Patents by Inventor Byoung-lyong Choi

Byoung-lyong Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130015424
    Abstract: An optoelectronic device is provided including an element that forms a dipole moment between an active layer and a charge transport layer. The optoelectronic device may include an active layer between a first electrode and a second electrode, a first charge transport layer between the first electrode and the active layer, and a dipole layer between the active layer and the first charge transport layer. A second charge transport layer may be further provided between the second electrode and the active layer. The second dipole layer may be further provided between the second charge transport layer and the active layer.
    Type: Application
    Filed: February 29, 2012
    Publication date: January 17, 2013
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Dae-young CHUNG, Kyung-sang CHO, Tae-ho KIM, Byoung-lyong CHOI
  • Patent number: 8354286
    Abstract: A method of manufacturing a silicon optoelectronic device, a silicon optoelectronic device manufactured by the method, and an image input and/or output apparatus including the silicon optoelectronic device are provided. The method includes preparing an n- or p-type silicon-based substrate, forming a microdefect pattern along a surface of the substrate by etching, forming a control film with an opening on the microdefect pattern, and forming a doping region on the surface of the substrate having the microdefect pattern in such a way that a predetermined dopant of the opposite type to the substrate is injected onto the substrate through the opening of the control film to be doped to a depth so that a photoelectric conversion effect leading to light emission and/or reception by quantum confinement effect in the p-n junction occurs.
    Type: Grant
    Filed: January 16, 2004
    Date of Patent: January 15, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Eun-kyung Lee, Byoung-lyong Choi, Pil-soo Ahn, Jun-young Kim, Young-gu Jin
  • Publication number: 20120326115
    Abstract: A graphene structure and a method of manufacturing the graphene structure, and a graphene device and a method of manufacturing the graphene device. The graphene structure includes a substrate; a growth layer disposed on the substrate and having exposed side surfaces; and a graphene layer disposed on the side surfaces of the growth layer.
    Type: Application
    Filed: May 14, 2012
    Publication date: December 27, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Byoung-lyong CHOI, Eun-kyung LEE, Dong-mok WHANG
  • Patent number: 8330142
    Abstract: A quantum dot light emitting device includes; a substrate, a first electrode disposed on the substrate, a second electrode disposed substantially opposite to the first electrode, a first charge transport layer disposed between the first electrode and the second electrode, a quantum dot light emitting layer disposed between the first charge transport layer and one of the first electrode and the second electrode, and at least one quantum dot including layer disposed between the quantum dot light emitting layer and the first charge transport layer, wherein the at least one quantum dot including layer has an energy band level different from an energy band level of the quantum dot light emitting layer.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: December 11, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kyung-sang Cho, Byoung-lyong Choi, Eun-kyung Lee, Tae-ho Kim, Sang-jin Lee
  • Patent number: 8263480
    Abstract: Methods for the site-selective growth of horizontal nanowires are provided. According to the methods, horizontal nanowires having a predetermined length and diameter can be grown site-selectively at desired sites in a direction parallel to a substrate to fabricate a device with high degree of integration. Further provided are nanowires grown by the methods and nanodevices comprising the nanowires.
    Type: Grant
    Filed: February 18, 2010
    Date of Patent: September 11, 2012
    Assignees: Samsung Electronics Co., Ltd., Seoul National University Industry Foundation
    Inventors: Eun Kyung Lee, Byoung Lyong Choi, Young Kuk, Je Hyuk Choi, Hun Huy Jung
  • Publication number: 20120161159
    Abstract: A method of manufacturing a silicon optoelectronic device, a silicon optoelectronic device manufactured by the method, and an image input and/or output apparatus including the silicon optoelectronic device are provided. The method includes preparing an n- or p-type silicon-based substrate, forming a microdefect pattern along a surface of the substrate by etching, forming a control film with an opening on the microdefect pattern, and forming a doping region on the surface of the substrate having the microdefect pattern in such a way that a predetermined dopant of the opposite type to the substrate is injected onto the substrate through the opening of the control film to be doped to a depth so that a photoelectric conversion effect leading to light emission and/or reception by quantum confinement effect in the p-n junction occurs.
    Type: Application
    Filed: January 16, 2004
    Publication date: June 28, 2012
    Applicant: Samsung Electronics Co, Ltd.
    Inventors: Eun-Kyung Lee, Byoung-lyong Choi, Pil-soo Ahn, Jun-young Kim, Young-gu Jin
  • Patent number: 8207521
    Abstract: Disclosed herein is a method for producing catalyst-free single crystal silicon nanowires. According to the method, nanowires can be produced in a simple and economical manner without the use of any metal catalyst. In addition, impurities contained in a metal catalyst can be prevented from being introduced into the nanowires, contributing to an improvement in the electrical and optical properties of the nanowires. Also disclosed herein are nanowires produced by the method and nanodevice comprising the nanowires.
    Type: Grant
    Filed: February 18, 2010
    Date of Patent: June 26, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Eun Kyung Lee, Dongmok Whang, Byoung Lyong Choi, Byung Sung Kim
  • Publication number: 20120141700
    Abstract: A graphene structure and a method of forming the same may include a graphene formed in a three-dimensional (3D) shape, e.g., a column shape, a stacking structure, and a three-dimensionally connected structure. The graphene structure can be formed by using Ge.
    Type: Application
    Filed: September 9, 2011
    Publication date: June 7, 2012
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Byoung-lyong CHOI, Eun-kyung LEE, Dong-mok WHANG
  • Publication number: 20120070612
    Abstract: A graphene-polymer layered composite and a method of manufacturing the same is provided. A graphene-polymer layered composite includes polymer layers surrounding a graphene sheet, and may include numerous polymer layers and graphene sheets in an alternating stacked configuration. The graphene-polymer layered composite has the characteristics of a polymer in that it provides flexibility, ease of manufacturing, low manufacturing costs, and low thermal conductivity. The graphene-polymer layered composite also has the characteristics of graphene in that it has a high electrical conductivity. Due to the low thermal conductivity and high electrical conductivity, the graphene-polymer layered composite may be useful for electrodes, electric devices, and thermoelectric materials.
    Type: Application
    Filed: April 26, 2011
    Publication date: March 22, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eun-kyung LEE, Byoung-lyong CHOI, Choong-ho YU
  • Publication number: 20120049696
    Abstract: A piezoelectric device including an engraved nanostructure body and a method of manufacturing the same are provided. The piezoelectric device includes a matrix including a piezoelectric material, a nanopore may be disposed in the matrix, and the nanopore may be extended substantially in a predetermined direction. The method may include coating a piezoelectric material on a substrate having a nanostructure body disposed thereon, and selectively etching the nanostructure body.
    Type: Application
    Filed: February 25, 2011
    Publication date: March 1, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seung-Nam CHA, Byoung-Lyong CHOI, Byong-Gwon SONG
  • Patent number: 8120010
    Abstract: A quantum dot electroluminescent device that includes a substrate, a quantum dot light-emitting layer disposed on the substrate, a first electrode which injects charge carriers into the quantum dot light-emitting layer, a second electrode which injects charge carriers, which have an opposite charge than the charge carriers injected by the first electrode, into the quantum dot light-emitting layer, a hole transport layer disposed between the first electrode and the quantum dot light-emitting layer, and an electron transport layer disposed between the second electrode and the quantum dot light-emitting layer, wherein the quantum dot light-emitting layer has a first surface in contact with the hole transport layer and a second surface in contact with an electron transport layer, and wherein the first surface has an organic ligand distribution that is different from an organic ligand distribution of the second surface.
    Type: Grant
    Filed: August 3, 2009
    Date of Patent: February 21, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kyung Sang Cho, Byoung Lyong Choi, Eun Kyung Lee
  • Publication number: 20120032138
    Abstract: A quantum dot light-emitting device includes a substrate, a first electrode, a hole injection layer (“HIL”), a hole transport layer (“HTL”), an emitting layer, an electron transport layer (“ETL”), a plurality of nanoplasmonic particles buried in the ETL, and a second electrode.
    Type: Application
    Filed: December 23, 2010
    Publication date: February 9, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Tae-ho KIM, Chang-won LEE, Byoung-lyong CHOI, Kyung-sang CHO
  • Publication number: 20110297202
    Abstract: A thermoelectric material including: a nanostructure; a discontinuous area disposed in the nanostructure, and an uneven portion disposed on the nano structure.
    Type: Application
    Filed: May 24, 2011
    Publication date: December 8, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eun-kyung LEE, Byoung-lyong CHOI, Jun-ho LEE, Dong-mok WHANG, Jong-woon LEE
  • Patent number: 8053070
    Abstract: Disclosed are an optical film having a graded refractive index and a method of manufacturing the same. The optical film includes one or more antireflection films composed of a mesoporous material having a plurality of pores of a uniform size, and the pores of the mesoporous material are filled with air or a filler having a refractive index different from that of the mesoporous material, and thus the volume ratio of mesoporous material to filler in the pores thereof is controlled, thereby obtaining a desired magnitude of effective refractive index and ensuring a refractive index distribution in which the refractive indexes sequentially change, resulting in high antireflection performance. The method of manufacturing the optical film may be conducted using a nanowire growing technique, thus making it easy to realize mass production.
    Type: Grant
    Filed: March 5, 2008
    Date of Patent: November 8, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Eun Kyung Lee, Jae Ho You, Byoung Lyong Choi, Seung Ho Nam
  • Patent number: 8043942
    Abstract: Disclosed is a method for producing core-shell nanowires in which an insulating film is previously patterned to block the contacts between nanowire cores and nanowire shells. According to the method, core-shell nanowires whose density and position is controllable can be produced in a simple manner. Further disclosed are nanowires produced by the method and a nanowire device comprising the nanowires. The use of the nanowires leads to an increase in the light emitting/receiving area of the device. Therefore, the device exhibits high luminance/efficiency characteristics.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: October 25, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Eun Kyung Lee, Jai Yong Han, Byoung Lyong Choi, Kyung Sang Cho
  • Publication number: 20110244662
    Abstract: A method of manufacturing graphene includes forming a germanium layer on a surface of a substrate, and forming the graphene directly on the germanium layer by supplying carbon-containing gas into a chamber in which the substrate is disposed.
    Type: Application
    Filed: December 22, 2010
    Publication date: October 6, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eun-kyung LEE, Byoung-lyong CHOI, Dong-mok WHANG, Jae-hyun LEE
  • Publication number: 20110220165
    Abstract: A thermoelectric device includes: a first region; a second region; and a thermoelectric body disposed between the first region and the second region, where the thermoelectric body includes a vacancy.
    Type: Application
    Filed: March 10, 2011
    Publication date: September 15, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eun-kyung LEE, Byoung-lyong CHOI, Gyeong S. HWANG
  • Patent number: 8017952
    Abstract: Disclosed are an inorganic electroluminescent diode and a method of fabricating the same. Specifically, this invention provides an inorganic electroluminescent diode, which includes a semiconductor nanocrystal layer formed of inorganic material, an electron transport layer or a hole transport layer formed on the semiconductor nanocrystal layer using amorphous inorganic material, and a hole transport layer or an electron transport layer formed beneath the semiconductor nanocrystal layer using inorganic material, and also provides a method of fabricating such an inorganic electroluminescent diode. According to the method of fabricating the inorganic electroluminescent diode of this invention, an inorganic electroluminescent diode can be fabricated while maintaining the properties of luminescent semiconductor material of the semiconductor crystal layer, and also an inorganic electroluminescent diode which is stably operated and has high luminescent efficiency can be provided.
    Type: Grant
    Filed: September 25, 2006
    Date of Patent: September 13, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kyung Sang Cho, Byung Lyong Choi, Byoung Lyong Choi, Soon Jae Kwon
  • Publication number: 20110204321
    Abstract: Disclosed herein is a method for producing nanowires. The method comprises the steps of providing a porous template with a plurality of holes in the form of tubes, filling the tubes with nanoparticles or nanoparticle precursors, and forming the filled nanoparticles or nanoparticle precursors into nanowires. According to the method, highly rectilinear and well-ordered nanowires can be produced in a simple manner.
    Type: Application
    Filed: May 3, 2011
    Publication date: August 25, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Byoung Lyong CHOI, Jong Min KIM, Eun Kyung LEE
  • Patent number: 7960251
    Abstract: Disclosed herein is a method for producing nanowires. The method comprises the steps of providing a porous template with a plurality of holes in the form of tubes, filling the tubes with nanoparticles or nanoparticle precursors, and forming the filled nanoparticles or nanoparticle precursors into nanowires. According to the method, highly rectilinear and well-ordered nanowires can be produced in a simple manner.
    Type: Grant
    Filed: June 6, 2006
    Date of Patent: June 14, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Byoung Lyong Choi, Jong Min Kim, Eun Kyung Lee