Patents by Inventor Hidekazu Hayashi

Hidekazu Hayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180257329
    Abstract: A synthetic polymer film (35), (36) having a surface which has a plurality of raised portions (35p), (36p), wherein a two-dimensional size of the plurality of raised portions is in a range of more than 20 nm and less than 500 nm when viewed in a normal direction of the synthetic polymer film, the surface having a microbicidal effect, and the synthetic polymer film includes a fluorine element in such a profile that a fluorine content is not constant in a thickness direction but is higher in a portion closer to the plurality of raised portions than in a portion farther from the plurality of raised portions.
    Type: Application
    Filed: August 24, 2016
    Publication date: September 13, 2018
    Inventors: TAKAHIRO NAKAHARA, HIDEKAZU HAYASHI
  • Publication number: 20180201001
    Abstract: The present invention provides an optical member with which degradation of adhesion between a substrate containing triacetylcellulose and a polymer layer caused by moisture absorption is suppressed. An optical member according to the present invention includes a substrate and a polymer layer in direct contact with the substrate and having an indented structure on a surface thereof, the indented structure including multiple protrusions formed at a pitch not greater than a wavelength of visible light. Triacetylcellulose is present in at least a surface of the substrate on the polymer layer side, the polymer layer is formed from a polymerizable composition polymerizable by active energy ray irradiation, and the polymerizable composition contains 30 parts by weight or more and 75 parts by weight or less of a polyfunctional acrylate, 25 parts by weight or more and 60 parts by weight or less of a monofunctional monomer having a tertiary amide group, and 0.
    Type: Application
    Filed: August 1, 2016
    Publication date: July 19, 2018
    Inventors: YASUHIRO SHIBAI, KEN ATSUMO, HIDEKAZU HAYASHI, NOBUAKI YAMADA
  • Patent number: 9899645
    Abstract: A battery pack may include a drainage device provided at a bottom portion of the housing case. The drainage device may include a drain hole communicating between the inside and the outside of the housing case, so that water introduced into the housing case is discharged to the outside of the housing case. The drainage device may be disposed between two of the terminal members that are connected to electrodes of the battery cells.
    Type: Grant
    Filed: August 15, 2017
    Date of Patent: February 20, 2018
    Assignee: MAKITA CORPORATION
    Inventors: Hidekazu Hayashi, Eiji Kondo, Hironori Ogura, Hideyuki Taga, Kazutoshi Ogino
  • Publication number: 20180026241
    Abstract: A battery pack may include a drainage device provided at a bottom portion of the housing case. The drainage device may include a drain hole communicating between the inside and the outside of the housing case, so that water introduced into the housing case is discharged to the outside of the housing case. The drainage device may be disposed between two of the terminal members that are connected to electrodes of the battery cells.
    Type: Application
    Filed: August 15, 2017
    Publication date: January 25, 2018
    Applicant: MAKITA CORPORATION
    Inventors: Hidekazu HAYASHI, Eiji KONDO, Hironori OGURA, Hideyuki TAGA, Kazutoshi OGINO
  • Patent number: 9873213
    Abstract: This is a mold repairing method for removing a resin material deposited on a mold, of which the surface is a porous film with a plurality of recesses that have been created through anodization. The mold repairing method includes the steps of: (I) removing the resin material that is exposed on the surface of the mold over the plurality of recesses without performing atmospheric pressure plasma processing; and (II) removing at least partially the resin material that is still left inside the plurality of recesses by the atmospheric pressure plasma processing, after the step (I) has been performed, thereby recovering the original function of the mold.
    Type: Grant
    Filed: February 7, 2013
    Date of Patent: January 23, 2018
    Assignee: SHARP KABUSHIKI KAISHA
    Inventor: Hidekazu Hayashi
  • Patent number: 9821494
    Abstract: A mold release processing method according to an embodiment of the present invention includes the steps of: (a) providing a mold releasing agent, including a fluorine-based silane coupling agent and a solvent, and a mold of which the surface has a porous alumina layer; (b) applying the mold releasing agent onto the surface; and (c) heating, either before or after the step (b), the surface to a temperature not less than 40° C. and less than 100° C. in an ambient with a relative humidity of 50% or more.
    Type: Grant
    Filed: March 25, 2013
    Date of Patent: November 21, 2017
    Assignee: SHARP KABUSHIKI KAISHA
    Inventor: Hidekazu Hayashi
  • Publication number: 20170320281
    Abstract: The present invention provides a method for producing an optical film excellent in anti-fouling properties and scratch resistance as well as anti-reflection properties. The method includes the steps of: (1) applying a lower layer resin and an upper layer resin; (2) forming a resin layer having the uneven structure on a surface thereof by pressing a mold against the lower layer resin and the upper layer resin from the upper layer resin side in the state where the applied lower layer resin and upper layer resin are stacked; and (3) curing the resin layer, the lower layer resin containing at least one kind of first monomer that contains no fluorine atoms, the upper layer resin containing a fluorine-containing monomer and at least one kind of second monomer that contains no fluorine atoms, at least one of the first monomer and the second monomer containing a compatible monomer that is compatible with the fluorine-containing monomer and being dissolved in the lower layer resin and the upper layer resin.
    Type: Application
    Filed: July 14, 2017
    Publication date: November 9, 2017
    Applicant: Sharp Kabushiki Kaisha
    Inventors: Hidekazu HAYASHI, Tokio TAGUCHI, Atsushi NIINOH, Kenichiro NAKAMATSU
  • Patent number: 9786878
    Abstract: A battery pack may include a drainage device provided at a bottom portion of the housing case. The drainage device may include a drain hole communicating between the inside and the outside of the housing case, so that water introduced into the housing case is discharged to the outside of the housing case. The drainage device may be disposed between two of the terminal members that are connected to electrodes of the battery cells.
    Type: Grant
    Filed: April 21, 2016
    Date of Patent: October 10, 2017
    Assignee: MAKITA CORPORATION
    Inventors: Hidekazu Hayashi, Eiji Kondo, Hironori Ogura, Hideyuki Taga, Kazutoshi Ogino
  • Patent number: 9754781
    Abstract: A semiconductor manufacturing method in accordance with an embodiment includes feeding a first gas, which contains a component of a first film, to a reaction chamber, and forming a first film over a semiconductor substrate, which is accommodated in the reaction chamber, through plasma CVD. The semiconductor manufacturing method includes feeding a second gas to the reaction chamber after forming the first film, allowing the first gas in the reaction chamber to react on the second gas, and forming a second film, which has a composition different from that of the first film, over the surface of the first film. The semiconductor manufacturing method includes selectively removing the second film.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: September 5, 2017
    Assignee: Toshiba Memory Corporation
    Inventors: Shinya Okuda, Kei Watanabe, Hidekazu Hayashi
  • Publication number: 20170187010
    Abstract: A battery pack includes a battery cell case, a plurality of battery cells accommodated in the battery cell case, a plurality of lead plates connected to the battery cells, arranged on a same side surface of the battery cell case, and arranged to be separated from each other, and one or more insulation sheets. A first insulation sheet included in the one or more insulation sheets is adhered to a surface of a first lead plate so as to cover the first lead plate at least partially and not to cover lead plates other than the first lead plate.
    Type: Application
    Filed: December 7, 2016
    Publication date: June 29, 2017
    Inventors: Hidekazu HAYASHI, Hideyuki TAGA
  • Patent number: 9612604
    Abstract: In a DC-DC converter that can be operated in an asynchronous manner with a rectification diode connected to an external terminal, a conducting path through a transistor that is turned on and off according to a clock signal is provided between a bootstrap circuit, which is composed of a bootstrap diode and a bootstrap capacitor, and a ground terminal.
    Type: Grant
    Filed: June 30, 2015
    Date of Patent: April 4, 2017
    Assignee: Rohm Co., Ltd.
    Inventor: Hidekazu Hayashi
  • Publication number: 20170066207
    Abstract: A method for producing an optical film includes: (1) applying a lower layer resin and an upper layer resin; (2) forming a resin layer having the uneven structure on a surface thereof by pressing a mold against the lower layer resin and the upper layer resin from the upper layer resin side in the state where the applied lower layer resin and upper layer resin are stacked; and (3) curing the resin layer, the lower layer resin containing at least one kind of first monomer that contains no fluorine atoms, the upper layer resin containing a fluorine-containing monomer and at least one kind of second monomer that contains no fluorine atoms, at least one of the first monomer and the second monomer containing a compatible monomer that is compatible with the fluorine-containing monomer and being dissolved in the lower layer resin and the upper layer resin.
    Type: Application
    Filed: February 10, 2016
    Publication date: March 9, 2017
    Applicant: Sharp Kabushiki Kaisha
    Inventors: Hidekazu HAYASHI, Tokio TAGUCHI, Nobuaki YAMADA, Yasuhiro SHIBAI, Atsushi NIINOH, Kenichiro NAKAMATSU
  • Patent number: 9583330
    Abstract: A supercritical drying method for a semiconductor substrate is disclosed. The method may include introducing the semiconductor substrate into a chamber in a state, a surface of the semiconductor substrate being wet with alcohol, substituting the alcohol on the semiconductor substrate with a supercritical fluid of carbon dioxide by impregnating the semiconductor substrate to the supercritical fluid in the chamber, and discharging the supercritical fluid and the alcohol from the chamber and reducing a pressure inside the chamber. The method may also include performing a baking treatment by supplying an oxygen gas or an ozone gas to the chamber after the reduction of the pressure inside the chamber.
    Type: Grant
    Filed: May 21, 2014
    Date of Patent: February 28, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Linan Ji, Hidekazu Hayashi, Hiroshi Tomita, Hisashi Okuchi, Yohei Sato, Takayuki Toshima, Mitsuaki Iwashita, Kazuyuki Mitsuoka, Gen You, Hiroki Ohno, Takehiko Orii
  • Patent number: 9570286
    Abstract: According to one embodiment, a supercritical drying method for a semiconductor substrate comprises introducing a semiconductor substrate, a surface of the semiconductor substrate being wet with a water-soluble organic solvent, to the inside of a chamber, hermetically sealing the chamber and increasing a temperature inside the chamber to not lower than a critical temperature of the water-soluble organic solvent, thereby bringing the water-soluble organic solvent into a supercritical state, decreasing a pressure inside the chamber and changing the water-soluble organic solvent in the supercritical state to a gas, thereby discharging the water-soluble organic solvent from the chamber, starting a supply of an inert gas into the chamber as the pressure inside the chamber decreases to atmospheric pressure, and cooling the semiconductor substrate in a state where the inert gas exists inside the chamber.
    Type: Grant
    Filed: January 29, 2015
    Date of Patent: February 14, 2017
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yohei Sato, Hisashi Okuchi, Hiroshi Tomita, Hidekazu Hayashi, Linan Ji
  • Patent number: 9556532
    Abstract: A method is provided for manufacturing a mold that has a porous alumina layer over its surface, which is capable of preventing formation of pits (recesses). A moth-eye mold manufacturing method of an embodiment of the present invention is a method for manufacturing a mold which has a porous alumina layer over its surface, including the steps of: providing a mold base which includes an aluminum base and an aluminum film deposited on a surface of the aluminum base, the aluminum film having a purity of not less than 99.99 mass %; anodizing a surface of the aluminum film to form a porous alumina layer which has a plurality of minute recessed portions; and bringing the porous alumina layer into contact with an etching solution to enlarge the plurality of minute recessed portions of the porous alumina layer.
    Type: Grant
    Filed: March 22, 2011
    Date of Patent: January 31, 2017
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Kiyoshi Minoura, Akinobu Isurugi, Ichirou Ihara, Hidekazu Hayashi, Kenichiro Nakamatsu
  • Patent number: 9502699
    Abstract: One aspect according to the present invention includes a battery pack and a shock absorbing device interposed between a battery cell holder and a case body and capable of keeping the battery cell holder and the battery cells not to directly contact with an inner surface of the case body.
    Type: Grant
    Filed: December 4, 2013
    Date of Patent: November 22, 2016
    Assignee: MAKITA CORPORATION
    Inventors: Tsuyoshi Murayama, Hideyuki Taga, Kazutoshi Ogino, Hidekazu Hayashi, Hitoshi Suzuki
  • Publication number: 20160276170
    Abstract: A semiconductor manufacturing method in accordance with an embodiment includes feeding a first gas, which contains a component of a first film, to a reaction chamber, and forming a first film over a semiconductor substrate, which is accommodated in the reaction chamber, through plasma CVD. The semiconductor manufacturing method includes feeding a second gas to the reaction chamber after forming the first film, allowing the first gas in the reaction chamber to react on the second gas, and forming a second film, which has a composition different from that of the first film, over the surface of the first film. The semiconductor manufacturing method includes selectively removing the second film.
    Type: Application
    Filed: March 9, 2016
    Publication date: September 22, 2016
    Inventors: Shinya OKUDA, Kei WATANABE, Hidekazu HAYASHI
  • Patent number: 9437416
    Abstract: According to one embodiment, a supercritical drying method for a semiconductor substrate includes introducing a semiconductor substrate formed with a metal film into a chamber, the surface of the substrate being wet with alcohol, supplying a supercritical fluid of carbon dioxide into the chamber, setting a temperature inside the chamber to a predetermined temperature, to replace the alcohol on the semiconductor substrate with the supercritical fluid, and discharging the supercritical fluid and the alcohol from the chamber while keeping the temperature inside the chamber at the predetermined temperature, to lower a pressure inside the chamber. The predetermined temperature is not lower than 75° C. but lower than a critical temperature of the alcohol.
    Type: Grant
    Filed: September 13, 2011
    Date of Patent: September 6, 2016
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hidekazu Hayashi, Hiroshi Tomita, Yukiko Kitajima, Hisashi Okuchi, Yohei Sato
  • Publication number: 20160233463
    Abstract: A battery pack may include a drainage device provided at a bottom portion of the housing case. The drainage device may include a drain hole communicating between the inside and the outside of the housing case, so that water introduced into the housing case is discharged to the outside of the housing case. The drainage device may be disposed between two of the terminal members that are connected to electrodes of the battery cells.
    Type: Application
    Filed: April 21, 2016
    Publication date: August 11, 2016
    Applicant: MAKITA CORPORATION
    Inventors: Hidekazu HAYASHI, Eiji KONDO, Hironori OGURA, Hideyuki TAGA, Kazutoshi OGINO
  • Patent number: RE46429
    Abstract: A battery housing of a tool battery has a hook accommodation chamber and a battery cell accommodation chamber defined therein. A hook is accommodated within the hook accommodation chamber and is operable to lock and unlock the tool battery against a tool body of a power tool. Battery cells are disposed within the battery cell accommodation chamber. The hook accommodation chamber and the battery cell accommodation chamber are partitioned from each other.
    Type: Grant
    Filed: October 14, 2015
    Date of Patent: June 6, 2017
    Assignee: MAKITA CORPORATION
    Inventors: Hidekazu Hayashi, Eiji Kondo, Hironori Ogura, Hideyuki Taga