Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

Abstract: To provide a thermal cycling system allowing an efficient thermal cycling and an optical detection during the diagnostic process a thermal cycling system is proposed, comprising: at least one heating device (10a, 10b) having a transparent substrate (11a, 11b) and a heating element (12a, 12b), and a chamber (30) adapted to receive a sample, the chamber (30) is placed adjacent to at least one heating device (10a, 10b), wherein at least a part of the chamber (30) comprises a transparent area (31) aligned with the transparent substrate (11a, 11b) of the at least one heating device (10a, 10b). Thereby, the speed and efficiency of the thermal system is increased. Moreover, an optical detection of the sample is possible.

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

Abstract: An ultrasound transducer is configured to be driven at multiple frequencies including a main frequency for efficient production of ultrasound waves and at least one alternative frequency, at which little or no ultrasound is generated and rather heat is generated in the ultrasound transducer for heating a sample.

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

Abstract: In a lithographic apparatus, a liquid supply system to provide a liquid to a space between the table and an optical element and to contact a surface of the optical element, the space having a cross-sectional area smaller than the area of the substrate, the liquid supply system comprising a liquid confinement structure extending along at least a part of a boundary of the space between the optical element surface and the table, wherein at least part of the liquid confinement structure is positioned between the optical element surface and the table, the at least part of the liquid confinement structure has an aperture through which the patterned beam can pass, the liquid confinement structure comprises an inlet to supply the liquid to the space above the aperture, and the liquid confinement structure comprises an outlet to remove the liquid, supplied by the inlet, from the space below the aperture.

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Abstract: An optical detection system for monitoring real-time PCR reactions in a plurality of sample chambers with a plurality of optical units is provided. Due to a relative movement, the optical units are relative to the sample chambers, color multiplexing and space multiplexing are combined for optically detecting pathogens in a sample during the process of the PCR and delivering a quantitative result.

Abstract: In order to provide heating means for an ultrasonic application setup, adapted for heating a sample (20) gently and fast and saving costs and space, an ultrasound transducer (10) capable of being driven at multiple frequencies including a main frequency for efficient production of ultrasound waves and at least one alternative frequency, at which almost no ultrasound is generated, a system for sample analysis comprising such an ultrasound transducer (10) and a method for controlling such an ultrasound transducer (10) are proposed, wherein the ultrasound transducer (10) is driven either at the main frequency for generating ultrasonic waves or at the alternative frequency for generating heat in the ultrasound transducer (10), if the sample (20) is to be heated.

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.

Abstract: An optical detection system for monitoring real-time PCR reactions in a plurality of sample chambers with a plurality of optical units is provided. Due to a relative movement, the optical units are relative to the sample chambers, color multiplexing and space multiplexing are combined for optically detecting pathogens in a sample during the process of the PCR and delivering a quantitative result.