Abstract: An additive for a cement slurry for a well that is capable of suppressing the generation of free water and preventing flotation/separation of low-specific-gravity aggregate while securing sufficient cement strength even at a high temperature and a method for producing this additive are disclosed. The additive contains an aqueous dispersion of silica and a layered silicate.

Abstract: An upper layer film-forming composition exhibits good solubility in hydrophobic solvents and can bring about vertical alignment of a block copolymer without dissolution, swelling or the like of a layer containing the block copolymer formed on a substrate. This upper layer film-forming composition is used for phase separation of a layer containing a block copolymer formed on a substrate, and contains: (A) a copolymer containing a unit structure derived from a maleimide structure (a) and a unit structure derived from a styrene structure; and (B) as a solvent, a non-aromatic hydrocarbon compound that is a liquid at normal temperature and pressure.

Abstract: A laminate having a semiconductor substrate, a UV-ray-transmissive support substrate, and an adhesive layer and a release layer disposed between the semiconductor substrate and the support substrate. The release layer is a film formed from a releasing agent composition containing a polymer of an ethylenic unsaturated monomer having a tert-butoxycarbonyl group, a photoacid generator, and a solvent.

Abstract: A cleaning agent composition for use in removing an adhesive residue, characterized in that the composition contains a quaternary ammonium salt and a composition solvent including a first organic solvent and a second organic solvent; the first organic solvent is an amide derivative represented by formula (Z) (wherein R0 represents an ethyl group, a propyl group, or an isopropyl group; and each of RA and RB represents a C1 to C4 alkyl group); the second organic solvent is a non-amide organic solvent other than the amide derivative; and the composition has a water content less than 4.0 mass %.

Abstract: A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses the resist underlayer film-forming composition. The resist underlayer film-forming composition comprises an organic solvent and the reaction product of (A) a hydantoin-containing compound that has two epoxy groups and (B) a hydantoin-containing compound different from (A). This reaction product is preferably the reaction product of a secondary amino group present in the hydantoin-containing compound (B) and the epoxy group present in the hydantoin-containing compound (A).

Abstract: A composition for forming a resist underlayer film containing a solvent and polymer comprising a unit structure (A) represented by formula (1) and/or formula (2). The composition is capable of forming a hydrophobic underlayer film that has a high contact angle with pure water and exhibits high adhesion to an upper layer film, thereby being not susceptible to separation therefrom, while meeting the requirement of good coatability, the composition being also capable of exhibiting other good characteristics such as sufficient resistance to a chemical agent that is used for resist underlayer films.

Abstract: The present invention is to provide a method for producing a cartilage tissue which comprises a step of providing a substrate for producing cell aggregates provided with a plurality of spots comprising a copolymer containing recurring units derived from monomers represented by the following formulae (I) and (II): [wherein Ua1, Ua, Ra1, Ra2 and Rb are as described in the specification and claims] on a substrate having an ability to suppress adhesion of cells; a step of seeding human cartilage progenitor cells which are positive for PRRX1 protein and derived from pluripotent stem cells on the substrate; a step of producing cell aggregates by culturing the cells; and a step of culturing the aggregates to produce a cartilage tissue.

Abstract: A method of treating bradyarrhythmia includes administering to a patient having bradyarrhythmia a therapeutically effective amount of at least one of compound (I) and compound (II) or pharmacologically acceptable salts thereof as an active component: wherein Ph is a phenyl group.

Abstract: A simple method for removing foreign substances that are formed on a substrate during a semiconductor device production process and a composition for forming a coating film for foreign substance removal, said coating film being used in the above-described method. A composition for forming a coating film for foreign substance removal, said composition containing a polymer and a solvent and being capable of forming a coating film that dissolves in a developer liquid, wherein: the polymer is selected from among phenolic novolacs, polyhydroxystyrene derivatives and carboxylic acid-containing polymers; and the polymer is contained in an amount of 50% by mass or more relative to the total solid content in the composition.

Abstract: The invention provides a composition for forming a coating film having compatibility with a biological substance which comprises a block copolymer having unit structures represented by the formula (1) and the formula (2): (wherein R1 to R3, U1 and U2 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, X1 and X2 represent an alkylene group having 1 to 5 carbon atoms, and n1 represents an integer of 1 to 10), and a solvent. The invention also provides a coating film using the same, a substrate for cell culture using the same, a method for producing the substrate for cell culture, and a method for producing a cell aggregate.

Abstract: A photocurable composition for forming coating film having flattening properties on a substrate, with high fillability into patterns and capability of forming a coating film that is free from thermal shrinkage, which contains at least one compound that contains a photodegradable nitrogen-containing and/or photodegradable sulfur-containing structure, a hydrocarbon structure, and a solvent. The compound may have the photodegradable nitrogen-containing and/or photodegradable sulfur-containing structure and the hydrocarbon structure in one molecule, or may be a combination of compounds which contain the structures in separate molecules.

Abstract: A therapeutic agent for drug-induced bradycardia and bradyarrhythmia. A therapeutic agent for drug-induced bradycardia and bradyarrhythmia including, as an active ingredient, the following compound (I): (wherein Ph is a phenyl group) or a pharmacologically acceptable salt of the compound.

Abstract: A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; a method for producing a resist pattern and producing a semiconductor device, which uses this composition for forming a resist underlayer film. A composition for forming an EUV resist underlayer film, said composition containing an organic solvent and a reaction product of a diepoxy compound and a compound represented by formula (1). (In formula (1), Y1 represents an alkylene group having from 1 to 10 carbon atoms, wherein at least one hydrogen atom is substituted by a fluorine atom; each of T1 and T2 independently represents a hydroxy group or a carboxy group; each of R1 and R2 independently represents an alkyl group having from 1-10 carbon atoms, said alkyl group being optionally substituted by a fluorine atom; and each of n1 and n2 independently represents an integer from 0 to 4.

Abstract: The invention provides a composition for forming a coating film containing a phosphoric acid group-containing polymer capable of forming a film on a substrate by a simple process and capable of maintaining film properties under a solvent environment containing water, and a coating film which is a cured product of the composition. In particular, the composition for forming a coating film contains (a) a polymer (P) containing a hydroxyl group, and the hydroxyl group is derived only from a phosphoric acid group, (b) a polycarbodiimide (C) containing a structure represented by the following formula (c-1): —N?C?N—??(c-1), and (c) a solvent.

Abstract: A stable form which uses a carbon material having electrical conductivity as a raw material and that the electrical conductivity of the carbon material is retained and/or improved, and which improves the electricity generation properties when used in a catalyst layer for a fuel cell. The present invention is directed to, e.g., a calcined material of a mixture of an aromatic compound having a phenolic hydroxyl group and a carbon material having electrical conductivity.

Abstract: A silica sol dispersed in a nitrogen-containing solvent and a silica-containing resin composition containing a nitrogen atom-containing polymer. A silica sol including silica particles containing aluminum atoms and having an average primary particle diameter of 5 to 100 nm, the silica particles being dispersed in a nitrogen-containing solvent, wherein the aluminum atoms are bonded to the surfaces of the silica particles in an amount in terms of Al2O3 of 800 to 10,000 ppm/SiO2. The silica particles are bonded to a silane compound or a hydrolysate of the silane compound. The nitrogen-containing solvent is an amide solvent. The nitrogen-containing solvent is dimethylacetamide, dimethylformamide, N-methylpyrrolidone, or N-ethylpyrrolidone. The insulating resin composition includes the silica sol and a nitrogen-containing polymer. The nitrogen-containing polymer is polyimide, polyamide, polyamic acid, polyamideimide, polyetherimide, or polyesterimide.

Abstract: Provided is a resist underlayer film-forming composition that is used in a lithographic process in semiconductor manufacturing and has excellent storage stability. The resist underlayer film-forming composition contains: a polymer having a disulfide bond in a main chain; a radical trapping agent; and a solvent. The radical trapping agent is preferably a compound having a ring structure or a thioether structure. The ring structure is preferably an aromatic ring structure having 6-40 carbon atoms or a 2,2,6,6-tetramethylpiperidine structure.

Abstract: The present invention relates to a utilizing method of a nucleic acid compound containing a selectively cleavable site. Also, the present invention relates to a DNA-encoded library containing the selectively cleavable site, a composition for synthesis therefor and a method of use thereof.

Abstract: A composition contains an organic solvent and compound (formula (1)), theoretical molecular weight 999 or less. (Z1 contains a nitrogen-containing heterocyclic ring; U represents a monovalent organic group (formula (2)); and p represents 2 to 4.) (In formula (2), R1 represents an alkylene group having 1 to 4 carbon atoms; A1 to A3 represent a hydrogen atom, or methyl or ethyl group: X represents —COO—, —OCO—, —O—, —S— or —NRa-; Ra represents a hydrogen atom or methyl group; Y represents a direct bond or optionally substituted alkylene group having 1 to 4 carbon atoms; R2, R3 and R4 represent a hydrogen atom or optionally substituted alkyl group having 1 to 10 carbon atoms or aryl group having 6 to 40 carbon atoms; R5 represents a hydrogen atom or hydroxy group; n represents 0 or 1; m1 and m2 represent 0 or 1; and * represents a binding site to Z1.

Abstract: A resist underlayer film forming composition capable of forming a flat film that exhibits high etching resistance, a good dry etching rate ratio and a good optical constant, while having good coverage even with respect to a so-called multileveled substrate and having a small difference in the film thickness after embedding. Also, a method for producing a polymer that is suitable for the resist underlayer film forming composition; a resist underlayer film which uses the resist underlayer film forming composition; and a method for producing a semiconductor device. This resist underlayer film forming composition contains: a reaction product of an aromatic compound (A) that has from 6 to 120 carbon atoms, and a compound that is represented by formula (1); and a solvent.