Patents by Inventor Aleksey Kolesnychenko
Aleksey Kolesnychenko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20060230959Abstract: An imprint template configured to imprint an imprintable medium by an imprint lithography process is disclosed, the imprint template having a pattern with a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of a contact face of the imprint template, wherein adjacent regions of the pattern on the imprint template contact face, each of which will provide different functionality once imprinted onto a substrate, have substantially the same pattern density, have differences in pattern density which are minimized, or differences in pattern density which are maintained below a maximum.Type: ApplicationFiled: April 19, 2005Publication date: October 19, 2006Applicants: ASML NETHERLANDS B.V., KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Peter Bartus Meijer, Aleksey Kolesnychenko
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Publication number: 20060232756Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.Type: ApplicationFiled: September 30, 2005Publication date: October 19, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Antonius Theodorus Derksen, Christiaan Hoogendam, Aleksey Kolesnychenko, Erik Loopstra, Theodorus Modderman, Johannes Catharinus Mulkens, Roelof Aeilko Ritsema, Klaus Simon, Joannes De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Santen, Sjoerd Nicolaas Donders
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Publication number: 20060196377Abstract: An imprinting method is disclosed that involves, in an embodiment, redistributing a volume of imprintable medium in a flowable state over a target portion of a surface of a substrate into regions of differing volume corresponding to regions of differing pattern density of an imprint pattern of a template, contacting the medium while in the flowable state with the template to form the imprint pattern in the medium, subjecting the medium to conditions to change the medium into a substantially non-flowable state, and separating the template from the medium while in the substantially non-flowable state.Type: ApplicationFiled: March 7, 2005Publication date: September 7, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Erik Loopstra, Aleksey Kolesnychenko, Helmar Santen
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Publication number: 20060180952Abstract: An imprinting method is disclosed that includes applying an imprinting force to a template to cause the template to contact an imprintable medium on a target region of a first surface of a substrate to form an imprint in the medium, during application of the imprinting force, applying a compensating force to a second surface of the substrate which is opposite to the first surface so as to reduce deformation of the substrate caused by the application of the imprinting force, and separating the template from the imprinted medium.Type: ApplicationFiled: February 17, 2005Publication date: August 17, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Kruijt-Stegeman, Henricus Janssen, Aleksey Kolesnychenko, Helmar Santen
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Publication number: 20060150849Abstract: An imprinting method is provided that, according to an embodiment, involves contacting an imprintable medium on a substrate with a template to define an imprint area in the medium, removing at least some of any imprintable medium present outside the imprint area, and separating the template from the medium.Type: ApplicationFiled: December 30, 2004Publication date: July 13, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Helmar Van Santen, Aleksey Kolesnychenko
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Publication number: 20060154179Abstract: An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the medium, allowing the medium to substantially cure such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while the medium is in the substantially non-flowable state.Type: ApplicationFiled: January 7, 2005Publication date: July 13, 2006Applicants: ASML NETHERLANDS B. V., KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Helmar Van Santen, Aleksey Kolesnychenko, Jacobus Neijzen, Emile Verstegen
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Publication number: 20060144274Abstract: An imprinting method is disclosed, in which an embodiment involves subjecting an imprintable medium on a substrate to conditions such that the medium is at a first temperature so that it is in a flowable state, the imprintable medium comprising an imprint material selected from a group consisting of: a crystalline material and a polycrystalline material, pressing a template into the medium to form an imprint in the medium, cooling the medium to a second temperature such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while in the substantially non-flowable state.Type: ApplicationFiled: December 30, 2004Publication date: July 6, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Aleksey Kolesnychenko, Helmar Santen, Yvonne Kruijt-Stegeman, Erik Loopstra
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Publication number: 20060144814Abstract: An imprinting method is disclosed, which in an embodiment, involves contacting an imprintable medium on a substrate with a template to form an imprint in the medium comprising a pattern feature and an area of reduced thickness, separating the template from the imprinted medium, and, after separating the template from the imprinted medium, providing a layer of an etch resistant material on the pattern feature.Type: ApplicationFiled: December 30, 2004Publication date: July 6, 2006Applicants: ASML NETHERLANDS B.V., KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Aleksey Kolesnychenko, Helmar Santen, Yvonne Kruijt-Stegeman, Peter Meijer
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Publication number: 20060138350Abstract: A lithographic apparatus includes a source for generating radiation, an illumination system for conditioning the radiation, a patterning device for patterning the conditioned radiation, and a projection system for projecting the patterned radiation onto a target portion of a substrate. The illumination system includes a debris mitigating system for mitigating debris particles that are released with the generation of radiation, and an optical system for collecting the radiation. The debris mitigation system is arranged to directly evaporate the debris particles, or to directly charge the debris particles, or to directly produce a plasma out of the debris particles, or any combination thereof, in a path along which the radiation propagates from the source to the optical system.Type: ApplicationFiled: December 28, 2004Publication date: June 29, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Aleksey Kolesnychenko, Johannes Hubertus Josephina Moors, Frank Jeroen Pieter Schuurmans
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Publication number: 20060023189Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.Type: ApplicationFiled: September 30, 2005Publication date: February 2, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Antonius Theodorus Derksen, Christiaan Hoogendam, Aleksey Kolesnychenko, Erik Loopstra, Theodorus Modderman, Johannes Catharinus Mulkens, Roelof Aeilko Ritsema, Klaus Simon, Joannes De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Santen
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Publication number: 20050264778Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.Type: ApplicationFiled: June 1, 2004Publication date: December 1, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Erik Bijlaart, Roelof Aeilko Ritsema, Frank Schaik, Timotheus Sengers, Klaus Simon, Joannes De Smit, Arie Den Boef, Hans Butler, Sjoerd Donders, Christiaan Hoogendam, Marcus Van De Kerkhof, Aleksey Kolesnychenko, Mark Kroon, Erik Loopstra, Hendricus Meijer, Jeroen Maria Mertens, Johannes Mulkens, Joost Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Publication number: 20050263068Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.Type: ApplicationFiled: October 18, 2004Publication date: December 1, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Christiaan Hoogendam, Bob Streefkerk, Johannes Catharinus Mulkens, Erik Theodorus Bijlaart, Aleksey Kolesnychenko, Erik Loopstra, Jeroen Johannes Sophia Mertens, Bernardus Slaghekke, Patricius Aloysius Tinnemans, Helmar Van Santen
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Publication number: 20050231694Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.Type: ApplicationFiled: April 14, 2004Publication date: October 20, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Aleksey Kolesnychenko, Johannes Jacobus Baselmans, Sjoerd Donders, Christiaan Hoogendam, Hans Jansen, Jeroen Johannes Mertens, Johannes Mulkens, Felix Peeters, Bob Streefkerk, Franciscus Johannes Teunissen, Helmar Santen
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Patent number: 6952253Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.Type: GrantFiled: November 12, 2003Date of Patent: October 4, 2005Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Publication number: 20050174549Abstract: An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.Type: ApplicationFiled: February 9, 2004Publication date: August 11, 2005Applicants: ASML NETHERLANDS B.V., KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Paulus Duineveld, Peter Dirksen, Aleksey Kolesnychenko, Helmar Van Santen
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Publication number: 20050148211Abstract: A device manufacturing method is disclosed. The method includes patterning a beam of radiation with a patterning device, projecting the patterned beam of radiation onto a target portion of a substrate, supplying a chemical reagent to a chamber that holds the patterning device and/or the substrate, and removing water from the chamber with use of the chemical reagent.Type: ApplicationFiled: October 29, 2004Publication date: July 7, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Aleksey Kolesnychenko, Ralph Kurt, Carolus Ida Spee
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Publication number: 20050134815Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.Type: ApplicationFiled: December 23, 2003Publication date: June 23, 2005Applicant: ASML Netherlands B.V.Inventors: Helmar Van Santen, Aleksey Kolesnychenko
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Publication number: 20050018155Abstract: A lithographic projection apparatus wherein a liquid supply system provides a space between a projection system and a substrate with liquid. The liquid supply system comprises a member. A liquid seal is formed between the member and the substrate by a flow of liquid. In an embodiment, the liquid seal is formed by a flow of liquid from an inlet to an outlet of the member.Type: ApplicationFiled: June 23, 2004Publication date: January 27, 2005Applicant: ASML NETHERLANDS B. V.Inventors: Henrikus Herman Cox, Sjoerd Nicolaas Donders, Christiaan Hoogendam, Aleksey Kolesnychenko, Erik Loopstra, Helmar Santen
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Publication number: 20050002004Abstract: Liquid is supplied to a space between a projection system of a lithographic apparatus and a substrate, but there is a space between the liquid and the substrate. An evanescent field may be formed between the liquid and the substrate allowing some photons to expose the substrate. Due to the refractive index of the liquid, the resolution of the system may be improved and liquid on the substrate may be avoided.Type: ApplicationFiled: June 14, 2004Publication date: January 6, 2005Applicant: ASML NITHERLANDS B.V.Inventors: Aleksey Kolesnychenko, Jan Van Der Werf
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Publication number: 20040207824Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.Type: ApplicationFiled: November 12, 2003Publication date: October 21, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen