Abstract: Methods for programming sense flags may include programming memory cells coupled to first data lines in a main memory array, and programming memory cells coupled to second data lines in the main memory array while programming memory cells coupled to data lines in a flag memory array with flag data indicative of the memory cells coupled to the second data lines being programmed. Methods for sensing flags may include performing a sense operation on memory cells coupled to first data lines of a main memory array and memory cells coupled to data lines of a flag memory array, and determining a program indication of memory cells coupled to second data lines of the main memory array from the sense operation performed on the memory cells coupled to the data lines of the flag memory array.

Abstract: In a memory device, odd bit lines of a flag memory cell array are connected with a short circuit to a dynamic data cache. Even bit lines of the flag memory cell array are disconnected from the dynamic data cache. When an even page of a main memory cell array is read, the odd flag memory cells, comprising flag data, are read at the same time so that it can be determined whether the odd page of the main memory cell array has been programmed. If the flag data indicates that the odd page has not been programmed, threshold voltage windows can be adjusted to determine the states of the sensed even memory cell page.

Abstract: In a memory device, odd bit lines of a flag memory cell array are connected with a short circuit to a dynamic data cache. Even bit lines of the flag memory cell array are disconnected from the dynamic data cache. When an even page of a main memory cell array is read, the odd flag memory cells, comprising flag data, are read at the same time so that it can be determined whether the odd page of the main memory cell array has been programmed. If the flag data indicates that the odd page has not been programmed, threshold voltage windows can be adjusted to determine the states of the sensed even memory cell page.

Abstract: Methods for forming a string of memory cells, an apparatus having a string of memory cells, and a system are disclosed. A method for forming the string of memory cells comprises forming a metal silicide source material over a substrate. The metal silicide source material is doped. A vertical string of memory cells is formed over the metal silicide source material. A semiconductor material is formed vertically and adjacent to the vertical string of memory cells and coupled to the metal silicide source material.

Abstract: Memory devices, methods for programming sense flags, methods for sensing flags, and memory systems are disclosed. In one such memory device, the odd bit lines of a flag memory cell array are connected with a short circuit to a dynamic data cache. The even bit lines of the flag memory cell array are disconnected from the dynamic data cache. When an even page of a main memory cell array is read, the odd flag memory cells, comprising flag data, are read at the same time so that it can be determined whether the odd page of the main memory cell array has been programmed. If the flag data indicates that the odd page has not been programmed, threshold voltage windows can be adjusted to determine the states of the sensed even memory cell page.

Abstract: Methods of programming memory devices include biasing each data line of a plurality of data lines to a program inhibit voltage; discharging a first portion of data lines of the plurality of data lines, wherein the first portion of data lines of the plurality of data lines are coupled to memory cells selected for programming; and applying a plurality of programming pulses to the memory cells selected for programming while biasing a remaining portion of data lines of the plurality of data lines to the program inhibit voltage.

Abstract: Methods for forming a string of memory cells, an apparatus having a string of memory cells, and a system are disclosed. A method for forming the string of memory cells comprises forming a metal silicide source material over a substrate. The metal silicide source material is doped. A vertical string of memory cells is formed over the metal silicide source material. A semiconductor material is formed vertically and adjacent to the vertical string of memory cells and coupled to the metal silicide source material.

Abstract: Memory devices, methods for programming sense flags, methods for sensing flags, and memory systems are disclosed. In one such memory device, the odd bit lines of a flag memory cell array are connected with a short circuit to a dynamic data cache. The even bit lines of the flag memory cell array are disconnected from the dynamic data cache. When an even page of a main memory cell array is read, the odd flag memory cells, comprising flag data, are read at the same time so that it can be determined whether the odd page of the main memory cell array has been programmed. If the flag data indicates that the odd page has not been programmed, threshold voltage windows can be adjusted to determine the states of the sensed even memory cell page.

Abstract: Memory devices, methods for programming sense flags, methods for sensing flags, and memory systems are disclosed. In one such memory device, the odd bit lines of a flag memory cell array are connected with a short circuit to a dynamic data cache. The even bit lines of the flag memory cell array are disconnected from the dynamic data cache. When an even page of a main memory cell array is read, the odd flag memory cells, comprising flag data, are read at the same time so that it can be determined whether the odd page of the main memory cell array has been programmed. If the flag data indicates that the odd page has not been programmed, threshold voltage windows can be adjusted to determine the states of the sensed even memory cell page.

Abstract: Methods for forming a string of memory cells, an apparatus having a string of memory cells, and a system are disclosed. A method for forming the string of memory cells comprises forming a metal silicide source material over a substrate. The metal silicide source material is doped. A vertical string of memory cells is formed over the metal silicide source material. A semiconductor material is formed vertically and adjacent to the vertical string of memory cells and coupled to the metal silicide source material.

Abstract: Methods of programming memory devices include biasing each data line of a plurality of data lines to a program inhibit voltage; discharging a first portion of data lines of the plurality of data lines, wherein the first portion of data lines of the plurality of data lines are coupled to memory cells selected for programming; and applying a plurality of programming pulses to the memory cells selected for programming while biasing a remaining portion of data lines of the plurality of data lines to the program inhibit voltage.

Abstract: A method to fabricate a three dimensional memory structure may include creating a stack of layers including a conductive source layer, a first insulating layer, a select gate source layer, and a second insulating layer, and an array stack. A hole through the stack of layers may then be created using the conductive source layer as a stop-etch layer. The source material may have an etch rate no faster than 33% as fast as an etch rate of the insulating material for the etch process used to create the hole. A pillar of semiconductor material may then fill the hole, so that the pillar of semiconductor material is in electrical contact with the conductive source layer.

Abstract: Methods of forming semiconductor device structures are disclosed. One method comprises forming a plurality of loops of a conductive material. Each loop of the plurality of loops comprises a uniform pattern. In one embodiment, a portion of the conductive material is removed from at least one location in each loop of the plurality of loops. Contacts are formed to the conductive material. A semiconductor device structure is also disclosed.

Abstract: A method of forming a memory array includes forming a dielectric over a semiconductor, forming a charge-storage structure over the dielectric, forming an isolation region through the dielectric and the charge-storage structure and extending into the semiconductor, recessing the isolation region to a level below a level of an upper surface of the dielectric and at or above a level of an upper surface of the semiconductor, forming an access line over the charge-storage structure and the recessed isolation region, and forming an air gap over the recessed isolation region so that the air gap passes through the charge-storage structure, so that the air gap extends to and terminates at a bottom surface of the access line, and so that the entire air gap is between the bottom surface of the access line and the upper surface of the semiconductor.

Abstract: Methods of programming memory devices include biasing each data line of a plurality of data lines to a program inhibit voltage; discharging a first portion of data lines of the plurality of data lines, wherein the first portion of data lines of the plurality of data lines are coupled to memory cells selected for programming; and applying a plurality of programming pulses to the memory cells selected for programming while biasing a remaining portion of data lines of the plurality of data lines to the program inhibit voltage.

Abstract: Memory devices and methods are disclosed, such as devices configured to apply a first program inhibit bias to data lines during a first portion of a program operation and to apply a second program inhibit bias to data lines during a second portion of the program operation. The second program inhibit bias is greater than the first program inhibit bias.

Abstract: Methods for programming a memory device, memory devices configured to perform the disclosed programming methods, and memory systems having a memory device configured to perform the disclosed programming methods are provided. According to at least one such method, multiple pages of memory cells are inhibited during a programming operation such that memory cells enabled for programming are separated by two or more inhibited memory cells of the same row of memory cells regardless of the intended pattern of data states to be programmed into that row of memory cells.

Abstract: A method of forming a memory array includes forming a dielectric over a semiconductor, forming a charge-storage structure over the dielectric, forming an isolation region through the dielectric and the charge-storage structure and extending into the semiconductor, recessing the isolation region to a level below a level of an upper surface of the dielectric and at or above a level of an upper surface of the semiconductor, forming an access line over the charge-storage structure and the recessed isolation region, and forming an air gap over the recessed isolation region so that the air gap passes through the charge-storage structure, so that the air gap extends to and terminates at a bottom surface of the access line, and so that the entire air gap is between the bottom surface of the access line and the upper surface of the semiconductor.

Abstract: Methods of forming memory and memory devices are disclosed, such as a memory device having a memory cell with a floating gate formed from a first conductor, a control gate formed from a second conductor, and a dielectric interposed between the floating gate and the control gate. For example, a select gate may be coupled in series with the memory cell and has a first control gate portion formed from the first conductor and a second control gate portion formed from a third conductor. A contact may be formed from the third conductor and coupled in series with the select gate. Other methods and devices are also disclosed.

Abstract: Memory arrays and their formation are disclosed. One such memory array has first and second memory cells over a semiconductor, an air gap between the first and second memory cells, and an isolation region within the semiconductor and under the air gap so that the isolation region is aligned with the air gap.