Abstract: In a coating apparatus, a nozzle moving mechanism selectively grips any one of a plurality of coating solution nozzles, moves the gripped coating solution nozzle and a solvent nozzle together, and moves at least the solvent nozzle to a solvent suction unit. The moved solvent nozzle is caused to dispense a solvent to the solvent suction unit, and the gripped coating solution nozzle is caused to suck the solvent retained in the same solvent suction unit to which the solvent has been dispensed. Thus, since dispensation and suction of the solvent are done in the same solvent suction unit, the quantity of the solvent used can be held down. Further, a supply line for supplying the solvent does not need to be provided for the suction unit. The construction of the suction unit can therefore be made simple, and its cost can be held down.

Abstract: A substrate is rotated with a holding rotator to form a coating liquid film on the substrate, and at least a part of an excess of the coating liquid is pushed out toward a periphery edge of the substrate by a centrifugal force caused by the rotation of the substrate to build up the excess of the coating liquid along the periphery edge of the substrate. Moreover, gas is blown to the periphery edge of the substrate through a gas nozzle to exhaust the excess of the coating liquid building up at the periphery edge. Blowing the gas toward the periphery edge of the substrate through the gas nozzle makes the coating liquid unbalanced that builds up without being exhausted outside the substrate due to its surface tension. Accordingly, the rotation achieves the coating liquid film having a uniform thickness while the coating liquid film is formed to be thick.

Abstract: In one embodiment, a spin coating apparatus includes a coating liquid feeding module to drop a coating liquid onto a substrate, and a motor to rotate the substrate. The module drops a first drop amount of the coating liquid onto the substrate at a first discharge rate, while the motor rotates the substrate at a first number of rotations. The module drops a second drop amount of the coating liquid onto the substrate at a second discharge rate larger than the first discharge rate, while the motor rotates the substrate at a second number of rotations smaller than the first number of rotations, after the first drop amount of the coating liquid is dropped. The module discharges the coating liquid onto the substrate at a third discharge rate smaller than the second discharge rate, after the coating liquid is discharged onto the substrate at the second discharge rate.

Abstract: A method of treating, tuning, assembling, and/or overhauling a twin rotor device (200, 1200) includes applying a coating material (102) on an internal set of working surfaces (218, 222, 224, 226, 228, 1218, 1222, 1224, 1226, 1228) of the twin rotor device when at least partially assembled. The coating may be factory or field applied to a new or used twin rotor device. The working surfaces may be uncoated or previously coated and may be built-up as the coating material forms a coating (206, 1206) on at least some of the working surfaces. Manufacturing variations of a pair of rotors (220, 1220) and a housing (210, 1210) may be compensated by the coating. One or more performance characteristics of the twin rotor device may be improved by the coating, and variation between a series of twin rotor device may be reduced or substantially eliminated. The coating may reduce internal leakage and increase volumetric efficiency of the twin rotor device.

Abstract: A device and method for dispensing liquid spin-on glass (SOG) onto semiconductor wafers. The method includes dispensing liquid SOG through a dispenser nozzle, detecting liquid SOG outside of the dispenser nozzle, indicating the presence of liquid SOG in an abnormal length relative to the dispenser nozzle and adjusting a suck back (SB) valve to withdraw liquid SOG from the abnormal length.

Abstract: Assemblies and methods of use are disclosed for repairing the coating of a coated wellbore line. A wellbore line can be cleaned and then coated with a repair material before being pulled through a die to shape the coating and then being pulled through setting section to set the repair material. The repair material can be a thermoplastic material that is set by cooling, or a thermoset material that is set by heating. The wellbore line can be repaired upon exiting a wellbore or being unspooled from a reel.

Abstract: A coating technique and a priming material are provided. In an exemplary embodiment, the coating technique includes receiving a substrate and identifying a material of the substrate upon which a layer is to be formed. A priming material is dispensed on the material of the substrate, and a film-forming material is applied to the priming material. The priming material includes a molecule containing a first group based on an attribute of the substrate material and a second group based on an attribute of the film-forming material. Suitable attributes of the substrate material and the film-forming material include water affinity and degree of polarity and the first and second groups may be selected to have a water affinity or degree of polarity that corresponds to that of the substrate material and the film-forming material, respectively.

Abstract: The present disclosure relates to a primer composition. The primer composition comprises: a tert butyl acetate solvent; an organometallic reagent selected from organotitanates, organozirconates, aluminum organometallic compounds, and any combination thereof; an organotin compound; a silane with at least 3 hydrolyzable groups; and a polyorganosiloxane resin. Optionally, the primer composition further comprises a second solvent different from the tert butyl acetate solvent.

Abstract: A group of inventions is related to process equipment to process surfaces in mass production, particularly, vacuum process equipment to apply thin film coatings with set optical, electrical and other parameters. The technical result is to ensure a capability of processing flexible large substrates, as well as small substrates with a high degree of coating uniformity, with an ability to utilize a wide range of technologies and process devices, as well as to have a highly effective useful operation of applied materials. The proposed technical result is obtained by a method of applying thin film coatings on substrates, which are placed on rotating drums, which consequently move along the processing zones with the same constant linear and angular speeds. Furthermore, a ratio between the linear and angular speeds of the drum is selected so that each surface point of the drum will complete at least two full revolutions while passing through the processing zone.

Abstract: The present invention is directed to repair compositions for thermal barrier coatings and methods of use thereof. The repair compositions include a ceramic composition, a colloidal solution, an aqueous binder, an aqueous dispersant, and an aqueous ammonia solution. The ceramic composition includes a first population of yttria-stabilized zirconia particles having a mean diameter from about 250 nm to about 1000 nm, a second population of yttria-stabilized zirconia particles having a mean diameter from about 2 ?m to about 10 ?m, and a third population of yttria-stabilized zirconia particles having a mean diameter from about 20 ?m to about 250 ?m. One method includes depositing the repair layer onto the damaged region, the repair layer including the repair composition, and heat treating the repair layer.

Abstract: A processing method in one embodiment includes: a step that takes an image of the end face of a reference substrate, whose warp amount is known, over the whole periphery thereof using a camera to obtain shape data of the end face of the reference substrate over the whole periphery of the reference substrate; a step that takes an image of the end face of a substrate over the whole periphery thereof using a camera to obtain shape data of the end face of the substrate over the whole periphery of the substrate; a step that calculates warp amount of the substrate based on the obtained shape data; a step that forms a resist film on a surface of the substrate; a step that determines the supply position from which an organic solvent is to be supplied to a peripheral portion of the resist film and dissolves the peripheral portion by the solvent supplied from the supply position to remove the same from the substrate.

Abstract: An adhesion layer formed of a thin film can be formed on a surface of a substrate. An adhesion layer forming method of forming the adhesion layer on the substrate includes supplying a coupling agent onto the substrate 2 while rotating the substrate 2. The substrate 2 is rotated at a low speed equal to or less than 300 rpm and the coupling agent diluted with IPA is supplied onto the substrate 2.

Abstract: According to one embodiment, provided is a coating apparatus. The coating apparatus includes a first discharger, a second discharger, and a third discharger. The first discharger discharges a first liquid on a top surface of a substrate. In addition, the second discharger discharges a second liquid of which surface tension is higher than surface tension of the first liquid on the top surface of the substrate. In addition, the third discharger is disposed in a side outer than the first discharger in the substrate and discharges a gas on the top surface of the substrate.

Abstract: Use of a non-solvent for the edge bead removal of spin-coated PZT or PLZT thinfilms, eliminates swelling of the exposed edges of the PZT or PLZT thinfilms and eliminates delamination and formation of particle defects in subsequent bake and anneal steps.

Abstract: A polymer based coating for application to rolled stock, such as aluminum is provided. A device for applying the polymer based coatings is also provided. Polymer based coatings applied to rolled stock, such as aluminum, are advantageous compared to anodized coatings since the polymers are self-leveling and may be applied to lower grades of aluminum, while still providing a smooth and durable surface finish.

Abstract: An adhesive-distributing device for use in repairing or reconditioning a hollow profile includes an adapter body, in which is arranged at least one channel system made up of at least two channels connected to one another. At least one channel is connected to an injection opening for injecting adhesive into the channel system. Each channel is designed with at least one exit opening.

Abstract: The present disclosure provides methods, device, and system for wafer processing. The wafer processing apparatus uses lid dispenser to disperse at least one reagent to the surface of the wafer. Further, the wafer is positioned on top of a rotatable vacuum chuck configured to spread at least one reagent over the surface of the wafer via a centrifugal force or surface tension, thereby permitting the at least one reagent to react with an additional reagent. Further, when dispensing the at least one reagent, a separation gap between the lid dispenser and the wafer is at a predetermined distance, for example, from 50 ?m to 2 mm.

Abstract: A developing apparatus includes: a substrate holder that hold a substrate horizontally; a developer nozzle that supplies a developer onto the substrate to form a liquid puddle; a turning flow generation mechanism including a rotary member that rotates about an axis perpendicular to the substrate while the rotary member is being in contact with the liquid puddle thereby to generate a turning flow in the liquid puddle of the developer formed on the substrate; and a moving mechanism for moving the turning flow generation mechanism along a surface of the substrate. The line-width uniformity of a pattern can be improved by forming turning flows in a desired region of the substrate and stirring the developer.

Abstract: A method of forming a self-cleaning coating on a substrate comprises the step of selecting a substrate, cleaning the substrate, and/or roughening the substrate using an abrasive. In an embodiment, roughening of the substrate create microscopic tortuous grooves. Another embodiment of the method comprises coating the roughened surface with at least one hydrophobic chemical agent. In an exemplary embodiment, the hydrophobic chemical agent covalently binds with the substrate creating nanoscopic grooves. Another embodiment of the present disclosure pertains to an apparatus for depositing a self-cleaning coating on a flat substrate. A further embodiment of the present disclosure pertains to a self-cleaning coating on a substrate comprising a hydrophobic chemical agent covalently bonded to at least one roughened surface of the substrate.

Abstract: A processing system and method for depositing a film on a substrate by liquid phase ALD is disclosed in various embodiments. The method includes providing the substrate in a process chamber, spinning on the substrate a first reactant in a first liquid to form a self-limiting layer of the first reactant on the substrate, spinning on the substrate a second reactant in a second liquid, where the second reactant reacts with the self-limiting layer of the first reactant on the substrate to form a film on the substrate, and repeating the spinning steps at least once until the film has a desired thickness. Other embodiments of the invention further include rinsing the substrate to remove excess first and second reactants from the substrate, and heat-treating the substrate during and/or following the film deposition.