Patents by Inventor Anirudha V. Sumant

Anirudha V. Sumant has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230272296
    Abstract: A low friction wear surface with a coefficient of friction in the superlubric regime under a sliding and rolling movement. The low friction wear surface includes molybdenum disulfide and graphene oxide on a first wear surface with a tribolayer formed on a rough steel counter surface during the sliding and rolling movement. Methods of producing the low friction wear surface are also provided.
    Type: Application
    Filed: June 18, 2021
    Publication date: August 31, 2023
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anirudha V. Sumant, Venkata Aditya Ayyagari
  • Patent number: 11440049
    Abstract: A low friction, wear-resistant surface operable at high temperatures and high loads with a low coefficient of friction including boron nitride and graphene-oxide on steel or nanodiamonds and graphene on aluminum. The low friction, wear-resistant surface remains with a coefficient of friction in the superlubric regime at temperatures in between about 200° C. and 970° C.
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: September 13, 2022
    Assignee: UChicago Argonne, LLC
    Inventors: Anirudha V. Sumant, Venkata Aditya Ayyagari
  • Patent number: 11441097
    Abstract: A low friction wear surface with a coefficient of friction in the superlubric regime including graphene and nanoparticles on the wear surface is provided, and methods of producing the low friction wear surface are also provided. A long lifetime wear-resistant surface including graphene exposed to hydrogen is provided, including methods of increasing the lifetime of graphene containing wear surfaces by providing hydrogen to the wear surface.
    Type: Grant
    Filed: July 17, 2020
    Date of Patent: September 13, 2022
    Assignee: UChicago Argonne, LLC
    Inventors: Anirudha V. Sumant, Ali Erdemir, Diana Berman
  • Patent number: 11230681
    Abstract: A system and method for forming at least one of graphene and graphene oxide on a substrate and an opposed wear member. The system includes graphene and graphene oxide formed by an exfoliation process or solution processing method to dispose graphene and/or graphene oxide onto a substrate. The system further includes an opposing wear member disposed on another substrate and a gas atmosphere of an inert gas like N2, ambient, a humid atmosphere and a water solution.
    Type: Grant
    Filed: January 10, 2018
    Date of Patent: January 25, 2022
    Assignee: UChicago Argonne, LLC
    Inventors: Anirudha V. Sumant, Ali Erdemir, Junho Choi, Diana Berman
  • Patent number: 11232241
    Abstract: A method for designing new materials for superlubricity comprises developing, on a computational system, a computational supercell comprising x unit cells of a base material, each unit cell comprising y atoms of the base material. The computational system replaces randomly chosen z atoms of the base material with an impurity atom of an impurity material to form a candidate material. The computational system determines volumetric strain of the candidate material. In response to the volumetric strain exceeding a predetermined threshold, the computational system determines that the candidate material has superlubricity. The computational system displays the candidate material to a user if the candidate material has superlubricity.
    Type: Grant
    Filed: July 16, 2018
    Date of Patent: January 25, 2022
    Assignee: UChicago Argonne, LLC
    Inventors: Badri Narayanan, Subramanian Sankaranarayanan, Anirudha V. Sumant, Mathew J. Cherukara, Diana Berman
  • Patent number: 11225415
    Abstract: A system for extracting two dimensional materials from a bulk material by functionalization of the bulk material in a reactor.
    Type: Grant
    Filed: August 3, 2018
    Date of Patent: January 18, 2022
    Assignee: UChicago Argonne, LLC
    Inventors: Demetrios Markou, Anirudha V. Sumant
  • Patent number: 11155762
    Abstract: A low friction wear surface operable at high temperatures and high loads with a coefficient of friction in the superlubric regime including MoS2 and graphene-oxide on the wear surface is provided, and methods of producing the low friction wear surface are also provided. The low friction wear surface remains with a coefficient of friction in the superlubric regime at temperatures in between about 200° C. and 400° C.
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: October 26, 2021
    Assignee: UChicago Argonne, LLC
    Inventors: Anirudha V. Sumant, Venkata Aditya Ayyagari
  • Publication number: 20210095218
    Abstract: A low friction wear surface operable at high temperatures and high loads with a coefficient of friction in the superlubric regime including MoS2 and graphene-oxide on the wear surface is provided, and methods of producing the low friction wear surface are also provided. The low friction wear surface remains with a coefficient of friction in the superlubric regime at temperatures in between about 200° C. and 400° C.
    Type: Application
    Filed: September 30, 2019
    Publication date: April 1, 2021
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anirudha V. Sumant, Venkata Aditya Ayyagari
  • Publication number: 20210094067
    Abstract: A low friction, wear-resistant surface operable at high temperatures and high loads with a low coefficient of friction including boron nitride and graphene-oxide on steel or nanodiamonds and graphene on aluminum. The low friction, wear-resistant surface remains with a coefficient of friction in the superlubric regime at temperatures in between about 200° C. and 970° C.
    Type: Application
    Filed: September 30, 2019
    Publication date: April 1, 2021
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anirudha V. Sumant, Venkata Aditya Ayyagari
  • Patent number: 10900137
    Abstract: A continuous or semi-continuous process for fabricating nanowires or microwires makes use of the substantially planar template that may be moved through electrochemical solution to grow nanowires or microwires on exposed conductive edges on the surface of that template. The planar template allows fabrication of the template using standard equipment and techniques. Adhesive transfer may be used to remove the wires from the template and in one embodiment to draw a continuous wire from the template to be wound around the drum.
    Type: Grant
    Filed: January 16, 2018
    Date of Patent: January 26, 2021
    Assignee: UChicago Argonne, LLC
    Inventors: Anirudha V. Sumant, Michael Zach, Alan David Marten
  • Publication number: 20210002579
    Abstract: A low friction wear surface with a coefficient of friction in the superlubric regime including graphene and nanoparticles on the wear surface is provided, and methods of producing the low friction wear surface are also provided. A long lifetime wear-resistant surface including graphene exposed to hydrogen is provided, including methods of increasing the lifetime of graphene containing wear surfaces by providing hydrogen to the wear surface.
    Type: Application
    Filed: July 17, 2020
    Publication date: January 7, 2021
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anirudha V. Sumant, Ali Erdemir, Diana Berman
  • Patent number: 10745641
    Abstract: A low friction wear surface with a coefficient of friction in the superlubric regime including graphene and nanoparticles on the wear surface is provided, and methods of producing the low friction wear surface are also provided. A long lifetime wear-resistant surface including graphene exposed to hydrogen is provided, including methods of increasing the lifetime of graphene containing wear surfaces by providing hydrogen to the wear surface.
    Type: Grant
    Filed: February 9, 2017
    Date of Patent: August 18, 2020
    Assignee: UChicago Argonne, LLC
    Inventors: Anirudha V. Sumant, Ali Erdemir, Diana Berman
  • Publication number: 20200019656
    Abstract: A method for designing new materials for superlubricity comprises developing, on a computational system, a computational supercell comprising x unit cells of a base material, each unit cell comprising y atoms of the base material. The computational system replaces randomly chosen z atoms of the base material with an impurity atom of an impurity material to form a candidate material. The computational system determines volumetric strain of the candidate material. In response to the volumetric strain exceeding a predetermined threshold, the computational system determines that the candidate material has superlubricity. The computational system displays the candidate material to a user if the candidate material has superlubricity.
    Type: Application
    Filed: July 16, 2018
    Publication date: January 16, 2020
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Badri Narayanan, Subramanian Sankaranarayanan, Anirudha V. Sumant, Mathew J. Cherukara, Diana Berman
  • Patent number: 10486195
    Abstract: A low friction wear surface with a coefficient of friction in the superlubric regime including graphene and nanoparticles on the wear surface is provided, and methods of producing the low friction wear surface are also provided. A long lifetime wear resistant surface including graphene exposed to hydrogen is provided, including methods of increasing the lifetime of graphene containing wear surfaces by providing hydrogen to the wear surface.
    Type: Grant
    Filed: January 17, 2017
    Date of Patent: November 26, 2019
    Assignee: UChicago Argonne, LLC
    Inventors: Anirudha V. Sumant, Diana Berman, Ali Erdemir
  • Patent number: 10410860
    Abstract: A method for coating a substrate comprises producing a plasma ball using a microwave plasma source in the presence of a mixture of gases. The plasma ball has a diameter. The plasma ball is disposed at a first distance from the substrate and the substrate is maintained at a first temperature. The plasma ball is maintained at the first distance from the substrate, and a diamond coating is deposited on the substrate. The diamond coating has a thickness. Furthermore, the diamond coating has an optical transparency of greater than about 80%. The diamond coating can include nanocrystalline diamond. The microwave plasma source can have a frequency of about 915 MHz.
    Type: Grant
    Filed: August 14, 2017
    Date of Patent: September 10, 2019
    Assignee: UChicago Argonne, LLC
    Inventors: Anirudha V. Sumant, Adam Khan
  • Patent number: 10351429
    Abstract: A method for coating a dielectric substrate with a R-GO film includes positioning the dielectric substrate in a chamber which is purged with a first gas to adjust a pressure of the chamber to a first pressure. A second gas at a second flow rate and a third gas at a third flow rate is inserted into the chamber to increase the chamber pressure to a second pressure greater than the first pressure. A chamber temperature is increased to a first temperature. The flow of the second gas and the third gas is stopped. The chamber is purged to a third pressure higher than the first pressure and lower than the second pressure. The pressure of the chamber is set at a fourth pressure greater than the first pressure and the third pressure. A fourth gas is inserted into the chamber at a fourth flow rate for a first time.
    Type: Grant
    Filed: May 13, 2015
    Date of Patent: July 16, 2019
    Assignee: UChicago Argonne, LLC
    Inventors: Anirudha V. Sumant, Richard Gulotty
  • Publication number: 20190039905
    Abstract: A system for extracting two dimensional materials from a bulk material by functionalization of the bulk material in a reactor.
    Type: Application
    Filed: August 3, 2018
    Publication date: February 7, 2019
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Demetrios Markou, Anirudha V. Sumant
  • Patent number: 10186584
    Abstract: A method of forming a p-n junction device comprises providing a base layer including a p-type diamond. A monolayer or few layer of a transition metal dichalcogenide (TMDC) is disposed on at least a portion of the base layer so as to form a heterojunction therebetween. The TMDC monolayer is an n-type layer such that the heterojunction between the intrinsic and p-type diamond base layer and the n-type TMDC monolayer is a p-n junction.
    Type: Grant
    Filed: August 18, 2016
    Date of Patent: January 22, 2019
    Assignee: UChicago Argonne, LLC
    Inventors: Anirudha V. Sumant, Kiran Kumar Kovi
  • Publication number: 20180223208
    Abstract: A low friction wear surface with a coefficient of friction in the superlubric regime including graphene and nanoparticles on the wear surface is provided, and methods of producing the low friction wear surface are also provided. A long lifetime wear-resistant surface including graphene exposed to hydrogen is provided, including methods of increasing the lifetime of graphene containing wear surfaces by providing hydrogen to the wear surface.
    Type: Application
    Filed: February 9, 2017
    Publication date: August 9, 2018
    Inventors: Anirudha V. Sumant, Ali Erdemir, Diana Berman
  • Publication number: 20180171251
    Abstract: A system and method for forming at least one of graphene and graphene oxide on a substrate and an opposed wear member. The system includes graphene and graphene oxide formed by an exfoliation process or solution processing method to dispose graphene and/or graphene oxide onto a substrate. The system further includes an opposing wear member disposed on another substrate and a gas atmosphere of an inert gas like N2, ambient, a humid atmosphere and a water solution.
    Type: Application
    Filed: January 10, 2018
    Publication date: June 21, 2018
    Applicant: UChicago Argonne, LLC
    Inventors: Anirudha V. Sumant, Ali Erdemir, Junho Choi, Diana Berman