Patents by Inventor Aleksey Kolesnychenko
Aleksey Kolesnychenko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20080303870Abstract: The invention provides an ink jet device for the positioning of a substance onto a substrate, the device comprising at least a print head comprising a nozzle provided to eject a droplet comprising the substance, the ink jet device further comprising at least one heating element arranged such that the substrate can be heated prior to, during and/or after the landing of a droplet on the substrate.Type: ApplicationFiled: December 19, 2006Publication date: December 11, 2008Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Roy Gerardus Franciscus Antonius Verbeek, Richard Joseph Marinus Schroeders, Aleksey Kolesnychenko
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Publication number: 20080266546Abstract: The invention relates to a device for analyzing one or more samples for the presence, amount or identity of one or more analytes in the samples, whereby the device comprises a focal microstructure for improving the signal/background ratio of an optical detection of the analytes.Type: ApplicationFiled: December 15, 2006Publication date: October 30, 2008Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Aleksey Kolesnychenko, Peter Dirksen, Yuri Aksenov
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Publication number: 20080218726Abstract: Lithographic Apparatus and Device Manufacturing Method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.Type: ApplicationFiled: April 9, 2008Publication date: September 11, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Sjoerd Nicolaas Lambertus Donders
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Publication number: 20080186459Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.Type: ApplicationFiled: July 31, 2007Publication date: August 7, 2008Applicant: ASML NETHERLANDS B.VInventors: Helmar Van Santen, Aleksey Kolesnychenko
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Patent number: 7394521Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.Type: GrantFiled: December 23, 2003Date of Patent: July 1, 2008Assignee: ASML Netherlands B.V.Inventors: Helmar Van Santen, Aleksey Kolesnychenko
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Patent number: 7388648Abstract: A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table. The liquid confinement structure is positioned adjacent a final surface of the projection system and includes a first inlet configured to supply a liquid, through which a patterned beam is to be projected, to the space, and a second inlet configured to supply gas and formed in a face of the structure. The face is arranged to oppose a surface of the substrate and the second inlet is located radially outward, with respect to an optical axis of the projection system, of the space and has a porous member to evenly distribute gas flow over an area of the second inlet.Type: GrantFiled: September 30, 2005Date of Patent: June 17, 2008Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Patent number: 7372541Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.Type: GrantFiled: September 30, 2005Date of Patent: May 13, 2008Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Sjoerd Nicolaas Lambertus Donders
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Publication number: 20070268471Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.Type: ApplicationFiled: February 26, 2007Publication date: November 22, 2007Applicant: ASML Netherlands B.V.Inventors: Joeri Lof, Hans Butler, Sjoerd Donders, Aleksey Kolesnychenko, Erik Loopstra, Hendricus Meijer, Jeroen Johannes Mertens, Johannes Mulkens, Roelof Ritsema, Frank Schaik, Timotheus Sengers, Klaus Simon, Joannes De Smit, Alexander Straaijer, Helmar Santen
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Publication number: 20070225859Abstract: The invention relates to an intelligent wardrobe management system for advising appropriate clothing to a user. It comprises a wardrobe controller which is arranged to: receive input data, said input data comprising information about the clothing in a wardrobe; receive user data; process said input data and said user data; and output, on the basis thereof, a clothing proposal to the user. The system facilitates and accelerates the user's access to the wardrobe.Type: ApplicationFiled: May 9, 2005Publication date: September 27, 2007Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Aleksey Kolesnychenko, Coen Theodorus Hubertus Liedenbaum
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Publication number: 20070141191Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: ApplicationFiled: December 21, 2005Publication date: June 21, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Kruijt-Stegeman, Raymond Knaapen, Johan Dijksman, Krassimir Krastev, Sander Wuister, Aleksey Kolesnychenko, Karel Van Der Mast, Klaus Simon
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Publication number: 20070132970Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.Type: ApplicationFiled: June 8, 2006Publication date: June 14, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Erik Bijlaart, Hans Butler, Sjoerd Donders, Christiaan Hoogendam, Aleksey Kolesnychenko, Erik Loopstra, Hendricus Meijer, Jeroen Johannes Mertens, Johannes Catharinus Mulkens, Roelof Ritsema, Frank Van Schaik, Thimotheus Sengers, Klaus Simon, Joannes De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Publication number: 20070132979Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.Type: ApplicationFiled: July 7, 2006Publication date: June 14, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Erik Maria Bijlaart, Roelof Aeilko Ritsema, Frank Schaik, Timotheus Sengers, Klaus Simon, Joannes De Smit, Arie Den Boef, Hans Butler, Sjoerd Lambertus Donders, Christiaan Hoogendam, Marcus Van De Kerkhof, Aleksey Kolesnychenko, Mark Kroon, Erik Loopstra, Hendricus Maria Meijer, Jeroen Sophia Maria Mertens, Johannes Hubertus Mulkens, Joost Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Santen
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Publication number: 20070104813Abstract: A lithographic apparatus is disclosed that includes an imprint template and a radiation source configured to cure photosensitive material, the radiation source including a laser or a light emitting diode. An imprint template is also disclosed.Type: ApplicationFiled: November 3, 2006Publication date: May 10, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Sander Wuister, Aleksey Kolesnychenko, Johan Dijksman, Yvonne Kruijt-Stegeman, Ivar Schram
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Publication number: 20070023976Abstract: A lithographic apparatus is disclosed that has an imprint template and a substrate table configured to hold a substrate, the imprint template having a patterned surface, a layer of heat absorbing material provided on the patterned surface of the imprint template.Type: ApplicationFiled: July 26, 2005Publication date: February 1, 2007Applicant: ASML NETHERLANDS B.V.Inventor: Aleksey Kolesnychenko
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Publication number: 20070018360Abstract: A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.Type: ApplicationFiled: July 21, 2005Publication date: January 25, 2007Applicant: ASML Netherlands B.V.Inventors: Aleksey Kolesnychenko, Helmar Santen, Yvonne Kruijt-Stegeman
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Publication number: 20060280829Abstract: A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.Type: ApplicationFiled: June 13, 2005Publication date: December 14, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Kruijt-Stegeman, Aleksey Kolesnychenko, Erik Loopstra, Johan Dijksman, Helmar Santen, Sander Wuister
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Publication number: 20060275524Abstract: An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal.Type: ApplicationFiled: May 25, 2006Publication date: December 7, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Helmar Santen, Aleksey Kolesnychenko, Yvonne Kruijt-Stegeman
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Publication number: 20060267231Abstract: An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal.Type: ApplicationFiled: May 27, 2005Publication date: November 30, 2006Applicant: ASML Netherlands B.V.Inventors: Helmar Van Santen, Aleksey Kolesnychenko, Yvonne Kruijt-Stegeman
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Publication number: 20060268256Abstract: A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.Type: ApplicationFiled: May 27, 2005Publication date: November 30, 2006Applicant: ASML Netherlands B.V.Inventors: Aleksey Kolesnychenko, Helmar Santen, Yvonne Kruijt-Stegeman
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Publication number: 20060231979Abstract: An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template and a substrate table, the template holder having a gas bearing configured to supply gas via a high pressure channel and to control a separation distance between the imprint template and a substrate held on the substrate table.Type: ApplicationFiled: April 19, 2005Publication date: October 19, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Helmar Santen, Aleksey Kolesnychenko