Abstract: A polishing composition eliminating protrusions around a laser mark in wafer polishing processes, the manufacturing method therefor and a polishing method using the composition. The polishing composition including silica particles and water, wherein: the composition includes a tetraalkylammonium ion such that the mass ratio of the ion to SiO2 of the silica particles is 0.400 to 1.500:1, and the mass ratio of SiO2 dissolved in the polishing composition to SiO2 is 0.100 to 1.500:1; the tetraalkylammonium ion is derived from a compound selected from the group made of an alkali silicate, a hydroxide, a carbonate, a sulfate, and a halide while the ion is contained in the polishing composition in 0.2% by mass to 8.0% by mass; and the dissolved SiO2 is derived from a tetraalkylammonium silicate, a potassium silicate, a sodium silicate, or a mixture of any of these.

Abstract: A gel dosimeter for radiation dosimetry includes a radically polymerizable monomer, a gelator, glucose, and glucose oxidase. Although a conventional polymer gel dosimeter contains a deoxygenating agent such as tetrakis(hydroxymethyl)phosphonium chloride, such a deoxygenating agent fails to exhibit sufficient effects. Thus, a more effective deoxygenation treatment technique has been required for a gel dosimeter.

Abstract: The present invention provides a composition containing an electron-donating polymer (D) and an electron-withdrawing polymer (A), wherein the electron-donating polymer (D) has a constitutional unit represented by the following formula (1a), Y1a in the following formula (1a) is a divalent group represented by the following formula (3a), and the electron-withdrawing polymer (A) has a constitutional unit represented by the following formula (4a): wherein the symbols in the formulas are as described in the DESCRIPTION.

Abstract: A cleaning agent composition for use in removal of a polysiloxane adhesive remaining on a substrate, the composition containing a tetrahydrocarbylammonium fluoride and an organic solvent, wherein the organic solvent contains an alkylene glycol dialkyl ether and a lactam compound represented by formula (1). (in formula (1), R101 represents a C1 to C6 alkyl group, and R102 represents a C1 to C6 alkylene group.

Abstract: A resist underlayer film-forming composition exhibiting high etching resistance, high heat resistance, and excellent coatability; a resist underlayer film obtained using the resist underlayer film-forming composition and a method for producing the same; a method for forming a resist pattern; and a method for producing a semiconductor device. A resist underlayer film-forming composition including a polymer and a compound represented by Formula (1) as a solvent. In Formula (1), R1, R2, and R3 in Formula (1) each independently represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, which may be interrupted by an oxygen atom, a sulfur atom, or an amide bond, and R1, R2, and R3 may be the same or different and may bond to each other to form a ring structure.

Abstract: A resist underlayer film-forming composition: in which self-curing is performed at a low temperature without an acid catalyst or a crosslinking agent, the amount of a sublimate can be reduced, and a high-hardness film having high bending resistance; suitable as a crosslinking agent; exhibits higher flattening and heat resistance when used as a crosslinking agent; has embedding properties equivalent to conventional products; and has an optical constant or etching resistance freely changeable according to monomer selection. The composition contains a solvent and a polymer (X) containing a repeating structural unit which is obtained by alternately bonding, via a linking group —O—, an aromatic compound A having an ROCH2— group (R is a monovalent organic group, a hydrogen atom, or a mixture thereof) to an aromatic compound B having at most 120 carbon atoms and different from A, and in which one to six B's are bonded to one A.

Abstract: There is provided a laminate including: a support substrate; a semiconductor substrate having a bump on a side of the support substrate; an inorganic material layer interposed between the support substrate and the semiconductor substrate and in contact with the semiconductor substrate; and an adhesive layer interposed between the support substrate and the inorganic material layer and in contact with the support substrate and the inorganic material layer, in which the laminate is used for an application in which the support substrate and the semiconductor substrate are separated from each other after processing of the semiconductor substrate in the laminate, and an adhesive force between the inorganic material layer and the adhesive layer when the support substrate and the semiconductor substrate are separated from each other is smaller than an adhesive force between the inorganic material layer and the semiconductor substrate.

Abstract: A composition forms a resist underlayer film that enables formation of a desired resist pattern; and a method produces a resist pattern and a method produces a semiconductor device, which each use the resist underlayer film-forming composition. This resist underlayer film-forming composition contains a reaction product obtained from: a compound (A) that is dissolved in a solvent and that is represented by formula (1) (in formula (1), A represents an organic group including an aliphatic ring, an aromatic ring, or a heterocyclic ring); a compound (B) having two functional groups that are reactive with respect to an epoxy group; and a compound (C) having one functional group that is reactive with respect to an epoxy group.

Abstract: The invention provides a method for producing a polymer used as a base film for cell culture which comprises (i) preparing a mixture containing (a) a monomer of formula (I): wherein Ua1 and Ua2 each independently represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, Ra1 represents a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, and Ra2 represents a linear or branched alkylene group having 1 to 5 carbon atoms, (b) a radical polymerization initiator, and (c) an organic solvent, and (ii) preparing a polymer by raising a temperature of the mixture under stirring to polymerize the monomer. The invention also provides methods of producing a base film for cell culture and a cell culture container.

Abstract: Provided is a secondary battery electrode additive with which an active material can be coated without heat treatment that is performed at a high temperature for a long period of time, an alkaline component can be neutralized, and the decomposition of an electrolytic solution can be suppressed. For example, provided is a secondary battery electrode additive comprising a boronic acid derivative represented by formula (5). (In the formula, R1-R5 each independently represent a hydrogen atom, an alkyl group, an ester group, a glycol chain, an alkoxy group, or a hydroxy group, and R6 represents a hydrogen atom, a methyl group, or an ethyl group.

Abstract: A polishing composition used in wafer polishing process for eliminating protrusion around laser mark, thereby achieving a flat polished surface, as well as a wafer polishing method using the polishing composition. A post-polishing composition for elimination of a laser mark remaining after polishing of silicon wafer with a primary polishing composition containing silica particles, water, and a basic compound, the post-polishing composition including silica particles, water, a tetraalkylammonium ion, and a water-soluble polymer, wherein the mass ratio of the tetraalkylammonium ion to SiO2 of the silica particles is 0.200 to 1.000:1; the mass ratio of SiO2 dissolved in the polishing composition to SiO2 of the silica particles is 0.100 to 1.500:1; and the mass ratio of the water-soluble polymer to SiO2 of the silica particles is 0.005 to 0.05:1. The silica particles have an average primary particle diameter of 1 nm to 100 nm.

Abstract: A new composition capable of preventing adhesion of pollutants by forming a film on the skin or the hair surface and promoting skin permeation as well as preventing the skin and the hair surface from being polluted by the substance. The composition characterized by containing a sucrose ester and a lipidic peptide in which a peptide moiety formed of at least two identical or different amino acid repeats is bounded to a lipidic moiety having a C10-C24 aliphatic group.

Abstract: The invention provides a composition for forming a coating film having an ability to suppress adhesion of biological substances, a coating film using the same, a substrate for cell culture using the same, a laminated film and a method for producing a cell aggregate(s). The composition for forming a coating film comprises a polymer containing unit structures represented by the formula (1) and the formula (2): wherein R1 to R3, X1, X2, T1, n1, n2 and n3 are as defined herein but not containing a polysiloxane skeleton, and a solvent.

Abstract: A resist underlayer film-forming composition contains: (A) a compound having a partial structure represented by Formula (1). In Formula (1), R1 and R2 each denote a hydrogen atom, an alkyl group having 1-10 carbon atoms or an aryl group having 6-40 carbon atoms, X denotes an alkyl group having 1-10 carbon atoms, a hydroxyl group, an alkoxy group having 1-10 carbon atoms, an alkoxycarbonyl group having 1-10 carbon atoms, a halogen atom, a cyano group, a nitro group or a combination of these, Y denotes a direct bond, an ether bond, a thioether bond or an ester bond, n is an integer between 0 and 4, and * denotes a site of bonding to a residue of compound (A)); and a solvent.

Abstract: An aqueous sol used in CO2 foam flooding, one of EOR flooding methods for recovering crude oil by injection into the oil reservoir of an onshore or offshore oil field, the aqueous sol increasing foam stability even over a substantial period of time, at high temperatures and pressures, and in salt water, thus improving crude oil recovery rate. The aqueous sol for increasing stability of froth or emulsion in a mixture containing carbon dioxide, water, and oil in CO2 foam flooding of EOR, the sol including silica particles having an average particle diameter of 1 to 100 nm as measured by dynamic light scattering and having surfaces at least partially coated with a silane compound having a hydrolyzable group, the silica particles serving as a dispersoid and dispersed in an aqueous solvent having a pH of 1.0 to 6.0 serving as a dispersion medium.

Abstract: The present invention provides a culture method of cells and/or tissues including culturing cells and/or tissues in a suspended state by using a medium composition having an effect of preventing sedimentation of cells and/or tissues, which is afforded by substantially retaining the cells and/or tissues, without substantially increasing the viscosity of the solution, by nanofibers which have been added to the solution and uniformly dispersed in the liquid medium, and the like.

Abstract: An aqueous sol used in CO2 foam flooding, one of EOR flooding methods for recovering crude oil by injection into the oil reservoir of an onshore or offshore oil field, the aqueous sol increasing foam stability even over a substantial period of time, at high temperatures and pressures, and in salt water, thus improving crude oil recovery rate. The aqueous sol for increasing stability of froth or emulsion in a mixture containing carbon dioxide, water, and oil in CO2 foam flooding of EOR, the sol including silica particles having an average particle diameter of 1 to 100 nm as measured by dynamic light scattering and having surfaces at least partially coated with a silane compound having a hydrolyzable group, the silica particles serving as a dispersoid and dispersed in an aqueous solvent having a pH of 1.0 to 6.0 serving as a dispersion medium.

Abstract: A coating composition can form a cured film which has excellent transparency, hardness, abrasion resistance, adhesion, and weather resistance. The stability of the composition itself is excellent. An optical member has a cured film formed from the coating composition.

Abstract: An object of the present invention is to provide an external pharmaceutical composition that imparts light stability to a ?-blocker (particularly propranolol hydrochloride) and is excellent in the balance between transdermal absorbability and skin retention, and the present invention provides a complex composed of a water-soluble ?-blocker and lecithin, a method for producing the complex, an external pharmaceutical composition containing the complex, and the like. The complex or a dispersion in oil containing the complex is applied to an existing pharmaceutical external preparation formulation (for example, W/O type cream), and a complex containing a ?-blocker is allowed to be present in the O phase, thereby avoiding contact with water or dissolved oxygen and reducing the risk of photolysis.

Abstract: A method for manufacturing a wafer having a functional film, with an outer peripheral part of a top face of the wafer annularly exposed, the method including: spin-coating a high-viscosity coating material that contains a functional film constituent over the top face of the wafer to form a coating film; subsequently, supplying a cleaning liquid to the outer peripheral part of the top face of the wafer and kept rotated to remove the coating film on the outer peripheral part of the top face of the wafer; subsequently, heating the coating film on the wafer to form a fluidity suppressed film; subsequently, supplying a cleaning liquid to the outer peripheral part of the top face of the wafer having the fluidity suppressed film and kept rotated to remove the fluidity suppressed film on the top face of the wafer; and subsequently, heating the fluidity suppressed film on the wafer.