Abstract: When an automatic analysis apparatus has a mechanism that performs an operation of an arcuate trajectory to access a plurality of positions arranged on a straight line, an arc and a straight line cannot coincide with each other. Thus position adjustment is required to minimize the deviation between the arc and the straight line. An automatic analysis apparatus according to the invention includes a reagent disk which accommodates a plurality of reagent bottles in each of which a plurality of suction ports are arranged along a center line, and which rotates around a central axis to transport a reagent bottle to a desired position; and a reagent dispensing mechanism which rotates around a rotation axis to suck a reagent from the reagent bottle at a predetermined suction position on the reagent disk, in which the reagent disk is provided with, at least one mounting position of the reagent bottle on the reagent disk, first and second marks sandwiching the mounting position of the reagent bottle.

Abstract: A semiconductor fabricating method for a film to be processed containing a transition metal on an upper surface of a semiconductor wafer placed in a processing chamber in a container being etched with a gas for complexing the transition metal supplied into the processing chamber, including a first step of adsorbing, to the film, the complexing gas, while supplying the complexing gas, then increasing a temperature of the wafer to form an organic metal complex on a surface of the film, and volatilizing and desorbing the organic metal complex, and a second step of adsorbing, to the surface of the film, the complexing gas at a low temperature, while supplying the complexing gas, then stopping the supply of the complexing gas, and stepwise increasing the temperature of the wafer to volatilize and desorb an organic metal complex formed on the surface of the film.

Abstract: A plasma processing apparatus includes a stage disposed in a processing chamber for mounting a wafer, a plasma generation chamber disposed above the processing chamber for plasma generation using process gas, a plate member having multiple introduction holes, made of a dielectric material, disposed above the stage and between the processing chamber and the plasma generation chamber, and a lamp disposed around the plate member for heating the wafer. The plasma processing apparatus further includes an external IR light source, an emission fiber arranged in the stage, that outputs IR light from the external IR light source toward a wafer bottom, and a light collection fiber for collecting IR light from the wafer. Data obtained using only IR light from the lamp is subtracted from data obtained also using IR light from the external IR light source during heating of the wafer. Thus, a wafer temperature is determined.

Abstract: Provided is a projection electron beam application apparatus suitable for use in semiconductor manufacturing lines. An electron optical system of the electron beam application apparatus includes a mirror aberration corrector 106 disposed perpendicular to an optical axis 109, a plurality of magnetic field sectors 104 by which an orbit of electrons is deviated from the optical axis to make the electrons incident on the mirror aberration corrector 106, and the orbit of the electrons emitted from the mirror aberration corrector 106 is returned to the optical axis, and a doublet lens 105 disposed between adjacent magnetic field sectors along the orbit of the electrons. The plurality of magnetic field sectors have the same deflection angle for deflecting the orbit of the electrons, and the doublet lens is disposed such that an object plane and an image plane thereof are respectively central planes of the adjacent magnetic field sectors along the orbit of the electrons.

Abstract: Provided is an analyzer column cartridge that can control the temperature of an analysis column while saving resources and costs. An analyzer column cartridge 1 includes: metal blocks 7, 8 that accommodate an analysis column 10 used in a liquid chromatography; and housings 2, 3 that accommodate the metal blocks 7, 8. A plurality of holes 11A, 11B, 11C, 11D, and 11E that communicate with an accommodation space of the analysis column 10 are formed in the metal block 8. The housing has a plurality of windows 6A, 6B, 6C, 6D, and 6E formed at positions facing the plurality of holes 11A, 11B, 11C, 11D, and 11E formed in the metal block 8.

Abstract: A technique for replacing a separation column includes: a driving device supporting a first pipe along a first direction; a fixing member that fixes a second pipe to be opposed to the first pipe along the first direction; a column case between the first pipe and the second pipe, having a first and second holes communicating with the first and second pipes, respectively; and an interlocking mechanism that moves the column case in the first direction in conjunction with movement of the first pipe. The column case allows a column cartridge retaining a separation column to be connected and disconnected. The driving device moves the first pipe and the interlocking mechanism such that two states are reversibly taken; a closed state in which the separation column is between the first and second pipes and an open state in which the first and second pipes are positioned outside the column case.

Abstract: Provided is an automated analyzer comprising a temperature regulator that can be made more compact in size while maintaining high-precision temperature regulation. In a temperature-regulating unit (20) of the automated analyzer, a first chemical reservoir (1) is constituted by a large-diameter spiral-shaped pipe, and a second chemical reservoir (2) is constituted by a large-diameter chemical reservoir container. The first chemical reservoir (1), which is positioned upstream of the second chemical reservoir (2), has an internal capacity that is set so as to be greater than the volume of a single discharge of each of syringe pumps (29, 30, 31), and the second chemical reservoir (2) also has an internal capacity (volume) that is set so as to be greater than the volume of a single discharge of each of the respective syringe pumps (29, 30, 31).

Abstract: Provided is an automatic analysis technique that prevents liquid contained in a reaction container from locally contacting with liquid added afterward and has less occurrence frequency of equipment malfunction and high performance.

Abstract: A model learning unit learns a prediction model on the basis of learning data, a target setting unit sets a target output parameter value by interpolating between a goal output parameter value and an output parameter value which is the closest to the goal output parameter value in output parameter values in the learning data, a processing condition search unit estimates input parameter values which corresponds to the goal output parameter value and the target output parameter value, a model learning unit updates the prediction model by using a set of the estimated input parameter value and an output parameter value which is a result of processing that a processing device performs as additional learning data.

Abstract: A liquid level detection device capable of accurately detecting an interface inside a container has an irradiation unit which irradiates a side surface of a sample container containing a sample having layers with light. A light receiving unit receives transmitted light from the sample container and an analysis unit acquires the interfaces between the layers from the received amount of the transmitted light. The sample container is moved vertically relative to the irradiation unit and the light receiving unit by a first drive and is moved in the circumferential direction relative to the irradiation unit and the light receiving unit by a second drive. The second drive is controlled so that the light receiving unit receives the transmitted light at first and second irradiation angles, and the interfaces between the layers are acquired on the basis of the received amounts of transmitted light at the first and second irradiation angles.

Abstract: This invention is capable of improving performance of a biochemical analyzer and facilitating the maintenance. A light source includes: a first LED that emits ultraviolet light and a second LED that has a light emission spectrum different from that of the first LED, the first LED and the second LED being disposed in parallel; a reflection surface that is opposite to the first LED and reflects light of the first LED; and a dichroic surface that is opposite to the second LED, reflects light of the first LED, and allows light of the second LED to penetrate.

Abstract: Provided is a calibration sample that can be used for three-dimensional structures and is unlikely to change over time. To this end, the calibration sample is a calibration sample for an autofocus target position in an optical microscope, and comprises a light-transmissive resin sample container that accommodates a first layer, which is disposed on a bottom side along the optical axis direction of the optical microscope and in which a target object having contrast with respect to a light-transmitting first resin is disposed inside the light-transmitting first resin, and a second layer which is disposed so as to cover the first layer and is composed of a light-transmitting second resin.

Abstract: Provided is a technique for realizing high analysis reproducibility. An ion source of the present disclosure includes a capillary and a gas spray tube into which the capillary is inserted, the gas spray tube spraying a gas to an outer side of the capillary, and the gas spray tube having a deflection site, which deflects a downstream end of the capillary with respect to a central axis of a tip hole of the gas spray tube, on an upstream side of the tip hole of the gas spray tube.

Abstract: A charged particle beam device includes a detector 109 converting a photon emitted by a scintillator into an electric signal and a signal processing unit 110 processing the electric signal from the detector 109. The signal processing unit 110 detects a peak position of the electric signal, steepness of a rising section associated with the peak position, and steepness of a falling section associated with the peak position and classifies the peak position based on the steepness of the rising section and the steepness of the falling section.

Abstract: The present disclosure proposes a diagnostic system capable of properly identifying the cause of even an error for which multiple factors or multiple compound factors may be accountable. The diagnostic system according to the present disclosure is provided with a learning device for learning at least one of a recipe defining operations of an inspection device, log data describing states of the device, or specimen data describing characteristics of a specimen in association with error types of the device, and estimates the cause of the error by using the learning device (refer to FIG. 4).

Abstract: Disclosed is a solution for quickly specifying an optical condition of a wafer to be inspected, and in particular, accelerating optical condition setting after obtaining a customer wafer.

Abstract: To provide an etching processing method and an etching processing apparatus which allow an aluminum oxide film to be etched with high accuracy and with a high selectivity to each of a silicon oxide film and a silicon nitride film, the etching processing method includes the step of placing, in a processing chamber, a wafer having the aluminum oxide film disposed on an upper surface thereof, maintaining the wafer at a temperature of ?20° C. or less, and supplying vapor of hydrogen fluoride from a plurality of through holes in a plate-like member disposed above the upper surface of the wafer with a predetermined gap being provided therebetween only for a predetermined period to etch the aluminum oxide film.

Abstract: A plasma treatment apparatus includes a treatment chamber 2 and a gas supply device 30 for supplying a treatment gas into the treatment chamber 2. The gas supply device 30 includes: a mass flow controller box 40 having an intake port 41 and an exhaust port 42; a plurality of pipes 43 to each of which a mass flow controller (43a) is attached; and a plurality of pipes 52 which are connected to the pipes 43 in the mass flow controller box 40 and connected to a plurality of pipes 54 as supply sources of the treatment gas by a plurality of joints 53 outside the mass flow controller box. At least one of the joints 53 is covered by a pipe cover 60 so that the joint 53 is hermetically sealed. The inside of the pipe cover 60 and the inside of the mass flow controller box 40 are communicated by a communicating member (circumferential pipe 61, tube 62).

Abstract: The invention provides an electron beam apparatus that reduces a time required for an electron gun chamber to which a sputter ion pump and a non-evaporable getter pump are connected to reach an extreme high vacuum state. The electron beam apparatus includes an electron gun configured to emit an electron beam and the electron gun chamber to which the sputter ion pump and the non-evaporable getter pump are connected. The electron beam apparatus further includes a gas supply unit configured to supply at least one of hydrogen, oxygen, carbon monoxide, and carbon dioxide to the electron gun chamber.