Patents by Inventor Hiroki Chisaka

Hiroki Chisaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240141085
    Abstract: A photocurable liquid composition capable of forming a cured product in which localization of metal oxide nanoparticles is suppressed, a cured product of the photocurable liquid composition, and a method for producing a cured product using the photocurable liquid composition. As a nitrogen-containing compound, at least one of an amine compound having a specific structure and an imine compound having specific structure is added to the photocurable liquid composition including the photopolymerizable monomer, metal oxide nanoparticles, and a photopolymerization initiator.
    Type: Application
    Filed: February 21, 2022
    Publication date: May 2, 2024
    Inventors: Yoichiro IJIMA, Hiroki CHISAKA, Koichi MISUMI, Kazuki URAKAWA
  • Patent number: 11926681
    Abstract: A curable composition capable of forming a cured product having a high refractive index and suppressed increase in reflectance, a cured product of the curable composition, and a method for producing the cured product using the curable composition. The curable composition includes a photopolymerizable monomer, metal oxide nanoparticles, and a photopolymerization initiating agent. The photopolymerizable monomer includes a compound represented by the following formula (a1).
    Type: Grant
    Filed: June 10, 2022
    Date of Patent: March 12, 2024
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hiroki Chisaka, Shinsuke Kawatsu
  • Patent number: 11905433
    Abstract: An energy-sensitive composition that yields a cured product with excellent thermal resistance and crack resistance, a cured product of the composition, and a method of forming a cured product. The energy-sensitive composition includes a polysilane and a thermal base generator, in which the thermal base generator includes an ionic compound and a nonionic compound. An anion moiety in the ionic compound preferably includes at least one of an anion having an oxaxanthone skeleton, an anion having a ketoprofen skeleton, and an anion having a fluorenone skeleton.
    Type: Grant
    Filed: October 26, 2021
    Date of Patent: February 20, 2024
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kunihiro Noda, Hiroki Chisaka, Kazuya Someya, Dai Shiota
  • Patent number: 11718587
    Abstract: A novel compound suitable as an epoxy curing catalyst; an epoxy curing catalyst using the compound; and a method for producing the compound. A compound represented by formula (1) in which Xm+ represents an m valent counter cation, R1 represents an aromatic group which may have a substituent; R2 represents an alkylene group which may have a substituent; R3 represents a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfonic acid ester group, a phosphino group, a phosphinyl group, a phosphonic acid ester group or an organic group; m represents an integer of 1 or more; n represents an integer of 0-3; and R2 may bond with R1 to form a cyclic structure.
    Type: Grant
    Filed: September 26, 2018
    Date of Patent: August 8, 2023
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Daicel Corporation
    Inventors: Kunihiro Noda, Hiroki Chisaka, Issei Suzuki, Jiro Hikida, Dai Shiota, Kieko Hanano, Kyohei Ishida, Tsutomu Watanabe, Kazuhiro Uehara
  • Patent number: 11718717
    Abstract: A resin composition including a silicon-containing resin component and a solvent, the silicon-containing resin component includes (I) mentioned below, the solvent including at least one of a terpene compound having at least one of a hydroxy group and an acetoxy group, and a cyclic skeleton-containing acetate compound (excluding the terpene compound): (I) a polysilane-polysiloxane resin having a polysilane structure and a polysiloxane structure.
    Type: Grant
    Filed: August 27, 2020
    Date of Patent: August 8, 2023
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kunihiro Noda, Hiroki Chisaka, Kazuya Someya, Dai Shiota
  • Publication number: 20230056225
    Abstract: A photosensitive composition capable of forming a cured product with high transparency, a cured product of the photosensitive composition, and a method for producing the cured product using the photosensitive composition. In a photosensitive composition including a base component having photopolymerizability and a photopolymerization initiator, a silicone resin is used as the base component, and a phosphine oxide compound and an oxime ester compound as a photopolymerization initiator are used in combination at a specific ratio.
    Type: Application
    Filed: November 17, 2020
    Publication date: February 23, 2023
    Inventors: Hiroki CHISAKA, Koichi MISUMI
  • Publication number: 20230038195
    Abstract: A photosensitive composition capable of forming a cured product with high transparency, a cured product of the photosensitive composition, and a method for producing the cured product using the photosensitive composition. In a photosensitive composition including a base component having photopolymerizability and a photopolymerization initiator, a phosphine oxide compound and an oxime ester compound as a photopolymerization initiator are used in combination such that the ratio of the mass W2 of the oxime ester compound is 35% by mass or more relative to sum of a mass W1 of the phosphine oxide compound and the mass W2 of the oxime ester compound.
    Type: Application
    Filed: November 20, 2020
    Publication date: February 9, 2023
    Inventors: Hiroki CHISAKA, Kunihiro NODA, Dai SHIOTA
  • Publication number: 20230028822
    Abstract: A liquid photosensitive ink composition capable of forming a cured product with a high refractive index and applicable to an inkjet method even though the photosensitive ink composition does not include the solvent, or include small amount of the solvent, a cured product of the photosensitive ink composition, a display panel having a film consisting of the cured product, and a method for producing the cured product using the above photosensitive ink composition. In a photosensitive ink composition including a photopolymerizable compound, metal compound particles, and a photopolymerization initiator, a sulfide compound having specific structure and a (meth)acrylate compound having specific structure as the photopolymerizable compound, and at least one selected from the group consisting of titanium oxide particles, barium titanate particles, cerium oxide particles, and zinc sulfide particles, as the metal compound particles are used.
    Type: Application
    Filed: November 17, 2020
    Publication date: January 26, 2023
    Inventors: Hiroki CHISAKA, Wataru SUZUKI, Koichi MISUMI
  • Publication number: 20230002520
    Abstract: A curable composition capable of forming a cured product having a high refractive index and suppressed increase in reflectance, a cured product of the curable composition, and a method for producing the cured product using the curable composition. The curable composition includes a photopolymerizable monomer, metal oxide nanoparticles, and a photopolymerization initiating agent. The photopolymerizable monomer includes a compound represented by the following formula (a1).
    Type: Application
    Filed: June 10, 2022
    Publication date: January 5, 2023
    Inventors: Hiroki CHISAKA, Shinsuke KAWATSU
  • Publication number: 20220404709
    Abstract: A liquid photosensitive ink composition capable of forming a cured product with a high refractive index and a high transparency, a cured product of the photosensitive ink composition, a display panel having a film consisting of the cured product, and a method for producing the cured product using the photosensitive ink composition. In a photosensitive ink composition including a photopolymerizable compound, and a photopolymerization initiator, a sulfide compound having specific structure and a (meth)acrylate compound having specific structure are used as the photopolymerizable compound, and a phosphine oxide compound and an oxime ester compound are used as the photopolymerization initiator.
    Type: Application
    Filed: November 20, 2020
    Publication date: December 22, 2022
    Inventors: Hiroki CHISAKA, Wataru SUZUKI, Koichi MISUMI
  • Publication number: 20220325127
    Abstract: A curable ink composition capable of forming a cured product with a high refractive index and applicable to the inkjet method, a cured product of the curable ink composition, and a nanocomposite having a film composed of the cured product of the curable ink composition. The curable ink composition includes a photopolymerizable compound and metal compound nanocrystals, using a sulfide compound having specific structure and a (meth)acrylate compound (as the photopolymerizable compound, and using zirconium oxide nanocrystals as the metal compound nanocrystals.
    Type: Application
    Filed: August 25, 2020
    Publication date: October 13, 2022
    Inventors: Hiroki CHISAKA, Wataru SUZUKI, Koichi MISUMI, Peter Christopher GUSCHL, Robert SWISHER
  • Publication number: 20220145011
    Abstract: An energy-sensitive composition that yields a cured product with excellent thermal resistance and crack resistance, a cured product of the composition, and a method of forming a cured product. The energy-sensitive composition includes a polysilane and a thermal base generator, in which the thermal base generator includes an ionic compound and a nonionic compound. An anion moiety in the ionic compound preferably includes at least one of an anion having an oxaxanthone skeleton, an anion having a ketoprofen skeleton, and an anion having a fluorenone skeleton.
    Type: Application
    Filed: October 26, 2021
    Publication date: May 12, 2022
    Inventors: Kunihiro NODA, Hiroki CHISAKA, Kazuya SOMEYA, Dai SHIOTA
  • Patent number: 11274245
    Abstract: To provide a curable composition which can easily form an optical film with good fluorescence efficiency and includes quantum dots (B), a film made of a cured product of the curable composition, an optical film for a light-emitting display element made of the film, a light-emitting display element panel including the optical film, and a light-emitting display equipped with the light-emitting display element panel. A film is formed by curing a curable composition which includes an epoxy compound (A) having two or more epoxy groups and including a cyclic structure other than an oxirane ring, quantum dots (B), and an acid generator (C).
    Type: Grant
    Filed: December 7, 2018
    Date of Patent: March 15, 2022
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hiroki Chisaka, Kunihiro Noda, Dai Shiota
  • Patent number: 11136435
    Abstract: A method for producing a polyimide film includes: obtaining a polyamic acid solution having a viscosity of 5 to 150 cps by preparing a raw material mixture liquid containing a solvent, a tetracarboxylic dianhydride represented by a specific general formula, and an aromatic diamine represented by a specific general formula, and has a total content of the tetracarboxylic dianhydride and aromatic diamine of 15% by mass or less, and reacting the tetracarboxylic dianhydride and aromatic diamine with each other in the raw material mixture liquid forming a polyamic acid having a repeating unit represented by a specific general formula; obtaining a polyimide-forming mixture liquid by adding a compound represented by a specific general formula to the polyamic acid solution; and obtaining a polyimide film represented by a specific general formula by forming a film made of the polyimide-forming mixture liquid, followed by imidization of the polyamic acid in the film.
    Type: Grant
    Filed: January 12, 2017
    Date of Patent: October 5, 2021
    Assignees: ENEOS CORPORATION, TOKYO OHKA KOGYO CO., LTD.
    Inventors: Shinichi Komatsu, Kunihiro Noda, Hiroki Chisaka, Dai Shiota
  • Patent number: 10954340
    Abstract: A polyimide precursor composition that exhibits excellent tensile strength and breaking elongation, and that provides a film containing an alicyclic polyimide resin; a method for producing a polyimide film using the polyimide precursor composition; and a permanent film that contains an alicyclic polyimide resin and that exhibits excellent tensile strength and breaking elongation. The polyimide precursor composition is a mixture of a resin precursor component which is a polyamic acid including an alicyclic backbone having a predetermined structure, a monomer component that includes an aromatic diamine compound having a predetermined structure or an alicyclic tetracarboxylic acid di-anhydride having a predetermined structure; an imidazole compound having a predetermined structure; and a solvent.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: March 23, 2021
    Assignees: Tokyo Ohka Kogyo Co., Ltd., ENEOS Corporation
    Inventors: Kunihiro Noda, Hiroki Chisaka, Dai Shiota, Shinichi Komatsu
  • Publication number: 20200392292
    Abstract: A resin composition including a silicon-containing resin component and a solvent, the silicon-containing resin component includes (I) mentioned below, the solvent including at least one of a terpene compound having at least one of a hydroxy group and an acetoxy group, and a cyclic skeleton-containing acetate compound (excluding the terpene compound): (I) a polysilane-polysiloxane resin having a polysilane structure and a polysiloxane structure.
    Type: Application
    Filed: August 27, 2020
    Publication date: December 17, 2020
    Inventors: Kunihiro NODA, Hiroki CHISAKA, Kazuya SOMEYA, Dai SHIOTA
  • Patent number: 10829662
    Abstract: A curable composition capable of forming a cured product having high refractive index and excellent bending resistance, a cured product of the curable composition, a cured film made of the cured product, a display panel provided with the cured film, and a method for producing a cured product using the above-mentioned curable composition. The curable composition includes a curable compound and a curing agent. The curable compound contains a curable compound including, as a main skeleton, a fused ring in which three or more rings including an aromatic ring are fused, followed by mixing a metal oxide in which a capping agent is covalently bonded to a surface thereof.
    Type: Grant
    Filed: May 8, 2018
    Date of Patent: November 10, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Kazuya Someya, Hiroki Chisaka, Naozumi Matsumoto, Koichi Misumi, Dai Shiota
  • Publication number: 20200283567
    Abstract: A novel compound suitable as an epoxy curing catalyst; an epoxy curing catalyst using the compound; and a method for producing the compound. A compound represented by formula (1) in which Xm+ represents an m valent counter cation, R1 represents an aromatic group which may have a substituent; R2 represents an alkylene group which may have a substituent; R3 represents a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfonic acid ester group, a phosphino group, a phosphinyl group, a phosphonic acid ester group or an organic group; m represents an integer of 1 or more; n represents an integer of 0-3; and R2 may bond with R1 to form a cyclic structure.
    Type: Application
    Filed: September 26, 2018
    Publication date: September 10, 2020
    Inventors: Kunihiro Noda, Hiroki CHISAKA, Issel SUZKI, Jiro JIKIDA, Dal SHOTA, Kieko HANANO, Kyohel ISHIDA, Tsutomu WATANABE, Kazuhiro UEHARA
  • Patent number: 10767017
    Abstract: A resin composition including a silicon-containing resin component and a solvent, the silicon-containing resin component including at least one of (I) and (II) mentioned below, the solvent including at least one of a terpene compound having at least one of a hydroxy group and an acetoxy group, and a cyclic skeleton-containing acetate compound (excluding the terpene compound): (I) a polysilane-polysiloxane resin having a polysilane structure and a polysiloxane structure, and (II) a mixture of a resin having a polysilane structure and a resin having a polysiloxane structure.
    Type: Grant
    Filed: December 27, 2017
    Date of Patent: September 8, 2020
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kunihiro Noda, Hiroki Chisaka, Kazuya Someya, Dai Shiota
  • Publication number: 20200270456
    Abstract: A silicon-containing resin composition with which it is possible to form a silica-based coating film in which generation of cracks is minimized, a method for forming a silica-based coating film using the composition, and a crack-free silica-based coating film formed using the composition. The silicon-containing resin composition includes a silicon-containing resin and a solvent, in which one or more of siloxane resins and polysilanes is used as the silicon-containing resin, and the solvent contains a cycloalkyl acetate having a specific structure.
    Type: Application
    Filed: May 8, 2020
    Publication date: August 27, 2020
    Inventors: Hiroki Chisaka, Mayumi Kuroko, Kunihiro Noda, Dai Shiota