Abstract: An electrical connector assembly includes a seat unit and a cover unit. The seat unit defines a receiving cavity for receiving the CPU. The cover unit is pivotably mounted upon one end of the seat unit. The cover unit includes a first cover and a second cover surrounding the first cover. The first cover includes a first frame equipped with therein a floating heat sink which is located above and aligned with the receiving cavity. The heat sink forms a pair of side extensions sandwiched between a pair of pressing blocks and the first frame in a vertical direction and essentially downwardly pressed by the pair of pressing blocks of the first cover in a resilient manner. Resilient mechanism is provided between the pressing block and the heat sink to result in a downward force constantly urge the heat sink downwardly against the first frame.

Abstract: A semiconductor device includes an active layer, a source electrode, a drain electrode, a gate electrode, a first insulating layer, a first source pad, and a first drain pad. The source electrode, the drain electrode, and the gate electrode are disposed on an active region of the active layer. The first insulating layer is disposed on the source electrode, the drain electrode, and the gate electrode. The first source pad and the first drain pad are disposed on the first insulating layer and the active region. The first source pad includes a first source body and a first source branch. The first source branch is electrically connected to the first source body and disposed on the source electrode. The first drain pad includes a first drain body and a first drain branch. The first drain branch is electrically connected to the first drain body and disposed on the drain electrode.

Abstract: A semiconductor device includes an active layer having an active region, a source electrode, a drain electrode, a gate electrode, a source metal layer, a drain metal layer, and a source pad. The source metal layer and the drain metal layer are electrically connected to the source electrode and the drain electrode, respectively. An orthogonal projection of the drain metal layer on the active layer each forms a drain metal layer region. The source pad is electrically connected to the source metal layer. An orthogonal projection of the source pad on the active layer forms a source pad region overlapping the drain metal layer. An area of an overlapping region between the source pad region and the drain metal layer region is smaller than or equal to 40% of an area of the drain metal layer region.

Abstract: An electrical connector with a contact module includes an insulative body, a plurality of contacts retained to the body, and a grounding bar embedded within the body. The contacts include a plurality of differential pair contacts and a plurality of grounding contacts. The ground bar forms a plurality of spring tangs. The body forms a plurality of cavities and the corresponding spring tangs of the grounding bar extend into the corresponding cavities to contact the corresponding grounding contacts. Conductive adhesive is filled within each cavity and solidified to secure all the spring tang, the corresponding grounding contact and the body together. The electrical connector is formed by a pair of contact modules back to back secured to together by an insulative case either by assembling or via an over-molding process. The cavities and the corresponding conductive adhesive of each contact module is hidden from the exterior.

Abstract: A semiconductor device including an active layer made of III-V group semiconductors, a source electrode and a drain electrode disposed on the active layer, a gate electrode disposed on or above the active layer and between the source electrode and the drain electrode, an interlayer dielectric covering the source electrode, the drain electrode, and the gate electrode and having a plurality of inter-gate via holes. The semiconductor device further includes an inter-source layer, an inter-drain layer, and an inter-gate layer disposed on the interlayer dielectric. The semiconductor device further includes an inter-gate plug filled in the inter-gate via hole and electrically connected to the gate electrode and the inter-gate layer, and a gate field plate being separated from the gate electrode and electrically connected to the gate electrode through the inter-gate layer.

Abstract: A semiconductor device including an active layer made of III-V group semiconductors, a source electrode and a drain electrode disposed on the active layer, a gate electrode disposed on or above the active layer and between the source electrode and the drain electrode, an interlayer dielectric covering the source electrode, the drain electrode, and the gate electrode and having a plurality of inter-gate via holes. The semiconductor device further includes an inter-source layer, an inter-drain layer, and an inter-gate layer disposed on the interlayer dielectric. The semiconductor device further includes an inter-gate plug filled in the inter-gate via hole and electrically connected to the gate electrode and the inter-gate layer, and a gate field plate being separated from the gate electrode and electrically connected to the gate electrode through the inter-gate layer.

Abstract: A semiconductor device includes an active layer having an active region, a source electrode, a drain electrode, a gate electrode, a source metal layer, a drain metal layer, and a source pad. The source metal layer and the drain metal layer are electrically connected to the source electrode and the drain electrode, respectively. An orthogonal projection of the drain metal layer on the active layer each forms a drain metal layer region. The source pad is electrically connected to the source metal layer. An orthogonal projection of the source pad on the active layer forms a source pad region overlapping the drain metal layer. An area of an overlapping region between the source pad region and the drain metal layer region is smaller than or equal to 40% of an area of the drain metal layer region.

Abstract: A semiconductor device including an active layer made of III-V group semiconductors, a source electrode and a drain electrode disposed on the active layer, a gate electrode disposed on or above the active layer and between the source electrode and the drain electrode, an interlayer dielectric covering the source electrode, the drain electrode, and the gate electrode and having a plurality of inter-gate via holes. The semiconductor device further includes an inter-source layer, an inter-drain layer, and an inter-gate layer disposed on the interlayer dielectric. The semiconductor device further includes an inter-gate plug filled in the inter-gate via hole and electrically connected to the gate electrode and the inter-gate layer, and a gate field plate being separated from the gate electrode and electrically connected to the gate electrode through the inter-gate layer.

Abstract: A semiconductor device includes an active layer, source electrodes, drain electrodes, gate electrodes, an insulating layer, gate metal layers, source metal layers, and drain metal layers. The source electrodes, drain electrodes, and gate electrodes are over the active layer, in which each of the gate electrodes includes a plurality of narrow portions and wider portions alternately arranged, and the wider portions of one of the gate electrodes extend toward the source electrode and directly connected to the wider portions of another one of the gate electrodes. The insulating layer is over the source electrodes, the drain electrodes, and the gate electrodes. The gate metal layers are over the gate electrodes and the insulating layer. The source metal layers are over the source electrodes and the insulating layer. The drain metal layers are over the drain electrodes and the insulating layer.

Abstract: In one aspect of the present disclosure, a semiconductor device includes a channel layer, an AlxIn1-xN layer on the channel layer with a thickness of t1, and a reverse polarization layer on the AlxIn1-xN layer with a thickness of t2. The thickness is 0.5×t1?t2?3×t1. In another aspect of the present disclosure, a method of manufacturing a semiconductor device is provided. The method including: forming a channel layer on a substrate; forming an AlxIn1-xN layer on the channel layer with a thickness of t1; and forming a reverse polarization layer on the AlxIn1-xN layer with a thickness of t2. The thickness is 0.5×t1?t2?3×t1.

Abstract: A semiconductor device includes an active layer, a source electrode, a drain electrode, a gate electrode, a first insulating layer, a first source pad, and a first drain pad. The source electrode, the drain electrode, and the gate electrode are disposed on an active region of the active layer. The first insulating layer is disposed on the source electrode, the drain electrode, and the gate electrode. The first source pad and the first drain pad are disposed on the first insulating layer and the active region. The first source pad includes a first source body and a first source branch. The first source branch is electrically connected to the first source body and disposed on the source electrode. The first drain pad includes a first drain body and a first drain branch. The first drain branch is electrically connected to the first drain body and disposed on the drain electrode.

Abstract: A semiconductor device includes an active layer, a source electrode, a drain electrode, a gate electrode, a first insulating layer, a gate metal layer, a via, a first source metal layer, a drain metal layer, and a second source metal layer. The source electrode, the drain electrode, and the gate electrode are present on the active layer. The first insulating layer is present on the source electrode, the drain electrode, and the gate electrode. The gate metal layer, the first source metal layer, the second source metal layer, and the drain metal layer are present on the first insulating layer. The gate metal layer includes a narrow portion and a wider portion. The via is present between the metal gate layer and the gate electrode. The second source metal layer is present between the gate metal layer and the drain metal layer.

Abstract: A semiconductor device includes an active layer, a source electrode, a drain electrode, a gate electrode, a first insulating layer, a first source pad, and a first drain pad. The source electrode, the drain electrode, and the gate electrode are disposed, on an active region of the active layer. The first insulating layer is disposed on the source electrode, the drain electrode, and the gate electrode. The first source pad and the first drain pad are disposed on the first insulating layer and the active region. The first source pad includes a first source body and a first source branch. The first source branch is electrically connected to the first source body and disposed on the source electrode. The first drain pad includes a first drain body and a first drain branch. The first drain branch is electrically connected to the first drain body and disposed on the drain electrode.

Abstract: A semiconductor device including an active layer made of III-V group semiconductors, a source electrode and a drain electrode disposed on the active layer, a gate electrode disposed on or above the active layer and between the source electrode and the drain electrode, an interlayer dielectric covering the source electrode, the drain electrode, and the gate electrode and having a plurality of inter-gate via holes. The semiconductor device further includes an inter-source layer, an inter-drain layer, and an inter-gate layer disposed on the interlayer dielectric. The semiconductor device further includes an inter-gate plug filled in the inter-gate via hole and electrically connected to the gate electrode and the inter-gate layer, and a gate field plate being separated from the gate electrode and electrically connected to the gate electrode through the inter-gate layer.

Abstract: A semiconductor device includes an active layer, a source electrode, a drain electrode, a gate electrode, an interlayer dielectric, an inter-source layer, an inter-source plug, an inter-drain layer, an inter-drain plug, an inter-gate layer, and an inter-gate plug. The active layer is made of III-V group semiconductors. The source electrode, the drain electrode, and the gate electrode are disposed on the active layer. The gate electrode is disposed between the source electrode and the drain electrode. The interlayer dielectric covers the source electrode, the drain electrode, and the gate electrode. The inter-source layer, the inter-drain layer, and the inter-gate layer are disposed on the interlayer dielectric. The inter-source plug is electrically connected to the source electrode and the inter-source layer. The inter-drain plug is electrically connected to the drain electrode and the inter-drain layer. The inter-gate plug is electrically connected to the gate electrode and the inter-gate layer.

Abstract: A receptacle connector includes an insulative housing defining a base and a mating tongue extending from the base, the mating tongue defining a thicken step structure around a root thereof adjacent to the base; two rows of contacts disposed in the insulating housing with contacting sections exposed upon the mating tongue and mount tails out of the base; and a shielding plate embedded within the insulative housing and disposed between the two rows of contacts. The shielding plate defines a pair of locking sides for locking with an internal latch of a corresponding plug and the locking sides protruding beyond corresponding lateral sides of the mating tongue. The insulative housing and the shielding plate are integrally formed via an insert molding process while at least one row of the contacts are configured to be forwardly assembled to corresponding passageways in the insulating housing.

Abstract: A semiconductor device includes an active layer, a source electrode, a drain electrode, a gate electrode, a first insulating layer, a gate metal layer, a via, a first source metal layer, a drain metal layer, and a second source metal layer. The source electrode, the drain electrode, and the gate electrode are present on the active layer. The first insulating layer is present on the source electrode, the drain electrode, and the gate electrode. The gate metal layer, the first source metal layer, the second source metal layer, and the drain metal layer are present on the first insulating layer. The gate metal layer includes a narrow portion and a wider portion. The via is present between the metal gate layer and the gate electrode. The second source metal layer is present between the gate metal layer and the drain metal layer.

Abstract: A semiconductor device includes an element layer, plural source electrodes, plural drain electrodes, plural gate electrodes, a source bus bar, a drain bus bar, a first gate bus bar, and a second gate bus bar. The source electrodes, the drain electrodes, and the gate electrodes are disposed on the element layer and extend along a first direction. The gate electrodes are respectively disposed between the source and drain electrodes. The source and drain bus bars and the first and second gate bus bars extend along a second direction interlaced with the first direction. The source bus bar and the drain bus bar are electrically connected to the source electrodes and the drain electrodes, respectively. The first and second gate bus bars are connected to the gate electrodes. The first bus bar is disposed at one end of the source electrodes. The source electrode crosses the second gate bus bar.

Abstract: A receptacle connector includes an insulative housing defining a base and a mating tongue extending from the base, the mating tongue defining a thicken step structure around a root thereof adjacent to the base; two rows of contacts disposed in the insulating housing with contacting sections exposed upon the mating tongue and mount tails out of the base; and a shielding plate embedded within the insulative housing and disposed between the two rows of contacts. The shielding plate defines a pair of locking sides for locking with an internal latch of a corresponding plug and the locking sides protruding beyond corresponding lateral sides of the mating tongue. The insulative housing and the shielding plate are integrally formed via an insert molding process while at least one row of the contacts are configured to be forwardly assembled to corresponding passageways in the insulating housing.

Abstract: An electrical connector has a mating cavity opening forwardly. The electrical connector has a main body, a terminal module and a sealing member. The terminal module has an insulator and a plurality of conductive terminals received therein. The conductive terminals have contacting portions exposed into the mating cavity and connecting legs. The terminal module is received in the main body. The sealing member is filled in a gap between the terminal module and main body to seal the gap.