Patents by Inventor Hidekazu Hayashi
Hidekazu Hayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11230074Abstract: The present invention provides a method for producing an optical film excellent in anti-fouling properties and scratch resistance as well as anti-reflection properties. The method includes the steps of: (1) applying a lower layer resin and an upper layer resin; (2) forming a resin layer having the uneven structure on a surface thereof by pressing a mold against the lower layer resin and the upper layer resin from the upper layer resin side in the state where the applied lower layer resin and upper layer resin are stacked; and (3) curing the resin layer, the lower layer resin containing at least one kind of first monomer that contains no fluorine atoms, the upper layer resin containing a fluorine-containing monomer and at least one kind of second monomer that contains no fluorine atoms, at least one of the first monomer and the second monomer containing a compatible monomer that is compatible with the fluorine-containing monomer and being dissolved in the lower layer resin and the upper layer resin.Type: GrantFiled: August 1, 2019Date of Patent: January 25, 2022Assignee: SHARP KABUSHIKI KAISHAInventors: Hidekazu Hayashi, Tokio Taguchi, Atsushi Niinoh, Kenichiro Nakamatsu
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Publication number: 20210348999Abstract: For an easy calibration using calibration particles, provided is a measuring device to capture images of target objects. An image analyzer acquires multiple images obtained at a predetermined time interval, (a) specifies the mean-square displacement of a bright point of a calibration particle based on the displacement of the bright point of the calibration particle in the multiple images in a calibration mode, and (b) specifies the mean-square displacement of a bright point of the target particle based on the displacement of the bright point of the target particle in the multiple images in a measurement mode. A particle size analyzer (c) derives the particle size of the target particle from the mean-square displacement of the bright point of the target particle based on the mean-square displacement of the bright point of the calibration particle and the particle size of the calibration particle in an analysis mode.Type: ApplicationFiled: September 30, 2019Publication date: November 11, 2021Inventors: Haruhisa KATO, Yusuke MATSUURA, Ayako NAKAMURA, Kaoru KONDO, Takuya TABUCHI, Hiroshi TOMITA, Hidekazu HAYASHI
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Patent number: 11142617Abstract: The present invention provides a method for producing an antifouling film capable of long-term continuous production of an antifouling film having excellent antifouling properties. The method for producing an antifouling film of the present invention includes Process (1) of applying a resin to a surface of a substrate; Process (2) of applying a second release agent to a surface of a die coated with a first release agent; Process (3) of pushing the substrate to the surface of the die coated with the second release agent with the resin in between to form an uneven structure on a surface of the resin; and Process (4) of curing the resin including the uneven structure on the surface thereof to form a polymer layer. The resin contains an antifouling agent that contains a predetermined compound. The first release agent contains a predetermined compound. The second release agent contains a predetermined compound.Type: GrantFiled: July 3, 2017Date of Patent: October 12, 2021Assignees: SHARP KABUSHIKI KAISHA, DAIKIN INDUSTRIES, LTD.Inventors: Hidekazu Hayashi, Tokio Taguchi, Kenichiro Nakamatsu, Yasuhiro Shibai, Ken Atsumo, Tsuneo Yamashita, Eiji Sakamoto, Saya Nii, Takayuki Araki
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Patent number: 11142653Abstract: The present invention provides a method for producing an antifouling film having excellent antifouling properties and rubbing resistance. The method for producing an antifouling film of the present invention includes Process (1) of applying a resin to a surface of a substrate; Process (2) of pushing the substrate to a die with the resin in between to form an uneven structure on a surface of the resin; and Process (3) of curing the resin including the uneven structure on the surface thereof to form a polymer layer. The resin contains an antifouling agent that contains a compound containing a perfluoro(poly)ether group. The die includes a surface having undergone release treatment using a release agent containing a compound that contains a perfluoro(poly)ether group, a hydrolyzable group, and a Si atom.Type: GrantFiled: July 3, 2017Date of Patent: October 12, 2021Assignees: SHARP KABUSHIKI KAISHA, DAIKIN INDUSTRIES, LTD.Inventors: Hidekazu Hayashi, Tokio Taguchi, Kenichiro Nakamatsu, Yasuhiro Shibai, Ken Atsumo, Tsuneo Yamashita, Saya Nii, Eiji Sakamoto, Kakeru Hanabusa, Hisashi Mitsuhashi, Takayuki Araki
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Publication number: 20210305897Abstract: A power supply controller used in a DC/DC converter includes a feedback control unit that generates a pulse-shaped PWM signal having a first level that is one of a high level and a low level and a second level that is the other of the high level and the low level, on the basis of a feedback voltage based on an output voltage of the DC/DC converter; a low voltage detection unit that detects a low voltage of the feedback voltage; and a selection unit that chooses, as a chosen clock signal, a first clock signal having a high duty when the low voltage is not detected by the low voltage detection unit, and chooses a second clock signal having a low duty when the low voltage is detected by the low voltage detection unit.Type: ApplicationFiled: March 17, 2021Publication date: September 30, 2021Inventor: Hidekazu Hayashi
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Patent number: 11112344Abstract: According to one embodiment, a particle measuring method is disclosed. The method includes irradiating a detection liquid with light. The detection liquid contains methyl salicylate. The method further includes converting scattered light from the detection liquid into an electric signal by using photoelectric conversion after irradiating the detection liquid with the light. The method further includes performing a particle measurement on the detection liquid by using the electric signal.Type: GrantFiled: March 3, 2020Date of Patent: September 7, 2021Assignees: Kioxia Corporation, Rion Co., Ltd.Inventors: Hiroshi Tomita, Hidekazu Hayashi, Eishi Shiobara, Kaoru Kondo, Takuya Tabuchi, Kazuna Bando, Sota Kondo
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Patent number: 10996377Abstract: The method for producing an optical member of the present invention includes: a step (1) of applying a lower layer resin and an upper layer resin; a step (2) of pressing a die against the lower layer resin and the upper layer resin from the upper layer resin side, so as to form a resin layer including an uneven structure on a surface thereof; and a step (3) of curing the resin layer to form the polymer layer, wherein the lower layer resin contains an amide group, the lower layer resin has an amide group concentration of 1.5 mmol/g or more and less than 5 mmol/g, and the polymer layer has a minimum storage modulus E? of 1×108 Pa or higher and 1×109 Pa or lower at a bottom temperature of 110° C. or higher and 210° C. or lower.Type: GrantFiled: February 15, 2017Date of Patent: May 4, 2021Assignee: SHARP KABUSHIKI KAISHAInventors: Yasuhiro Shibai, Ken Atsumo, Hidekazu Hayashi
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Patent number: 10981352Abstract: The method for producing an optical member of the present invention includes: Process (1) of applying a first resin to a substrate; Process (2) of applying a second resin to at least one of the first resin and a die; Process (3) of pushing the substrate to the die with the first resin and the second resin in between to form a resin layer including on a surface thereof an uneven structure; and Process (4) of curing the resin layer to provide a polymer layer. The die includes a surface after release treatment with a fluorine release agent. The first resin contains a resin component, and the resin component contains predetermined amounts of a (meth)acrylamide compound and a urethane prepolymer containing six or more functional groups. The second resin contains predetermined amounts of a reactive group-containing monomer, a fluorosurfactant, and a fluorine-containing monomer.Type: GrantFiled: March 6, 2017Date of Patent: April 20, 2021Assignee: Sharp Kabushiki KaishaInventors: Hidekazu Hayashi, Tokio Taguchi, Kenichiro Nakamatsu, Hisashi Maruyama, Nobuaki Nakao, Suguru Aoki
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Patent number: 10967663Abstract: A printing intaglio (100A), (100B) is a printing intaglio for use in intaglio printing, the printing intaglio having a surface which has a plurality of first recessed portions (12) that form a pattern to be printed, wherein at least one of the plurality of first recessed portions has a plurality of minute recessed portions (16p) inside the first recessed portion, and when viewed in a direction normal to the surface of the printing intaglio, a two-dimensional size of the plurality of minute recessed portions is not less than 10 nm and less than 500 nm.Type: GrantFiled: December 16, 2016Date of Patent: April 6, 2021Assignee: SHARP KABUSHIKI KAISHAInventors: Nobuaki Yamada, Kenichiro Nakamatsu, Hidekazu Hayashi
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Patent number: 10947411Abstract: The optical member of the present invention includes a substrate and a polymer layer that is in direct contact with the substrate and includes on a surface thereof an uneven structure provided with multiple projections at a pitch not longer than a wavelength of visible light, the polymer layer containing an amide group, the polymer layer having an amide group concentration of 2 mmol/g or higher and lower than 5 mmol/g, the polymer layer having a minimum storage modulus E? of 1×108 Pa or higher and 1×109 Pa or lower at a bottom temperature of 110° C. or higher and 210° C. or lower in a dynamic viscoelasticity measurement with a measurement temperature range of ?50° C. to 250° C., a temperature rise rate of 5° C./min, and a frequency of 10 Hz.Type: GrantFiled: December 8, 2016Date of Patent: March 16, 2021Assignee: SHARP KABUSHIKI KAISHAInventors: Yasuhiro Shibai, Ken Atsumo, Hidekazu Hayashi, Nobuaki Yamada
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Publication number: 20200284714Abstract: According to one embodiment, a particle measuring method is disclosed. The method includes irradiating a detection liquid with light. The detection liquid contains methyl salicylate. The method further includes converting scattered light from the detection liquid into an electric signal by using photoelectric conversion after irradiating the detection liquid with the light. The method further includes performing a particle measurement on the detection liquid by using the electric signal.Type: ApplicationFiled: March 3, 2020Publication date: September 10, 2020Applicants: Kioxia Corporation, RION Co., Ltd.Inventors: Hiroshi TOMITA, Hidekazu HAYASHI, Eishi SHIOBARA, Kaoru KONDO, Takuya TABUCHI, Kazuna BANDO, Sota KONDO
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Patent number: 10763068Abstract: An electron emitting device (100) includes a first electrode (12), a second electrode (52), and a semi-conductive layer (30) provided between the first electrode (12) and the second electrode (52). The semi-conductive layer (30) includes a porous alumina layer (32) having a plurality of pores (34) and silver (42) supported in the plurality of pores (34) of the porous alumina layer (32).Type: GrantFiled: May 15, 2018Date of Patent: September 1, 2020Assignee: SHARP KABUSHIKI KAISHAInventors: Hidekazu Hayashi, Tokio Taguchi, Kenichiro Nakamatsu, Tadashi Iwamatsu, Kohji Shinkawa, Mai Takasaki, Toshihiro Kaneko, Atsushi Niinoh
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Patent number: 10752788Abstract: The antifouling film includes a polymer layer that includes on a surface thereof an uneven structure provided with multiple projections at a pitch not longer than a wavelength of visible light. The polymer layer has a proportion of the number of fluorine atoms relative to the sum of the numbers of carbon atoms, nitrogen atoms, oxygen atoms, and fluorine atoms of 33 atom % or more on the surface of the uneven structure and of 3 atom % or less on average in a region 90 to 120 nm deep from the surface of the uneven structure. The polymer layer has a proportion of the number of nitrogen atoms relative to the sum of the numbers of carbon atoms, nitrogen atoms, oxygen atoms, and fluorine atoms of 4 atom % or less on average in a region 90 to 120 nm deep from the surface of the uneven structure.Type: GrantFiled: July 3, 2017Date of Patent: August 25, 2020Assignee: SHARP KABUSHIKI KAISHAInventors: Hidekazu Hayashi, Atsushi Niinoh
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Publication number: 20200263055Abstract: The optical member of the present invention includes a substrate and a polymer layer that is in direct contact with the substrate and includes on a surface thereof an uneven structure provided with multiple projections at a pitch not longer than a wavelength of visible light, the polymer layer containing an amide group, the polymer layer having an amide group concentration of 2 mmol/g or higher and lower than 5 mmol/g, the polymer layer having a minimum storage modulus E? of 1×108 Pa or higher and 1×109 Pa or lower at a bottom temperature of 110° C. or higher and 210° C. or lower in a dynamic viscoelasticity measurement with a measurement temperature range of ?50° C. to 250° C., a temperature rise rate of 5° C./min, and a frequency of 10 Hz.Type: ApplicationFiled: December 8, 2016Publication date: August 20, 2020Inventors: YASUHIRO SHIBAI, KEN ATSUMO, HIDEKAZU HAYASHI, NOBUAKI YAMADA
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Patent number: 10744738Abstract: The antifouling film includes a polymer layer that includes on a surface thereof an uneven structure provided with multiple projections at a pitch not longer than a wavelength of visible light. The polymer layer has a proportion of the number of fluorine atoms relative to the sum of the numbers of carbon atoms, nitrogen atoms, oxygen atoms, and fluorine atoms of 33 atom % or more on the surface of the uneven structure. The polymer layer has at least one local maximum of the proportion of the number of nitrogen atoms relative to the sum of the numbers of carbon atoms, nitrogen atoms, oxygen atoms, and fluorine atoms in a region 5 to 90 nm deep from the surface of the uneven structure. The local maximum is 0.3 atom % or more greater than the average value in a region 90 to 120 nm deep from the surface of the uneven structure.Type: GrantFiled: July 3, 2017Date of Patent: August 18, 2020Assignee: SHARP KABUSHIKI KAISHAInventors: Hidekazu Hayashi, Atsushi Niinoh
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Publication number: 20200241172Abstract: A manufacturing method of a mold (100) includes the steps of: (a) providing a mechanically mirror-finished aluminum base (12); (b) propelling an abrasive media toward a surface of the aluminum base, thereby forming a plurality of recessed portions (12a) in the surface (12s) of the aluminum base, the abrasive media being generally-spherical, the abrasive media containing an alumina particle, an average particle diameter of the abrasive media being not less than 10 ?m and not more than 40 ?m; (c) after step (b), forming an inorganic material layer (16) over the surface of the aluminum base and forming an aluminum film (18) over the inorganic material layer, thereby forming a mold base (10); and after step (c), anodizing a surface of the aluminum film and bringing the porous alumina layer into contact with an etchant.Type: ApplicationFiled: February 1, 2018Publication date: July 30, 2020Inventors: Hidekazu HAYASHI, Tokio TAGUCHI, Yukio SHIMAMURA, Tomoyuki KITAGAWA
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Patent number: 10695955Abstract: A manufacturing method of a mold, the mold having at its surface a plurality of recessed portions whose two-dimensional size is not less than 10 nm and less than 500 nm when viewed in a direction normal to the surface, the method comprising: (a) providing a mold base (10); (b) partially anodizing the aluminum alloy layer (18), thereby forming a porous alumina layer (14) which has a plurality of minute recessed portions (14p); (c) bringing the porous alumina layer into contact with an etching solution, thereby enlarging the plurality of minute recessed portions; (d) detecting a protrusion (210) formed at a surface of the porous alumina layer or the mold base; (e) determining whether or not a height of the detected protrusion is greater than a predetermined height; and (f) if it is determined at step (e) that the height of the protrusion is greater, irradiating the protrusion with laser light such that the height of the protrusion becomes smaller than the predetermined height.Type: GrantFiled: October 30, 2015Date of Patent: June 30, 2020Assignee: SHARP KABUSHIKI KAISHAInventors: Nobuaki Yamada, Hidekazu Hayashi, Miho Yamada
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Patent number: 10675788Abstract: A manufacturing method of a mold, the mold having at its surface a plurality of recessed portions whose two-dimensional size is not less than 10 nm and less than 500 nm when viewed in a direction normal to the surface, the method including: (a) providing a mold base, (b) partially anodizing an aluminum alloy layer, thereby forming a porous alumina layer which has a plurality of minute recessed portions; and (c) after step (b), bringing the porous alumina layer into contact with a first etching solution, thereby enlarging the plurality of minute recessed portions of the porous alumina layer. Step (a) of providing the mold base includes (a1) providing a metal base, (a2) forming an aluminum alloy layer on the metal base, and (a3) forming a surface protection layer on the aluminum alloy layer. Step (a2) and step (a3) are performed in a same chamber.Type: GrantFiled: November 6, 2015Date of Patent: June 9, 2020Assignees: SHARP KABUSHIKI KAISHA, GEOMATEC CO., LTD.Inventors: Nobuaki Yamada, Kiyoshi Minoura, Miho Yamada, Hidekazu Hayashi, Takashi Satoh, Hiroyuki Sugawara
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Publication number: 20200144456Abstract: An optical device case (100A) of an embodiment includes: a light-transmitting window member (20A); and a housing (10) which has a space for accommodating a light-receiving element and/or a light-emitting element (OE), wherein the window member (20A) includes a light-transmitting member (22), a polymer film (50) provided on an outer surface of the light-transmitting member (22), the polymer film (50) having a moth-eye structure at its surface, a contact angle of the surface with respect to water being not less than 140°, and a resistance heater (24) provided on an inner surface of the light-transmitting member (22).Type: ApplicationFiled: March 12, 2018Publication date: May 7, 2020Inventors: Hidekazu HAYASHI, Hiroyuki SUGAWARA
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Patent number: 10643815Abstract: Provided are an electron emission device having a novel structure and being capable of improving characteristics and/or extending a lifetime of a related-art electron emission device, and a method of manufacturing the electron emission device.Type: GrantFiled: September 11, 2018Date of Patent: May 5, 2020Assignee: SHARP KABUSHIKI KAISHAInventors: Kenichiro Nakamatsu, Hidekazu Hayashi, Tokio Taguchi, Tadashi Iwamatsu, Kohji Shinkawa, Mai Takasaki, Toshihiro Kaneko, Atsushi Niinoh