Patents by Inventor Keiichi Sasaki

Keiichi Sasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6624506
    Abstract: A plurality of semiconductor chips with the same structure are stacked to construct a multichip semiconductor device. In each of the semiconductor chips, an optional circuit is formed. In the optional circuit, fuses corresponding to the stacked-stage number of each chip are formed and the fuses are selectively cut off so as to permit each chip to individually receive a chip control signal.
    Type: Grant
    Filed: April 19, 2001
    Date of Patent: September 23, 2003
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Keiichi Sasaki, Koji Sakui
  • Publication number: 20030168744
    Abstract: A semiconductor device comprises a first substrate including an element, a first plug penetrating through the first substrate, made of a conductive material, and electrically connected with the element, a second substrate provided above the first substrate, and electrically connected with the element via the first plug, and a second plug penetrating through the first substrate, made of a non-dielectric material, and being not electrically connected with the second substrate.
    Type: Application
    Filed: December 26, 2002
    Publication date: September 11, 2003
    Inventors: Kanako Sawada, Keiichi Sasaki
  • Publication number: 20030122252
    Abstract: After a barrier film is formed on a pad electrode, Ni particles having a diameter of 2 &mgr;m or less are selectively deposited on the barrier film, thereby forming a Ni fine particle film. Then, a bump electrode made of a solder ball is provided on the pad electrode through the Ni fine particle film. Thereafter, the bump electrode is melted by a heat treatment to join the Ni fine particle film to the bump electrode. Thus, a bump electrode structure is finished.
    Type: Application
    Filed: December 9, 2002
    Publication date: July 3, 2003
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Atsuko Sakata, Keiichi Sasaki, Nobuo Hayasaka, Katsuya Okumura, Hirotaka Nishino
  • Patent number: 6542836
    Abstract: The waveform signal analyzer of the present invention is equipped with: input means 10 that inputs a waveform signals; period detection means 20 that detects the period of the waveform signals inputted by input means 10; and division means 30 that divides the waveform signals by the period detected by period detection means 20. Wavelet transformation means 40 performs wavelet transformation of each individual division of the waveform signals. Display means 50 consecutively displays in time series the wavelet transformation results of each individual division of the waveform signals.
    Type: Grant
    Filed: March 23, 2000
    Date of Patent: April 1, 2003
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Keiichi Sasaki, Akira Sawada
  • Patent number: 6538323
    Abstract: After a barrier film is formed on a pad electrode, Ni particles having a diameter of 2 &mgr;m or less are selectively deposited on the barrier film, thereby forming a Ni fine particle film. Then, a bump electrode made of a solder ball is provided on the pad electrode through the Ni fine particle film. Thereafter, the bump electrode is melted by a heat treatment to join the Ni fine particle film to the bump electrode. Thus, a bump electrode structure is finished.
    Type: Grant
    Filed: November 29, 1999
    Date of Patent: March 25, 2003
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Atsuko Sakata, Keiichi Sasaki, Nobuo Hayasaka, Katsuya Okumura, Hirotaka Nishino
  • Publication number: 20020120426
    Abstract: In a method of degradation diagnosis according to the present invention, an equipment degradation diagnosis request is input through network 4 from a diagnosis requester and a degradation diagnosis requests handler is selected in accordance with execution condition information of degradation diagnosis specified in respect of at least one degradation diagnosis requests handler and condition information in accordance with which an diagnosis requester requests degradation diagnosis. A request for execution of degradation diagnosis is made to this selected degradation diagnosis requests handler and the results of execution of the degradation diagnosis obtained by the selected degradation diagnosis requests handler are acquired and output through network 4 to the diagnosis requester. In this way, a service can be implemented whereby diagnosis of degradation requested by a diagnosis requester from a diagnostic service provider is performed rapidly and easily at low cost.
    Type: Application
    Filed: December 31, 2001
    Publication date: August 29, 2002
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Keiichi Sasaki, Akira Sawada, Yoko Todo, Katsumi Kanehira, Kazushige Kimura, Kenji Adachi, Masaaki Ookubo, Tadayoshi Murayama, Hiromi Imai
  • Publication number: 20020072878
    Abstract: A deterioration diagnosis method, wherein the amount of weight loss of a metallic material due to corrosion in atmospheric air for the exposure days is formulated as a function for environmental assessment points which represents a level of a harmfulness of the atmospheric conditions; and the life span of the metallic material is diagnosed based on the corrosion loss calculated from the function.
    Type: Application
    Filed: March 7, 2001
    Publication date: June 13, 2002
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Katsumi Kanehira, Yoko Todo, Keiichi Sasaki, Akira Sawada, Kenji Adachi, Kazushige Kimura
  • Patent number: 6376894
    Abstract: There is provided a semiconductor device in which redundancy fuses formed in an upper layer wiring region can be cut without damaging an underlying Si substrate or adjacent regions. The semiconductor device comprises a lower layer wiring formed within an interlayer insulating film on the Si substrate, and an upper layer metal wiring made of Al, Cu or the like, formed above the lower layer wiring and connected thereto through a via metal, wherein the redundancy fuses are formed in the same wiring layer as the upper layer metal wiring. For cutting a fuse by irradiating with a laser having a wavelength in a range of 1,000 to 1,100 nm and a beam diameter D (&mgr;m), the fuse may be designed to have a film thickness T (&mgr;m) and a width W (&mgr;m) which satisfy T≦(−0.15 (D+2&sgr;)+0.
    Type: Grant
    Filed: March 14, 2000
    Date of Patent: April 23, 2002
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hiroshi Ikegami, Keiichi Sasaki, Nobuo Hayasaka
  • Publication number: 20010045645
    Abstract: A plurality of semiconductor chips with the same structure are stacked to construct a multichip semiconductor device. In each of the semiconductor chips, an optional circuit is formed. In the optional circuit, fuses corresponding to the stacked-stage number of each chip are formed and the fuses are selectively cut off so as to permit each chip to individually receive a chip control signal.
    Type: Application
    Filed: April 19, 2001
    Publication date: November 29, 2001
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Keiichi Sasaki, Koji Sakui
  • Patent number: 6235624
    Abstract: Form a trench in a major surface of a semiconductor substrate, then bury a paste in the trench. The paste contains solids having a conductive substance and a resin, and solvent for dissolving the resin. The solids content of the paste is not less than 60 vol % and a viscosity ratio thereof is not more than 2.
    Type: Grant
    Filed: May 28, 1999
    Date of Patent: May 22, 2001
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Keiichi Sasaki, Manabu Kimura, Nobuo Hayasaka
  • Patent number: 5861675
    Abstract: The tungsten nitride film containing fluorine is used as a barrier metal in the contact hole or via hole of the semiconductor device. The tungsten nitride film formed contains 1% to 20% fluorine at atomic density. With this structure, it is possible to obtain a WNF film having a good step coverage for a fine hole.
    Type: Grant
    Filed: December 22, 1997
    Date of Patent: January 19, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Keiichi Sasaki, Iwao Kunishima
  • Patent number: 5446841
    Abstract: An information processing system comprises: plural processors; a shared memory connected to the plurality of processors for enabling communication between the processors; a unit disposed in the shared memory for storing information for specifying a processor connected thereto; and a unit for checking, when a first processor communicates with a second processor, whether or not the first and second processors are connected to the shared memory for direct access thereto by referring to the information storing means.
    Type: Grant
    Filed: June 15, 1992
    Date of Patent: August 29, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Kitano, Yoshitaka Ohfusa, Katsuya Kohda, Keiichi Sasaki, Hiroyuki Okura, Katsumi Takeda
  • Patent number: 4402824
    Abstract: A coal-based heavy oil is refined so as to remove quinoline insolubles and provide a hydrocarbon product suitable for making carbon stocks by heating to remove the volatile components which have boiling points ranging from the initial boiling point of the heavy oil to up to at least 200.degree. C. and at most 270.degree. C., thereby leaving a residual coal-based heavy oil, the residual coal-based heavy oil is mixed with a ketone-type solvent having a boiling point less than 200.degree. C. to form an insoluble precipitate (including quinoline insolubles) and a supernatent, the supernatent is treated to recover the ketone-type solvent, and the remaining hydrocarbon mixture is easily processed by vacuum distillation to produce a hydrocarbon product suitable for making carbon stocks.
    Type: Grant
    Filed: March 25, 1981
    Date of Patent: September 6, 1983
    Assignee: Sumitomo Metal Industries, Limited
    Inventors: Yoshihiko Sunami, Keiichi Sasaki, Tohru Iwahashi
  • Patent number: 4326946
    Abstract: A process of producing a solvent useful in coal liquefaction which includes separating the heavy liquid produced from the liquefaction of coal into a fraction boiling at 200.degree. to 210.degree. C., a fraction boiling at 211.degree. to 230.degree. C., and a fraction boiling at not less than 231.degree. subjecting the fraction boiling at 211.degree. to 230.degree. C. to a hydrogenation treatment to produce a hydrogenated fraction, mixing the hydrogenated fraction with the fraction boiling at 200.degree. to 210.degree. C. to form a resultant mixture, and mixing a portion of the resultant mixture with a portion of the fraction boiling at not less than 231.degree. C. Alternately, the solvent is produced from the heavy liquid by separating it into a fraction boiling at 200.degree. C. to 210.degree. C., a fraction boiling at 211.degree. C. to 230.degree. C., a fraction boiling at 231.degree. C. to 250.degree. C., a fraction boiling at 251.degree. C. to 350.degree. C. and a fraction boiling at not less than 351.
    Type: Grant
    Filed: June 9, 1980
    Date of Patent: April 27, 1982
    Assignee: Sumitomo Metal Industries Ltd.
    Inventors: Tsukasa Chikata, Yoshihiko Sunami, Keiichi Sasaki, Kunihiko Nishioka
  • Patent number: 4303498
    Abstract: A solvent useful in coal liquefaction is obtained by separating the heavy liquid resulting from coal liquefaction into a fraction boiling at temperatures of between 200.degree. to 210.degree. C., a fraction boiling at temperatures between 211.degree. to 250.degree. C., and a fraction boiling at not less than 250.degree. C., subjecting the fraction boiling at between 211.degree. C. to 250.degree. C. to two hydrogenation treatments, mixing the hydrogenated product with the fraction boiling at between 200.degree. to 210.degree. C. which optionally has been hydrogenated to form a resultant mixture and mixing a portion of the resultant mixture with the fraction boiling at not less than 250.degree. C. which has been optionally hydrogenated.
    Type: Grant
    Filed: June 6, 1980
    Date of Patent: December 1, 1981
    Assignee: Sumitomo Metal Industries Limited
    Inventors: Tsukasa Chikata, Yoshihiko Sunami, Keiichi Sasaki, Kunihiko Nishioka
  • Patent number: 4290849
    Abstract: A nuclear reactor comprising a reactor vessel, a core housed in the reactor vessel, an ultrasonic transducer mounted in the vicinity of the upper end of the core for emitting and receiving an ultrasonic wave pulse signal propagating above the core, means for rotating the transducer by a prescribed angle to scan horizontally the ultrasonic wave emitted from the transducer, a plurality of reflective means mounted in the vicinity of the upper end of the core in a manner to face the transducer for reflecting the ultrasonic wave signal emitted from the transducer, means for energizing the transducer, and means for displaying the ultrasonic wave signal reflected by the reflective members and received by the transducer in synchronism with the wave scanning motion of the transducer, wherein each reflective member comprises reflective surfaces each capable of reflecting the incident ultrasonic wave signal in a direction parallel with the incident direction and is mounted such that the distances of the reflective surfa
    Type: Grant
    Filed: October 20, 1978
    Date of Patent: September 22, 1981
    Assignee: Tokyo Shibaura Denki Kabushiki Kaisha
    Inventors: Nobuo Uesugi, Tatsuo Miyazawa, Mituaki Furudate, Keiichi Sasaki, Hiroji Mizuguchi
  • Patent number: D305894
    Type: Grant
    Filed: May 5, 1986
    Date of Patent: February 6, 1990
    Assignee: Kubota, Ltd.
    Inventors: Hisato Kato, Shigeru Morita, Keiichi Sasaki, Takashi Fukutaka