Patents Assigned to HITACHI HIGH-TECH CORPORATION
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Patent number: 11894213Abstract: An ion milling device capable of high-speed milling is realized even for a specimen containing a material having an imide bond. Therefore, the ion milling device includes: a vacuum chamber 6 configured to hold a specimen 3 in a vacuum atmosphere; an ion gun 1 configured to irradiate the specimen with a non-focused ion beam 2; a vaporization container 17 configured to store a mixed solution 13 of a water-soluble ionic liquid and water; and nozzles 11, 12 configured to supply water vapor obtained by vaporizing the mixed solution to a vicinity of a surface of the specimen processed by the ion beam.Type: GrantFiled: June 22, 2018Date of Patent: February 6, 2024Assignee: Hitachi High-Tech CorporationInventors: Asako Kaneko, Hisayuki Takasu
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Patent number: 11892706Abstract: An observation device captures images at focal positions inside a sample container with an optical system that includes an objective lens; an objective lens actuator; an irradiation unit; a reflection light intensity detector; a focus controller that positions the focal point of the objective lens on a reflection surface imparting a peak in the reflected light intensity; and a counting unit. The focus control unit drives the objective lens actuator and positions the focal point on a reflection surface when a peak is detected in the reflected light intensity; and the counting unit counts the reflection surface when the focus control unit has positioned the focal point on the reflection surface. The computation unit determines whether or not the focal point is positioned at the focal position, and causes the optical system to capture images if the focal point is positioned at the focal position.Type: GrantFiled: June 20, 2018Date of Patent: February 6, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Akira Masuya, Tadao Yabuhara, Hiroko Fujita
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Publication number: 20240036052Abstract: The present invention provides a cancer test method and a cancer test system for evaluating cancer in a subject. Specifically, the present invention provides a method for testing cancer in a subject, including: preparing a database that has stored a marker panel on which information of multiple cancer markers with respect to multiple healthy subjects and cancer patients is registered, the database including discrimination information that classifies a measured value of each cancer marker, into any of three groups: within the reference range, higher than the reference range, and lower than the reference range; analyzing, with respect to measured values of one or more cancer markers of the subject, and evaluating cancer in the subject on the basis of a result of the analysis.Type: ApplicationFiled: September 9, 2020Publication date: February 1, 2024Applicant: HITACHI HIGH-TECH CORPORATIONInventors: Minoru Sakairi, Mayumi Abe, Takashi Ishigaki
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Publication number: 20240033741Abstract: The present invention provides a thermal cycler capable of rapidly and efficiently heating and cooling a reaction liquid. The thermal cycler according to the present invention comprises: a temperature control block where a reaction vessel can be installed, a thermoelectric conversion unit capable of heating and cooling, a temperature sensor that measures the temperature of the temperature control block, an insulating substrate that is in contact at one surface with the thermoelectric conversion unit, and a heat radiating unit that is provided on the other surface of the insulating substrate and serves for discharging the heat of the thermoelectric conversion unit to the outside, wherein the temperature control block is heated and cooled by controlling a current or voltage supplied to the thermoelectric conversion unit on the basis of the temperature of the temperature adjustment block measured by the temperature sensor.Type: ApplicationFiled: December 18, 2020Publication date: February 1, 2024Applicant: Hitachi High-Tech CorporationInventors: Nobuyuki ISOSHIMA, Tatsuya KOBARI, Masashi SHIBAHARA, Toshiki YAMAGATA, Yoko MAKINO, Wataru SATOH
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Patent number: 11887814Abstract: Provided is a plasma processing method capable of improving an etching selectivity of a material to be etched with respect to a mask material and reducing a roughness of a side wall of a mask pattern. The plasma processing method of selectively depositing a deposition film on the mask material with respect to the material to be etched includes controlling an etching parameter so that an incubation time of the mask material is shorter than an incubation time of the material to be etched.Type: GrantFiled: February 10, 2020Date of Patent: January 30, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Mamoru Yakushiji, Kenichi Kuwahara, Masaaki Taniyama
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Patent number: 11885824Abstract: An automatic analyzer keeps the inside of a reagent cooler that stores a reagent vessel clean. The automatic analyzer includes: a reagent cooler that stores a reagent vessel containing a reagent to be reacted with a sample at a predetermined temperature. A reagent vessel replacement unit includes an opening configured to put the reagent vessel into and take the regent vessel out of the reagent cooler, wherein the opening is opened and closed to replace the reagent vessel. A positive pressure unit positively pressurizes the inside of the reagent cooler with respect to a periphery of the reagent cooler when the opening is opened.Type: GrantFiled: February 4, 2020Date of Patent: January 30, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Takahiro Kumagai, Kazuhiro Noda, Nobuya Fukuda
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Patent number: 11887780Abstract: The present invention comprises: an object to be conveyed that has at least one permanent magnet 10; a magnetic pole 25 that has a core 22 comprising a second magnetic body and a winding 21 wound around the outer periphery of the core 22; a drive circuit 50 for supplying a current to the winding 21 of the magnetic pole 25; a current detection unit 30 for detecting the value of the current flowing through the winding 21; and a computation unit 40 for estimating the position of the permanent magnet 10 on the basis of the current value detected by the current detection unit 30 and controlling the value of the current supplied from the drive circuit 50 to the winding 21 on the basis of information about the estimated position of the permanent magnet 10.Type: GrantFiled: November 7, 2019Date of Patent: January 30, 2024Assignee: Hitachi High-Tech CorporationInventors: Yasuaki Aoyama, Hiroyuki Kobayashi, Satoru Kaneko, Takeshi Tamakoshi, Ryosuke Hoshi, Katsuhiro Kambara, Hiroshi Watanabe, Kuniaki Onizawa
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Patent number: 11879902Abstract: An object of the present invention is to provide a test method capable of efficiently performing a step of evaluating a surface state of a dispensing probe provided in a dispensing apparatus. In the test method according to the present invention, a first solution in which a coloring matter is dissolved is dispensed to a first container in advance by a first dispensing probe, a second solution in which a coloring matter is not dissolved is dispensed to a second container in advance by the first dispensing probe and then the first solution and the second solution are respectively sucked and discharged by a second dispensing probe. After that, a surface state of the second dispensing probe is evaluated by acquiring an amount of the coloring matter collected by the second solution (see FIG. 2).Type: GrantFiled: August 5, 2019Date of Patent: January 23, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Akihiro Nojima, Takamichi Mori, Isao Yamazaki, Tetsuji Kawahara, Youichi Aruga
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Publication number: 20240019407Abstract: A method of controlling a liquid chromatograph that estimates the maximum value of the pressure reached during measurement before actually measuring a sample. The method includes a pump having a gradient function that feeds liquid while changing the composition of a plurality of eluents, according to gradient liquid feeding conditions, a sample filling unit for filling a sample, a separation column, an analysis flow channel connecting the pump to the separation column, and a pressure sensor which detects a pressure within the analysis flow channel during liquid feeding by the pump. A maximum pressure presumed during measurement is calculated based on an initial pressure as a pressure within the analysis flow channel when the pump starts feeding liquid and the gradient liquid feeding conditions and that when the maximum pressure presumed is determined to be a predetermined upper pressure limit, the sample filling is not performed.Type: ApplicationFiled: December 7, 2021Publication date: January 18, 2024Applicant: Hitachi High-Tech CorporationInventor: Shinya ITO
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Publication number: 20240017263Abstract: Provided is an automated analysis device with which sufficient reaction process data can be acquired irrespective of the scale of the device, and with which it is possible to ensure freedom of the device configuration. An automated analysis device 100 is provided with: a reaction disk 1 which circumferentially accommodates a plurality of reaction vessels 2; a specimen dispensing mechanism 11 which dispenses a specimen into the reaction vessels 2; a reagent dispensing mechanism 7 which dispenses a reagent into the reaction vessels 2; a measuring unit 4 which measures a reaction process of a mixture of the specimen and the reagent in the reaction vessels 2; and a cleaning mechanism 3 which cleans the reaction vessels 2 after measurement.Type: ApplicationFiled: September 29, 2023Publication date: January 18, 2024Applicant: Hitachi High-Tech CorporationInventors: Akihiro YASUI, Akihisa MAKINO, Masashi AKUTSU, Hiroyuki MISHIMA, Yoshihiro SUZUKI
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Patent number: 11875978Abstract: A plasma processing apparatus 1 that performs, on a wafer 16 in which a multilayer film in which an insulating film and a film to be processed containing a metal are alternately laminated is formed on a substrate, plasma etching of the film to be processed, includes: a processing chamber 10 which is disposed inside a vacuum container; a sample stage 14 which is disposed inside the processing chamber and on which the wafer is placed; a detection unit 28 which detects reflected light obtained by the wafer reflecting light emitted to the wafer; a control unit 40 which controls plasma processing on the wafer; and an end point determination unit 30 which determines an etching end point of the film to be processed based on a change in an amplitude of vibration in a wavelength direction of a light spectrum of the reflected light, and the control unit receives determination of the end point made by the end point determination unit and stops the plasma processing on the wafer.Type: GrantFiled: June 16, 2020Date of Patent: January 16, 2024Assignee: Hitachi High-Tech CorporationInventors: Tsubasa Okamoto, Tatehito Usui, Miyako Matsui, Shigeru Nakamoto, Naohiro Kawamoto, Atsushi Sekiguchi
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Publication number: 20240013873Abstract: The present disclosure relates to a computer implemented method of managing sample processing priorities in a diagnostic laboratory comprising at least one sample processing device connected to a host system. The method comprises generating a communication message between the host system and the at least one sample processing device related to a sample processing order received in association with a sample, the message comprising one of at least two priority identifiers (R, S) indicative of respective sample processing priorities from lower priority to higher priority according to the received sample processing order. The method further comprises identifying the sample by the at least one sample processing device and processing the sample by the at least one sample processing device according to the sample processing priority (S, R) in the message.Type: ApplicationFiled: July 27, 2023Publication date: January 11, 2024Applicants: Roche Diagnostics Operations, Inc., Hitachi High-Tech CorporationInventors: Daniel Laubert, Rita Sachse, Dennis Aldorf, Werner Rapp, Ralf Herzog, Kenichi Yagi, Satoru Chida
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Patent number: 11869745Abstract: An object of the invention is to provide a charged particle beam device capable of increasing the contrast of an observation image of a sample as much as possible in accordance with light absorption characteristics that change for each optical parameter. The charged particle beam device according to the invention changes an optical parameter such as a polarization plane of light emitted to the sample, and generates the observation image having a contrast corresponding to the changed optical parameter. An optical parameter that maximizes a light absorption coefficient of the sample is specified according to a feature amount of a shape pattern of the sample (refer to FIG. 5).Type: GrantFiled: March 27, 2019Date of Patent: January 9, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Minami Shouji, Natsuki Tsuno, Hiroya Ohta, Daisuke Bizen
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Publication number: 20240005682Abstract: Representative features which are representative features for deciding the types or states of objects are extracted, the types or states of the objects are identified on the basis of the representative features to classify the objects, and the object classification results and the representative features are output in association with an image.Type: ApplicationFiled: November 12, 2021Publication date: January 4, 2024Applicant: HITACHI HIGH-TECH CORPORATIONInventors: Yasuki KAKISHITA, Hideharu HATTORI, Taku SAKAZUME
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Patent number: 11860142Abstract: A liquid chromatograph mass spectrometer specifying a location where a flow path is clogged and recovering in a short time. The liquid chromatograph mass spectrometer includes a first flow path passing through a separation column, a second flow path not passing through the separation column, a mass spectrometry unit on the downstream side of the first and second flow paths that analyzes a sample that has passed through the first flow path, a first valve for connecting any one of the first and second flow paths to the mass spectrometry unit, and a controller for controlling driving of the first valve connecting the first flow path to the mass spectrometric unit, comparing the measured value of the mass spectrometric unit with a predetermined threshold value, and connecting the second flow path to the mass spectrometry unit when it is determined to be abnormal.Type: GrantFiled: October 25, 2019Date of Patent: January 2, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Masuyuki Sugiyama, Yuichiro Hashimoto, Hideki Hasegawa
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Patent number: 11859600Abstract: A liquid feed pump which increases the liquid flow velocity in a stagnation area in the pressure chamber of a plunger pump, thereby improving the liquid replacement speed in the plunger pump. When the liquid in the liquid feed pump is replaced, a first plunger slides back and forth in the space between a lower limit point and an upper limit point, and the second plunger stops at least temporarily at a position near to the upper limit point or slides back and forth for a shorter distance than when the liquid feed pump usually feeds the liquid.Type: GrantFiled: December 3, 2019Date of Patent: January 2, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Nobuhiro Tsukada, Daisuke Akieda, Shinya Ito, Kenichiro Nishiki
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Patent number: 11860094Abstract: An analysis system includes an analyzer configured to separate a sample including a plurality of components labeled with any of M kinds of fluorescent substances by chromatography and acquire first time-series data of fluorescence signals detected in N kinds (M>N) of wavelength bands in a state in which at least a part of the plurality of components is not completely separated; and a computer configured to compare the first time-series data with the second time-series data, and determine which kind of fluorescent substance of M kinds of fluorescent substances individually labels each of the plurality of components.Type: GrantFiled: February 20, 2017Date of Patent: January 2, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventor: Takashi Anazawa
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Patent number: 11860177Abstract: An analysis method of an automatic analyzer is provided. The automatic analyzer includes: an insertion unit into which a rack is inserted; a transport line that transports the rack; a detection unit that detects a rack identifier from a rack or an attribute from a sample container which accommodates therein a sample as an object to be examined and which is mounted on a rack; an analysis module that includes a light source and a spectrometer which measures a measurement value to analyze a sample; a rack standby unit in which a rack stands by; and, a rack recovery unit that recovers a rack. In the automatic analyzer, a rack stands by in the rack standby unit until a measurement result in the analysis module is output; and is then recovered to the rack recovery unit.Type: GrantFiled: July 7, 2020Date of Patent: January 2, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Satoshi Shibuya, Tsuguhiko Satou, Toshihide Hanawa
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Patent number: 11860179Abstract: To provide a high-throughput automatic analysis apparatus at a lower cost. The automatic analysis apparatus includes an incubator which accommodates a plurality of reaction vessels; a specimen dispensing mechanism which dispenses a specimen into each of the plurality of reaction vessels; a mounting unit which mounts a dispensing tip on the specimen dispensing mechanism; a suction unit which sucks a specimen from a specimen vessel containing the specimen by means of the specimen dispensing mechanism having the dispensing mounted thereon; a discharging unit which is provided in the incubator and discharges the specimen from the specimen dispensing mechanism to the reaction vessel; a disposal unit which discards the dispensing tip; a sensor which detects whether the dispensing tip is mounted to the specimen dispensing mechanism; and a control unit which controls the specimen dispensing mechanism.Type: GrantFiled: December 6, 2022Date of Patent: January 2, 2024Assignee: Hitachi High-Tech CorporationInventors: Ayaka Hashimoto, Kazunori Yamazawa, Takenorì Okusa
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Patent number: 11863374Abstract: In a distributed control system, when the determination that an error has occurred is made as a result of comparison of correct connection information retained in a storage unit and connection information of an actually connected control object device or terminal communication device by a comparison unit, a central computation device outputs a display signal of an abnormal part to a display device, and the display device displays the abnormal part on the basis of the display signal. A distributed control system and an automatic analysis device provided with the same, and an automatic analysis system are thereby provided, whereby an erroneous connections or defects can be more easily and reliably detected than in the prior art, even when a plurality of control boards are distributedly arranged in the same device.Type: GrantFiled: May 27, 2019Date of Patent: January 2, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventor: Takafumi Hasegawa