Abstract: A manufacturing method of a TFT array substrate is provided. The method includes the following steps: respectively forming a metal oxide semiconductor layer (3), an etching barrier layer (4), a source electrode (7), a data line, a drain electrode (6), a pixel electrode (5), a gate insulating layer (8), a contact hole, a gate electrode (9) and a gate scanning line on a substrate (1) by patterning processes, wherein the metal oxide semiconductor layer (3) and the etching barrier layer (4) are formed by a same patterning process, and the source electrode (7), the drain electrode (6), the pixel electrode (5) and the data line are formed by another same patterning process.

Abstract: An embodiment of the present invention provides a TFT array substrate comprising: a base substrate (1) and thin film transistors. The thin film transistor comprises a gate electrode (2), a semiconductor layer (5), a semiconductor protective layer, a source electrode (8) and a drain electrode (9). The semiconductor protective layer is disposed adjacent to the semiconductor layer (5) and comprises a composite lamination structure, which comprises a protective layer formed of an insulating material capable of preventing de-oxygen of the semiconductor layer (5) and an insulating layer formed of an insulating material to be etched more easily.

Abstract: An embodiment of the invention discloses an alkaline soluble resin and a method for preparing the same. The chemical formula of this alkaline soluble resin is shown in Formula I: wherein a is an integer of 1 to 5, b is an integer of 1 to 5, c is an integer of 1 to 10, d is an integer of 1 to 10, m is an integer of 1 to 30, n is an integer of 1 to 10, R is hydrogen, alkyl, alkoxy or acrylate; the alkaline soluble resin has a weight-average molecular weight of 3,500-35,000. The invention also discloses a light sensible resin composition comprising the alkaline soluble resin, as well as a colored photoresist for color filters comprising the aforementioned light sensible resin composition and a display element comprising this colored photoresist.

Abstract: The present disclosure relates to a transflective LCD panel. A thin film transistor and a first insulating layer are formed on the side of a first transparent substrate facing a second transparent substrate, and the first insulating layer covers the thin film transistor; a transparent electrode layer and a reflective electrode layer are formed above the first insulating layer. A color filter layer is provided on the side of the second transparent substrate facing the first transparent substrate, and comprises a first color filter layer and a second color filter layer, the first color filter layer corresponds to the reflective electrode layer and the second color filter layer corresponds to the transparent electrode layer which is overlapped with the reflective electrode layer, and the color filtering ability of the first color filter layer is less than that of the second first color filter layer.

Abstract: Embodiments of the present invention provide a display panel for the blind and a method for manufacturing the same and a display device for the blind. The display panel for the blind comprises: an array substrate, including a glass substrate and data lines and gate lines formed on the glass substrate, the data lines and gate lines intersecting each other so as to form pixel units, each of the pixel units including a pixel electrode; a touch substrate, including a flexible film layer and charged columnar structures provided on the flexible film layer; and an elastic film layer, provided between the array substrate and the touch substrate, wherein a side of the touch substrate on which the charged columnar structures are formed faces a side of the array substrate on which the pixel electrodes are formed, and the charged columnar structures on the touch substrate correspond to the pixel electrodes on the array substrate one to one.

Abstract: The invention is related to a method of preparing a conducting film on an ultra-thin glass substrate. The preparing method uses magnetron sputtering, setting an initial magnetron sputtering power and/or an initial flow rate of argon to deposit the conducting film, detecting film layer stress of the conducting film by a pressure sensor on provided on the ultra-thin glass substrate, and adjusting a magnetron sputtering power and/or a flow rate of argon gas in real time according to the detected film layer stress, such that an absolute value of the film layer stress is kept below a predetermined value; the ultra-thin glass substrate has a thickness less than 0.1 mm.

Abstract: Embodiments of the present disclosure provide an electrowetting display panel and the manufacturing method thereof The electrowetting display panel comprises: a first glass substrate; a second glass substrate provided opposite to the first glass substrate; a cavity provided between the first glass substrate and the second glass substrate; a colored conductive liquid filled into the cavity; and a reflecting conductive element provided on the surface of the first glass substrate facing away from the second glass substrate, and corresponding to the cavity, wherein the reflecting conductive element is used for controlling the light transmissivity of the colored conductive liquid within the cavity according to the voltage applied to the reflecting conductive element and reflecting the light passing through the colored conductive liquid toward the second glass substrate.

Abstract: Embodiments of the present invention disclose a liquid crystal display panel and a method of driving the same. A subpixel unit includes a transmissive portion and a reflective portion, the transmissive portion comprises a transmissive portion thin film transistor and a transmissive pixel electrode connected to a drain of the transmissive portion thin film transistor, the reflective portion comprises a reflective layer, a reflective portion thin film transistor and a reflective pixel electrode connected to a drain of the reflective portion thin film transistor, a gate of the transmissive portion thin film transistor and a gate of the reflective portion thin film transistor each are connected to a gate line of the subpixel unit, and a source of the transmissive portion thin film transistor and a source of the reflective portion thin film transistor are connected to different data lines.

Abstract: Embodiments of the present invention disclose a thin film transistor array substrate and a method for manufacturing the same and an electronic device.

Abstract: An embodiment of the invention discloses a kind of electrophoretic ink comprising an electrophoretic display solution which is an electrorheological fluid comprising a base solution, solid particles and an additive, wherein the solid particles account for 5%-50% of the electrorheological fluid by mass-volume percentage. The electrophoretic display solution is preferably a negative electrorheological fluid. The invention also discloses an electronic paper comprising the electrophoretic ink and a display method for the electronic paper.

Abstract: According to the present invention, there is provided an organic thin film transistor array substrate and a method for manufacturing the same and a display device.

Abstract: The present invention provides an array substrate, comprising: a base substrate; a pixel electrode pattern and a gate pattern formed on the base substrate, the gate pattern comprises a gate scanning line and a gate electrode of a transistor, both of the gate scanning line and the gate electrode comprise transparent conductive metal layer and the gate metal layer stacking on the substrate, each pixel electrode in the pixel electrode pattern comprises transparent conductive metal layer; a gate insulating layer on the pixel electrode pattern and the gate pattern, an active layer pattern on the gate insulating layer and corresponding to the gate electrode, a via hole in the gate insulating layer for exposing the pixel electrode; and a source/drain pattern on the gate insulating layer, the source/drain pattern comprises a data scanning line crossing with the gate scanning line, source and drain electrodes of the transistor, and the drain electrode is in contact with the pixel electrode through the via hole.

Abstract: The disclosure provides an ink jet ink for color filter and a method for preparing the same, as well as a method for preparing of a color filter. The ink jet ink for color filter comprising, by weight, 10 to 50 parts of aqueous nano pigment dispersion and 51 to 95 parts of a cold curing component.

Abstract: Embodiments of the disclosed technology disclose manufacture methods of a thin film transistor and an array substrate and a mask therefor are provided. The manufacture method of the thin film transistor comprises: patterning a wire layer by using a exposure machine and a mask with a first exposure amount larger than a normal exposure amount during formation of source and drain electrodes; forming a semiconductor layer on the patterned wire layer; patterning the semiconductor layer by using the exposure machine and the mask with a second exposure amount smaller than the first exposure amount. The mask comprises a source region for forming the source electrode, a drain region for forming the drain electrode and a slit provided between the source region and the drain region, and the width of the slit is smaller than the resolution of the exposure machine.

Abstract: An embodiment of the disclosed technology discloses an electrowetting display, comprising a first substrate, a second substrate disposed opposite to and under the first substrate, a plurality of separation walls, a first fluid, and a second fluid, wherein the plurality of separation walls are disposed in grid on the second substrate to define a plurality of pixel units, and the first fluid is filled in the spaces of the grid formed by adjacent separation walls, the first fluid is opaque and does not mix with the second fluid, the second fluid is transparent, has conductivity or polarity, and is filled between the first fluid and the first substrate; and wherein a colored layer is disposed for each pixel unit, and the colored layer has at least one predetermined color and is between the first fluid and the second substrate.

Abstract: Embodiments of disclosed technology provide a color filter substrate and a liquid crystal display having the same. The color filter substrate comprises: a base substrate; a plurality of pixels on the base substrate, each of which comprises first filter blocks and colorful filter blocks; and a black matrix disposed on the base substrate for isolating the filter blocks. In each of the pixels, each of the colorful filter blocks is disposed adjoining at least one first filter block to form a sub-pixel.

Abstract: An embodiment of the disclosed technology provides a display device comprising an electrophoresis solution tank containing electrophoresis solution and at least a rolling ball used for display colors, the rolling ball being immerged into the electrophoresis solution; and a shelter layer disposed above and covering the electrophoresis solution tank, the shelter layer being made up of an opaque material. A light transmitting hole is formed in the shelter layer and above the core of the rolling ball, so that the light of the color to be currently displayed on the rolling ball passes through the light transmitting hole for display, while the light of the colors not intended to be displayed is blocked by the shelter layer.

Abstract: The present disclosed technology is related to a TFT array substrate and a method for fabricating the TFT array substrate. The method may comprise: depositing a transparent conductive film layer and a source-drain metal layer in this order on a base substrate, and forming source electrodes, drain electrodes, data scan lines and transparent pixel electrodes by a first pattering process, with the transparent conductive film layer being left under the source electrodes, the drain electrodes and the data scan lines; on the resultant substrate, depositing a semiconductor layer and forming a patterned semiconductor layer by a second pattering process; and on the resultant substrate, depositing a gate insulator and a gate metal film in this order, and forming gate electrodes and gate scan lines by a third pattering process, the gate electrodes being located over the patterned semiconductor layer.

Abstract: Embodiments of the disclosed technology provide an electronic ink microcapsule and a method for producing the same, wherein the electronic ink microcapsule comprises gelatin, polyanion, and an electrophoretic suspension, and the polyanion comprises a hydrolyzate of styrene-maleic anhydride-hexafluorobutyl methacrylate-vinyl triethoxysilane tetracopolymer.

Abstract: The disclosure provides a color filter substrate, a fabricating method of the color filter substrate and a liquid crystal display with the color filter substrate. The color filter substrate comprises a substrate and a barrier wall black matrix layer on the base substrate. The barrier wall black matrix layer defines subpixel regions. The barrier wall black matrix layer comprises a light blocking layer and a barrier wall layer on the light blocking layer.