Abstract: A single-poly, P-channel non-volatile memory cell that is fully compatible with nano-scale semiconductor manufacturing process is provided. The single-poly, P-channel non-volatile memory cell includes an N well, a gate formed on the N well, a gate dielectric layer between the gate and the N well, an ONO layer on sidewalls of the gate, a P+ source doping region and a P+ drain doping region. The ONO layer includes a first oxide layer deposited on the sidewalls of the gate and extends to the N well, and a silicon nitride layer formed on the first oxide layer. The silicon nitride layer functions as a charge-trapping layer.

Abstract: Input image signals are spatially and temporally compensated. First, gray scales of a target pixel in a current frame and in a previous frame are compared to determine whether to spatially and temporally compensate the input image signals or not. Next, in accordance to weight parameters and gray scales of pixels adjacent to the target pixel, the target pixel of the current frame is spatially compensated. Further, based on the gray scale of the target pixel of the previous frame, the target pixel of the current frame after spatial compensation is temporally compensated.

Abstract: A control circuit of a liquid crystal display (LCD) panel and a method thereof are provided. The circuit includes a frame memory, a look-up table (LUT) module, and a signal processor. The frame memory provides a previous value of a pixel, and the previous value includes at least one bit of a previous frame data of the pixel. The LUT module provides a plurality of basic values according to the previous value and a current value of the pixel, and the current value includes at least one bit of a current frame data of the pixel. The signal processor produces a driving value according to the basic values and replaces the current frame data with the driving value.

Abstract: A single-poly, P-channel non-volatile memory cell that is fully compatible with nano-scale semiconductor manufacturing process is provided. The single-poly, P-channel non-volatile memory cell includes an N well, a gate formed on the N well, a gate dielectric layer between the gate and the N well, an ONO layer on sidewalls of the gate, a P+ source doping region and a P+ drain doping region. The ONO layer includes a first oxide layer deposited on the sidewalls of the gate and extends to the N well, and a silicon nitride layer formed on the first oxide layer. The silicon nitride layer functions as a charge-trapping layer.

Abstract: A single-poly non-volatile memory cell that is fully compatible with nano-scale semiconductor manufacturing process is provided. The single-poly non-volatile memory cell includes an ion well, a gate formed on the ion well, a gate dielectric layer between the gate and the ion well, a dielectric stack layer on sidewalls of the gate, a source doping region and a drain doping region. The dielectric stack layer includes a first oxide layer deposited on the sidewalls of the gate and extends to the ion well, and a silicon nitride layer formed on the first oxide layer. The silicon nitride layer functions as a charge-trapping layer.

Abstract: A non-volatile memory formed on a first conductive type substrate is provided. The non-volatile memory includes a gate, a second conductive type drain region, a charge storage layer, and a second conductive type first lightly doped region. The gate is formed on the first conductive type substrate. The second conductive type drain region is formed in the first conductive type substrate at the first side of the gate. The charge storage layer is formed on the first conductive type substrate at the first side of the gate and between the second conductive type drain region and the gate. The second conductive type first lightly doped region is formed in the first conductive type substrate at the second side of the gate. The second side is opposite to the first side.

Abstract: A method for operating a single-poly, single-transistor (1-T) non-volatile memory (NVM) cell. The NVM cell includes a gate on a P substrate, a gate dielectric layer, an N drain region and an N source region. N channel is defined between the N drain region and N source region. The NVM cell is programmed by breaking down the gate dielectric layer. To read the NVM cell, a positive voltage is provided to N drain region, a positive voltage is provided to the gate, and grounding the N source region and the P substrate.

Abstract: A semiconductor device formed on a first conductive type substrate is provided. The device includes a gate, a second conductive type drain region, a second conductive type source region, and a second conductive type first lightly doped region. The gate is formed on the first conductive type substrate. The second conductive type drain region and the second conductive type source region are formed in the first conductive type substrate at both sides of the gate. The second conductive type first lightly doped region is formed in the first conductive type substrate between the gate and the second conductive type source region.

Abstract: A Lactobacillus paracasei-containing product used for inhibiting dental diseases caused by bacteria is provided, which comprises a plurality of Lactobacillus paracasei for inhibiting the growth of bacteria of dental diseases. Particularly, foods, oral hygiene products or oral treatment medicine containing the Lactobacillus paracasei when being administered or applied to a user can inhibit or reduce the number of pathogens of dental caries and periodontal diseases in oral cavity of the user, thereby achieving the efficacy of preventing dental diseases, such as dental caries and periodontal diseases.

Abstract: A method for color correction is provided. In this method, a plurality of groups of gray levels and luminance of light source of display device are respectively selected by color measurement system. The selected data of each color light are respectively calculated to obtain fitting functions which can fit the gray level data of each interval. The fitting luminance of the gray levels in interval is obtained by the fitting function and formed into a lookup table. Then in order to correspond a gamma curve of normalized gray data of image to a predetermined target curve, the two gamma curves are first taken to logarithmic calculation and the modified gray signals are obtained from the lookup table, then the modified gray signals are transmitted out for providing the display device to express the gray distribution state. The method for color correction is applicable to various display devices, especially liquid crystal display device.

Abstract: The present invention provides a modified Dermatophagoides pteronyssinus allergen Der p 5 protein which has ability to inhibit IgE binding when exposed against to the antigen. A method for treating allergy comprising administrating a therapeutically effective dose of the modified D. pteronyssinus allergen Der p 5 protein to a subject suffering from allergy Der p 5 is also provided.

Abstract: A non-volatile memory disposed in a SOI substrate is provided. The non-volatile memory includes a memory cell and a first conductive type doped region. The memory cell includes a gate, a charge storage structure, a bottom dielectric layer, a second conductive type drain region, and a second conductive type source region. The gate is disposed on the SOI substrate. The charge storage structure is disposed between the gate and the SOI substrate. The bottom dielectric layer is disposed between the charge storage layer and the SOI substrate. The second conductive type drain region and the second conductive type source region are disposed in a first conductive type silicon body layer next to the two sides of the gate. The first conductive type doped region is disposed in the first conductive type silicon body layer and electrically connected to the first conductive type silicon body layer beneath the gate.

Abstract: A method for operating a single-poly, single-transistor (1-T) non-volatile memory (NVM) cell. The NVM cell includes a gate on a P substrate, a gate dielectric layer, an N drain region and an N source region. N channel is defined between the N drain region and N source region. The NVM cell is programmed by breaking down the gate dielectric layer. To read the NVM cell, a positive voltage is provided to N drain region, a positive voltage is provided to the gate, and grounding the N source region and the P substrate.

Abstract: An island type mobile communication arrangement is disclosed. A plurality of BTSs connected to BSCs are reassigned as island BTSs and connected to an island BSC, the island BSC is connected to an island MSC. When entering or leaving the scope of the island MSC, a cellular phone performs a location updating procedure, and thus the island type mobile communication arrangement can provide a special service to all cellular phones in a particular local area by reading MSISDNs in an island VLR corresponding to the island MSC.

Abstract: A memory cell includes an N-type well, three P-type doped regions, a first stacked dielectric layer, a first gate, a second stacked dielectric layer, and a second gate. The three P-type doped regions are formed on the N-well. The first dielectric stack layer is formed on the N-type well and between the first doped region and the second doped region from among the three P-type doped regions. The first gate is formed on the first stacked dielectric layer. The second stacked dielectric layer is formed on the N-type well and between the second doped region and the third doped region from among the three P-type doped regions. The second gate is formed on the second stacked dielectric layer.

Abstract: The present invention provides a modified Dermatophagoides pteronyssinus allergen Der p 5 protein which has ability to inhibit IgE binding when exposed against to the antigen. A method for treating allergy comprising administrating a therapeutically effective dose of the modified D. pteronyssinus allergen Der p 5 protein to a subject suffering from allergy Der p 5 is also provided.

Abstract: A single-poly non-volatile memory device invented to integrate into logic process is disclosed. This non-volatile memory device includes a memory cell unit comprising a PMOS access transistor that is serially connected to a PMOS storage transistor formed in a cell array area, and, in a peripheral circuit area, a high-voltage MOS transistor having a high-voltage gate insulation layer is provided. The PMOS access transistor has an access gate oxide layer that has a thickness equal to the thickness of the high-voltage gate insulation layer in a peripheral circuit area.

Abstract: The invention provides an authentication, authorization and accounting (AAA) a system and method for a plurality of wireless local area networks (WLANs) operated by a plurality of WLAN operators comprising a mobile communications device connecting to a terminal comprising an Internet access application program for accessing the Internet, a personal identification number (PIN) application program, and a unique identifier application program. An Internet access session is requested from the mobile device by activating the Internet access application program in the terminal. Entry of a PIN is requested by activating the PIN application program in the terminal, wherein the PIN is authenticated.

Abstract: A single-poly non-volatile memory cell that is fully compatible with nano-scale semiconductor manufacturing process is provided. The single-poly non-volatile memory cell includes an ion well, a gate formed on the ion well, a gate dielectric layer between the gate and the ion well, a dielectric stack layer on sidewalls of the gate, a source doping region and a drain doping region. The dielectric stack layer includes a first oxide layer deposited on the sidewalls of the gate and extends to the ion well, and a silicon nitride layer formed on the first oxide layer. The silicon nitride layer functions as a charge-trapping layer.

Abstract: A single-poly, P-channel non-volatile memory cell that is fully compatible with nano-scale semiconductor manufacturing process is provided. The single-poly, P-channel non-volatile memory cell includes an N well, a gate formed on the N well, a gate dielectric layer between the gate and the N well, an ONO layer on sidewalls of the gate, a P+ source doping region and a P+ drain doping region. The ONO layer include a first oxide layer deposited on the sidewalls of the gate and extends to the N well, and a silicon nitride layer formed on the first oxide layer. The silicon nitride layer functions as a charge-trapping layer. The metallurgical junction of P-type drain and N-type well locates underneath the ONO sidewall.