Patents by Inventor Michael Tucker

Michael Tucker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography
    Patent number: 8039176
    Abstract: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a series of curvilinear character projection shots are determined for a charged particle beam writer system, such that the set of shots can form a continuous track, possibly of varying width, on a surface. A method for forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed.
    Type: Grant
    Filed: November 14, 2009
    Date of Patent: October 18, 2011
    Assignee: D2S, Inc.
    Inventors: Akira Fujimura, Michael Tucker
  • System and method for information retrieval from object collections with complex interrelationships
    Patent number: 8019752
    Abstract: A data-driven information navigation system and method enable search and analysis of a set of objects or other materials by certain common attributes that characterize the materials, as well as by relationships among the materials. The invention includes several aspects of a data-driven information navigation system that employs this navigation mode. The navigation system of the present invention includes features of a knowledge base, a navigation model that defines and enables computation of a collection of navigation states, a process for computing navigation states that represent incremental refinements relative to a given navigation state, and methods of implementing the preceding features.
    Type: Grant
    Filed: November 10, 2005
    Date of Patent: September 13, 2011
    Assignee: Endeca Technologies, Inc.
    Inventors: Adam J. Ferrari, Frederick C. Knabe, Vinay Seth Mohta, Jason Paul Myatt, Benjamin S. Scarlet, Daniel Tunkelang, John S. Walter, Joyce Wang, Michael Tucker
  • Method for fracturing circular patterns and for manufacturing a semiconductor device
    Patent number: 8017288
    Abstract: A method for manufacturing a semiconductor device using a photomask and optical lithography is disclosed, wherein circular patterns on the semiconductor wafer are formed by using circular patterns on the photomask, which is manufactured using a charged particle beam writer. In one embodiment, circular patterns of varying sizes have been formed on the photomask using a single character projection (CP) character, by varying the charged particle beam dosage. A method for fracturing circular patterns is also disclosed, either using circular CP characters or using VSB shots wherein the union of the plurality of VSB shots is different than the set of desired patterns.
    Type: Grant
    Filed: August 12, 2009
    Date of Patent: September 13, 2011
    Assignee: D2S, Inc.
    Inventors: Akira Fujimura, Michael Tucker
  • Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots
    Patent number: 7985514
    Abstract: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a shot determined for a shaped charged particle beam writer system comprises dragging the charged particle beam across a surface during the shot, so as to form a complex pattern in a single, extended shot. The dragging may be done with either variable shaped beam (VSB) or character projection (CP) shots. Methods for specifying in the shot data the path for the dragged shot are also disclosed. Other embodiments include using dragged shots with partial projection, varying the dragging velocity during a shot, and combining dragged shots with conventional shots. A method and system for creating glyphs which contain dragged shots is also disclosed.
    Type: Grant
    Filed: October 21, 2009
    Date of Patent: July 26, 2011
    Assignee: D2S, Inc.
    Inventors: Akira Fujimura, Harold Robert Zable, Michael Tucker
  • Method for Fracturing a Pattern for Writing with a Shaped Charged Particle Beam Writing System Using Dragged Shots
    Publication number: 20110089344
    Abstract: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a shot determined for a shaped charged particle beam writer system comprises dragging the charged particle beam across a surface during the shot, so as to form a complex pattern in a single, extended shot. The dragging may be done with either variable shaped beam (VSB) or character projection (CP) shots. Methods for specifying in the shot data the path for the dragged shot are also disclosed. Other embodiments include using dragged shots with partial projection, varying the dragging velocity during a shot, and combining dragged shots with conventional shots. A method and system for creating glyphs which contain dragged shots is also disclosed.
    Type: Application
    Filed: October 21, 2009
    Publication date: April 21, 2011
    Applicant: D2S, INC.
    Inventors: Akira Fujimura, Harold Robert Zable, Michael Tucker
  • METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING CHARGED PARTICLE BEAM LITHOGRAPHY
    Publication number: 20110089345
    Abstract: In the field of semiconductor production using shaped beam charged particle beam lithography, a pattern is formed on a surface by dragging a charged particle beam across the surface in a single extended shot to form a track. In some embodiments, the track may form a straight path, a curved path, or a perimeter of a curvilinear shape. In other embodiments, the width of the track may be altered by varying the velocity of the dragged beam. The techniques may be used for manufacturing an integrated circuit by dragging a charged particle beam across a resist-coated wafer to transfer a pattern to the wafer, or by dragging a charged particle beam across a reticle, where the reticle is used to manufacture a photomask which is then used to transfer a pattern to a wafer using an optical lithographic process.
    Type: Application
    Filed: October 5, 2010
    Publication date: April 21, 2011
    Applicant: D2S, INC.
    Inventors: Takashi Komagata, Akira Fujimura, Harold Robert Zable, Michael Tucker
  • LED lamp assembly
    Patent number: 7923907
    Abstract: A robust LED lamp may be assembly by forming a heat sinking sandwich with two metal heat sinks positioned around the circuit board and pinned together a heat conductive element. The assembly is positioned by pressing it into a base providing electrical connections. The robust assembly is rapidly assembled, thermally effective in draining or spreading heat from the circuit board and is readily adaptable to a variety of applications lighting. The heat sink may be decorated, colored or otherwise esthetically enhanced for consumer appreciation.
    Type: Grant
    Filed: January 19, 2009
    Date of Patent: April 12, 2011
    Assignee: Osram Sylvania Inc.
    Inventors: Thomas Tessnow, Kim Albright, Michael Tucker
  • LED lamp assembly
    Patent number: 7922364
    Abstract: An LED lamp assembly with a substantial heat sink may be inexpensively constructed using sections of extruded metal as the heat sink. The extruded heat sink sections are trapped in latched sandwich structure assuring good thermal contact between the LED light sources and the extruded heat sink and a metal optic. The inexpensive structure may be rapidly assembled.
    Type: Grant
    Filed: March 10, 2009
    Date of Patent: April 12, 2011
    Assignee: OSRAM SYLVANIA, Inc.
    Inventors: Thomas Tessnow, Kim Albright, Michael Tucker
  • Method for Fracturing and Forming a Pattern Using Curvilinear Characters with Charged Particle Beam Lithography
    Publication number: 20110053056
    Abstract: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a series of curvilinear character projection shots are determined for a charged particle beam writer system, such that the set of shots can form a continuous track, possibly of varying width, on a surface. A method for forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed.
    Type: Application
    Filed: November 14, 2009
    Publication date: March 3, 2011
    Applicant: D2S, Inc.
    Inventors: Akira Fujimura, Michael Tucker
  • AUTOMOTIVE TAILLIGHT LIGHT GUIDE
    Publication number: 20100246200
    Abstract: A light guide for an automotive tail light may be efficiently made with a plurality of thick planar light guides stacked side by side to have a common input source point at one end, but spread at their respective opposite ends to be arranged to form parallel planes separated sufficiently to project a relatively larger combined image that may suggest in outline a larger object. The relatively thick plates efficiently transmit light. The planar structures direct light efficiently in the horizontal plane. The side by side offset of the output windows creates an image of a larger more readily seen structure.
    Type: Application
    Filed: March 30, 2009
    Publication date: September 30, 2010
    Applicant: OSRAM SYLVANIA Inc.
    Inventors: THOMAS TESSNOW, MICHAEL TUCKER
  • Method for design and manufacture of a reticle using variable shaped beam lithography
    Patent number: 7799489
    Abstract: A method is disclosed for using non-overlapping variable shaped beam (VSB) shots in the design and manufacture of a reticle, where the union of the plurality of shots deviates from the desired pattern. Methods are described for fracturing or mask data preparation or proximity effect correction of a desired pattern to be formed on a reticle; for forming a pattern on a reticle using charged particle beam lithography; and for optical proximity correction (OPC) of a desired pattern. Dosages of the shots may be allowed to vary with respect to each other. The plurality of shots may be determined such that a pattern on the surface calculated from the plurality of shots is within a predetermined tolerance of the desired pattern. In some embodiments, an optimization technique may be used to minimize shot count.
    Type: Grant
    Filed: August 12, 2009
    Date of Patent: September 21, 2010
    Assignee: D2S, Inc.
    Inventors: Akira Fujimura, Michael Tucker
  • LED LAMP ASSEMBLY
    Publication number: 20100232164
    Abstract: An LED lamp assembly with a substantial heat sink may be inexpensively constructed using sections of extruded metal as the heat sink. The extruded heat sink sections are trapped in latched sandwich structure assuring good thermal contact between the LED light sources and the extruded heat sink and a metal optic. The inexpensive structure may be rapidly assembled.
    Type: Application
    Filed: March 10, 2009
    Publication date: September 16, 2010
    Applicant: OSRAM SYLVANIA INC.
    Inventors: Thomas Tessnow, Kim Albright, Michael Tucker
  • LED LAMP ASSEMBLYl
    Publication number: 20100181885
    Abstract: A robust LED lamp may be assembly by forming a heat sinking sandwich with two metal heat sinks positioned around the circuit board and pinned together a heat conductive element. The assembly is positioned by pressing it into a base providing electrical connections. The robust assembly is rapidly assembled, thermally effective in draining or spreading heat from the circuit board and is readily adaptable to a variety of applications lighting. The heat sink may be decorated, colored or otherwise esthetically enhanced for consumer appreciation.
    Type: Application
    Filed: January 19, 2009
    Publication date: July 22, 2010
    Applicant: OSRAM SYLVANIA INC.
    Inventors: THOMAS TESSNOW, KIM ALBRIGHT, MICHAEL TUCKER
  • COMBINED SURFACE COOLER AND ACOUSTIC ABSORBER FOR TURBOMACHINES
    Publication number: 20100155016
    Abstract: A surface cooler for turbomachines is provided. The surface cooler comprises an inner layer and an outer layer disposed adjacent to the inner layer and comprising a metal foam, a carbon foam, or a combination thereof, wherein the metal foam, the carbon foam or a combination thereof is configured to augment heat transfer and enhance acoustic absorption. Further, the outer layer comprises a plurality of fins, wherein the plurality of fins is configured to augment heat transfer and enhance acoustic absorption, and wherein the plurality of fins comprises metal foam, a carbon foam, or a combination thereof.
    Type: Application
    Filed: December 23, 2008
    Publication date: June 24, 2010
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Trevor Howard Wood, Todd Garrett Wetzel, Jonathan Glenn Luedke, Thomas Michael Tucker
  • Automotive lamp and reflector for low beam and advanced forward lighting system
    Patent number: 7722210
    Abstract: An advanced forward lighting system may be made with a lamp having a first filament and a second filament extending perpendicular to the first filament. The second filament is partially hidden rearward and above the first filament. A reflector forms a main beam from the first filament light and a right or left cast supplemental beam from the second filament light. The second filament's position minimizes glare, and enables a simple advanced forward lighting system from a single standard lamp fitting both right and left side reflectors.
    Type: Grant
    Filed: July 2, 2008
    Date of Patent: May 25, 2010
    Assignee: OSRAM SYLVANIA Inc.
    Inventors: Thomas Tessnow, Joseph C. Swadel, Daniel D. Devir, Richard D. Holland, Edward P. Otto, Michael Tucker
  • METHOD FOR DESIGN AND MANUFACTURE OF A RETICLE USING VARIABLE SHAPED BEAM LITHOGRAPHY
    Publication number: 20100055581
    Abstract: A method is disclosed for using non-overlapping variable shaped beam (VSB) shots in the design and manufacture of a reticle, where the union of the plurality of shots deviates from the desired pattern. Methods are described for fracturing or mask data preparation or proximity effect correction of a desired pattern to be formed on a reticle; for forming a pattern on a reticle using charged particle beam lithography; and for optical proximity correction (OPC) of a desired pattern. Dosages of the shots may be allowed to vary with respect to each other. The plurality of shots may be determined such that a pattern on the surface calculated from the plurality of shots is within a predetermined tolerance of the desired pattern. In some embodiments, an optimization technique may be used to minimize shot count.
    Type: Application
    Filed: August 12, 2009
    Publication date: March 4, 2010
    Applicant: D2S, INC.
    Inventors: Akira Fujimura, Michael Tucker
  • METHOD AND SYSTEM FOR FORMING CIRCULAR PATTERNS ON A SURFACE
    Publication number: 20100055586
    Abstract: A method for forming circular patterns on a surface using a character projection (CP) charged particle beam writer is disclosed, wherein circular patterns of different sizes may be formed using a single CP character, by varying dosage. A method for forming circular patterns on a surface using a variable shaped beam (VSB) charged particle beam writer is also disclosed, wherein the dosages of the shots may vary, and wherein the union of the shots is different than the set of target patterns. A method for forming circular patterns on a surface using a library of glyphs is also disclosed, wherein the glyphs are pre-calculated dosage maps that can be formed by one or more charged particle beam shots.
    Type: Application
    Filed: August 12, 2009
    Publication date: March 4, 2010
    Applicant: D2S, INC.
    Inventors: Akira Fujimura, Michael Tucker
  • METHOD FOR FRACTURING CIRCULAR PATTERNS AND FOR MANUFACTURING A SEMICONDUCTOR DEVICE
    Publication number: 20100055580
    Abstract: A method for manufacturing a semiconductor device using a photomask and optical lithography is disclosed, wherein circular patterns on the semiconductor wafer are formed by using circular patterns on the photomask, which is manufactured using a charged particle beam writer. In one embodiment, circular patterns of varying sizes have been formed on the photomask using a single character projection (CP) character, by varying the charged particle beam dosage. A method for fracturing circular patterns is also disclosed, either using circular CP characters or using VSB shots wherein the union of the plurality of VSB shots is different than the set of desired patterns.
    Type: Application
    Filed: August 12, 2009
    Publication date: March 4, 2010
    Applicant: D2S, INC.
    Inventors: Akira Fujimura, Michael Tucker
  • Bending beam headlamp with multi-filament bulb
    Patent number: 7670037
    Abstract: An automotive headlamp bulb provides the two light or three filament sources in a single bulb. One source may be used to generate a standard headlamp beam, while the second source may be used to generate an augmenting side beam in response to a turning signal. A similar third filament may provide an augmenting beam to the opposite side, or farther to the same side. The single bulb eliminates the need for a second bulb, or a second reflector in an advanced headlamp system with turning light augmentation.
    Type: Grant
    Filed: September 28, 2007
    Date of Patent: March 2, 2010
    Assignee: Osram Sylvania Inc.
    Inventors: Daniel D. Devir, Thomas Tessnow, Michael Tucker, Joseph L. Wegman, Andreas Osten, Craig Landcastle
  • Automotive lamp and reflector for low beam and advanced forward lighting system
    Publication number: 20100002458
    Abstract: An advanced forward lighting system may be made with a lamp having a first filament and a second filament extending perpendicular to the first filament. The second filament is partially hidden rearward and above the first filament. A reflector forms a main beam from the first filament light and a right or left cast supplemental beam from the second filament light. The second filament's position minimizes glare, and enables a simple advanced forward lighting system from a single standard lamp fitting both right and left side reflectors.
    Type: Application
    Filed: July 2, 2008
    Publication date: January 7, 2010
    Applicant: OSRAM SYLVANIA INC
    Inventors: Thomas Tessnow, Joseph C. Swadel, Daniel D. Devir, Richard D. Holland, Edward P. Otto, Michael Tucker