Patents by Inventor Aleksey Kolesnychenko

Aleksey Kolesnychenko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040160582
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
    Type: Application
    Filed: November 12, 2003
    Publication date: August 19, 2004
    Applicant: ASML Netherlands B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Publication number: 20040105084
    Abstract: A lithographic apparatus having a supply to a space in the apparatus of a composition including at least one of one or more perhalogenated C1-C6 alkanes and one or more compounds including one or more nitrogen atoms and one or more atoms selected from hydrogen, oxygen and halogen. The activation of the alkane(s) and compound(s) provides reactive species which are capable of highly selective etching of hydrocarbon species while minimizing damage to sensitive optical surfaces.
    Type: Application
    Filed: September 29, 2003
    Publication date: June 3, 2004
    Applicant: ASML Netherlands B.V.
    Inventors: Ralph Kurt, Aleksey Kolesnychenko