Abstract: According to the present invention, there is provided an organic thin film transistor array substrate and a method for manufacturing the same and a display device.

Abstract: An array substrate comprises: a base substrate; a gate scanning line, a data scanning line, a pixel electrode and a thin film transistor, formed on the base substrate; and a light blocking layer, formed on the base substrate and corresponding to the thin film transistor and the data scanning line.

Abstract: Embodiments of the present invention provide an antistatic protective film, a display device, and a preparation method of an antistatic protective film. The antistatic protective film comprises: a layer of substrate and a layer of graphene; the substrate and the graphene layer are adhered together. The antistatic protective film in accordance with the embodiment of the present invention, utilizes graphene to protect a component from being scratched by a foreign object or damaged by rubbing, and at the same time allows static electricity on an electronic component to be discharged in time, thus avoids the electronic component from being damaged by static electricity and prolongs the service life of the electronic component; meanwhile, the antistatic protective film has high light-transmittance, which greatly reduces the influence of the antistatic protective film on the output light of the electronic component.

Abstract: An embodiment of the disclosed technology discloses an electrowetting display, comprising a first substrate, a second substrate disposed opposite to and under the first substrate, a plurality of separation walls, a first fluid, and a second fluid, wherein the plurality of separation walls are disposed in grid on the second substrate to define a plurality of pixel units, and the first fluid is filled in the spaces of the grid formed by adjacent separation walls, the first fluid is opaque and does not mix with the second fluid, the second fluid is transparent, has conductivity or polarity, and is filled between the first fluid and the first substrate; and wherein a colored layer is disposed for each pixel unit, and the colored layer has at least one predetermined color and is between the first fluid and the second substrate.

Abstract: The present invention provides an array substrate and a method for manufacturing the same, and a display device. In the method for manufacturing the array substrate, a one-time patterning process is employed to form a channel region, a source electrode and a drain electrode of the array substrate. Specifically, a channel region, a source region and a drain region that are consisted of a metal oxide layer are formed via a one-time patterning process, and a heat treatment is carried out on the metal oxide layer of the source region and the drain region in hydrogen gas, thereby forming a conducting source electrode and a conducting drain electrode, respectively. By the technical solution of the invention, the manufacturing process of the array substrate can be simplified, and the manufacturing cost of the array substrate can be lowered.

Abstract: A display device, an array substrate and a manufacturing method thereof are provided. The array substrate comprises a substrate, a gate electrode on the substrate, a gate insulating layer, an active layer, an etch stop layer, a source/drain electrode layer, a passivation layer and a pixel electrode layer; wherein the active layer is a metal oxide semiconductor, a metal oxide insulating layer is provided between the gate insulating layer and the active layer, the gate insulating layer is located between the gate electrode and the metal oxide insulating layer, and the metal oxide insulating layer is located between the gate insulating layer and the active layer.

Abstract: Embodiments of the present disclosure provide an electrowetting display panel and the manufacturing method thereof The electrowetting display panel comprises: a first glass substrate; a second glass substrate provided opposite to the first glass substrate; a cavity provided between the first glass substrate and the second glass substrate; a colored conductive liquid filled into the cavity; and a reflecting conductive element provided on the surface of the first glass substrate facing away from the second glass substrate, and corresponding to the cavity, wherein the reflecting conductive element is used for controlling the light transmissivity of the colored conductive liquid within the cavity according to the voltage applied to the reflecting conductive element and reflecting the light passing through the colored conductive liquid toward the second glass substrate.

Abstract: The invention provides a conductive graphene-metal composite material, which is a composite of monolayer graphene nanoflakes and metal or metal oxide. The monolayer graphene nanoflakes of the invention are made by exfoliating graphite, and have a good combination with metal material by adopting an ultrasonic treatment or a mechanical agitation treatment. The graphene is uniformly dispersed therein and forms a conductive network, which can improve the electrochemical activity efficiently and reduce the resistance against the transfer of the charges efficiently. Use of the graphene-metal composite electrode reduces the costs of processes and facilities, on the premise of good properties. It can be used to replace the ITO conductive layer of the liquid crystal display.

Abstract: Embodiments of the invention provide a manufacturing method of a TFT array substrate. The TFT array substrate is formed to comprise a plurality of scanning lines, a plurality of data lines and a plurality of pixel units defined by intersecting these scanning lines and these data lines with each other. Each of the pixel units comprises a TFT and a pixel electrode. The TFT is formed to comprise a gate electrode, a gate insulating layer, a metal oxide semiconductor layer used as an active layer, an etch stopping layer formed on a portion of the surface of the metal oxide semiconductor layer, a source electrode and a drain electrode. In this method, the metal oxide semiconductor layer, the source electrode and the drain electrode are formed by a same patterning process.

Abstract: Embodiments of the invention provide a conductive structure, a thin film transistor, an array substrate, and a display device. The conductive structure comprises a copper layer formed of copper or copper alloy; a blocking layer for preventing copper ions of the copper layer from diffusing outward; and a diffusion prevention layer for preventing exterior ions from diffusing to the copper layer and disposed between the copper layer and the blocking layer. The multilayer conductive structure according to an embodiment of the invention can prevent exterior ions from diffusing into a copper layer and prevent copper ions from diffusing outward to reduce ions diffusion that adversely impacts the electricity performance and chemical corrosion resistance of the copper metal layer, and meanwhile can enhance adhesiveness of the conductive structure, which may be helpful for etching/patterning of the multilayer conductive structure.

Abstract: The invention discloses a deep-ultraviolet chemically-amplified positive photoresist. The deep-ultraviolet chemically-amplified positive photoresist according to one embodiment of the invention includes a cyclopentenyl pimaric acid, a divinyl ether, a photoacid generator and an organic solvent. The deep-ultraviolet chemically-amplified positive photoresist according to the invention has a good sensitivity and a good transparency.

Abstract: Embodiments of the disclosed technology disclose manufacture methods of a thin film transistor and an array substrate and a mask therefor are provided. The manufacture method of the thin film transistor comprises: patterning a wire layer by using a exposure machine and a mask with a first exposure amount larger than a normal exposure amount during formation of source and drain electrodes; forming a semiconductor layer on the patterned wire layer; patterning the semiconductor layer by using the exposure machine and the mask with a second exposure amount smaller than the first exposure amount. The mask comprises a source region for forming the source electrode, a drain region for forming the drain electrode and a slit provided between the source region and the drain region, and the width of the slit is smaller than the resolution of the exposure machine.

Abstract: A color filter substrate and a fabrication method thereof, and a transflective liquid crystal display device are provided. The color filter substrate comprises: a transparent base substrate; a plurality of separators formed on a surface of the transparent base substrate and separating the surface of the transparent base substrate into a plurality of color filter regions; a plurality of color filter patterns that arrange alternatively with the separators, wherein each color filter pattern covers one color filter region; an aperture formed in the color filter pattern on at least one of the color filter regions; a flat protective layer at least disposed on the color filter pattern and the aperture, wherein an upper surface of a portion of the flat protective layer above the color filter pattern is even with an upper surface of a portion of the flat protective layer above the aperture.

Abstract: Embodiments of the present invention provide a thin film transistor (TFT) array substrate and a method for manufacturing the same and a display device. The TFT array substrate improves a structure of a TFT array substrate and has a small thickness, and process flow is simplified. The method for manufacturing a thin film transistor (TFT) array substrate comprises: obtaining a gate line and a gate electrode through a first patterning process on a glass substrate; forming a gate insulating layer on the gate line and the gate electrode; forming a graphene layer on the gate insulating layer, and obtaining a semiconductor active layer over the gate electrode by a second patterning process and a hydrogenation treatment; obtaining a data line, a source electrode, a drain electrode and a pixel electrode which are located on the same layer by a third patterning process; and forming a protection layer on the data line, the source electrode, the semiconductor active layer, the drain electrode and the pixel electrode.

Abstract: The invention provides a transreflective color filter and a method for manufacturing the same, and a liquid crystal display device. The transreflective color filter comprises a substrate and color resin layers formed on the substrate, wherein the color resin layers include transmissive portions and reflective portions, regions of the substrate corresponding to the transmissive portions have concaves formed therein, and a part of the transmissive portion fills the concave.

Abstract: Embodiments of the present invention provide a TFT array substrate and a method for manufacturing the same and a display device. The TFT array substrate comprises: a base substrate; gate lines, gate electrodes, a gate insulating layer and a semiconductor active layer formed on the base substrate; a metal barrier layer formed on the semiconductor active layer, the metal barrier layer covering the semiconductor active layer; source electrodes and drain electrodes formed on the metal barrier layer, with a metal oxide part being formed between the source electrode and the drain electrode to insulate the source electrode and the drain electrode from each other; and a protection layer formed on the gate insulating layer and the source and drain electrodes, wherein the metal oxide part is formed by oxidizing a part of the metal barrier layer located between the source electrode and the drain electrode.

Abstract: An array substrate and a method for fabricating the same are disclosed. The method for fabricating the array substrate comprises: forming a pattern of a gate electrode (2) and a common electrode (3) on a substrate (1); forming a pattern of a gate insulating layer (4), an active layer (5), a source/drain electrode layer (6) and a first passivation layer (7), wherein the first passivation layer (7) has a via hole and a thin film transistor (TFT) channel window, and the TFT channel window is located above the gate electrode (2); forming a TFT channel and a pixel electrode (9) with slits, wherein the pixel electrode (9) is connected to one of the source/drain electrode (6) through the via hole. The method is not only simple and stable but also improves the TFT quality.

Abstract: Disclosed are a color filter substrate and the manufacturing method thereof. The color filter substrate comprises: a substrate (1); a black matrix (3) and a color pixel layer (4, 5, 6) formed on the substrate (1); and a transparent thermally conductive layer (2) disposed between the substrate (1) and the black matrix (3) and between the substrate (1) and the color pixel layer (4, 5, 6).

Abstract: An embodiment of the present invention provides an electrowetting display panel which can achieve full-color display, comprising: a first substrate; a second substrate opposite to the first substrate; a plurality of baffle walls disposed on the second substrate and defining a plurality of sub-pixels; an opaque insulating layer disposed on the second substrate, the opaque insulating layer comprising a dielectric layer and opaque liquid elements disposed on the dielectric layer, the opaque insulating layer being capable of displaying black or white under an action of an electric field; a plurality of colored liquid elements corresponding to the individual sub-pixels respectively and disposed between the opaque insulating layer and the first substrate, the colored liquid elements being an electric-conductive or polar light-transmissive color solution.

Abstract: Embodiments of the disclosed technology disclose a method for fixing glass substrates and a method for preparing a flexible display device. The method for fixing glass substrates comprises coating an edge portion of a first glass substrate corresponding to a second glass substrate with epoxy resin and screeding the coated epoxy resin layer, adhering the second glass substrate to the first glass substrate, and annealing the two glass substrates. With the technical solution of this disclosed technology, the time period for fixing the adhered glass substrates can be reduced with an improved productivity.