: April 20, 2022
    Date of Patent: March 12, 2024
    Assignee: Hitachi High-Tech Corporation
    Inventors: Akito Tanokuchi, Seiichiro Kanno, Kei Shibayama
  • Patent number: 11929230
    Abstract: A large current electron beam is stably emitted from an electron gun of a charged particle beam device. The electron gun of the charged particle beam device includes: a SE tip 202; a suppressor 303 disposed rearward of a distal end of the SE tip; a cup-shaped extraction electrode 204 including a bottom surface and a cylindrical portion and enclosing the SE tip and the suppressor; and an insulator 208 holding the suppressor and the extraction electrode. A shield electrode 301 of a conductive metal having a cylindrical portion 302 is provided between the suppressor and the cylindrical portion of the extraction electrode. A voltage lower than a voltage of the SE tip is applied to the shield electrode.
    Type: Grant
    Filed: April 18, 2019
    Date of Patent: March 12, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Keigo Kasuya, Akira Ikegami, Kazuhiro Honda, Masahiro Fukuta, Takashi Doi, Souichi Katagiri, Aki Takei, Soichiro Matsunaga