Abstract: A method for manufacturing an isolating layer onto a crucible includes the steps as follows: providing a spraying device for the following spraying steps; heating the crucible and measuring the heated crucible to get a first temperature; spraying a slurry on the inner wall of the crucible to form an isolating layer by a spraying unit with a predetermined spraying manner; measuring the isolating layer to get a second temperature; obtaining a value for the difference between the first and second temperatures and judging whether the difference value in a within predetermined difference scope or not, in which the predetermined difference scope is about 6° C.˜12° C.; when the difference value is not in the predetermined difference scope, adjusting the predetermined spraying manner; when the difference value is in the predetermined difference scope, implementing the above spraying steps to the crucible.

Abstract: A method for forming a photoresist layer on a semiconductor device is disclosed. An exemplary includes providing a wafer. The method further includes spinning the wafer during a first cycle at a first speed, while a pre-wet material is dispensed over the wafer and spinning the wafer during the first cycle at a second speed, while the pre-wet material continues to be dispensed over the wafer. The method further includes spinning the wafer during a second cycle at the first speed, while the pre-wet material continues to be dispensed over the wafer and spinning the wafer during the second cycle at the second speed, while the pre-wet material continues to be dispensed over the wafer. The method further includes spinning the wafer at a third speed, while a photoresist material is dispensed over the wafer including the pre-wet material.

Abstract: A developing method can perform a developing process on a resist film that is exposed to light. The developing method includes forming a developing solution film by supplying a developing solution onto a surface of a substrate having thereon a resist film that is exposed to light; thinning the developing solution film by pushing out the developing solution containing components dissolved from the resist film; and supplying a new developing solution onto the thinned developing solution film.

Abstract: A coating apparatus includes: a rotation holding unit configured to hold and rotate a substrate; a coating liquid supply unit configured to supply a coating liquid onto a surface of the substrate; and a control unit configured to control the rotation holding unit and the coating liquid supply unit. The control unit performs: controlling the coating liquid supply unit to supply the coating liquid onto an encircling line surrounding a rotational center of the substrate while controlling the rotation holding unit to rotate the substrate; followed by controlling the coating liquid supply unit to supply the coating liquid onto a central area; and followed by controlling the rotation holding unit to rotate the substrate at an angular velocity greater than that when the coating liquid is supplied onto the encircling line.

Abstract: Systems and methods are provided for fabricating pyrite thin films from molecular inks. A process is provided that comprises dissolving simple iron-bearing and sulfur-bearing molecules in an appropriate solvent and then depositing the solution onto an appropriate substrate using one of several methods (roll-to-roll coating, spraying, spin coating, etc.), resulting in a solid film consisting of the molecules. These molecular precursor films are then heated to 200-600° C. in the presence of sulfur-bearing gases (e.g., S2, H2S) to convert the molecular films into films of crystalline iron pyrite (FeS2).

Abstract: An optically transparent, hydrophobic coating, exhibiting an average contact angle of at least 100 degrees with a drop of water. The coating can be produced using low-cost, environmentally friendly components. Methods of preparing and using the optically transparent, hydrophobic coating.

Abstract: A panel including a surface made of a synthetic material may be subjected to a material removal process to create a specific decorative or architectural appearance. In one embodiment, a panel of cellular PVC is blasted with an abrasive material such as crushed glass to create a realistic stucco appearance on the panel surface. Benefits related to using certain synthetic materials as cladding may be realized, such as weather resistance. A coating containing aggregate may be applied to the blasted panel to enhance the surface appearance.

Abstract: Provided is a multi-phase process for conditionally treating MIC by evaluating whether MIC-correlating conditions exist, the degree of MIC, if present, and then applying a concomitant MIC-mitigating treatment which is adjusted in its degree of aggressiveness in proportion to MIC severity. The disclosed methodology allows, in part, for the continuous or periodic monitoring and assessment of MIC risk in petroleum-based equipment (e.g., pipeline) and the administering of a treatment that corresponds to the level of severity of the MIC resulting in a more fine-tuned, localized, and cost-effective treatment.

Abstract: A method of sealing an aircraft wing vent stringer may include placing a movable sealant sled in a vent stringer cavity of an aircraft wing. The sealant sled may include a sealant source configured to apply sealant to a wing portion within the vent stringer. The sealant sled may be transported through the cavity in a longitudinal direction defined by the wing, thereby applying a layer of sealant to the wing. In some cases, vent stringer may be abraded and/or washed before sealing. In some cases, two or more layers of sealant may be applied, one of which may be a secondary fuel barrier.

Abstract: A method includes rotating a wafer at a first speed for a first time duration. The wafer is rotated at a second speed that is lower than the first speed for a second time duration after the first time duration. The wafer is rotated at a third speed that is higher than the second speed for a third time duration after the second time duration. A photoresist is dispensed on the wafer during the first time duration and at least a portion of a time interval that includes the second time duration and the third time duration.

Abstract: The invention relates to a method and to an apparatus for avoiding surface defects, which are caused by zinc dust, on galvanized metal strip in continuous strip galvanization, in which metal strip which is to be galvanized and is heated in a continuous annealing furnace is moved through a furnace pipe in protective furnace gas and is immersed into a zinc bath, wherein the furnace pipe is provided with injection openings via which the front side and the rear side of the metal strip can be acted upon with protective furnace gas, and wherein extraction openings for extracting protective furnace gas loaded with zinc vapor are arranged adjacent to the injection openings.

Abstract: An ultra dense and ultra low power microhotplates using silica aerogel and method of making the same, comprising spin coating an aerogel layer followed by SiO2 as capping interlayer, and Nichrome (Ni80/Cr20) for heating element to increase the efficiency of metal oxide gas sensors. There may be multiple thin layers of aerogel separated by interlayers such as of SiO2.

Abstract: Catalytic metal nanoparticles can be attached on a base. A pre-treatment method for plating includes a catalytic particle-containing film forming process of forming a catalytic particle-containing film on a surface of a substrate by supplying, onto the substrate, a catalytic particle solution which is prepared by dispersing the catalytic metal nanoparticles and a dispersing agent in a solvent containing water; a first heating process of removing moisture contained at least in the catalytic particle-containing film by heating the substrate to a first temperature; and a second heating process of polymerizing the dispersing agent to have a sheet shape by heating the substrate to a second temperature higher than the first temperature after the first heating process and fixing the catalytic metal nanoparticles on a base layer by covering the catalytic metal nanoparticles with the sheet-shaped dispersing agent.

Abstract: The present disclosure provides methods for removing defects nanotube application solutions and providing low defect, highly uniform nanotube fabrics. In one aspect, a degassing process is performed on a suspension of nanotubes to remove air bubbles present in the solution. In another aspect, a continuous flow centrifugation (CFC) process is used to remove small scale defects from the solution. In another aspect, a depth filter is used to remove large scale defects from the solution. According to the present disclosure, these three methods can be used alone or combined to realize a low defect nanotube application solutions and fabrics.

Abstract: Disclosed herein are systems and methods for treating a surface, such as a gas turbine surface, with a filming agent using an inlet bleed heat manifold. A filming control system includes a storage tank configured to contain a filming agent; an inlet bleed heat manifold; and a supply conduit coupled to the storage tank on a first end and the inlet bleed heat manifold on a second end; wherein the filming control system is configured to deliver the filming agent from the storage tank and to discharge the filming agent through the inlet heat bleed manifold and the filming agent includes siloxane, fluorosilane, mercapto silane, amino silane, tetraethyl orthosilicate, succinic anhydride silane, or a combination including at least one of the foregoing.

Abstract: A method for forming a coating layer includes spraying coating material having a first flowability onto a substrate; performing a first spin coating process with a first spin speed to form an initial coating layer; and performing a first baking process to the initial coating layer to form a first material layer having a second flowability and a second material layer having a third flowability. The third flowability is less than the first flowability but larger than the second flowability, which is less than the first flowability. Further, the method includes performing a second spin coating process with a second spin speed to drive the coating material in the second material layer flowing on the surface of the first material layer to form a third material layer with a uniform thickness, and performing a second baking process to form a final coating layer on the substrate.

Abstract: A method for coating a surface of a material involves contacting a surface of a material with a surface activator containing a fluoride-containing compound and an organic solvent to form an activated surface, contacting the activated surface with a protective reagent to form an initial coated surface, and contacting the initial coated surface with a thinning agent containing a fluoride-containing compound and a surfactant to from a final coated surface, wherein the final coated surface is coated with a protective coating that is covalently bonded to the surface of the material.

Abstract: Provided is a vertical annealing furnace, in which a heating zone and a soaking zone are communicated with each other in the upper part of the furnace, in which a part of the furnace other than the communicated parts is separated by a dividing wall, in which part of the furnace gas is suctioned into a refiner having a deoxidation device and a dehumidification device which is placed outside the furnace to decrease the dew point of the gas by removing oxygen and moisture from the gas and such that the resultant gas having a decreased dew point is returned into the furnace, in which a gas suction port into the refiner is located in the lower part of the connection part between the soaking zone and the cooling zone and in which one or more gas suction ports are located in the parts of the heating zone and/or the soaking zone outside of an area within 6 m in the vertical direction and 3 m in the longitudinal direction of the furnace from the steel strip entrance in the lower part of the heating zone.

Abstract: A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other.

Abstract: A gauge and method of use. The gauge includes a body configured to removeably mount to substrate chuck of a spin apply coating tool, the body rotatable about an axis passing through a center of the chuck; an extendable arm having a first end mounted to the body, the extendable arm having a retracted position and a deployed position, a second end of the arm including an upper finger and a lower finger, the upper finger configured to be positioned above a rim of the coat apply bowl and the lower finger positioned below the rim of the coat apply bowl in the deployed position when the coat apply bowl is mounted in the spin apply tool; and wherein the gauge provides an error indication when the gauge is rotated about the axis and the coat apply bowl is not installed in the spin apply coating tool correctly.