Abstract: An insulating composition containing silica particles, a resin, and a curing agent, wherein: when an aqueous solution of the silica particles having an SiO2 concentration of 3.8% by mass is heated at 121° C. for 20 hours, the amount of Na ions eluted from the silica particles is 40 ppm/SiO2 or less, especially, wherein the amount of Na ions eluted from the silica particles after the heating may be 5-38 ppm/SiO2, and, the silica particles may contain a polyvalent metal oxide so the ratio by mole of a polyvalent metal M to Si is 0.001-0.02; the mass ratio of Na2O/SiO2 in the silica particles may be 700-1,300 ppm; and the silica particles may have, on the surfaces thereof, a layer having a thickness of 0.1-1.5 nm and an Na2O/SiO2 mass ratio of 10-400 ppm, and may have an average particle diameter of 5-40 nm.

Abstract: [Task] There is provided a practical method for producing a lipidic peptide compound, the method enabling to mass-produce the lipidic peptide compound inexpensively with no need of complicated operations. [Solution] There is provided a method to mix a non-polar solvent solution of an ester compound represented by formula (1) with a non-polar organic solvent containing an ?-amino acid compound and a base represented by formula (2) so as to produce a lipidic peptide compound or a pharmacologically acceptable salt thereof represented by formula (3).

Abstract: A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses said composition for forming a resist underlayer film. A resist underlayer film-forming composition includes a solvent and a polymer having a unit structure represented by formula (I): (in formula (I), A1, A2, A3, A4, A5, and A6 each independently represent a hydrogen atom, a methyl group, or an ethyl group, Q1 represents a divalent organic group, R1 represents a tetravalent organic group including a C6-40 aromatic ring structure, and L1 and L2 each independently represent a hydrogen atom or a C1-10 alkyl group optionally substituted with a hydroxy group and optionally interrupted by an oxygen atom).

Abstract: A resist underlayer film-forming composition that exhibits a high etching resistance, a favorable dry etching rate ratio and optical constant, and can form a film exhibiting a good coatability even to a so-called uneven substrate, providing a small difference in film thickness after embedding, and having planarity and a superior hardness; a resist underlayer film formed from the resist underlayer film-forming composition; and a method of producing a semiconductor device.

Abstract: An object of the present invention is to provide a novel method for forming a carbonaceous structure comprising minute carbon bodies such as CNTs. A method for forming a carbonaceous structure on the surface of a substrate, comprising a step of forming a layered structure by at least partially filling a gap between a porous membrane which can hold a dispersion medium and a substrate with a minute-carbon-body dispersion liquid comprising the minute carbon bodies and the dispersion medium, and a step of removing the dispersion medium by at least partially taking the dispersion medium out of the layered structure through the porous membrane and/or the substrate.

Abstract: A chemical fluid for underground injection includes an inorganic substance, an antioxidant (e.g. ascorbic acid, gluconic acid, or a salt thereof, or ?-acetyl-?-butyrolactone, or bisulfite, or disulfite), and water. The inorganic substance may be a colloidal particle or a powder. The inorganic substance may be present in the chemical fluid in amounts of 0.001% by mass to 50% by mass based on the total mass of the chemical fluid for underground injection. The antioxidant may be present in the chemical fluid at a ratio of 0.0001 to 2 of the mass of the antioxidant to the mass of the inorganic substance. A surface of the inorganic substance may be coated with a silane compound. The chemical fluid may further include an anionic surfactant, a cationic surfactant, an amphoteric surfactant, a nonionic surfactant, or a mixture thereof.

Abstract: The invention provides a method for producing a polymer used as a base film for cell culture which comprises (i) preparing a mixture containing (a) a monomer of formula (I): wherein Ua1 and Ua2 each independently represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, Ra1 represents a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, and Ra2 represents a linear or branched alkylene group having 1 to 5 carbon atoms, (b) a radical polymerization initiator, and (c) an organic solvent, and (ii) preparing a polymer by raising a temperature of the mixture under stirring to polymerize the monomer. The invention also provides methods of producing a base film for cell culture and a cell culture container.

Abstract: A condensed heterocyclic compound has a sepiapterin reductase inhibitory action and is particularly useful for treatment of a pain. The condensed heterocyclic compound represented by Formula (I) below (R1 represents a hydrocarbon group or the like; R2 and R3 represent a hydrogen atom or the like; R4, X, and Y represent defined substituents), a tautomer or a pharmaceutically acceptable salt of the compound, or a solvate of any of these.

Abstract: A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses the composition for forming a resist underlayer film. (In formula (1), A1, A2, A3, A4, A5, and A6 each independently represent a hydrogen atom, methyl group, or ethyl group; Q1 represents a divalent organic group; R1 represents a tetravalent organic group; and R2 represents an alkenyl group or alkynyl group having 2-10 carbon atoms.) The film-forming composition contains a solvent and a polymer that has a unit structure given by formula (1).

Abstract: The invention provides a single-stranded oligonucleotide represented by the formula (I), wherein X and Y hybridize by a first nucleotide sequence portion and a second nucleotide sequence portion. X is composed of 7 to 100 nucleotides, contains at least one modified-nucleotide, and has a first nucleotide sequence capable of hybridizing with a second oligonucleotide. Y is composed of 4 to 100 nucleotides, enables hybridization with the above-mentioned first oligonucleotide, and has a second nucleotide sequence containing at least one ribonucleotide. At least one of the nucleotide sequences X, Xz and Y has an antisense sequence capable of hybridizing with a target RNA. At least one of L, Lx and Ly is a linking group that contains a non-nucleotide structure.

Abstract: An adhesive composition for use in debonding with light irradiation, which composition can achieve debonding through irradiation with light, characterized in that the adhesive composition contains an adhesive component (S) and a light-absorbing organic compound (X); and the light-absorbing organic compound (X) contains, in the molecule thereof, one or more aromatic rings, one or more rings each containing a heteroatom forming the ring, and one or more groups selected from among a carbonyl group and a thiocarbonyl group.

Abstract: An inorganic oxide particles which have a minute particle diameter at which no interference fringes occur in a coating film and high transparency can be secured even when applied to a high refractive index substrate, and in which excitation by ultraviolet radiation is almost completely suppressed, a coating composition containing such particles, and an optical member having a cured film formed from the coating composition. Inorganic oxide particles obtained by bonding an organosilicon compound having a nitrogen-containing heterocyclic group to the surface of modified metal oxide colloid particles (C) having an average particle diameter of 2 to 100 nm, which include metal oxide colloid particles (A) having an average primary particle diameter of 2 to 60 nm as nuclei and with the nuclei surface coated with a coating composed of inorganic oxide colloid particles (B) having an average primary particle diameter of 1 to 4 nm.

Abstract: A method for producing a lipid peptide compound represented by formula (3) or a pharmaceutically usable salt thereof, the method comprising: a reaction step of reacting an ester compound of the following Formula (1) with an ?-amino acid compound of the following Formula (2) and a base in a solvent containing a non-polar organic solvent; an extraction step of adding an organic acid to a solution containing a salt of a lipidic peptide prepared through the reaction step and being of the following Formula (3) to thereby neutralize the solution, adding water and an alcohol to the neutralized solution, and subjecting the resultant mixture to phase separation, thereby removing the non-polar organic solvent; and a separation step of removing the lipidic peptide compound of Formula (3) from the solution prepared through the extraction step to the outside of the system.

Abstract: A resist underlayer film-forming composition capable of reducing occurrence of defects caused by microparticles or the like that may be generated during formation of a coating film. A silicon-containing resist underlayer film-forming composition including: [A]a polysiloxane; [B] a glycol compound having a normal boiling point of 230.0° C. or higher and being of the following Formula (1): (wherein R1 and R2 are each independently a hydrogen atom, a C1-4 alkyl group, or a C3-4 acyl group; and n is an integer of 3 or more); and [C] a solvent (except for a compound corresponding to the compound [B]).

Abstract: Provided is a method capable of easily producing a layered silicate in a short time. The problem may be solved by a method of producing a layered silicate, including the following steps (a) and (b): (a) providing a cage silicate that contains an anion component represented by formula (1) below and a cation component represented by formula (2) below with a ratio of the mole number of water to the mole number of the anion component in terms of SiO2, (H2O/SiO2), of 0.7 to 30; (in formula (2), R represents an alkyl group having 2 to 9 carbon atoms) and (b) treating the cage silicate obtained in step (a) in an autoclave.

Abstract: An object is to provide a cage silicate that can be industrially safely and simply produced by using an alkali silicate solution that does not generate alcohol as a Si raw material and using non-toxic quaternary ammonium, and a method for producing the same. The problem is solved by the following cage silicate: A cage silicate consisting of anion component 1 represented by following formula (1), anion component 2 which is a mineral acid ion, cation component 1 represented by following formula (2), and cation component 2 which is an alkali ion, in which, to the mole number in terms of SiO2, a ratio of the mole number of water, (H2O/SiO2), is 0.7 to 30, a ratio of the mole number of alkali ions, (alkali ions/SiO2), is 1.0×10?7 to 1.0×10?2, and a ratio of the mole number of the mineral acid ions, (mineral acid ions/SiO2), is 1.0×10?7 to 1.0×10?3. In formula (2), R represents an alkyl group having 2 to 20 carbon atoms.

Abstract: A method for producing a silica sol containing a small amount of metal impurities and in which colloidal silica having an elongated particle shape dispersed in a solvent, includes: preparing a raw material liquid by adding a compound as an anion source selected from inorganic acids, organic acids, and their ammonium salts, and ammonia to a colloidal aqueous solution of activated silica having an SiO2 concentration of 1 to 6% by mass and a pH of 2 to 5 so that the mass ratio of the compound to SiO2 is 3.0 to 7.0%; and heating the raw material liquid at 80 to 200° C. for 0.5 to 20 hours. The elongated colloidal silica particles exhibit a DL/DB ratio of 2.5 or more. DL is an average particle diameter as measured by the dynamic light scattering method. DB is a primary particle diameter as measured by the nitrogen gas adsorption method.

Abstract: The present invention provides a polarization-independent terahertz wave control element, and provides a method for manufacturing a polarization-independent terahertz wave control element.

Abstract: A polishing composition used in wafer polishing process for eliminating protrusion around laser mark, thereby achieving a flat polished surface, as well as a wafer polishing method using the polishing composition. A post-polishing composition for elimination of a laser mark remaining after polishing of silicon wafer with a primary polishing composition containing silica particles, water, and a basic compound, the post-polishing composition including silica particles, water, a tetraalkylammonium ion, and a water-soluble polymer, wherein the mass ratio of the tetraalkylammonium ion to SiO2 of the silica particles is 0.200 to 1.000:1; the mass ratio of SiO2 dissolved in the polishing composition to SiO2 of the silica particles is 0.100 to 1.500:1; and the mass ratio of the water-soluble polymer to SiO2 of the silica particles is 0.005 to 0.05:1. The silica particles have an average primary particle diameter of 1 nm to 100 nm.

Abstract: An acetal-protected polysiloxane composition, used as a photosensitive composition and a coating composition for forming a flat film on a substrate to be processed for performing pattern reversal. A coating composition or photosensitive composition including: a polysiloxane obtained from a hydrolysis-condensation product of a hydrolyzable silane having 2 to 4 hydrolyzable groups in a molecule by protecting the condensation product's silanol groups with acetal groups, wherein in the hydrolysis-condensation product, an organic group bonded to silicon atoms through Si—C bonds exists in molar ratio of 0?(organic group)/(Si)?0.29 on average.