Patents by Inventor Gerhard Schmidt
Gerhard Schmidt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240094353Abstract: The present disclosure provides a light detection and ranging (LIDAR) system, which comprises: a distance measuring unit configured to emit a plurality of first pulses towards an object located in a field of view (FOV), wherein the object is associated with one or more markers; and a detector configured to receive at least one second pulse from the one or more markers of the object, wherein each of the at least one second pulse indicates object information identifying the object.Type: ApplicationFiled: November 20, 2023Publication date: March 21, 2024Inventors: Ricardo Ferreira, Stefan Hadrath, Peter Hoehmann, Herbert Kaestle, Florian Kolb, Norbert Magg, Jiye Park, Tobias Schmidt, Martin Schnarrenberger, Norbert Haas, Helmut Horn, Bernhard Siessegger, Guido Angenendt, Charles Braquet, Gerhard Maierbacher, Oliver Neitzke, Sergey Khrushchev
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Patent number: 11804415Abstract: A semiconductor device includes: a semiconductor body having an active region and an edge termination region between the active region and a side surface of the semiconductor body; a first portion including silicon and nitrogen; a second portion including silicon and nitrogen, the second portion being in direct contact with the first portion; and a front side metallization in contact with the semiconductor body in the active region. The first portion separates the second portion from the semiconductor body. An average silicon content in the first portion is higher than in the second portion. The front side metallization is interposed between the first portion and the semiconductor body in the active region but not in the edge termination region, and/or the first portion and the second portion are both present in the edge termination region but not in the active region.Type: GrantFiled: May 28, 2021Date of Patent: October 31, 2023Assignee: Infineon Technologies AGInventors: Markus Kahn, Oliver Humbel, Philipp Sebastian Koch, Angelika Koprowski, Christian Maier, Gerhard Schmidt, Juergen Steinbrenner
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Patent number: 11713084Abstract: A body front-end structure for a two-track vehicle, having an A-pillar from which an upper wheel well longitudinal member projects toward the front of the vehicle in the longitudinal direction of the vehicle, and from which a lower body longitudinal member that is offset toward the inside of the vehicle with respect to the upper wheel well longitudinal member projects toward the front of the vehicle in the longitudinal direction of the vehicle. In a head-on crash with small lateral overlap, a suspension strut dome is loaded with a crash force in the longitudinal direction of the vehicle. The body front-end structure has a sheet-metal tension strip that connects the suspension strut dome to the lower body longitudinal member in a force-transmitting manner. In the event of a head-on crash, the sheet-metal tension strip provides a load path through which a tensile force opposing the crash force acts on the suspension strut dome.Type: GrantFiled: October 26, 2021Date of Patent: August 1, 2023Assignee: Volkswagen AktiengesellschaftInventors: Gerhard Schmidt, Mario Ubaldo, Soeren Krengel
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Publication number: 20220041217Abstract: A body front-end structure for a two-track vehicle, having an A-pillar from which an upper wheel well longitudinal member projects toward the front of the vehicle in the longitudinal direction of the vehicle, and from which a lower body longitudinal member that is offset toward the inside of the vehicle with respect to the upper wheel well longitudinal member projects toward the front of the vehicle in the longitudinal direction of the vehicle. In a head-on crash with small lateral overlap, a suspension strut dome is loaded with a crash force in the longitudinal direction of the vehicle. The body front-end structure has a sheet-metal tension strip that connects the suspension strut dome to the lower body longitudinal member in a force-transmitting manner. In the event of a head-on crash, the sheet-metal tension strip provides a load path through which a tensile force opposing the crash force acts on the suspension strut dome.Type: ApplicationFiled: October 26, 2021Publication date: February 10, 2022Applicant: Volkswagen AktiengesellschaftInventors: Gerhard SCHMIDT, Mario UBALDO, Soeren KRENGEL
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Publication number: 20210287954Abstract: A semiconductor device includes: a semiconductor body having an active region and an edge termination region between the active region and a side surface of the semiconductor body; a first portion including silicon and nitrogen; a second portion including silicon and nitrogen, the second portion being in direct contact with the first portion; and a front side metallization in contact with the semiconductor body in the active region. The first portion separates the second portion from the semiconductor body. An average silicon content in the first portion is higher than in the second portion. The front side metallization is interposed between the first portion and the semiconductor body in the active region but not in the edge termination region, and/or the first portion and the second portion are both present in the edge termination region but not in the active region.Type: ApplicationFiled: May 28, 2021Publication date: September 16, 2021Inventors: Markus Kahn, Oliver Humbel, Philipp Sebastian Koch, Angelika Koprowski, Christian Maier, Gerhard Schmidt, Juergen Steinbrenner
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Publication number: 20210265468Abstract: A semiconductor device includes a semiconductor substrate having a first dopant and a second dopant. A covalent atomic radius of a material of the semiconductor substrate is i) larger than a covalent atomic radius of the first dopant and smaller than a covalent atomic radius of the second dopant, or ii) smaller than the covalent atomic radius of the first dopant and larger than the covalent atomic radius of the second dopant. The semiconductor device further includes a semiconductor layer on the semiconductor substrate and semiconductor device elements in the semiconductor layer. A vertical concentration profile of the first dopant decreases along at least 80% of a distance between an interface of the semiconductor substrate and the semiconductor layer to a surface of the semiconductor substrate opposite to the interface.Type: ApplicationFiled: April 21, 2021Publication date: August 26, 2021Inventors: Ingo Muri, Johannes Konrad Baumgartl, Oliver Hellmund, Jacob Tillmann Ludwig, Iris Moder, Thomas Neidhart, Gerhard Schmidt, Hans-Joachim Schulze
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Patent number: 11075134Abstract: A semiconductor device includes a semiconductor body and a first portion including silicon and nitrogen. The first portion is in direct contact with the semiconductor body. A second portion including silicon and nitrogen is in direct contact with the first portion. The first portion is between the semiconductor body and the second portion. An average silicon content in the first portion is higher than in the second portion.Type: GrantFiled: August 30, 2019Date of Patent: July 27, 2021Assignee: Infineon Technologies AGInventors: Markus Kahn, Oliver Humbel, Philipp Sebastian Koch, Angelika Koprowski, Christian Maier, Gerhard Schmidt, Juergen Steinbrenner
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Patent number: 11038028Abstract: A method of manufacturing a semiconductor device includes providing a semiconductor substrate having opposing first and second main surfaces and first and second dopants. A covalent atomic radius of a material of the substrate is i) larger than a covalent atomic radius of the first dopant and smaller than that of the second dopant, or ii) smaller than the covalent atomic radius of the first dopant and larger than that of the second dopant. A vertical extension of the first dopant into the substrate from the first main surface ends at a bottom of a substrate portion at a first vertical distance to the first main surface. The method further includes forming a semiconductor layer on the first main surface, forming semiconductor device elements in the semiconductor layer, and reducing a thickness of the substrate by removing material from the second main surface at least up to the substrate portion.Type: GrantFiled: May 8, 2019Date of Patent: June 15, 2021Assignee: Infineon Technologies AGInventors: Ingo Muri, Johannes Konrad Baumgartl, Oliver Hellmund, Jacob Tillmann Ludwig, Iris Moder, Thomas Christian Neidhart, Gerhard Schmidt, Hans-Joachim Schulze
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Patent number: 10954361Abstract: What are presented and described are a curing agent for silicone rubber compounds comprising a compound having the general structural formula R1mSi(R)4-m, a process for preparation thereof and the use of this curing agent for hardening a silicone rubber compound. The invention further relates to a composition comprising the curing agent for silicone rubber compounds and to the use of such a composition as sealant, adhesive or coating composition.Type: GrantFiled: July 13, 2017Date of Patent: March 23, 2021Assignee: NITROCHEMIE ASCHAU GMBHInventors: Klaus Langerbeins, Ulrich Pichl, Alexis Krupp, Gerhard Schmidt
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Patent number: 10906569Abstract: A rail vehicle includes a coupling disposed centrally in a front region of the rail vehicle. The coupling is mounted in a transversely extended crossmember, so that forces acting on the coupling are introduced through the crossmember into abutments which are supported on a front side of a car body of the rail vehicle. The crossmember is connected through at least one elastic energy absorption configuration to one of the abutments.Type: GrantFiled: August 10, 2015Date of Patent: February 2, 2021Assignee: Siemens Mobility GmbHInventor: Gerhard Schmidt
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Patent number: 10904298Abstract: Techniques are disclosed for using machine-learning processing for generating resource-allocation specifications. A first data set may be received from a first data source. The first data set can include a first resource request and a first timestamp associated with entities. A second data set can be received from a second data source that includes communication data and allocation data associated with the entities. Target characteristics may be defined for training instances. The training instances can be used to train a machine-learning model using the first data set and the second data set. A third data set may be accessed and used to generate a user session within which, the trained machine-learning model may execute to generate a resource-allocation specification. The resource-allocation specification including a communication schedule. One or more communications compliant with the communication schedule may be output to an entity.Type: GrantFiled: September 27, 2019Date of Patent: January 26, 2021Assignee: Oracle International CorporationInventors: Bhupinder Sondhi, Keshava Mangipudi, Babou Srinivasan, Madhavi Makkapati, Gerhard Schmidt, Venugopal Bheemreddy, Balaji Dasarath, Christopher Bharath, Tripti Nair
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Patent number: 10892168Abstract: A method for forming a semiconductor device includes incorporating recombination center atoms into a semiconductor substrate. The method further includes, after incorporating the recombination center atoms into the semiconductor substrate, implanting noble gas atoms into a doping region of a diode structure and/or a transistor structure, the doping region being arranged at a surface of the semiconductor substrate.Type: GrantFiled: December 17, 2018Date of Patent: January 12, 2021Assignee: Infineon Technologies AGInventors: Gerhard Schmidt, Mario Barusic, Benedikt Stoib
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Publication number: 20200335579Abstract: A semiconductor device includes: a semiconductor body with an edge region arranged between an inner region and an edge surface; a first semiconductor region of a first doping type in the inner region; and a second semiconductor region of a second doping type in the inner and edge regions. An edge termination structure includes: a third semiconductor region in the edge region adjoining the first semiconductor region; a surface section of the second semiconductor region adjoining a first main surface of the semiconductor body; and an amorphous passivation layer having a specific resistance higher than 109 ?cm adjoining the third semiconductor region and the surface section. An electrically active doping dose of the third region at a lateral position spaced apart from the first region by 50% of a width of the edge termination structure is at least QBR/q, wherein QBR is breakdown charge and q is elementary charge.Type: ApplicationFiled: April 17, 2020Publication date: October 22, 2020Inventors: Gerhard Schmidt, Elmar Falck
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Patent number: 10727311Abstract: A method for forming a power semiconductor device is provided. The method includes: providing a semiconductor wafer grown by a Czochralski process and having a first side; forming an n-type substrate doping layer in the semiconductor wafer at the first side, the substrate doping layer having a doping concentration of at least 1017/cm3; and forming an epitaxy layer on the first side of the semiconductor wafer after forming the n-type substrate doping layer.Type: GrantFiled: July 31, 2018Date of Patent: July 28, 2020Assignee: Infineon Technologies AGInventors: Gerhard Schmidt, Johannes Konrad Baumgartl, Matthias Kuenle, Erwin Lercher, Daniel Schloegl
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Publication number: 20200128051Abstract: Techniques are disclosed for using machine-learning processing for generating resource-allocation specifications. A first data set may be received from a first data source. The first data set can include a first resource request and a first timestamp associated with entities. A second data set can be received from a second data source that includes communication data and allocation data associated with the entities. Target characteristics may be defined for training instances. The training instances can be used to train a machine-learning model using the first data set and the second data set. A third data set may be accessed and used to generate a user session within which, the trained machine-learning model may execute to generate a resource-allocation specification. The resource-allocation specification including a communication schedule. One or more communications compliant with the communication schedule may be output to an entity.Type: ApplicationFiled: September 27, 2019Publication date: April 23, 2020Applicant: Oracle International CorporationInventors: Bhupinder Sondhi, Keshava Mangipudi, Babou Srinivasan, Madhavi Makkapati, Gerhard Schmidt, Venugopal Bheemreddy, Balaji Dasarath, Christopher Bharath, Tripti Nair
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Publication number: 20200083133Abstract: A semiconductor device includes a semiconductor body and a first portion including silicon and nitrogen. The first portion is in direct contact with the semiconductor body. A second portion including silicon and nitrogen is in direct contact with the first portion. The first portion is between the semiconductor body and the second portion. An average silicon content in the first portion is higher than in the second portion.Type: ApplicationFiled: August 30, 2019Publication date: March 12, 2020Inventors: Markus Kahn, Oliver Humbel, Philipp Sebastian Koch, Angelika Koprowski, Christian Maier, Gerhard Schmidt, Juergen Steinbrenner
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Patent number: 10562824Abstract: The present invention relates to processes for producing fiber cement products as well as to the fiber cement products obtainable therewith. More specifically, the present invention relates to fiber cement products that are suitable for being subjected to ink-jet printing, which fiber cement products at least comprise on their outer surface one or more cured layers of a first coating composition, which at least comprises a binder and a pigment and which is characterized by a pigment volume concentration of higher than about 40%. The invention further provides processes for producing such fiber cement products. Moreover, the present invention provides processes for producing ink-jet printed fiber cement products and ink jet printed fiber cement products obtainable therewith. The present invention further relates to various uses of these fiber cement products, in particular as building materials.Type: GrantFiled: March 7, 2016Date of Patent: February 18, 2020Assignee: Eternit GmbHInventors: Raphael Hoque Chowdhury, Nicolas Lüders, Gerhard Schmidt
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Publication number: 20190348506Abstract: A method of manufacturing a semiconductor device includes providing a semiconductor substrate having opposing first and second main surfaces and first and second dopants. A covalent atomic radius of a material of the substrate is i) larger than a covalent atomic radius of the first dopant and smaller than that of the second dopant, or ii) smaller than the covalent atomic radius of the first dopant and larger than that of the second dopant. A vertical extension of the first dopant into the substrate from the first main surface ends at a bottom of a substrate portion at a first vertical distance to the first main surface. The method further includes forming a semiconductor layer on the first main surface, forming semiconductor device elements in the semiconductor layer, and reducing a thickness of the substrate by removing material from the second main surface at least up to the substrate portion.Type: ApplicationFiled: May 8, 2019Publication date: November 14, 2019Inventors: Ingo Muri, Johannes Konrad Baumgartl, Oliver Hellmund, Jacob Tillmann Ludwig, Iris Moder, Thomas Christian Neidhart, Gerhard Schmidt, Hans-Joachim Schulze
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Publication number: 20190333765Abstract: A method for manufacturing a high-voltage semiconductor device includes exposing a semiconductor substrate to a plasma to form a protective substance layer on the semiconductor substrate. A semiconductor device includes a semiconductor substrate and a protective substance layer on the semiconductor substrate.Type: ApplicationFiled: April 26, 2019Publication date: October 31, 2019Inventors: Markus Kahn, Oliver Humbel, Ravi Keshav Joshi, Philipp Sebastian Koch, Angelika Koprowski, Bernhard Leitl, Christian Maier, Gerhard Schmidt, Juergen Steinbrenner
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Patent number: D910486Type: GrantFiled: November 28, 2018Date of Patent: February 16, 2021Assignee: SIEMENS MOBILITY GMBHInventors: Andreas Grzona, Nadine Hohlstein, Gerhard Schmidt, Ralf Staub