Abstract: Reflectance of a p-Si film crystallized by laser annealing is measured, a wave length dependency of the reflectance is found, and a first order rate of change is calculated to determine a minimum value near a wave length of 500 nm. The value is to be an inherent optical value under the laser power and relates to a grain size measured by Secco etching or the like. A number of correspondence between the optical value and the grain size are recorded and linearly plotted. By calculating the optical value from the reflectance in the p-Si film at in-line, the grain size is correspondingly determined. Thus, the semiconductor film can be in-line monitored, thereby improving a yield and saving a cost in producing a semiconductor device.

Abstract: A large-sized organic EL display unit is formed by bonding four small display panels on junction surfaces so that the pitch between emission parts adjacent to each other over the small display panels is equal to the pitch between the emission parts in the small display panels, so that the junction between the adjacent ones of the small electroluminescence display panels is inconspicuous.

Abstract: For obtaining p-Si by irradiating a laser beam to an a-Si layer to polycrystallize, an energy level in a region to be irradiated by the laser beam is set such that a level at the rear area of the region along a scan direction of the laser beam is lower than that at the front area or the center area of the region. The energy level at the front area or the center area of the region is set such that it is substantially equal to or more than the upper limit energy level which maximizes a grain size of the p-Si obtained. since an energy profile is set as described above, when the laser beam is scanned on the a-Si layer, an irradiated energy of the laser on the region is gradually lowered from the upper limit as the laser beam passes through, which allows the semiconductor layer to be annealed within an optimal energy level during the latter half of the annealing process.

Abstract: A pixel electrode for driving liquid crystal is formed on a planarization insulator film covering a thin film transistor, and a vertical alignment film without rubbing treatment is formed on the pixel electrode. An alignment control window that has electrode-free portion is formed in a common electrode, and a vertical alignment film is formed on the common electrode without rubbing treatment. The liquid crystal having negative dielectric constant anisotropy is controlled in an initial direction of the substantially normal direction without pretilt. Upon applying a voltage, the tilt of the alignment is controlled in the direction of a slanting electric field at the edge of the pixel electrode and the edge of the alignment control window, so that pixel division is performed. Since rubbing treatment is not performed, electrostatic breakdown of the thin film transistor is prevented and, because a black matrix is eliminated, aperture ratio is improved.

Abstract: On a substrate, a gate electrode, a gate insulating film covering the gate electrode, a p-Si film, and an interlayer insulating film covering the p-Si film are formed. On these a drain electrode and a source electrode are formed, so as to form a thin film transistor. In addition, a smoothing insulator film covering the thin film transistor, a pixel electrode, and a vertical alignment film covering the pixel electrode are formed. The vertical alignment film is not processed with rubbing treatment, so that the liquid crystal having negative dielectric constant anisotropy is controlled in an initial direction of the substantially normal direction without pretilt. Upon applying a voltage, the tilt of the orientation is controlled in the direction of a slanting electric field at the edge of the pixel electrode, so that a pixel division is performed. Since the rubbing treatment is not performed, electrostatic breakdown of the thin film transistor is prevented.

Abstract: A thin film transistor (TFT) which may be used as a pixel drive element in an active matrix LCD display includes a pair of side wall spacers adjacent to the opposing side walls of its gate electrode. The side wall spacers provide the gate electrode with a substantially rectangular cross section, such that the gate electrode has a substantially constant thermal conductivity over its area. The TFT has a uniform device characteristic.

Abstract: Reflectance of a p-Si film crystallized by laser annealing is measured, a wavelength dependency of the reflectance is found, and a first order rate of change is calculated to determine a minimum value near a wavelength of 500 nm. The value is to be an inherent optical value under the laser power and relates to a grain size measured by Secco etching or the like. A number of correspondence between the optical value and the grain size are recorded and linearly plotted. By calculating the optical value from the reflectance in the p-Si film at in-line, the grain size is correspondingly determined. Thus, the semiconductor film can be in-line monitored, thereby improving a yield and saving a cost in producing a semiconductor device.

Abstract: A thin film transistor (TFT) which may be used as a pixel drive element in an active matrix LCD display includes a pair of side wall spacers adjacent to the opposing side walls of its gate electrode. The side wall spacers provide the gate electrode with a substantially rectangular cross section, such that the gate electrode has a substantially constant thermal conductivity over its area. The TFT has a uniform device characteristic.

Abstract: A pixel electrode for driving liquid crystal is formed on a planarization insulator film covering a thin film transistor, and a vertical alignment film without rubbing treatment is formed on the pixel electrode. An alignment control window that has electrode-free portion is formed in a common electrode, and a vertical alignment film is formed on the common electrode without rubbing treatment. The liquid crystal having negative dielectric constant anisotropy is controlled in an initial direction of the substantially normal direction without pretilt. Upon applying a voltage, the tilt of the alignment is controlled in the direction of a slanting electric field at the edge of the pixel electrode and the edge of the alignment control window, so that pixel division is performed. Since rubbing treatment is not performed, electrostatic breakdown of the thin film transistor is prevented and, because a black matrix is eliminated, aperture ratio is improved.

Abstract: On a TFT substrate, a TFT using a low-temperature poly silicon thin film as an active layer is formed and a plurality of pixel electrodes are formed over the TFT and its electrode wiring, with an interlayer insulating layer between. In a common electrode formed on an opposite substrate opposite the TFT substrate with a liquid crystal layer between, an alignment controlling window for the liquid crystal is formed at a predetermined position opposite each of the pixel electrodes. A wide viewing angle is achieved by dividing an alignment area of liquid crystal molecules in one pixel area. The liquid crystal layer is vertically aligned and can be operated at a low driving voltage obtained by a poly silicon TFT by including fluorine liquid crystal molecules having negative dielectric anisotropy and fluorine side chains in the liquid crystal.

Abstract: A thin film transistor (TFT) which may be used as a pixel drive element in an active matrix LCD display includes a pair of side wall spacers adjacent to the opposing side walls of its gate electrode. The side wall spacers provide the gate electrode with a substantially rectangular cross section, such that the gate electrode has a substantially constant thermal conductivity over its area. The TFT has a uniform device characteristic.

Abstract: A liquid crystal display includes a display region which is provided with a display pixel driving element, a drain driver which is arranged at least on a part around the display region for supplying a video signal to the display pixel driving element of the display region, a gate driver which is arranged at least on a part around the display region for supplying a scanning signal to the display pixel driving element of the display region, a drain line which is provided to connect the display region with the drain driver, and an additional capacitive electrode which is provided on a region between the display region and the drain driver.

Abstract: An active matrix liquid crystal display improves its contrast by suppressing irregularity of an alignment film caused by video lines thereby reducing reverse regions on a display electrode. The active matrix liquid crystal display has first and second opposite substrates, a video line, an active element and a display electrode which are directly or indirectly formed on the first substrate, and an alignment film which is formed on or above the video line, the active element and the display electrode. The alignment film is so formed that is surface is at an angle of inclination of not more than 10.5.degree. with respect to the display electrode surface between the video line and the display electrode.

Abstract: A semiconductor device includes an insulating layer and an interconnection layer having a conductive layer provided over the insulating layer. The interconnection layer is patterned by photolithography. The device further includes a cap-metal layer, which is deposited on the conductive layer and suppresses reflection of light beams at the time of patterning the interconnection layer. The cap-metal layer has any one of the following structures: a double-layered structure having a titanium nitride layer and a titanium layer located between the titanium nitride layer and the conductive layer; a double-layered structure having a titanium nitride layer and an aluminum-titanium alloy layer located between the titanium nitride layer and the conductive layer; and a single-layered structure consisting essentially of an aluminum-titanium alloy. These design ensure accurate interconnection patterning in the photolithography, and provide improved EM and SM immunities of the interconnection.

Abstract: An active matrix liquid crystal display improves its contrast by suppressing irregularity of an alignment film caused by video lines thereby reducing reverse regions on a display electrode. The active matrix liquid crystal display has first and second opposite substrates, a video line, an active element and a display electrode which are directly or indirectly formed on the first substrate, and an alignment film which is formed on or above the video line, the active element and the display electrode. The alignment film is so formed that its surface is at an angle of inclination of not more than 10.5.degree. with respect to the display electrode surface between the video line and the display electrode.

Abstract: To provide a manufacturing method of thin film transistors (TFT) using poly-silicone and having an LDD structure. In particular, the LDD sections of the TFTs are formed in an improved method so as to achieve a high throughput and stable performance of the TFTs. To be specific, the LD region is doped at a low concentration in the ion implantation method which includes mass spectrometry because high controllability over a dose is required. On the other hand, the source and drain regions are doped at a higher concentration than the LD region in the ion showering method which does not include mass spectrometry. Using the ion showering method, poly-crystal silicon can be doped such that less doping damage is caused thereto. This makes it possible to apply a lower temperature for annealing, such as RTA, to activate doped impurities so as to prevent the substrate from being curved.

Abstract: A keyboard has a joyball centrally positioned and operable by the operator with a hand, and a plurality of operation keys operable by the operator with the fingertips and disposed in a substantially semicircular array around the joyball. The keyboard is connected to a video camera for controlling the attitude of the video camera with the joyball and adjusting the optical system of the video camera, all with one hand of the operator.

Abstract: A method of fabricating a thin film transistor by setting the temperature of a heat treatment for crystallizing an active layer which is formed on a substrate at a level not deforming the substrate and activating an impurity layer in a heat treatment method different from that employed for the heat treatment, and a semiconductor device prepared by forming a heat absorption film, a semiconductor film, a gate insulating film, and a gate electrode on a substrate, the heat absorption film being provided within a region substantially corresponding to the semiconductor film.

Abstract: A dry etching method includes the steps of etching a transparent electrode film by reactive ion etching with a first etching gas, changing the first etching gas to a second etching gas, and etching the transparent electrode film by reactive ion etching with the second etching gas. A chlorine containing gas is employed as the second etching gas.

Abstract: A liquid crystal display unit is described, which includes a first substrate, a second substrate opposing to the first substrate, pixel driving elements, first and second insulation layers, a planarizing film and a liquid crystal layer. The pixel driving elements are disposed on the first substrate and between the first and second substrates. The first insulation layer is deposited over the first substrate and the pixel driving elements. The planarizing film is formed on the first insulation layer. This planarizing film provides a substantially flat surface over the first substrate to minimize a height of a step present between an area corresponding to each pixel driving element and an area locating adjacent to the pixel driving element on the first substrate. The second insulation layer is formed on the planarizing film. The display electrodes are formed on the second insulation layer and electrically connected to the pixel driving elements, respectively.