Abstract: Embodiments of staircase and contact structures of a three-dimensional (3D) memory device and fabrication method thereof are disclosed. The 3D memory device includes a semiconductor substrate and a plurality of through-substrate-trenches penetrating the semiconductor substrate. The 3D memory device also includes a film stack disposed on a first surface of the semiconductor substrate extending through the through-substrate-trenches to a second surface of the semiconductor substrate, wherein the film stack includes alternating conductive and dielectric layers. The 3D memory device also includes a staircase structure formed at an edge of the film stack.

Abstract: Embodiments of bonded semiconductor structures and fabrication methods thereof are disclosed. In an example, a method for forming a semiconductor device is disclosed. A first device layer is formed above a first substrate. A first bonding layer including a first bonding contact is formed above the first device layer. The first bonding contact is made of a first indiffusible conductive material. A second device layer is formed above a second substrate. A second bonding layer including a second bonding contact is formed above the second device layer. The first substrate and the second substrate are bonded in a face-to-face manner, such that the first bonding contact is in contact with the second bonding contact at a bonding interface.

Abstract: Methods and systems for managing security in a cloud computing environment are provided. Exemplary methods include: receiving a target, the target specifying workloads of a plurality of workloads to be included in the security policy, the plurality of workloads being associated with the cloud computing environment; identifying nodes and edges in the graph database using the target, the graph database representing the plurality of workloads as nodes and relationships between the plurality of workloads as edges; getting a security intent, the security intent including a high-level security objective in a natural language; obtaining a security template associated with the security intent; and applying the security template to the identified nodes and edges to produce security rules for the security policy, the security rules at least one of allowing and denying communications between the target and other workloads of the plurality of workloads.

Abstract: Methods and systems for managing security in a cloud computing environment are provided. Exemplary methods include: gathering data about workloads and applications in the cloud computing environment; updating a graph database using the data, the graph database representing the workloads of the cloud computing environment as nodes and relationships between the workloads as edges; receiving a security template, the security template logically describing targets in the cloud computing environment to be protected and how to protect the targets; creating a security policy using the security template and information in the graph database; and deploying the security policy in the cloud computing environment.

Abstract: Methods and systems for validating security policy in a cloud computing environment are provided. An example method includes providing a graph database, the graph database representing workloads of the cloud computing environment as nodes and relationships between the workloads as edges, receiving a security policy, the security policy logically describing rules for the relationships between the workloads, determining, based on the security policy and the graph database, a list of violations, the list of violations including at least one relationship from the relationships between the workloads in the graph database, the at least one relationship being not allowed by at least one of the rules in the security policy, and providing the list of violations to a user.

Abstract: Embodiments of three-dimensional (3D) memory devices with stacked device chips using interposers and fabrication methods thereof are disclosed. In an example, a method for forming a 3D memory device is disclosed. An alternating conductor/dielectric stack is formed at a first side of a chip substrate. A memory string extending vertically through the alternating conductor/dielectric stack is formed. A chip contact is formed at a second side opposite to the first side of the chip substrate and is electrically connected to the memory string. A first interposer contact is formed at a first side of an interposer substrate. A second interposer contact is formed at a second side opposite to the first side of the interposer substrate and is electrically connected to the first interposer contact through the interposer substrate. The first interposer contact is attached to the chip contact.

Abstract: Embodiments of three-dimensional (3D) memory devices having a shielding layer and methods for forming the 3D memory devices are disclosed. In an example, a method for forming a 3D memory device is disclosed. A peripheral device is formed on a substrate. A first interconnect layer including a first plurality of interconnects is formed above the peripheral device. A shielding layer including a conduction region is formed above the first interconnect layer. A second interconnect layer including a second plurality of interconnects is formed above the shielding layer. The conduction region of the shielding layer covers an area of the first and second plurality of interconnects in the first and second interconnect layers. A plurality of memory strings each extending vertically above the second interconnect layer are formed.

Abstract: A scanning type laser induced spectrum surface range analysis and detection system includes a laser emitting head connected to an external laser inducing light source, which generates lasers emitted through the laser emitting head, so as to generate laser induced plasma. A focusing optical device converges induction excited laser beams emitted by the laser emitting head onto a surface of a tested sample. Then, a reflector collects wide spectral range induced plasma scattered light signals of the tested sample and converges the signals into a light collecting device. The light collecting device converges induced plasma scattered light into an optical fiber and transmits the induced plasma scattered light to an external spectrograph; and the external spectrograph divides a spectrum formed by the plasma to obtain spectral strength data of different wavelengths.

Abstract: Embodiments of three-dimensional memory device architectures and fabrication methods therefor are disclosed. In an example, the memory device includes a substrate and one or more peripheral devices on the substrate. The memory device also includes one or more interconnect layers and a semiconductor layer disposed over the one or more interconnect layers. A layer stack having alternating conductor and insulator layers is disposed above the semiconductor layer. A plurality of structures extend vertically through the layer stack. A first set of conductive lines are electrically coupled with a first set of the plurality of structures and a second set of conductive lines are electrically coupled with a second set of the plurality of structures different from the first set. The first and second sets of conductive lines are vertically distanced from opposite ends of the plurality of structures.

Abstract: Embodiments of this application disclose an object on which a two-dimensional code is disposed, a two-dimensional code generation method, identification method, generation apparatus, and identification apparatus, and a storage medium. The two-dimensional code includes a square module array of m*m modules. The square module array includes a location detection pattern and a data information pattern. The location detection pattern is used for determining a location of the two-dimensional code. The data information pattern is used for carrying data. m=17 or 18 or 19 or 20. Even if printed in a miniature area whose side length is 0.5 cm to 0.7 cm, a miniature two-dimensional code provided in the embodiments of this application can still be normally identified, and is suitable for being used in a small area application scenario such as an inner side of a bottle cap or a corner of an object.

Abstract: Embodiments of 3D memory devices and the fabrication methods to form the 3D memory devices are provided. A 3D memory device includes a substrate, a memory deck, and a memory string. The memory deck includes a plurality of interleaved conductor layers and dielectric layers on the substrate. The memory string extends vertically through the memory deck. A bottom conductor layer of the plurality of interleaved conductor layers and dielectric layers can intersect with and contact the memory string.

Abstract: Embodiments of staircase and contact structures of a three-dimensional (3D) memory device and fabrication method thereof are disclosed. The 3D memory device includes a semiconductor substrate and a plurality of through-substrate-trenches penetrating the semiconductor substrate. The 3D memory device also includes a film stack disposed on a first surface of the semiconductor substrate extending through the through-substrate-trenches to a second surface of the semiconductor substrate, wherein the film stack includes alternating conductive and dielectric layers. The 3D memory device also includes a staircase structure formed at an edge of the film stack.

Abstract: Embodiments of three-dimensional (3D) memory devices with stacked device chips using interposers and fabrication methods thereof are disclosed. In an example, a 3D memory device includes first and second device chips and an interposer therebetween. The first device chip includes a peripheral device and a first chip contact on a surface of the first device chip and electrically connected to the peripheral device. The second device chip includes an alternating conductor/dielectric stack, a memory string extending vertically through the alternating conductor/dielectric stack, and a second chip contact on a surface of the second device chip and electrically connected to the memory string. The interposer includes an interposer substrate, first and second interposer contacts on opposite surfaces of the interposer and electrically connected to one another through the interposer substrate. The first and second interposer contacts are attached to the first and second chip contacts, respectively.

Abstract: Embodiments of 3D memory devices and methods for forming the same are disclosed. In an example, a 3D memory device includes a substrate, a memory stack, and a NAND memory string. The memory stack includes a plurality of interleaved gate conductive layers and gate-to-gate dielectric layers above the substrate. Each of the gate-to-gate dielectric layers includes a silicon oxynitride layer. The NAND memory string extends vertically through the interleaved gate conductive layers and gate-to-gate dielectric layers of the memory stack.

Abstract: Embodiments of 3D memory devices and methods for forming the same are disclosed. In an example, a 3D memory device includes a substrate, a memory stack, and a NAND memory string. The memory stack includes a plurality of interleaved gate conductive layers and gate-to-gate dielectric layers above the substrate. Each of the gate-to-gate dielectric layers includes a silicon nitride layer. The NAND memory string extends vertically through the interleaved gate conductive layers and gate-to-gate dielectric layers of the memory stack.

Abstract: Embodiments of a method for forming a three-dimensional (3D) memory device includes the following operations. First, a channel hole is formed in a stack structure of a plurality first layers and a plurality of second layers alternatingly arranged over a substrate. A semiconductor channel is formed by filling the channel hole with a channel-forming structure. The plurality of first layers is removed. A plurality of conductor layers is formed from the plurality of second layers. Further, a gate-to-gate dielectric layer is formed between the adjacent conductor layers, the gate-to-gate dielectric layer including at least one sub-layer of silicon oxynitride.

Abstract: Embodiments of a method for forming three-dimensional (3D) memory devices include the following operations. First, an initial channel hole is formed in a stack structure of a plurality first layers and a plurality of second layers alternatingly arranged over a substrate. An offset is formed between a side surface of each one of the plurality of first layers and a side surface of each one of the plurality of second layers on a sidewall of the initial channel hole to form a channel hole. A semiconductor channel is formed by filling the channel hole with a channel-forming structure. The semiconductor channel may have a memory layer including a plurality of first memory portions each surrounding a bottom of a respective second layer and a plurality of second memory portions each connecting adjacent first memory portions. Further, the plurality of second memory portions is removed.

Abstract: Embodiments of methods to form three-dimensional (3D) memory devices include the following operations. First, an initial channel hole is formed in a stack structure of a plurality first layers and a plurality of second layers alternatingly arranged over a substrate. An offset is formed between a side surface of each one of the plurality of first layers and a side surface of each one of the plurality of second layers on a sidewall of the initial channel hole to form a channel hole. A semiconductor channel is formed by filling the channel hole with a channel-forming structure, the semiconductor channel having a memory layer including a plurality of first memory portions each surrounding a bottom of a respective second layer and a plurality of second memory portions each connecting adjacent first memory portions.

Abstract: Embodiments of a method for forming a three-dimensional (3D) memory device includes the following operations. First, an initial channel hole is formed in a stack structure of a plurality first layers and a plurality of second layers alternatingly arranged over a substrate. An offset is formed between a side surface of each one of the plurality of first layers and a side surface of each one of the plurality of second layers on a sidewall of the initial channel hole to form a channel hole. A semiconductor channel is formed by filling the channel hole with a channel-forming structure, the semiconductor channel having a memory layer including a plurality of first memory portions each surrounding a bottom of a respective second layer and a plurality of second memory portions each connecting adjacent first memory portions.

Abstract: Embodiments of a method for forming three-dimensional (3D) memory devices include the following operations. First, an initial channel hole is formed in a stack structure of a plurality first layers and a plurality of second layers alternatingly arranged over a substrate. An offset is formed between a side surface of each one of the plurality of first layers and a side surface of each one of the plurality of second layers on a sidewall of the initial channel hole to form a channel hole. A semiconductor channel is further formed by filling the channel hole with a channel-forming structure. The semiconductor channel may have a memory layer having a first memory portion surrounding a bottom of each second layer and a second memory portion connecting adjacent first memory portions. The first memory portion and the second memory portion may be staggered along a vertical direction.