Abstract: A lid is provided for engagement with a projecting rim of an opening on a container. The lid includes a covering panel for closing the container opening and a skirt formed on a periphery of the cover and depending therefrom. The skirt overlaps with the container rim when the cover is positioned over the opening. The skirt includes a defined gap therein that is positioned between adjacent gap edges. A clasp is provided on the periphery of the cover adjacent the defined gap. The clasp pivots between an open position and an engaged position. In the engaged position, the clasp engages the gap edges and draws the edges toward one another. The drawing of the gap edges moves the skirt inwardly towards the container rim. The lid may further include a flexing portion defining a connection between the cover panel and the skirt. The engagement of the clasp on the skirt causes compliance of the flexing portion and a corresponding axial movement of the skirt relative to the cover panel.

Abstract: A stencil for character projection (CP) charged particle beam lithography and a method for manufacturing the stencil is disclosed, where the stencil contains two circular characters, where each character is capable of forming patterns on a surface in a range of sizes by using different dosages, and where the size ranges for the two characters is continuous. A method for forming circular patterns on a surface using variable-shaped beam (VSB) shots of different dosages is also disclosed. A method for forming circular patterns on a surface using a set of shots, where all of the shots comprise dosages, is also disclosed.

Abstract: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a series of curvilinear character projection shots are determined for a charged particle beam writer system, such that the set of shots can form a continuous track, possibly of varying width, on a surface. In some embodiments, characteristics of the continuous track will be within a predetermined tolerance.

Abstract: Tubular objects having two or more concentric layers that have different properties are joined to one another during their manufacture primarily by compressive and friction forces generated by shrinkage during sintering and possibly mechanical interlocking. It is not necessary for the concentric tubes to display adhesive-, chemical- or sinter-bonding to each other in order to achieve a strong bond. This facilitates joining of dissimilar materials, such as ceramics and metals.

Abstract: An outlet guide vane assembly for turbomachines is provided. The outlet guide vane assembly comprises one or more outlet guide vanes, wherein each of the one or more outlet guide vanes comprises a first surface and a second surface, and wherein the one or more outlet guide vanes are disposed between an inner wall and an outer wall of an engine and a surface cooler layer disposed on at least a portion of the first surface, the second surface, or both of the one or more outlet guide vanes, wherein the surface cooler layer comprises a metal foam, a carbon foam, or a combination thereof, wherein the metal foam, the carbon foam or the combination thereof is configured to augment heat transfer and enhance acoustic absorption.

Abstract: A lamp (10) has a cup-shaped body (12) with a planar bottom (14) with an up-standing, peripheral sidewall (16) defining a top (18). The body (12) is thermally conductive and preferably is a metal such as aluminum. A reflective coating (20) is provided on the inside surface of the planar bottom (14) and side wall (16) for reflecting light generated by a single, side emitting LED (22) that is mounted on a thermally conductive, electrically insulating coupling (24) and is positioned substantially in the center of the planar bottom (14). A lens (26) for directing a beam of light emitted from the LED (22) in a desired direction is provided and preferably is a Fresnel optic. The lens (26) can close the opening (18) as shown in FIG. 1 or it can be formed as an integral part of bottom (14) or it can be added to the bottom (14), as shown in FIG. 2. Alternatively, the lens (26) can be solid with the lens elements either external (FIG. 4) or internal (FIG. 5).

Abstract: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of shots of circular or nearly-circular character projection characters, having at least two shots that overlap, can form a non-circular pattern on a surface. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming non-circular patterns on a surface using a plurality of circular or nearly-circular character projection shots, where at least two shots overlap, is also disclosed.

Abstract: Systems and methods are disclosed to identify and generate keyword searches in real-time or near real-time for active participants in an on-going Audio, Video and Data Collaboration meeting (also referred to as “Unified Communications and Collaboration” or UCC). In one embodiment, multiple input sources are screened to detect text data and generate search strings from the deciphered keywords. Keywords are deciphered from presentation materials and other forms of data input to a UCC (e.g., documents, video, and audio). Keywords and generated search strings can then be presented to one or more participants for selection (e.g., hyperlink) to retrieve and present supporting material relative to a topic of discussion or point of interest in the UCC. Alternatively, recorded content can be search during or prior to playback to allow incorporation of disclosed embodiments and concepts.

Abstract: In a safety management system for equipment adapted to operate autonomously in a real-time environment, both a deterministic processor and a non-deterministic processor are provided for processing incoming alerts and generating control signals in response. The non-deterministic processor can deal with unrehearsed, complex and unpredictable situations, by providing essentially open-ended procedures working in large search spaces with no guarantee of a solution. The deterministic processor monitors behaviour of the non-deterministic processor and validates control signals produced by it against safety policies. The deterministic processor also provides an “intelligent” interface to the non-deterministic processor, which receives alerts only from the deterministic processor, and enforces time-critical delivery of responses.

Abstract: A fan shroud assembly includes a fixed fan shroud and a removable fan shroud. An upper retention system integral with the fixed and removable fan shrouds secures the two circumferential ends of the removable fan shroud to the fixed fan shroud. A lower retention system integral with the fixed and removable fan shroud secures the center of the removable fan shroud to the fixed fan shroud. No additional fasteners are required to connect the removable fan shroud to the fixed fan shroud because of the integral nature of the upper and lower retention systems.

Abstract: A data-driven information navigation system and method enable search and analysis of a set of objects or other materials by certain common attributes that characterize the materials, as well as by relationships among the materials. The invention includes several aspects of a data-driven information navigation system that employs this navigation mode. The navigation system of the present invention includes features of a knowledge base, a navigation model that defines and enables computation of a collection of navigation states, a process for computing navigation states that represent incremental refinements relative to a given navigation state, and methods of implementing the preceding features.

Abstract: A method for manufacturing a semiconductor device is disclosed, wherein during the physical design process, a curvilinear path is designed to represent an interconnecting wire on the fabricated semiconductor device. A method for fracturing or mask data preparation (MDP) is also disclosed in which a manhattan path which is part of the physical design of an integrated circuit is modified to create a curvilinear pattern, and where a set of charged particle beam shots is generated, where the set of shots is capable of forming the curvilinear pattern on a resist-coated surface.

Abstract: A wing structure is provided, wherein the wing structure comprises; an upper covering, a lower covering, and a spar, the spar comprising; a spar web, an upper spar cap attached to the upper covering, and a lower spar cap attached to the lower covering, the wing structure also comprising a face spaced apart from the spar web extending between the upper and lower spar caps. The wing structure is arranged to contain fuel in a fuel containment area between the upper and lower coverings on one side of the spar web. The upper and lower spar caps extend from the spar web only on the other side of the spar web to the fuel containment area.

Abstract: A stencil for character projection (CP) charged particle beam lithography and a method for manufacturing the stencil is disclosed, where the stencil contains two circular characters, where each character is capable of forming patterns on a surface in a range of sizes by using different dosages, and where the size ranges for the two characters is continuous. A method for forming circular patterns on a surface using variable-shaped beam (VSB) shots of different dosages is also disclosed. A method for forming circular patterns on a surface using a set of shots, where all of the shots comprise dosages, is also disclosed.

Abstract: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of shots of circular or nearly-circular character projection characters, having at least two shots that overlap, can form a non-circular pattern on a surface. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming non-circular patterns on a surface using a plurality of circular or nearly-circular character projection shots, where at least two shots overlap, is also disclosed.

Abstract: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a series of curvilinear character projection shots are determined for a charged particle beam writer system, such that the set of shots can form a continuous track, possibly of varying width, on a surface. A method for forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed.

Abstract: A solid-state light source (10) comprising a plurality of LED units (12) arrayed to emit light generally about an axis (14). Each of the LED units (12) can comprise a number of LEDs, for example, up to five. They may all emit in a single color or multiple colors can be combined for a specific effect. A light transmissive light guide (16) is associated with the LED units (12) and has a plurality of input widows (18). Each LED unit (12) faces a respective input window (18) and each window (18) transversely intercepts the axis (14) and receives light from the LED units (12). The input windows (18) lead to a common output window (20) that is axially aligned with the input windows (18). The light guide (16) has smooth sidewalls (22) that extend between the input windows (18) and the output window (20).

Abstract: A lid is provided for engagement with a projecting rim of an opening on a container. The lid includes a covering panel for closing the container opening and a skirt formed on a periphery of the cover and depending therefrom. The skirt overlaps with the container rim when the cover is positioned over the opening. The skirt includes a defined gap therein that is positioned between adjacent gap edges. A clasp is provided on the periphery of the cover adjacent the defined gap. The clasp pivots between an open position and an engaged position. In the engaged position, the clasp engages the gap edges and draws the edges toward one another. The drawing of the gap edges moves the skirt inwardly towards the container rim. The lid may further include a flexing portion defining a connection between the cover panel and the skirt. The engagement of the clasp on the skirt causes compliance of the flexing portion and a corresponding axial movement of the skirt relative to the cover panel.

Abstract: A method for forming circular patterns on a surface using a character projection (CP) charged particle beam writer is disclosed, wherein circular patterns of different sizes may be formed using a single CP character, by varying dosage. A method for forming circular patterns on a surface using a variable shaped beam (VSB) charged particle beam writer is also disclosed, wherein the dosages of the shots may vary, and wherein the union of the shots is different than the set of target patterns. A method for forming circular patterns on a surface using a library of glyphs is also disclosed, wherein the glyphs are pre-calculated dosage maps that can be formed by one or more charged particle beam shots.

Abstract: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a series of curvilinear character projection shots are determined for a charged particle beam writer system, such that the set of shots can form a continuous track, possibly of varying width, on a surface. A method for forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed.