Patents by Inventor An-Pang Tu

An-Pang Tu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210189075
    Abstract: Provided are a liquid crystal polymer (LCP) film and a laminate comprising the same. The LCP film has a first surface and a second surface opposite each other, and a ratio of a ten-point mean roughness relative to a maximum height (Rz/Ry) of the first surface is from 0.30 to 0.62. By controlling Rz/Ry of at least one surface of the LCP film, the peel strength of the LCP film stacked to a metal foil can be increased, and the laminate comprising the same can still maintain the merit of low insertion loss.
    Type: Application
    Filed: January 22, 2020
    Publication date: June 24, 2021
    Inventors: An-Pang TU, Chia-Hung WU, Chien-Chun CHEN
  • Publication number: 20210189059
    Abstract: Provided are a laminate, a circuit board, and a liquid crystal polymer (LCP) film comprised therein. The laminate comprises a metal foil and an LCP film. The LCP film in the laminate has a dissipation factor before water absorption (Df?0), a dissipation factor after water absorption (Df?1), and a relative percentage difference between dissipation factors (?Df?), which is calculated by the following equation: ? ? D ? f ? ? ? ( % ) = ? Df 1 ? - D ? f 0 ? ? D ? f 0 ? × 1 ? 00 ? % ; wherein ?Df? may be less than or equal to 16%. By controlling ?Df? of the LCP film in the laminate, the insertion loss of a circuit board comprising a laminate during signal transmission in low-, medium-, and/or high-frequency bands is decreased and/or inhibited. In addition, the difference between the insertion losses of signal transmission before and after water absorption is decreased, so the laminate is suitable for high-end or outdoor high-frequency electronic products.
    Type: Application
    Filed: December 18, 2020
    Publication date: June 24, 2021
    Inventors: An-Pang TU, Chien-Chun CHEN, Chia-Hung WU
  • Patent number: 10961208
    Abstract: Products of glycidyl ether of a mono or polyhydric phenol as well as methods to manufacture the same. In some instances, the product of glycidyl ether of a mono or polyhydric phenol has an epoxy equivalent weight (“EEW”) and a hydroxyl value (“HV”), wherein the epoxy equivalent weight multiplied by the hydroxyl value (EEWxHV) is a value from 1 to 10. A process for producing the product of glycidyl ether of a mono or polyhydric phenol typically includes reacting an epihalohydrin with a mono or polyhydric phenol in the presence of a catalyst to produce a halohydrin ether; and dehalogenating the halohydrin ether to form the product of glycidyl ether of a mono or polyhydric phenol.
    Type: Grant
    Filed: December 24, 2019
    Date of Patent: March 30, 2021
    Assignee: CHANG CHUN PLASTICS CO., LTD.
    Inventors: Sung-Kuang Chung, An-Pang Tu
  • Patent number: 10899871
    Abstract: The present invention provides epoxy resin compounds comprising a high phosphorus and oxazolidone content, methods to prepare these epoxy resin compounds, curable compositions comprising these epoxy resins, and cured epoxy resin compounds by curing the curable epoxy resin compounds comprising a high phosphorus and oxazolidone content.
    Type: Grant
    Filed: April 23, 2019
    Date of Patent: January 26, 2021
    Assignee: CHANG CHUN PLASTICS CO., LTD.
    Inventors: Szu-Fang Chen, Sung-Kuang Chung, An-Pang Tu, Gai-Chi Chen, Zhao-Ming Chen, Kuen-Yuan Hwang
  • Publication number: 20200339736
    Abstract: The present invention provides epoxy resin compounds comprising a high phosphorus and oxazolidone content, methods to prepare these epoxy resin compounds, curable compositions comprising these epoxy resins, and cured epoxy resin compounds by curing the curable epoxy resin compounds comprising a high phosphorus and oxazolidone content.
    Type: Application
    Filed: April 23, 2019
    Publication date: October 29, 2020
    Inventors: Szu-Fang CHEN, Sung-Kuang CHUNG, An-Pang TU, Gai-Chi CHEN, Zhao-Ming CHEN, Kuen-Yuan HWANG
  • Patent number: 10570254
    Abstract: A preparation method of a polyurethane resin including the following steps is provided. A liquid polyamine compound is placed in a continuous reaction system, and the liquid polyamine compound is circulated in the continuous reaction system. A solid bis(cyclic carbonate) and a solid catalyst are placed in the continuous reaction system to mix the solid bis(cyclic carbonate), solid catalyst, and liquid polyamine compound to form a heterogeneous mixture. The heterogeneous mixture is heated in the continuous reaction system in a microwave manner, such that the heterogeneous mixture reacts to form a polyurethane resin.
    Type: Grant
    Filed: October 31, 2017
    Date of Patent: February 25, 2020
    Assignees: National Tsing Hua University, Chang Chun Plastics Co., Ltd., Chang Chun Petrochemical Co., Ltd.
    Inventors: David S. H. Wong, Kan-Nan Chan, Ping-Lin Yang, An-Pang Tu, En-Ko Lee
  • Patent number: 10544261
    Abstract: The present invention relates to a phosphinated poly(2,6-dimethy phenylene oxide)oligomer, specifically an unsaturated group-containing phosphinated poly(2,6-dimethy phenylene oxide)oligomer, and processes for producing the same. A thermoset produced from the unsaturated group-containing phosphinated poly(2,6-dimethy phenylene oxide)oligomers according to the present invention exhibits flame retardancy and has a low dielectric constant and dissipation factor and a high glass transition temperature.
    Type: Grant
    Filed: October 7, 2016
    Date of Patent: January 28, 2020
    Assignee: Chang Chun Plastics Co., Ltd.
    Inventors: Ching Hsuan Lin, Ping-Chieh Wang, An-Pang Tu, Kuen-Yuan Hwang, Chun Yu Tseng
  • Patent number: 10545403
    Abstract: The present invention provides a photosensitive resin composition, comprising: (a) photo-polymerizable unsaturated compound, (b) hydroxyurethane compound, and (c) photoinitiator. The photosensitive resin composition can be used as photoresist coating for dry film photoresist to manufacture the electronic components, such as print circuit board and so on. Further, the (b) hydroxyurethane compound having [CC]/[NH2] between 0.5 and 0.9, which increases the resolution, adhesion, and stripping ability of photosensitive resin composition for dry film photoresist, and improves the effectiveness and the quality of dry film photoresist for manufacturing printed circuit board and other electric component.
    Type: Grant
    Filed: October 23, 2017
    Date of Patent: January 28, 2020
    Assignee: CHANG CHUN PLASTICS CO., LTD.
    Inventors: Gai-Chi Chen, Yun-Chung Wu, An-Pang Tu, Kuen-Yuan Hwang
  • Patent number: 10259970
    Abstract: The present invention is to provide polyether compounds having epoxy hydroxyl urethane group, as the following formula (I), (II) or (III) shows: and waterborne epoxy resin composition. Using the hydroxyl urethane as emulsifier, the obtained waterborne epoxy resin composition of the present invention has better stability and freeze-thaw resistance.
    Type: Grant
    Filed: April 13, 2017
    Date of Patent: April 16, 2019
    Assignee: CHANG CHUN PLASTICS CO., LTD.
    Inventors: Gai-Chi Chen, Chia-En Wu, An-Pang Tu, Kuen-Yuan Hwang
  • Publication number: 20190077912
    Abstract: A preparation method of a polyurethane resin including the following steps is provided. A liquid polyamine compound is placed in a continuous reaction system, and the liquid polyamine compound is circulated in the continuous reaction system. A solid bis(cyclic carbonate) and a solid catalyst are placed in the continuous reaction system to mix the solid bis(cyclic carbonate), solid catalyst, and liquid polyamine compound to form a heterogeneous mixture. The heterogeneous mixture is heated in the continuous reaction system in a microwave manner, such that the heterogeneous mixture reacts to form a polyurethane resin.
    Type: Application
    Filed: October 31, 2017
    Publication date: March 14, 2019
    Applicants: National Tsing Hua University, Chang Chun Plastics Co., Ltd., Chang Chun Petrochemical Co., Ltd.
    Inventors: David S. H. Wong, Kan-Nan Chan, Ping-Lin Yang, An-Pang Tu, En-Ko Lee
  • Patent number: 10138325
    Abstract: Polyphenolic condensates and epoxidized products prepared from said condensates are prepared by a reaction utilizing multi catalysts to control the weight average molecular weight (Mw) and the number average molecular weight (Mn). Improved color and ultraviolet absorbance are possessed by the condensates described herein.
    Type: Grant
    Filed: April 28, 2017
    Date of Patent: November 27, 2018
    Assignee: CHANG CHUN PLASTICS CO., LTD.
    Inventors: Yu-Jen Chen, Sung-Kuang Chung, Chang-Lin Hung, An-Pang Tu, Kuen-Yuan Hwang
  • Publication number: 20180120700
    Abstract: The present invention provides a photosensitive resin composition, comprising: (a) photo-polymerizable unsaturated compound, (b) hydroxyurethane compound, and (c) photoinitiator. The photosensitive resin composition can be used as photoresist coating for dry film photoresist to manufacture the electronic components, such as print circuit board and so on. Further, the (b) hydroxyurethane compound having [CC]/[NH2] between 0.5 and 0.9, which increases the resolution, adhesion, and stripping ability of photosensitive resin composition for dry film photoresist, and improves the effectiveness and the quality of dry film photoresist for manufacturing printed circuit board and other electric component.
    Type: Application
    Filed: October 23, 2017
    Publication date: May 3, 2018
    Inventors: Gai-Chi CHEN, Yun-Chung WU, An-Pang TU, Kuen-Yuan HWANG
  • Publication number: 20170327629
    Abstract: Polyphenolic condensates and epoxidized products prepared from said condensates are prepared by a reaction utilizing multi catalysts to control the weight average molecular weight (Mw) and the number average molecular weight (Mn). Improved color and ultraviolet absorbance are possessed by the condensates described herein.
    Type: Application
    Filed: April 28, 2017
    Publication date: November 16, 2017
    Inventors: Yu-Jen CHEN, Sung-Kuang CHUNG, Chang-Lin HUNG, An-Pang TU, Kuen-Yuan HWANG
  • Publication number: 20170321080
    Abstract: The present invention is to provide polyether compounds having epoxy hydroxyl urethane group, as the following formula (I), (II) or (III) shows: and waterborne epoxy resin composition. Using the hydroxyl urethane as emulsifier, the obtained waterborne epoxy resin composition of the present invention has better stability and freeze-thaw resistance.
    Type: Application
    Filed: April 13, 2017
    Publication date: November 9, 2017
    Inventors: Gai-Chi CHEN, Chia-En WU, An-Pang TU, Kuen-Yuan HWANG
  • Publication number: 20170101507
    Abstract: The present invention relates to a phosphinated poly(2,6-dimethy phenylene oxide)oligomer, specifically an unsaturated group-containing phosphinated poly(2,6-dimethy phenylene oxide)oligomer, and processes for producing the same. A thermoset produced from the unsaturated group-containing phosphinated poly(2,6-dimethy phenylene oxide)oligomers according to the present invention exhibits flame retardancy and has a low dielectric constant and dissipation factor and a high glass transition temperature.
    Type: Application
    Filed: October 7, 2016
    Publication date: April 13, 2017
    Applicant: Chang Chun Plastics Co., Ltd.
    Inventors: Ching Hsuan Lin, Ping-Chieh Wang, An-Pang Tu, Kuen-Yuan Hwang, Chun Yu Tseng
  • Patent number: 9605109
    Abstract: The instant disclosure relates to phosphorus-containing compounds that can be used to form flame retardant phosphorus-containing resins, and also can serve as a hardener for a flame retardant epoxy resin compositions. In particular, the phosphorus-containing compounds are modified with acyloxy groups (—O—(C?O)—R), as shown below. Incorporation of the acyloxy groups results in resins that are water resistant and exhibit improved dielectric properties.
    Type: Grant
    Filed: March 10, 2016
    Date of Patent: March 28, 2017
    Assignee: Chang Chun Plastics Co. Ltd.
    Inventors: An-Pang Tu, Szu-Fang Chen, Ping-Chieh Wang, Kuen-Yuan Hwang
  • Patent number: 9546262
    Abstract: The instant disclosure relates to phosphorus-containing compounds that can be used to form flame retardant phosphorus-containing resins, and also can serve as a hardener for a flame retardant epoxy resin compositions. In particular, the phosphorus-containing compounds are modified with acyloxy groups (—O—(C?O)—R), as shown below. Incorporation of the acyloxy groups results in resins that are water resistant and exhibit improved dielectric properties.
    Type: Grant
    Filed: November 4, 2015
    Date of Patent: January 17, 2017
    Assignee: Chang Chun Plastics Co. Ltd.
    Inventors: An-Pang Tu, Szu-Fang Chen, Ping-Chieh Wang, Kuen-Yuan Hwang
  • Patent number: 9527962
    Abstract: A series of novel phosphorus-containing compounds having the following formula is provided: in which: R1-R4, A, Q and m are as defined in the specification. A process for the preparation of the compound of formula (I) is also provided. A polymer of formula (PA), and preparation process and use thereof are further provided. A polymer of formula (PI), and preparation process and use thereof are also provided.
    Type: Grant
    Filed: April 14, 2015
    Date of Patent: December 27, 2016
    Assignees: Chang Chun Plastics Co., Ltd., National Chung Hsing University
    Inventors: Ching-Hsuan Lin, Tsung Li Lin, Yu-Ting Fang, Kuen-Yuan Hwang, An-Pang Tu
  • Patent number: 9499505
    Abstract: The subject invention is related to a process for the epoxidation of olefin with peroxide, comprising reacting peroxide with olefin in the presence a solvent, wherein the solvent has Hansen Solubility Parameters (HSPs) of ?T,solvent and ?H,solvent and the epoxide product has Hansen Solubility Parameters (HSPs) of ?T,product and ?H,product, and wherein: ?T,product?6??T,solvent??T,product+6, and ?H,product?6??H,solvent.
    Type: Grant
    Filed: September 17, 2015
    Date of Patent: November 22, 2016
    Assignee: Chang Chun Plastics Co., Ltd.
    Inventors: Sung-Kuang Chung, Ping-Chieh Wang, An-Pang Tu, Kuen-Yuan Hwang
  • Publication number: 20160177023
    Abstract: The subject invention is related to a continuous process of epoxidation of an olefin with supported heteropoly acid catalyst, which does not involve the use of an additive(s). The subject invention separates the products and oxides through a continuous process to reduce backmixing, thereby achieving an efficacy equal to that of a process involving the use of an additive. By excluding additives from the process, the subject invention has a lower cost, and avoids the need for additional wastewater treatment since no alkali metal or alkali earth metal compound is formed during the reaction. Moreover, the continuous process of the invention is also beneficial in industrial manufacturing.
    Type: Application
    Filed: December 15, 2015
    Publication date: June 23, 2016
    Applicant: Chang Chun Plastics Co., Ltd.
    Inventors: Shih-De Yang, Ping-Chieh Wang, An-Pang Tu, Kuen-Yuan Hwang