Patents Examined by S. Leon Bashore
  • Patent number: 4720327
    Abstract: Distillative separation of liquid mixtures of one or more water-insoluble substances which have boiling points higher than that of water and one or more substances which have boiling points lower than that of water or which form azeotropes having boiling points lower than that of water, wherein the mixture to be distilled is mixed with a quantity of water such that the boiling point of the water under the pressure applied limits the bottom temperature of the mixture of substances to be separated.
    Type: Grant
    Filed: September 20, 1982
    Date of Patent: January 19, 1988
    Assignee: BASF Aktiengesellschaft
    Inventors: Werner Aquila, Axel Nissen, Gerd Kaibel, Michael Horner, Walter Rebafka
  • Patent number: 4720326
    Abstract: An amine is separated from an aqueous solution of amine and volatile organic compounds by distillation in a column. The vapors generated during distillation are condensed. The condensed vapors are then passed into a separating device in which the volatile organic compounds are removed. The liquid remaining in the separating device is then fed to the head of the distillation column. Water is removed from the column in a sidestream and diamine is the residue. This process is particularly effective in recovering aromatic diamines from solutions which accumulate during hydrogenation of dinitro aromatic compounds.
    Type: Grant
    Filed: February 13, 1987
    Date of Patent: January 19, 1988
    Assignee: Bayer Aktiengesellschaft
    Inventors: Heiko Beckhaus, Harro Witt, Dieter Becher, Hermann Dallmeyer, Uwe J. Zarnack
  • Patent number: 4719772
    Abstract: A process and apparatus for removing ink particles from an inked paper product which includes a conveyor for conveying the paper product along a path, the conveyor being constructed of a semi-permeable material that passes the ink particles while retaining the paper product. Vacuum boxes are positioned proximate to a first side of the conveyor for establishing a pressure differential across the conveyor and across a first segment of the path to draw the ink particles from the paper product through the conveyor. Shower heads on a second side of the conveyor directed a liquid toward the conveyor and on to the paper product as the paper product is advanced along the second segment of the path.
    Type: Grant
    Filed: February 24, 1987
    Date of Patent: January 19, 1988
    Assignee: Michael Scheck
    Inventor: Remberto P. Bastanzuri
  • Patent number: 4718980
    Abstract: A two-stage pulp refining system in which the fibrous material from the first stage refiner is in contact with an alkaline bleaching solution between refining stages at a temperature of 32.degree.-96.degree. C. and at a consistency of 15-25% on an oven dry basis. The material is then diluted and then pressed to a consistency of at least 20% and passes through the second stage refiner.
    Type: Grant
    Filed: December 30, 1985
    Date of Patent: January 12, 1988
    Assignee: Weyerhaeuser Company
    Inventors: Leonard E. Lowrie, William L. Duncan
  • Patent number: 4718977
    Abstract: Structure and method for metallization patterns of different thicknesses on a semiconductor device or integrated circuit. The improved structure and method utilizes three layers of metal in order to reduce the required number of processing steps. One preferred embodiment entails a single metal deposition sequence followed by two etch steps, while a second embodiment, suitable for thicker metallization, requires only two depositions and two etch steps.
    Type: Grant
    Filed: September 6, 1985
    Date of Patent: January 12, 1988
    Assignee: SGS Microelettronica S.p.A.
    Inventors: Claudio Contiero, Giulio Iannuzzi, Giorgio De Santi, Fabrizio Andreani
  • Patent number: 4718973
    Abstract: In a silicon integrated circuit manufacturing process a layer of polysilicon is ion implanted with an n-type dopant and etched through a mask with a fluorine:chlorine mixture. The etchant undercuts at the mask to an extent dependent on the ratio of chlorine:fluorine and on the dopant level. By appropriately selecting that ratio and dopant level, polysilicon islands having a rounded profile can be achieved, this being most efficacious for subsequent deposition onto the polysilicon.
    Type: Grant
    Filed: May 19, 1986
    Date of Patent: January 12, 1988
    Assignee: Northern Telecom Limited
    Inventors: Thomas Abraham, Robert E. Theriault
  • Patent number: 4718985
    Abstract: A system for diaphragm distillation of a liquid, for example for desalination of salt water, comprising a diaphragm, through which vapor, but not liquid can pass, and a condensation surface for condensing vapor having passed through the diaphragm, and necessary passageways. According to the invention, the system comprises one or several units, each of which comprises a plurality of pipes located one within the other, viz. a first (1) inner pipe, a second (2) pipe located outside thereof and consisting of a diaphragm of the aforesaid kind, and a third (3) pipe located outside the second (2) pipe, which first (1) and third (3) pipes are of a gas-tight material, that said unit is surrounded by a fourth (4) gas-tight pipe, where a first (5) passageway is formed by the first (1) pipe and a second (6), a third (7) and a fourth (8) passageway are formed between said pipes (1,2;2,3;3,4) in successive order in the direction from the inside outward.
    Type: Grant
    Filed: January 29, 1986
    Date of Patent: January 12, 1988
    Assignee: Svenska Utvecklings AB
    Inventor: Nils Kjellander
  • Patent number: 4719009
    Abstract: Certain water dissipatable polyester materials containing ether groups and metal sulfonate groups are useful as depressants for siliceous gangue in the froth flotation separation of zinc sulfide concentrates from complex ores containing, minerals of other metals such as lead and iron, as well as various silicon compounds. The polyester materials ae effective in amounts ranging from about 0.03 to about 1.5 kg/tonne of ore feed. Zinc rougher concentrates when conditioned with the depressant yields zinc cleaner concentrates containing less than about 1.5% silica without the need for extensive regrinding of the rougher concentrate. Particularly useful polyester material is prepared from an acid component of from about 80 to 85 mole % isophthalic acid with the remainder comprising mainy 5-sodiosulfoisopthalic acid, and a diol component of from about 50 to 60 mole % diethylene glycol with the remainder comprising mainly 1.4-cyclohexanedimethanol.
    Type: Grant
    Filed: July 7, 1986
    Date of Patent: January 12, 1988
    Assignees: Cominco Ltd., Eastman Kodak Company
    Inventors: James T. Furey, Richard J. Lobban, Michael Palmer
  • Patent number: 4718986
    Abstract: High purity butene-1, in particular polymerization grade butene-1, is obtained by means of a two-stage fractionation of a C.sub.4 hydrocarbon stream comprising butene-1 which is substantially free from butadiene.The first stage of the fractionation process allows practically all the isobutane contained in the C.sub.4 batch to be separated as the top stream.The bottom phase of the first stage of fractionation is supplied to the second stage of fractionation thus obtaining high purity butene-1 as the top fraction, and the remaining components as the bottom phaseAccording to the process of the invention, vapors of butene-1 obtained as the top stream from the second stage of fractionation are compressed and the resultant heat of condensation is used for operating the reboilers of the two fractionation stages.
    Type: Grant
    Filed: September 4, 1986
    Date of Patent: January 12, 1988
    Assignee: Snamprogetti, S.p.A.
    Inventors: Renzo Comiotto, Bruno De Maglie
  • Patent number: 4718972
    Abstract: A method of making a printed circuit board is disclosed wherein metallic seed particles are applied to a surface of the substrate. An image of the desired conductor pattern is defined by a maskant layer to permit the subsequent electroless deposition of the conductor material upon the exposed seeded areas of the substrate. Then, the substrate surface is subjected to a plasma discharge to facilitate removal of the seed particles.
    Type: Grant
    Filed: January 24, 1986
    Date of Patent: January 12, 1988
    Assignee: International Business Machines Corporation
    Inventors: Suryadevara V. Babu, William F. Herrmann, Joseph G. Hoffarth, Voya Markovich, Robert T. Wiley
  • Patent number: 4717445
    Abstract: A method for determining the etch bias of a particular semiconductor device feature layer material in a given etch process employing a hard mask reference material that changes very little or not at all during the etch under examination, and using a cross-sectional examination of the critical dimensions to determine the bias. Silicon dioxide would be a suitable hard mask material for a plasma etch bias study, for example. Preferably, a scanning electron microscope would determine the etch bias in one microphotograph. The need for optically taking two or more separate measurements to optically determine the etch bias, and the possiblility for incorporating error between measurements, is eliminated. In addition, the contribution of photoresist erosion to the etch bias of the device feature layer may be independently determined.
    Type: Grant
    Filed: March 24, 1986
    Date of Patent: January 5, 1988
    Assignee: Motorola, Inc.
    Inventor: Howard K. H. Leung
  • Patent number: 4717453
    Abstract: The device comprises a head box with a nozzle for applying a pulp suspension on a wire located below the nozzle. A pressure plate is located after the nozzle over the pulp suspension. The pressure plate comprises a concave formed portion, against which the pulp suspension is sprayed, and a subsequent convex formed portion. The fiber web is formed in a forming zone where dewatering is effected in that the convex portion of the pressure plate and an unsupported portion of the wire are pressed against each other.
    Type: Grant
    Filed: December 9, 1985
    Date of Patent: January 5, 1988
    Assignee: Molnlycke Aktiebolag
    Inventor: Per L. Reiner
  • Patent number: 4717448
    Abstract: A process for forming deep (>6.mu.m) trenches in a silicon substrate. The substrate is etched through a silicon oxide mask in a plasma having 75%-86% HCl, 9%-16% O.sub.2, and 1%-8% BCl.sub.3. The resulting trenches have substantially vertical sidewalls and rounded bottom surfaces. The plasma etch is performed at high power and low pressure, so that it achieves a high aspect ratio at a minimum etch bias.
    Type: Grant
    Filed: October 9, 1986
    Date of Patent: January 5, 1988
    Assignee: International Business Machines Corporation
    Inventors: Randy D. Cox, Arthur B. Israel, Edward H. Payne
  • Patent number: 4717450
    Abstract: A method of removing chloride ions in preference to oxidized sulfur ions, in particular sulfate or thiosulphate ions from a process solution containing either or both, or sulfide ions which are first oxidized to sulfate or thiosulphate ions. The method utilizes an electrochemical reactor having an anode and a cathode, disposed in respective anode and cathode compartments, separated by an ion selective separator, typically an anion exchange membrane. The process solution acts as the catholyte and is placed or flowed through the cathode chamber while simultaneously, an electrically conducting anolyte is placed or flowed through the anode chamber. A sufficient current density is maintained between the anode and the cathode, which at any time is not substantially greater than, and is preferably equal to, that which corresponds to the maximum chloride flux through the reactor membrane at the time.
    Type: Grant
    Filed: August 19, 1985
    Date of Patent: January 5, 1988
    Assignee: University of British Columbia
    Inventors: John M. Shaw, Colin W. Oloman
  • Patent number: 4717446
    Abstract: A method of detecting the endpoint of expitaxially grown silicon using a monitor wafer is described. A monitor wafer having a substrate, an oxide layer, and a polysilicon layer is process in an epi chamber along with working wafers. The monitor wafer is used to determine the endpoint of the working wafers epi layer when the epi layer is etched.
    Type: Grant
    Filed: September 18, 1986
    Date of Patent: January 5, 1988
    Assignee: Motorola Inc.
    Inventors: Andrew G. Nagy, Donald K. Stemple, Clarence J. Tracy
  • Patent number: 4717674
    Abstract: A method for determining the extent of polymerization of an epoxy system consisting of adding a fluorescent label, the label having a reactivity similar to the reactivity of the curing agent, to the epoxy system and measuring the fluorescence intensity during polymerization. The fluorescence intensity of the label at its emission maximum increases sharply with polymerization, allowing one to follow cure reactions in a quantitative way by measuring fluorescence, especially in the later stages of cure beyond gelation. The composition, reactivity ratio, activation energy and weight-average molecular weight can also be determined by adding a label, such as p,p'-diaminoazobenzene (DAA) or trans diamine-stilbene (DAS), to mimic the reactivity of the curing agent, such as diaminodiphenyl sulfone (DDS) or methylene dianiline (MDA), and measuring the UV-VIS spectra in addition to the fluorescence intensity.
    Type: Grant
    Filed: June 25, 1986
    Date of Patent: January 5, 1988
    Inventor: Chong S. P. Sung
  • Patent number: 4717470
    Abstract: A method for classifying sand wherein a mixture of sand and water is introduced into a classification tank (7) partially filled with water. Depending on the weight of the sand grains, the grains of sand will precipitate at the bottom (8) of the tank (7) at graduated distances from an inlet pipe (6), the heavier particles nearest the inlet and the lighter particles farther away.To prevent large quantities of fines, i.e., sand grains between about 0.002 mm and 0.006 mm in size, from being lost by being washed out of the tank (7) together with the overflow water, the water from the tank (7) is recirculated by means of a pump (14) so that the water becomes progressively more saturated with fines, which means that larger amounts of fines will precipitate in the tank (7).Because the water is recirculated, water consumption can be reduced by 2/3, and at the same time the problem of the overflow water from the tank (7) is also reduced.
    Type: Grant
    Filed: July 29, 1985
    Date of Patent: January 5, 1988
    Inventor: Ivar Apeland
  • Patent number: 4717454
    Abstract: A process for removing by product acetone from reaction mixtures obtained by reacting methyl acetate and/or dimethylether with carbon monoxide at elevated temperatures to obtain acetic anhydride in the presence of a catalyst system consisting essentially of carbonyl complexes of noble metals belonging to group VIII of the Periodic System of the elements, acetic acid, an organophosphorus or organonitrogen compound, and methyl iodide whereby the acetone obtained as a by-product during the reaction is subjected to condensation at temperatures of 50.degree. to 250.degree. C., under pressures of 0.01 to 150 bars and at a molar ratio as above defined for the catalyst system constituent of 1:(25-500):(10-100):(15-150) so as to obtain predominantly higher-boiling secondary products to be distillatively separated in a successive distillation zone together with volatile constituents of the catalyst system.
    Type: Grant
    Filed: September 10, 1985
    Date of Patent: January 5, 1988
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Heinz Erpenbach, Klaus Gehrmann, Peter Horstermann, Georg Kohl
  • Patent number: 4716021
    Abstract: An apparatus is provided for the heat treatment of polyolefin resin particles. The apparatus is equipped with an autoclave in which the particles are heated and agitated in the presence of an aqueous medium and dispersing agent. The autoclave has a tilted bottom wall portion, over which an impeller, preferably, a turbine-type impeller is provided.
    Type: Grant
    Filed: July 9, 1986
    Date of Patent: December 29, 1987
    Assignee: Japan Styrene Paper Corp.
    Inventors: Hiroyuki Akiyama, Susumu Izawa, Shigeru Okabe, Toru Yamaguchi
  • Patent number: 4715951
    Abstract: A counterflow separator is provided having a feed pipe for bulk material opening into the top of a chamber housing. A discharge conduit radial extends from the top of the housing and an inlet conduit for classifying air extends radially into the housing at its lower portion. The housing is provided with a wall section below the orifice of the feed pipe, which section expands conically outwardly into a collecting hopper. The conical wall section permits the design of a braking stretch longer than its own length, thus reducing the requirement for classifying air, without causing a deterioration in the classifying quality.
    Type: Grant
    Filed: October 21, 1986
    Date of Patent: December 29, 1987
    Assignee: Waeschle Maschinenfabrik GmbH
    Inventors: Wolfgang Krambrock, Hans Hoppe