Abstract: A deposition mask group includes a first deposition mask having two or more first through holes arranged along two different directions, a second deposition mask having two or more second through holes arranged along two different directions and a third deposition mask having two or more third through holes. The first through hole and the second through hole or the third through hole partly overlap when the first deposition mask, the second deposition mask and the third deposition mask are overlapped.

Abstract: A metal plate includes a surface including a longitudinal direction of the metal plate and a width direction orthogonal to the longitudinal direction. A surface reflectance by regular reflection of a light is 8% or more and 25% or less. The surface reflectance is measured when the light is incident on the surface at an angle of 45°±0.2°. The light is in at least one plane orthogonal to the surface.

Abstract: A method for manufacturing a metal plate, the metal plate including a first surface and a second surface positioned on the opposite side of the first surface, may include a step of rolling a base metal having an iron alloy containing nickel to produce the metal plate. The metal plate may include particles containing as a main component an element other than iron and nickel. In a sample including the first surface and the second surface of the metal plate, the following conditions (1) and (2) regarding the particles may be satisfied: (1) The number of the particles having an equivalent circle diameter of 1 ?m or more is 50 or more and 3000 or less per 1 mm3 in the sample, and (2) The number of the particles having an equivalent circle diameter of 3 ?m or more is 50 or less per 1 mm3 in the sample.

Abstract: An abnormal irregularity cause identifying device includes a process data acquisition unit that reads, from a storage device storing process data, the pieces of process data, an abnormality determination unit that calculates an abnormality degree representing an extent of an irregularity of process data of the pieces of process data read by the process data acquisition unit, and a cause diagnosis unit that obtains accuracy of a cause of the irregularity based on a proportion of process data having the abnormality degree calculated by the abnormality determination unit satisfying a predetermined criterion to the plurality of types of pieces of process data, by using causal relation information defining a combination between the cause and the irregularity, which appears as an influence resulting from the cause, of each of the plurality of types of pieces of process data.

Abstract: An abnormal irregularity cause identifying device includes a process data acquisition unit that reads, from a storage device storing process data and each associated with a management number of a processing target, the pieces of process data, an abnormality determination unit that continuously calculates an abnormality degree representing an extent of an irregularity of process data of the pieces of process data read by the process data acquisition unit, and a cause diagnosis unit that determines, for each of the pieces of process data and corresponding to the management number of the processing target, whether the abnormality degree calculated by the abnormality determination unit satisfies a predetermined criterion by using causal relation information defining a combination between a cause and the irregularity, which appears as an influence resulting from the cause, of the process data.

Abstract: An abnormal irregularity cause identifying device includes a process data acquisition unit that reads, from a storage device storing process data, the pieces of process data, an abnormality determination unit that calculates an abnormality degree representing an extent of an irregularity of process data of the pieces of process data read by the process data acquisition unit, and a cause diagnosis unit that determines, for each of the pieces of process data output by the corresponding one of the plurality of sensors, whether the abnormality degree calculated by the abnormality determination unit satisfies a predetermined criterion by using causal relation information defining a combination of a causal relation between a cause and the irregularity, which appears as an influence resulting from the cause, of the process data output by each of the plurality of sensors in a hierarchical manner along time series.

Abstract: An abnormal irregularity cause identifying device includes a process data acquisition unit that reads process data output by sensors included in a production facility performing a batch stage and a continuous stage, a preprocessing unit that associates a range of a complete timing of the batch stage with an output timing of process data of the process data in the continuous stage based on a residence time of the processing target in the production facility, an abnormality determination unit that calculates an abnormality degree by using process data in the batch stage and process data in the continuous stage associated with each other by the preprocessing unit, and a cause diagnosis unit that determines, for each of the process data output by the corresponding one of the plurality of sensors, whether the abnormality degree calculated by the abnormality determination unit satisfies a predetermined criterion.

Abstract: A method for manufacturing a metal plate, the metal plate including a first surface and a second surface positioned on the opposite side of the first surface, may include a step of rolling a base metal having an iron alloy containing nickel to produce the metal plate. The metal plate may include particles containing as a main component an element other than iron and nickel. In a sample including the first surface and the second surface of the metal plate, the following conditions (1) and (2) regarding the particles may be satisfied: (1) The number of the particles having an equivalent circle diameter of 1 ?m or more is 50 or more and 3000 or less per 1 mm3 in the sample, and (2) The number of the particles having an equivalent circle diameter of 3 ?m or more is 50 or less per 1 mm3 in the sample.

Abstract: There is a substrate transfer apparatus comprising: a circular tube having a tube axis extending in a lateral direction and having a transfer region for a substrate in the circular tube; a magnetic field generating portion having a magnetic field generating surface facing the transfer region and configured to generate a magnetic field on the magnetic field generating surface; and a transfer body configured to transfer the substrate while moving in a plane direction of the magnetic field generating surface in a state that the transfer body is distant from the magnetic field generating surface by the magnetic field.

Abstract: A deposition mask group includes a first deposition mask having two or more first through holes arranged along two different directions, a second deposition mask having two or more second through holes arranged along two different directions and a third deposition mask having two or more third through holes. The first through hole and the second through hole or the third through hole partly overlap when the first deposition mask, the second deposition mask and the third deposition mask are overlapped.

Abstract: A deposition mask group includes a first deposition mask having two or more first through holes arranged along two different directions, a second deposition mask having two or more second through holes arranged along two different directions and a third deposition mask having two or more third through holes. The first through hole and the second through hole or the third through hole partly overlap when the first deposition mask, the second deposition mask and the third deposition mask are overlapped.

Abstract: A deposition mask group includes a first deposition mask having two or more first through holes arranged along two different directions, a second deposition mask having two or more second through holes arranged along two different directions and a third deposition mask having two or more third through holes. The first through hole and the second through hole or the third through hole partly overlap when the first deposition mask, the second deposition mask and the third deposition mask are overlapped.

Abstract: A substrate processing device includes a transfer chamber configured to transfer a substrate under an atmospheric atmosphere and a plurality of processing units each including at least one processing chamber for processing the substrate under a vacuum atmosphere and at least one load-lock chamber connected to the processing chamber to switch an inner atmosphere thereof between the atmospheric atmosphere and the vacuum atmosphere. The transfer chamber includes a connection unit configured to connect the transfer chamber and the load-lock chamber such that each of the processing units is detachably attached. The connection unit includes an opening that allows the transfer chamber to communicate with the load-lock chamber, and an opening/closing mechanism configured to open and close the opening portion.

Abstract: Provided is an assessment device that includes: an input unit that receives, as an input, a use field of an ICT solution as an assessment target and a damage item as a target of the ICT solution; a risk extraction unit that extracts one or more risk candidates corresponding to the use field and the damage item from a database in which use fields, damage items, and risks are associated; a calculation unit that calculates cooccurrence probability between each of the one or more risk candidates and an operation target of the ICT solution; and an output unit that outputs the risk candidates based on the cooccurrence probability.

Abstract: An evaluation device includes a first calculation unit configured to calculate feature quantities of respective words, the feature quantities being regarding text data in which a target of any of goals of the SDGs is described and text data in which an outline of one or more first services a contribution of which to the goal is clear is described, the respective words being included in the text data, a generation unit configured to generate a sentence feature matrix based on the feature quantities of the respective words, a second calculation unit configured to calculate, when text data in which an outline of a second service is described is input, feature quantities of respective words, the feature quantities being regarding the text data, the respective words being included in the text data, and an evaluation unit configured to evaluate a degree of a contribution of the second service to the goal based on the feature quantities of the respective words relevant to the second service and the sentence feature

Abstract: A recording medium post-processing device includes a binding unit and a hole forming unit. The binding unit performs a binding process on a recording medium bundle. The hole forming unit performs a hole forming process in a region of recording media that constitute the recording medium bundle including a part of a binding region in which the binding process is performed.

Abstract: The metal plate includes a plurality of pits located on the surface of the metal plate. The manufacturing method for a metal plate for use in manufacturing of a deposition mask includes an inspection step of determining a quality of the metal plate based on a sum of volumes of a plurality of pits located at a portion of the surface of the metal plate.

Abstract: A deposition mask group includes a first deposition mask having two or more first through holes arranged along two different directions, a second deposition mask having two or more second through holes arranged along two different directions and a third deposition mask having two or more third through holes. The first through hole and the second through hole or the third through hole partly overlap when the first deposition mask, the second deposition mask and the third deposition mask are overlapped.

Abstract: The metal plate includes a plurality of pits located on the surface of the metal plate. The manufacturing method for a metal plate for use in manufacturing of a deposition mask includes an inspection step of determining a quality of the metal plate based on a sum of volumes of a plurality of pits located at a portion of the surface of the metal plate.

Abstract: A deposition mask group includes a first deposition mask having two or more first through holes arranged along two different directions, a second deposition mask having two or more second through holes arranged along two different directions and a third deposition mask having two or more third through holes. The first through hole and the second through hole or the third through hole partly overlap when the first deposition mask, the second deposition mask and the third deposition mask are overlapped.