Abstract: A shutter device includes a light blocking unit and a voice coil motor. The voice coil motor includes a permanent magnet module, a guide track assembly and a coil assembly. The coil assembly is arranged on the guide track assembly, and the permanent magnet module is adapted to produce a magnetic field in the guide track assembly. The light blocking unit includes two shutter blades both connecting to the coil assembly. When energized, the coil assembly will produce a magnetic field having a direction same as or opposite to the direction of the magnetic field in the guide track assembly so that the coil assembly moves forward or backward along the guide track assembly to drive the two shutter blades to open or close. A method controls the shutter device. An exposure dose control method is used with a photolithography machine including the shutter device.

Abstract: A projection objective, used for projecting an object space to an image space. The objective includes, from the object space along an optical axis in sequence: a first lens set (G1) having positive focal power, a second lens set (G2) having negative focal power, a third lens set (G3) having positive focal power, a fourth lens set (G4) having negative focal power, and a fifth lens set (G5) having positive focal power. Aspheric lenses are provided in the first lens set (G1), the second lens set (G2), the third lens set (G3), the fourth lens set (G4), and the fifth lens set (G5).

Abstract: An objective lens protection device, objective lens system and lithographic device. The objective lens protection device includes a main structure provided with, oppositely disposed, an air supply unit and extraction unit. The air supply unit is used to output air. The extraction unit extracts air output by the air supply unit to form at least one layer of air curtain between the air supply unit and extraction unit. The objective lens protection device can effectively control the flow rate of wind discharge, controlling wind in a laminar flow state and ensuring uniform flow field of the air curtain, and can effectively block organic matters volatilized from the bottom up, eliminate opportunity for a direct contact of the organic matters with the lens, and prevent objective lens from contamination by the volatilization of the organic matters of photoresist, thus ensuring the imaging quality of the objective lens.

Abstract: A levellable reticle library assembly includes a reticle library assembly (4), a pivot assembly (3) and a frame assembly (2). The reticle library assembly (4) is disposed on the frame assembly (2) so that it is able to be leveled by the pivot assembly (3) via the frame assembly (2), and the reticle library assembly (4) can also be leveled by the frame assembly (2).

Abstract: A debonding leveling device and a debonding method are for leveling during a process for debonding a first object and a second object. The first and second objects are retained by a first fixation plate (11) and a second fixation plate (21), respectively. The device includes: a mounting plate (30), disposed at an outer side of one of the first (11) and second (21) fixation plates; a connecting rod assembly (40) fixed around a center position of the mounting plate (30), the connecting rod assembly (40) connected to the one of the first (11) and second (21) fixation plates sequentially via a sliding pair (50) and a spherical pair (60) connected to the sliding pair (50); and at least three elastic assemblies (70) disposed between the mounting plate and the one of the first and second fixation plates, each of the elastic assemblies coupled to the mounting plate (30) and the one of the first (11) and second (21) fixation plates.

Abstract: An apparatus and method for die defect detection are disclosed. The apparatus includes: a light source unit (10) for emitting light of at least two wavelengths; a beam splitter (40) for receiving the light emitted by the light source unit (10) and splitting it into a first portion and a second portion, the first portion of the light reflected by a die (60) surface under inspection and thereby forming a detection beam; a reference unit (70) for receiving the second portion of the light and processing it into a reference beam; and a detection unit (90) for receiving the detection beam and the reference beam. The reference beam crosses the detection beam at an angle and thus produces interference fringes on a sensing surface of the detection unit (90), based on which a defect parameter of the die (60) surface under inspection is determined. This apparatus is capable of measuring a die with improved accuracy and efficiency and is suitable for the measurement of large dies.

Abstract: An exposure system (10), an exposure apparatus and an exposure method are disclosed. The exposure system (10) includes: a laser unit (11), a light spot switching unit (12) and a lens unit (13); the laser unit (11) is configured for producing a laser beam; the light spot switching unit (12) is configured to direct the laser beam to travel along one of different optical paths based on a desired size of a light spot for a workpiece to be exposed so that a laser beam in correspondence with the desired size of the light spot is obtained; and the lens unit (13) is configured for altering a direction in which the laser beam is incident on the workpiece. The light spot switching unit (12) enables the laser beam to be switched between the different optical paths so as to form light spots sized in different ranges, which can satisfy different needs of workpieces with various critical dimensions.

Abstract: A device and method for measuring amplitude of a scanning mirror are disclosed. The device includes a light source (20) for outputting an optical signal; a diaphragm (21) for modifying size and shape of a light spot of the optical signal output by the light source (20); a scanning mirror retainer for placing a scanning mirror (22) to be measured, the scanning mirror, after being retained, being able to periodically reflect the optical signal; a photoelectric sensor (23) including three or more sensing elements and configured to detect and collect the optical signal reflected by the scanning mirror (22); and a signal acquisition and processing unit (24) for processing a signal collected by the photoelectric sensor (23) to derive an amplitude of the scanning mirror (22). Therefore, it is possible to characterize the scanning mirror (22) before the scanning mirror (22) is used, determining performance of the scanning mirror (22).

Abstract: An automatic optical inspection (AOI) method for inspecting defects on a surface of an object is provided. The method includes: providing at least two different illumination systems; acquiring, by at least one detector, at least two pieces of image information of the object, each piece of image information being acquired under illumination of a corresponding one of the illumination systems; obtaining at least two pieces of surface defect information of the object by analyzing the acquired at least two pieces of image information using a computer and storing at least one of the obtained at least two pieces of surface defect information by the computer; and combining, by the computer, all of the at least two pieces of surface defect information to de-duplicate the at least two pieces of surface defect information and obtain a piece of combined surface defect information.

Abstract: A shutter device includes a movable shading module and a movement control module configured to control movement of the movable shading module. The movable shading module includes a shading unit, a driving unit and a signal measuring unit. The shading unit includes two blades, and the movement control module is configured to generate a control signal. The driving unit is configured to receive the control signal and drive the two blades. The signal measuring unit is configured to measure an operating status of the blades feed it back to the movement control module in real time. The movement control module is configured to update the control signal based on the fed back operating status. This shutter device can overcome the problems of low exposure dose accuracy and light leaks arising from the use of existing shutters and provide various accurately-controlled exposure doses suitable for different applications.

Abstract: An optical measurement device includes: a deformation measurement device for measuring magnitude of deformation of an optical detection platform frame, and a correction module for correcting the position of a substrate carrier and/or the position of an optical detection device according to the magnitude of deformation of the optical detection platform frame, so as to eliminate an error in measurement of mark positions due to deformation of the frame. An optical measurement method is also disclosed.

Abstract: A light spot arrangement, a surface profile measuring method and a method for calculating control data for an exposure field are disclosed. The light spot arrangement includes a plurality of measuring light spots (100) which define at least one set of orthogonal line segments, wherein the measuring light spots (100) lying on the orthogonal line segments radiate outward from a center, with each of the orthogonal line segments defined by at least four measuring light spots. With this light spot arrangement comprising at least one set of orthogonal line segments defined by measuring light spots radiating outward from a center, readings of multiple ones of the light spots (100) can be acquired in real time, and exposure can be performed with real-time focusing and leveling based on a surface profile of the wafer (200) derived from a surface fitting process carried out on the readings.

Abstract: An optical measurement device and method are disclosed. A position measurement device is provided with a device for measuring inclinations of an optical detection module (5) and a substrate carrier (6) which are measured during movement of the optical detection unit and the substrate carrier. Calculation and correction can be made according to the inclination data and with reference to displacements of the optical detection module (5) and the substrate carrier (6) and coordinates of their positions. During measurement for a certain point on the substrate, measured data related to the point is corrected by using the device and the method, which improves measurement precision, thus eliminating a large error caused in measurement for a large-sized substrate (9).

Abstract: A reticle cassette includes a bottom panel, a frame arranged on the bottom panel, and a top cover arranged on the frame, the bottom panel, the frame and the top cover defining a chamber with an opening, the reticle cassette further providing a door panel at one side of the opening. The bottom panel is provided thereon with a plurality of reticle supporting posts each separated from the frame by a lateral gap, and the frame has a longitudinal cross-section comprising H-shaped structures. A web and a bottom surface of the first vertical wall are separated from the bottom panel by vertical gaps. The gaps are arranged between the reticle supporting posts and the frame so as to make the reticle cassette suitable for use with both vacuum suction type and physical clamping type handling forks to pick up the reticle.

Abstract: A flip-chip bonding device and method are disclosed. The bonding device includes: a supply unit (10) for separating a flip-chip (200) from a carrier (100) and providing the flip-chip (200), the supply unit (10) including flipping device (11); a transfer unit (20) for receiving the flip-chip (200) from the flipping device (11); a position adjustment unit (30) for adjusting the positions of flip-chips (200) on the transfer unit (20); a bonding unit (40) for bonding the flip-chips (200) on the transfer unit (20) onto a substrate (400); a transportation unit (50) for transporting the transfer unit (20); and a control unit (60) for controlling the movement of the preceding units. The transfer unit (20) is capable of receiving multiple flip-chips (200) and allows the flip-chips (200) to be bonded simultaneously. This can result in savings in bonding time and an improvement in throughput.

Abstract: A coaxial reticle alignment device, a lithography apparatus and alignment methods are disclosed. The coaxial reticle alignment device includes: illumination modules (A, B), each configured to provide an alignment light beam; a projection objective (8) under a reticle (5); a reference plate (9) on a workpiece stage (12), configured to carry a reference mark (10); and an image detection and processing module (11) under the reference plate (9).

Abstract: A shifting-in/out mechanism includes a connecting block, flat spring made of two segments connected by a hinge, spring deflection assembly and wheel assembly. One segment of the flat spring is connected to the wheel assembly and the other is mounted, by the connecting block, on an object to be moved. The spring deflection assembly provides a driving force for deflecting the segment of the flat spring connected to the wheel assembly toward a movement supporting surface. A shifting-in/out device for a workpiece stage of a photoetching machine includes a bottom frame, air spring, air-cushion device and plurality of the mechanisms arranged on a lower or side surfaces of the bottom frame. In the mechanism, the flat spring has two segments hinged together. All locations of the flat spring that are stressed to cause deflection of the flat spring are substantially on a single line.

Abstract: A heat exchange apparatus, heat exchange method, and vapour deposition device. The heat exchange apparatus performs cooling processing on a target object to be cooled, and has a heat exchanger, cooling water channels, water circulation channels and switchers. The cooling water channels realize heat exchange between cooling water and the heat exchanger. The water circulation channels perform temperature control on the target object to be cooled. The switchers disconnect the water circulation channels from the target object to be cooled, and realize the connection between the cooling water channels and the target object to be cooled. The heat exchange apparatus can also realize cooling with the cooling water provided by a cooling water inlet pipe when the heat exchanger fails, ensuring that the target object to be cooled, in particular a process cavity, can be subjected to effective cooling in any circumstances, to ensure normal production.

Abstract: A measurement device for measuring a thin film on a transparent substrate is disclosed which includes, disposed sequentially along the direction of light propagation, a light source (1), a collimator lens (2), a filter (3), a polarizer (4), a beam splitter (5) and an objective lens (7). To the beam splitter (5) are connected a planar array detector (11) and a processor (13). Light emitted by the light source (1) sequentially passes through the collimator lens (2), the filter (3), the polarizer (4), the beam splitter (5) and the objective lens (7) and thereby forms a measuring light incident on the thin film. The objective lens (7) and the beam splitter (5) gather light reflected from the thin film, and the planar array detector (11) and the processor (13) measure physical parameters of the thin film based on the gathered reflected light. The device further includes a stop configured to block interfering light reflected from the transparent substrate during the measurement.

Abstract: A focusing and leveling device calculates an amount of defocus and/or tilt of a substrate and includes an illumination unit, projection-side mark plate with projection-side slit mark, projection-side imaging group, deflection prism, beam splitter, detection unit and signal processing unit. A light beam emitted from the illumination unit passes through the projection-side mark plate and is trimmed into a probe beam directed by the projection-side imaging group onto a substrate surface. The prism deflects the probe beam reflected by the surface of the substrate for a first time so that it is incident on the substrate surface and reflected for a second time onto the projection-side imaging group. The beam splitter directs the probe beam that travelled through the projection-side imaging group onto the detection unit. The signal processing unit calculates the amount of defocus and/or tilt based on a measurement spot detected by the detection unit.