Patents by Inventor Chad Rue
Chad Rue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11798804Abstract: A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.Type: GrantFiled: December 9, 2020Date of Patent: October 24, 2023Assignee: FEI CompanyInventors: Brian Roberts Routh, Thomas G. Miller, Chad Rue, Noel Thomas Franco
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Patent number: 11735404Abstract: The invention relates to a method, a device and a system for the treatment of biological frozen samples using plasma focused ion beams (FIB). The samples can then be used for mass spectrometry (MS), genomics, such as gene sequencing analysis or next generation sequencing (NGS) analysis, and proteomics. The present invention particularly relates to a method of treatment of at least one biological sample. This method is particularly used for high performance microscopy, proteomics analytics, sequencing, such as NGS etc. According to the present invention the method comprises the steps of providing at least one biological sample in frozen form. The milling treats at least one part of the sample by a plasma ion beam comprising at least one of an O+ and/or a Xe+ plasma.Type: GrantFiled: September 10, 2020Date of Patent: August 22, 2023Assignee: FEI CompanyInventors: Alex De Marco, Sergey Gorelick, Chad Rue, Joseph Christian, Kenny Mani, Steven Randolph, Matthias Langhorst
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Patent number: 11651924Abstract: Methods of producing microrods for electron emitters and associated microrods and electron emitters. In one example, a method of producing a microrod for an electron emitter comprises providing a bulk crystal ingot, removing a first plate from the bulk crystal ingot, reducing a thickness of the first plate to produce a second plate, and milling the second plate to produce one or more microrods. In another example, a microrod for an electron emitter comprises a microrod tip region that comprises a nanoneedle that in turn comprises a nanorod and a nanoprotrusion tip. The microrod and the nanoneedle are integrally formed from a bulk crystal ingot by sequentially: (i) removing the microrod from the bulk crystal ingot; (ii) coarse processing the microrod tip region to produce the nanorod; and (iii) fine processing the nanorod to produce the nanoprotrusion tip.Type: GrantFiled: June 22, 2022Date of Patent: May 16, 2023Assignee: FEI CompanyInventors: Kun Liu, Chad Rue, Alan Stephen Bahm
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Publication number: 20230095798Abstract: Methods and systems for imaging a sample with a charged particle microscope comprises after scanning a region of interest (ROI) of a sample with an electron beam and acquiring X-rays emitted from the sample, scanning the ROI with an ion beam and acquiring ion-induced photons emitted from the sample. A spatial distribution of multiple elements in the sample may be determined based on both the acquired X-rays and the acquired ion-induced photons.Type: ApplicationFiled: September 30, 2021Publication date: March 30, 2023Applicant: FEI CompanyInventors: Garrett BUDNIK, Chengge JIAO, Mostafa MAAZOUZ, Suzanna OFFICER, Galen Gledhill, Chad Rue
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Patent number: 11069523Abstract: A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.Type: GrantFiled: May 21, 2018Date of Patent: July 20, 2021Assignee: FEI CompanyInventors: Brian Roberts Routh, Jr., Thomas G. Miller, Chad Rue, Noel Thomas Franco
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Patent number: 11062879Abstract: Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.Type: GrantFiled: December 18, 2019Date of Patent: July 13, 2021Assignee: FEI CompanyInventors: Noel Thomas Franco, Kenny Mani, Chad Rue, Joe Christian, Jeffrey Blackwood
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Publication number: 20210118646Abstract: Methods and apparatuses disclosed herein for large-area 3D analysis of samples using glancing incidence FIB milling. An example method at least includes milling, with a focused ion beam, a sample at a shallow angle and at a plurality of rotational orientations to remove a layer of the sample and to expose a surface, and after milling, imaging, with a charged particle beam, the exposed surface of the sample.Type: ApplicationFiled: October 19, 2020Publication date: April 22, 2021Applicant: FEI CompanyInventors: Chad Rue, Jing Wang, Aurelien Philippe Jean Maclou Botman, Joe Christian, Kenny Mani, Gabriella Kiss
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Publication number: 20210118678Abstract: A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.Type: ApplicationFiled: December 9, 2020Publication date: April 22, 2021Applicant: FEI CompanyInventors: Brian Roberts Routh, Thomas G. Miller, Chad Rue, Noel Thomas Franco
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Publication number: 20210066056Abstract: The invention relates to a method, a device and a system for the treatment of biological frozen samples using plasma focused ion beams (FIB). The samples can then be used for mass spectrometry (MS), genomics, such as gene sequencing analysis or next generation sequencing (NGS) analysis, and proteomics. The present invention particularly relates to a method of treatment of at least one biological sample. This method is particularly used for high performance microscopy, proteomics analytics, sequencing, such as NGS etc. According to the present invention the method comprises the steps of providing at least one biological sample in frozen form. The milling treats at least one part of the sample by a plasma ion beam comprising at least one of an O+ and/or a Xe+ plasma.Type: ApplicationFiled: September 10, 2020Publication date: March 4, 2021Inventors: Alex DE MARCO, Sergey GORELICK, Chad RUE, Joseph CHRISTIAN, Kenny MANI, Steven RANDOLPH, Matthias LANGHORST
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Patent number: 10930514Abstract: Techniques for planarizing surfaces are disclosed herein. One example includes orienting a surface of a sample to a charged particle beam axis, the sample including a first layer formed from first and second materials, the first material patterned into a plurality of parallel lines and disposed in the second material, where the surface is oriented to form a shallow angle with the charged particle beam axis and to arrange the plurality of parallel lines perpendicular to the charged particle beam axis, providing a charged particle beam toward the surface, providing a gas to the surface, and selectively etching, with ion induced chemical etching, the second material at least down to a top surface of the first material, the charged particle induced etching stimulated due to concurrent presence of the charged particle beam and the gas over the surface of the sample.Type: GrantFiled: June 11, 2018Date of Patent: February 23, 2021Assignee: FEI CompanyInventors: Philip Brundage, Zachary Klassen, Chad Rue
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Publication number: 20200126756Abstract: Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.Type: ApplicationFiled: December 18, 2019Publication date: April 23, 2020Applicant: FEI CompanyInventors: Noel Thomas Franco, Kenny Mani, Chad Rue, Joe Christian, Jeffrey Blackwood
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Patent number: 10546719Abstract: Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.Type: GrantFiled: May 23, 2018Date of Patent: January 28, 2020Assignee: FEI CompanyInventors: Noel Thomas Franco, Kenny Mani, Chad Rue, Joe Christian, Jeffrey Blackwood
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Publication number: 20190378689Abstract: Techniques for planarizing surfaces are disclosed herein. One example includes orienting a surface of a sample to a charged particle beam axis, the sample including a first layer formed from first and second materials, the first material patterned into a plurality of parallel lines and disposed in the second material, where the surface is oriented to form a shallow angle with the charged particle beam axis and to arrange the plurality of parallel lines perpendicular to the charged particle beam axis, providing a charged particle beam toward the surface, providing a gas to the surface, and selectively etching, with ion induced chemical etching, the second material at least down to a top surface of the first material, the charged particle induced etching stimulated due to concurrent presence of the charged particle beam and the gas over the surface of the sample.Type: ApplicationFiled: June 11, 2018Publication date: December 12, 2019Inventors: Philip BRUNDAGE, Zachary KLASSEN, Chad RUE
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Patent number: 10347463Abstract: Method and system for enhanced charged particle beam processes for carbon removal. With the method and system for enhancing carbon removal, associated method and system for decreasing levels of carbon impurity in depositions, also using a precursor gas in charged particle beam processes (and particularly focused ion beam methodologies), are provided. In a preferred embodiment, the precursor gas comprises methyl nitroacetate. In alternative embodiments, the precursor gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.Type: GrantFiled: December 9, 2016Date of Patent: July 9, 2019Assignee: FEI CompanyInventors: Chad Rue, Joe Christian, Kenny Mani, Noel Thomas Franco
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Publication number: 20190206664Abstract: The invention relates to a method, a device and a system for the treatment of biological frozen samples using plasma focused ion beams (FIB). The samples can then be used for mass spectrometry (MS), genomics, such as gene sequencing analysis or next generation sequencing (NGS) analysis, and proteomics. The present invention particularly relates to a method of treatment of at least one biological sample. This method is particularly used for high performance microscopy, proteomics analytics, sequencing, such as NGS etc. According to the present invention the method comprises the steps of providing at least one biological sample in frozen form. The milling treats at least one part of the sample by a plasma ion beam comprising at least one of an O+ and/or a Xe+ plasma.Type: ApplicationFiled: December 19, 2018Publication date: July 4, 2019Inventors: Alex DE MARCO, Sergey GORELICK, Chad RUE, Joseph CHRISTIAN, Kenny MANI, Steven RANDOLPH, Matthias LANGHORST
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Patent number: 10325754Abstract: Implanting a material in a pattern hardens the material in the pattern for subsequent etching. When the region is etched, by ion beam sputtering, chemically enhanced charged particle beam etching, or chemical etching, a thicker structure remains because of the reduced etch rate of the hardened pattern. The invention is particularly useful for the preparation of thin lamella for viewing on a transmission electron microscope.Type: GrantFiled: January 10, 2014Date of Patent: June 18, 2019Assignee: FEI COMPANYInventors: David Foord, Chad Rue
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Patent number: 10190953Abstract: Sample pillars for x-ray tomography or other tomography scanning are created using an innovative milling strategy on a Plasma-FIB. The strategies are provided in methods, systems, and program products executable to perform the strategies herein. The milling strategy creates an asymmetrical crater around a sample pillar, and provides a single cut cut-free process. Various embodiments may include tuning the ion dose as a function of pixel coordinates along with optimization of the beam scan and crater geometries, drastically reducing the preparation time and significantly improving the overall workflow efficiency. A novel cut-free milling pattern is provided with a crescent shape and optimized dwell-time values.Type: GrantFiled: November 2, 2017Date of Patent: January 29, 2019Inventors: Guillaume Delpy, Guillaume Audoit, Laurens Franz Taemsz Kwakman, Chad Rue, Jorge Filevich
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Publication number: 20180350558Abstract: Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.Type: ApplicationFiled: May 23, 2018Publication date: December 6, 2018Applicant: FEI CompanyInventors: Noel Thomas Franco, Kenny Mani, Chad Rue, Joe Christian, Jeffrey Blackwood
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Publication number: 20180277361Abstract: A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.Type: ApplicationFiled: May 21, 2018Publication date: September 27, 2018Applicant: FEI CompanyInventors: Brian Roberts Routh, JR., Thomas G. Miller, Chad Rue, Noel Thomas Franco
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Publication number: 20180166272Abstract: Method and system for enhanced charged particle beam processes for carbon removal. With the method and system for enhancing carbon removal, associated method and system for decreasing levels of carbon impurity in depositions, also using a precursor gas in charged particle beam processes (and particularly focused ion beam methodologies), are provided. In a preferred embodiment, the precursor gas comprises methyl nitroacetate. In alternative embodiments, the precursor gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.Type: ApplicationFiled: December 9, 2016Publication date: June 14, 2018Applicant: FEI CompanyInventors: Chad Rue, Joe Christian, Kenny Mani, Noel Thomas Franco